摘要:
A system for testing electronic circuits is configured to receive a test signal and an ideal response signal and output a test result signal. The system for testing electronic circuits includes a circuit portion to be tested, a comparator and a comparison result recorder. The circuit portion to be tested receives a test signal from a test instrument, and outputs a system response signal. The comparator receives the system response signal from the circuit portion to be tested and receives an ideal response signal from the test instrument. Then, the comparator outputs a comparison result according to the system response signal and the ideal response signal. The comparison result recorder receives and records the comparison result. The comparison result recorder may record comparison results within a period of test time. The test instrument can obtain a record of the comparison results from the comparison result recorder.
摘要:
Apparatuses, methods and systems of selecting a gain setting of a receiver chain are disclosed. One method includes bypassing a filter portion of the receiver chain and sampling a bypass receive signal while the filter portion of the receiver chain is bypassed. If the sampled bypass receive signal is determined to be saturated greater than a threshold, then selecting a gain setting of the receive chain as a function of the saturation. Further, the filter portion of the receive chain is included while sampling a receive signal with the selected gain setting.
摘要:
A wafer layout assisting method is used to assist a circuit designer to estimate the layout related parameter during a circuit designing process. The wafer layout assisting method includes the following steps. A circuit information file is read. A graphic user interface (GUI) is generated according to the circuit information file. A coarse layout arrangement input by a user is received. It is determined whether the coarse layout arrangement is finished or not. A layout related parameter is generated according to device types, device parameters, and the coarse layout arrangement, if the coarse layout arrangement is finished. The circuit designer may increase an accuracy of a circuit simulation result by appropriately utilizing the layout related parameters. Through the wafer layout assisting method, the layout related parameter after the layout is performed may be pre-estimated, thus reducing a difference between the circuit simulation results before and after the layout is performed.
摘要:
A fast testable wafer includes a die group, testing points located on dies, a scribe line located between the dies, and a plurality of testing pads disposed in the scribe line area. The testing points comprise bonding pads or electrodes of internal circuits within the dies. The testing pads and bonding pads may be electrically connected and arranged suitably such that testing probes may be electrically connected to the testing pads and bonding pads easily so as to test the plurality of dies at about the same time. Through suitable circuits on the wafer, different circuit routes may be selected to connect the testing pads and different testing points on the dies so as to test a plurality of dies without moving the testing probes and thereby accelerating the test.
摘要:
A method and apparatus of calibrating a transmitter are disclosed. The method includes attenuating transmitter output signals as controlled by an output control signal, ensuring that an average power of the transmitter output signals is below a threshold level, and performing calibration of the transmitter at periods of time in which the output control signal is attenuating the transmitter output signals a lesser amount. The lesser amount can be less than an average of a minimum amount of attenuation and a maximum amount of attenuation. The apparatus includes a transmitter that includes a frequency up-converting LO mixer for frequency up-converting base band signals, generating transmitter output signals, a transmitter antenna for transmitting the transmitter output signals, and control circuitry for controlling attenuating the transmitter output signals during a calibration of the transmitter.
摘要:
A method and apparatus of calibrating a transmitter are disclosed. The method includes attenuating transmitter output signals as controlled by an output control signal, ensuring that an average power of the transmitter output signals is below a threshold level, and performing calibration of the transmitter at periods of time in which the output control signal is attenuating the transmitter output signals a lesser amount. The lesser amount can be less than an average of a minimum amount of attenuation and a maximum amount of attenuation. The apparatus includes a transmitter that includes a frequency up-converting LO mixer for frequency up-converting base band signals, generating transmitter output signals, a transmitter antenna for transmitting the transmitter output signals, and control circuitry for controlling attenuating the transmitter output signals during a calibration of the transmitter.
摘要:
A method and apparatus of calibrating filtering of receive and transmit signals is disclosed. The method of calibrating filtering of a received signal includes injecting an LO signal. The injected LO signal is filtered by a tunable filter. The filtered signal is frequency down-converted with an equivalent LO signal. The frequency down-converted signal is sampled while tuning the filtering. A desired filter tuning is determined based upon the samples and a frequency of the LO signal. The method of calibrating filtering of a transmit signal includes injecting an LO signal to a transmitter. The LO signal is filtered by a tunable filter. The filtered signal is frequency down-converted with an equivalent LO signal. The frequency down-converted signal is sampled while tuning the filter. A desired filter tuning is determined based upon the samples and a frequency of the LO signal.
摘要:
Within a method for fabricating a microelectronic fabrication there is first provided a substrate. There is then formed over the substrate a spirally patterned conductor layer which terminates in a microelectronic structure within the center of the spirally patterned conductor layer. The spirally patterned conductor layer forms a planar spiral inductor, and the microelectronic structure formed within the center of the spirally patterned conductor layer further comprises a series of electrically interconnected sub-patterns. The method contemplates a microelectronic fabrication fabricated in accord with the method. The microelectronic fabrication is fabricated with optimal performance while occupying minimal microelectronic substrate area.
摘要:
A metal-insulator-metal (MIM) capacitor structure and method of fabrication for CMOS circuits having copper interconnections are described. The method provides metal capacitors with high figure of merit Q (Xc/R) and which does not require additional masks and metal layers. The method forms a copper capacitor bottom metal (CBM) electrode while concurrently forming the pad contacts and level of copper interconnections by the damascene process. An insulating (Si3N4) metal protect layer is formed on the copper and a capacitor interelectrode dielectric layer is formed. A metal protecting buffer is used to protect the thin interelectrode layer, and openings are etched to pad contacts and interconnecting lines. A TiN/AlCu/TiN metal layer is deposited and patterned to form the capacitor top metal (CTM) electrodes, the next level of interconnections, and to provide a pad protect layer on the copper pad contacts. The thick TiN/AlCu/TiN CTM electrode reduces the capacitor series resistance and improves the capacitor figure of merit Q, while the pad protect layer protects the copper from corrosion.
摘要:
This MIM structure provides metal capacitors with high figure of merit Q (Xc/R) and does not require additional masks and metal layers. A copper capacitor bottom metal (CBM) electrode is formed, while concurrently forming the pad contacts and level of copper interconnections by the damascene process. An insulating (Si3N4) metal protect layer is formed on the copper and a capacitor interelectrode dielectric layer is formed. A metal protecting buffer protects the thin interelectrode layer, and openings are etched to pad contacts and interconnecting lines. A TiN/AlCu/TiN metal layer is deposited and patterned to form the capacitor top metal (CTM) electrodes, the next level of interconnections, and to provide a pad protect layer on the copper pad contacts. The thick TiN/AlCu/TiN CTM electrode reduces the capacitor series resistance and improves the capacitor figure of merit Q, while the pad protect layer protects the copper from corrosion.