公开(公告)号：US10229840B2

公开(公告)日：2019-03-12

申请号：US15522499

申请日：2015-10-29

Applicant: ENTEGRIS, INC.

Inventor： W. Karl Olander ,  Ying Tang ,  Barry Lewis Chambers ,  Steven E. Bishop

IPC: H01L21/00 ,  H01L21/67 ,  C23C14/48 ,  H01J37/317 ,  H01L21/265 ,  H01L21/66

Abstract: An ion implantation system is described, including: an ion implanter comprising a housing defining an enclosed volume in which is positioned a gas box configured to hold one or more gas supply vessels, the gas box being in restricted gas flow communication with gas in the enclosed volume that is outside the gas box; a first ventilation assembly configured to flow ventilation gas through the housing and to exhaust the ventilation gas from the housing to an ambient environment of the ion implanter; a second ventilation assembly configured to exhaust gas from the gas box to a treatment apparatus that is adapted to at least partially remove contaminants from the gas box exhaust gas, or that is adapted to dilute the gas box exhaust gas, to produce a treated effluent gas, the second ventilation assembly comprising a variable flow control device for modulating flow rate of the gas box exhaust gas between a relatively lower gas box exhaust gas flow rate and a relatively higher gas box exhaust gas flow rate, and a motive fluid driver adapted to flow the gas box exhaust gas through the variable flow control device to the treatment apparatus; and a monitoring and control assembly configured to monitor operation of the ion implanter for occurrence of a gas hazard event, and thereupon to responsively prevent gas-dispensing operation of the one or more gas supply vessels, and to modulate the variable flow control device to the relatively higher gas box exhaust gas flow rate so that the motive fluid driver flows the gas box exhaust gas to the treatment apparatus at the relatively higher gas box exhaust gas flow rate. Preferably, in a gas hazard event, the shell exhaust discharge from the housing is also terminated, to facilitate exhausting all gas within the housing, outside as well as inside the gas box, to the treatment unit.

公开(公告)号：US09170246B2

公开(公告)日：2015-10-27

申请号：US14054497

申请日：2013-10-15

Applicant: Entegris, Inc.

Inventor： James Dietz ,  Steven E. Bishop ,  James V. McManus ,  Steven M. Lurcott ,  Michael J. Wodjenski ,  Robert Kaim ,  Frank DiMeo, Jr.

IPC: G01D1/00 ,  G01N33/00 ,  H01L23/538 ,  H01L23/00 ,  H01L21/683 ,  H01L25/03 ,  H01L25/16 ,  H05K1/18 ,  G01F23/00 ,  H01L21/56 ,  H01L25/065 ,  H05K3/46

CPC classification number: G01N33/00 ,  F17C11/00 ,  G01F15/063 ,  G01F22/02 ,  G01F23/0076 ,  G01M3/32 ,  G01M3/3236 ,  G06Q10/087 ,  G06Q30/04 ,  G06Q50/04 ,  H01L21/561 ,  H01L21/568 ,  H01L21/6835 ,  H01L22/10 ,  H01L23/5389 ,  H01L24/24 ,  H01L24/48 ,  H01L24/82 ,  H01L25/03 ,  H01L25/0652 ,  H01L25/16 ,  H01L2224/16225 ,  H01L2224/16227 ,  H01L2224/24011 ,  H01L2224/2518 ,  H01L2224/48091 ,  H01L2224/48227 ,  H01L2924/00014 ,  H01L2924/01005 ,  H01L2924/01006 ,  H01L2924/01013 ,  H01L2924/01023 ,  H01L2924/01027 ,  H01L2924/01033 ,  H01L2924/01058 ,  H01L2924/01076 ,  H01L2924/01078 ,  H01L2924/01082 ,  H01L2924/014 ,  H01L2924/09701 ,  H01L2924/14 ,  H01L2924/19042 ,  H05K1/185 ,  H05K3/4602 ,  H05K2203/0165 ,  H05K2203/085 ,  H05K2203/1469 ,  Y02P90/30 ,  Y10T29/4913 ,  Y10T29/49133 ,  Y10T29/49165 ,  Y10T29/53183 ,  H01L2224/45099

Abstract: A monitoring system for monitoring fluid in a fluid supply vessel during operation including dispensing of fluid from the fluid supply vessel. The monitoring system includes (i) one or more sensors for monitoring a characteristic of the fluid supply vessel or the fluid dispensed therefrom, (ii) a data acquisition module operatively coupled to the one or more sensors to receive monitoring data therefrom and responsively generate an output correlative to the characteristic monitored by the one or more sensors, and (iii) a processor and display operatively coupled with the data acquisition module and arranged to process the output from the data acquisition module and responsively output a graphical representation of fluid in the fluid supply vessel, billing documents, usage reports, and/or resupply requests.

