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    EMULSION OF NITROGEN ATOM-CONTAINING POLYMER OR SALT THEREOF, PRODUCTION METHOD THEREFOR, AND PRODUCTION METHOD FOR PARTICLES
    1.
    发明申请
    EMULSION OF NITROGEN ATOM-CONTAINING POLYMER OR SALT THEREOF, PRODUCTION METHOD THEREFOR, AND PRODUCTION METHOD FOR PARTICLES 审中-公开

    公开(公告)号：US20190315932A1

    公开(公告)日：2019-10-17

    申请号：US16455091

    申请日：2019-06-27

    Applicant: FUJIFILM Corporation

    Inventor： Shinsuke TOKUOKA ,  Hayato YOSHIDA ,  Katsuhiro SHIMONO ,  Takayuki ITO

    IPC: C08J3/09 ,  C08L1/26 ,  C08K5/00 ,  B29B9/12 ,  C08J3/24

    Abstract: Provided are an emulsion of a nitrogen atom-containing polymer or a salt thereof, the emulsion having high emulsion stability and having a low dispersity of the particle diameter of emulsified particles, and a method for producing the emulsion. Also provided is a method for producing particles including a crosslinked nitrogen atom-containing polymer or a salt thereof by using the emulsion described above. Disclosed is a method for producing an emulsion of a nitrogen atom-containing polymer or a salt thereof, the method including a step of mixing a first solution that includes a nitrogen atom-containing polymer or a salt thereof and a hydrophilic solvent and has a viscosity of 10 to 2,000 mPa·s, and a second solution that includes a hydrophobic solvent and has a viscosity of 1 to 100 mPa·s, stirring the mixture, and thus obtaining an emulsion of the nitrogen atom-containing polymer or a salt thereof, wherein a ratio between the viscosity of the first solution and the viscosity of the second solution is in a range of 0.1:1 to 300:1.

    UNDERLAY FILM COMPOSITION FOR IMPRINTS AND METHOD OF FORMING PATTERN AND PATTERN FORMATION METHOD USING THE SAME
    5.
    发明申请
    UNDERLAY FILM COMPOSITION FOR IMPRINTS AND METHOD OF FORMING PATTERN AND PATTERN FORMATION METHOD USING THE SAME 有权
    用于印刷的底膜组合物和使用其形成图案和图案形成方法的方法

    公开(公告)号：US20140220353A1

    公开(公告)日：2014-08-07

    申请号：US14245491

    申请日：2014-04-04

    Applicant: FUJIFILM CORPORATION

    Inventor： Kunihiko KODAMA ,  Shinji TARUTANI ,  Yuichiro ENOMOTO ,  Tadashi OOMATSU ,  Takayuki ITO ,  Hirotaka KITAGAWA ,  Akiko HATTORI

    IPC: G03F7/09

    CPC classification number: G03F7/094 ,  G03F7/0002 ,  Y10T428/31504

    Abstract: Provided is the pattern formability and line edge roughness of the resultant substrate.An underlay film composition for imprints comprising a compound (A) and a solvent (B), the compound (A) having at least either one of a group (Ka) capable of covalently bonding and/or interacting with a substrate, and, a group (Kb) capable of covalently bonding and/or interacting with a curable composition for imprints, an Ohnishi parameter (Z) calculated from (equation 1) of 3.8 or larger, and a molecular weight of 400 or larger: the Ohnishi parameter=(total number of atoms)/(number of carbon atoms−number of oxygen atoms)  (Equation 1)

    Abstract translation: 提供了所得基板的图案成形性和线边缘粗糙度。 包含化合物（A）和溶剂（B）的印迹用底胶膜组合物，具有能够与底物共价键合和/或相互作用的基团（Ka）中的至少一种的化合物（A），和 能够与用于印记的可固化组合物共价键合和/或相互作用的组（Kb），由（式1）计算为3.8或更大，分子量为400或更大的Ohnishi参数（Z）：Ohnishi参数=（ 总原子数）/（碳原子数 - 氧原子数）（式1）

    METHOD FOR PRODUCING THIOLANE SKELETON-TYPE GLYCOCONJUGATE, AND THIOLANE SKELETON-TYPE GLYCOCONJUGATE
    10.
    发明申请
    METHOD FOR PRODUCING THIOLANE SKELETON-TYPE GLYCOCONJUGATE, AND THIOLANE SKELETON-TYPE GLYCOCONJUGATE 有权
    用于生产硫醇酮型糖苷酸盐的方法，以及硫醇型骨架型糖蛋白

    公开(公告)号：US20160355536A1

    公开(公告)日：2016-12-08

    申请号：US15238232

    申请日：2016-08-16

    Applicant: FUJIFILM Corporation

    Inventor： Takayuki ITO ,  Toru WATANABE ,  Hideki OKADA ,  Hidenobu KUNIYOSHI

    IPC: C07H13/08 ,  C07D333/32 ,  C07H15/04

    CPC classification number: C07H13/08 ,  C07D333/32 ,  C07H15/04 ,  C07H15/18

    Abstract: There is provided a production method of a compound represented by the following formula (II) through a step of reacting a compound represented by the following General Formula (I) with a sulfur compound. In General Formulas (I) and (II), R1 represents a hydrogen atom or an acyl group, R2 represents a hydrogen atom, a fluorine atom, an acyloxy group, an arylmethyloxy group, an allyloxy group, an arylmethyloxycarbonyloxy group, or an allyloxycarbonyloxy group, R3 represents a hydrogen atom or an acyloxy group, R5 represents an alkyl group or an aryl group, and X represents a leaving group. Here, in a case where R2 is a fluorine atom, an acyloxy group, an arylmethyloxy group, an allyloxy group, an arylmethyloxycarbonyloxy group, or an allyloxycarbonyloxy group, R3 is an acyloxy group.

    Abstract translation: 在通式（I）和（II）中，R 1表示氢原子或酰基，R 2表示氢原子，氟原子，酰氧基，芳基甲氧基，烯丙氧基，芳基甲氧基羰基氧基或烯丙氧羰基氧基 基团，R 3表示氢原子或酰氧基，R 5表示烷基或芳基，X表示离去基团。 这里，在R 2为氟原子，酰氧基，芳基甲氧基，烯丙氧基，芳基甲氧基羰基氧基或烯丙氧基羰基氧基的情况下，R 3为酰氧基。

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