Effective near neutral pH etching solution for molybdenum or tungsten
    3.
    发明授权
    Effective near neutral pH etching solution for molybdenum or tungsten 失效
    有效的近中性pH腐蚀溶液用于钼或钨

    公开(公告)号:US4995942A

    公开(公告)日:1991-02-26

    申请号:US516845

    申请日:1990-04-30

    申请人: Lawrence D. David

    发明人: Lawrence D. David

    CPC分类号: C23F1/14

    摘要: A neutral or near neutral pH etching solution for effectively etching molybdenum and tungsten including: an aqueous ferricyanide ion solution, a soluble molybdate or tungstate, and an essential compound such that upon combination of said soluble molybdate or tungstate and said essential compound, a heteropoly compound is formed in which said essential compound contributes at least one heteroatom to said heteropoly compound.The etching solution is most preferably used for etching molybdenum or tungsten which is adhered or proximate to a base-sensitive material.