Abstract translation: 一种用于在操作期间监测流体供应容器中的流体的监测系统，包括从流体供应容器分配流体。 监测系统包括（i）用于监测流体供应容器或从其分配的流体的特性的一个或多个传感器，（ii）可操作地耦合到所述一个或多个传感器以从其接收监测数据的数据采集模块，并且响应地生成 输出与由一个或多个传感器监测的特性相关联，以及（iii）处理器和显示器，其与数据采集模块可操作地耦合并被布置成处理来自数据采集模块的输出并且响应地输出流体在流体中的图形表示 供应船，记帐单，使用报告和/或补货请求。

公开(公告)号：US20160172164A1

公开(公告)日：2016-06-16

申请号：US14906537

申请日：2014-07-21

Applicant: Entegris, Inc.

Inventor： Joseph D. Sweeney ,  Edward E. Jones ,  Oleg Byl ,  Ying Tang ,  Joseph R. Despres ,  Steven E. Bishop

IPC: H01J37/32

CPC classification number: H01J37/32449 ,  H01J37/3171 ,  H01J2237/002 ,  H01J2237/006 ,  H01J2237/08 ,  H01J2237/24564 ,  H01J2237/3365

Abstract: Fluid storage and dispensing systems and methods for remote delivery of fluids are described, for providing fluid from a source vessel at lower voltage to one or more fluid-utilizing tools at higher voltage, so that the fluid crosses the associated voltage gap without arcing, discharge, premature ionization, or other anomalous behavior, and so that when multiple fluid-utilizing tools are supplied by the remote source vessel, fluid is efficiently supplied to each of the multiple tools at suitable pressure level during the independent operation of others of the multiple vessels.

Abstract translation: 描述用于远程输送流体的流体存储和分配系统和方法，用于将来自较低电压的源容器的流体提供给在较高电压下的一个或多个流体利用工具，使得流体跨过相关联的电压间隙而没有电弧，放电 过早电离或其他异常行为，并且当多个流体利用工具由远程源容器供应时，在多个容器的其他人的独立操作期间，以适当的压力水平将流体有效地供给到多个工具中的每一个 。

公开(公告)号：US20160041136A1

公开(公告)日：2016-02-11

申请号：US14887023

申请日：2015-10-19

Applicant: Entegris, Inc.

Inventor： James Dietz ,  Steven E. Bishop ,  James V. McManus ,  Steven M. Lurcott ,  Michael J. Wodjenski ,  Robert Kaim ,  Frank DiMeo, JR.

IPC: G01N33/00 ,  H01L21/66

CPC classification number: G01N33/00 ,  F17C11/00 ,  G01F15/063 ,  G01F22/02 ,  G01F23/0076 ,  G01M3/32 ,  G01M3/3236 ,  G06Q10/087 ,  G06Q30/04 ,  G06Q50/04 ,  H01L21/561 ,  H01L21/568 ,  H01L21/6835 ,  H01L22/10 ,  H01L23/5389 ,  H01L24/24 ,  H01L24/48 ,  H01L24/82 ,  H01L25/03 ,  H01L25/0652 ,  H01L25/16 ,  H01L2224/16225 ,  H01L2224/16227 ,  H01L2224/24011 ,  H01L2224/2518 ,  H01L2224/48091 ,  H01L2224/48227 ,  H01L2924/00014 ,  H01L2924/01005 ,  H01L2924/01006 ,  H01L2924/01013 ,  H01L2924/01023 ,  H01L2924/01027 ,  H01L2924/01033 ,  H01L2924/01058 ,  H01L2924/01076 ,  H01L2924/01078 ,  H01L2924/01082 ,  H01L2924/014 ,  H01L2924/09701 ,  H01L2924/14 ,  H01L2924/19042 ,  H05K1/185 ,  H05K3/4602 ,  H05K2203/0165 ,  H05K2203/085 ,  H05K2203/1469 ,  Y02P90/30 ,  Y10T29/4913 ,  Y10T29/49133 ,  Y10T29/49165 ,  Y10T29/53183 ,  H01L2224/45099

Abstract: A monitoring system for monitoring fluid in a fluid supply vessel during operation including dispensing of fluid from the fluid supply vessel. The monitoring system includes (i) one or more sensors for monitoring a characteristic of the fluid supply vessel or the fluid dispensed therefrom, (ii) a data acquisition module operatively coupled to the one or more sensors to receive monitoring data therefrom and responsively generate an output correlative to the characteristic monitored by the one or more sensors, and (iii) a processor and display operatively coupled with the data acquisition module and arranged to process the output from the data acquisition module and responsively output a graphical representation of fluid in the fluid supply vessel, billing documents, usage reports, and/or resupply requests.

