Array Of Non-volatile Memory Cells With ROM Cells
    82.
    发明申请
    Array Of Non-volatile Memory Cells With ROM Cells 有权
    具有ROM单元的非易失性存储单元阵列

    公开(公告)号:US20160254269A1

    公开(公告)日:2016-09-01

    申请号:US14639063

    申请日:2015-03-04

    Abstract: A memory device that includes a plurality of ROM cells each having spaced apart source and drain regions formed in a substrate with a channel region therebetween, a first gate disposed over and insulated from a first portion of the channel region, a second gate disposed over and insulated from a second portion of the channel region, and a conductive line extending over the plurality of ROM cells. The conductive line is electrically coupled to the drain regions of a first subgroup of the ROM cells, and is not electrically coupled to the drain regions of a second subgroup of the ROM cells. Alternately, a first subgroup of the ROM cells each includes a higher voltage threshold implant region in the channel region, whereas a second subgroup of the ROM cells each lack any higher voltage threshold implant region in the channel region.

    Abstract translation: 一种存储器件,其包括多个ROM单元,每个ROM单元具有形成在衬底中的间隔开的源极和漏极区域,其间具有沟道区域,设置在沟道区域的第一部分上方并与沟道区域的第一部分绝缘的第一栅极, 与沟道区的第二部分绝缘,以及在多个ROM单元上延伸的导电线。 导电线电耦合到ROM单元的第一子组的漏极区域,并且不电耦合到ROM单元的第二子组的漏极区域。 或者,ROM单元的第一子组各自包括沟道区域中的较高电压阈值注入区域,而ROM单元的第二子组每个在沟道区域中都缺少任何较高电压阈值注入区域。

    High Density Split-Gate Memory Cell
    83.
    发明申请
    High Density Split-Gate Memory Cell 审中-公开
    高密度分离栅极存储单元

    公开(公告)号:US20160217849A1

    公开(公告)日:2016-07-28

    申请号:US15002302

    申请日:2016-01-20

    Abstract: A method of forming a memory device that includes forming on a substrate, a first insulation layer, a first conductive layer, a second insulation layer, a second conductive layer, a third insulation layer. First trenches are formed through third insulation layer, the second conductive layer, the second insulation layer and the first conductive layer, leaving side portions of the first conductive layer exposed. A fourth insulation layer is formed at the bottom of the first trenches that extends along the exposed portions of the first conductive layer. The first trenches are filled with conductive material. Second trenches are formed through the third insulation layer, the second conductive layer, the second insulation layer and the first conductive layer. Drain regions are formed in the substrate under the second trenches. A pair of memory cells results, with a single continuous channel region extending between drain regions for the pair of memory cells.

    Abstract translation: 一种形成存储器件的方法,包括在衬底上形成第一绝缘层,第一导电层,第二绝缘层,第二导电层,第三绝缘层。 第一沟槽通过第三绝缘层,第二导电层,第二绝缘层和第一导电层形成,从而使第一导电层的侧面部分露出。 第一绝缘层形成在沿第一导电层的暴露部分延伸的第一沟槽的底部。 第一个沟槽填充有导电材料。 第二沟槽通过第三绝缘层,第二导电层,第二绝缘层和第一导电层形成。 在第二沟槽下的衬底中形成漏区。 导致一对存储单元,其中单个连续沟道区域在用于该对存储单元的漏极区域之间延伸。

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