Abstract translation: 一种用于在操作期间监测流体供应容器中的流体的监测系统，包括从流体供应容器分配流体。 监测系统包括（i）用于监测流体供应容器或从其分配的流体的特性的一个或多个传感器，（ii）可操作地耦合到所述一个或多个传感器以从其接收监测数据的数据采集模块，并且响应地生成 输出与由一个或多个传感器监测的特性相关联，以及（iii）处理器和显示器，其与数据采集模块可操作地耦合并被布置成处理来自数据采集模块的输出并且响应地输出流体在流体中的图形表示 供应船，记帐单，使用报告和/或补货请求。

公开(公告)号：US20180337020A1

公开(公告)日：2018-11-22

申请号：US15778002

申请日：2016-12-23

Applicant: ENTEGRIS, Inc.

Inventor： Steven E. Bishop

IPC: H01J37/317

CPC classification number: H01J37/3171 ,  H01J37/02 ,  H01J2237/0041 ,  H01J2237/0044 ,  H01J2237/006 ,  H01J2237/022 ,  H01J2237/06366

Abstract: A gas supply assembly is described for delivery of gas to a plasma flood gun. The gas supply assembly includes: a fluid supply package configured to deliver inert gas to a plasma flood gun for generating inert gas plasma including electrons for modulating surface charge of a substrate in ion implantation operation; and cleaning gas in the inert gas fluid supply package in mixture with the inert gas, or in a separate cleaning gas supply package configured to deliver cleaning gas to the plasma flood gun concurrently or sequentially with respect to delivery of inert gas to the plasma flood gun. A method of operating a plasma flood gun is also described, in which cleaning gas is introduced to the plasma flood gun, intermittently, continuously, or sequentially in relation to flow of inert gas to the plasma flood gun. The cleaning gas is effective to generate volatile reaction product gases from material deposits in the plasma flood gun, and to effect re-metallization of a plasma generation filament in the plasma flood gun.

公开(公告)号：US20170330726A1

公开(公告)日：2017-11-16

申请号：US15593486

申请日：2017-05-12

Applicant: Entegris, Inc.

Inventor： Barry Lewis Chambers ,  Biing-Tsair Tien ,  Joseph D. Sweeney ,  Ying Tang ,  Oleg Byl ,  Steven E. Bishop ,  Sharad N. Yedave

IPC: H01J37/317 ,  C09D5/24 ,  C09D1/00 ,  H01J37/32 ,  H01L21/67 ,  H01L21/265

CPC classification number: H01J37/3171 ,  C09D1/00 ,  C09D5/24 ,  H01J37/026 ,  H01J37/3244 ,  H01J2237/006 ,  H01J2237/022 ,  H01L21/265 ,  H01L21/67213

Abstract: Compositions, methods, and apparatus are described for carrying out nitrogen ion implantation, which avoid the incidence of severe glitching when the nitrogen ion implantation is followed by another ion implantation operation susceptible to glitching, e.g., implantation of arsenic and/or phosphorus ionic species. The nitrogen ion implantation operation is advantageously conducted with a nitrogen ion implantation composition introduced to or formed in the ion source chamber of the ion implantation system, wherein the nitrogen ion implantation composition includes nitrogen (N2) dopant gas and a glitching-suppressing gas including one or more selected from the group consisting of NF3, N2F4, F2, SiF4, WF6, PF3, PF5, AsF3, AsF5, CF4 and other fluorinated hydrocarbons of CxFy (x≧1, y≧1) general formula, SF6, HF, COF2, OF2, BF3, B2F4, GeF4, XeF2, O2, N2O, NO, NO2, N2O4, and O3, and optionally hydrogen-containing gas, e.g., hydrogen-containing gas including one or more selected from the group consisting of H2, NH3, N2H4, B2H6, AsH3, PH3, SiH4, Si2H6, H2S, H2Se, CH4 and other hydrocarbons of CxHy (x≧1, y≧1) general formula and GeH4.

公开(公告)号：US20190078696A1

公开(公告)日：2019-03-14

申请号：US15743109

申请日：2016-07-08

Applicant: Entegris, Inc.

Inventor： Glenn M. Tom ,  Karl W. Olander ,  James A. Dietz ,  Michael J. Wodjenski ,  Edward A. Sturm ,  Susan K. Dimascio ,  Luping Wang ,  James V. McManus ,  Steven M. Lurcott ,  Jose I. Amo ,  Paul J. Marganski ,  Joseph D. Sweeney ,  Shaun M. Wilson ,  Steven E. Bishop ,  Greg Nelson ,  Donald J. Carruthers ,  Sharad N. Yedave ,  Ying Tang ,  Joseph Despres ,  Barry Chambers ,  Richard Ray ,  Daniel Elzer

IPC: F16K17/00 ,  F16K17/04 ,  F16K31/00 ,  F16K31/06 ,  F17C13/04

Abstract: Fluid supply packages of varying types are described, which are useful for delivery of fluids to fluid-utilizing facilities such as semiconductor manufacturing facilities, solar panel manufacturing facilities, and flat-panel display manufacturing facilities. The fluid supply packages include fluid supply vessels and valve heads of varied configuration, as useful to constitute fluid supply packages that are pressure-regulated and/or adsorbent-based in character.