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50 条记录 (耗时 0.035 秒)

    Pulsed valve manifold for atomic layer deposition
    2.
    发明授权
    Pulsed valve manifold for atomic layer deposition 有权
    用于原子层沉积的脉冲阀歧管

    公开(公告)号：US09574268B1

    公开(公告)日：2017-02-21

    申请号：US13284738

    申请日：2011-10-28

    申请人： Todd Dunn ,  Carl White ,  Mike Halpin ,  Eric Shero ,  Herbert Terhorst ,  Jerry Winkler

    发明人： Todd Dunn ,  Carl White ,  Mike Halpin ,  Eric Shero ,  Herbert Terhorst ,  Jerry Winkler

    IPC分类号： C23C16/455 ,  C23C16/453

    CPC分类号： C23C16/45544 ,  C23C16/455 ,  C23C16/45512 ,  C23C16/45561 ,  C23C16/45563 ,  C23C16/45565 ,  C23C16/4557 ,  C23C16/45574 ,  C23C16/45576 ,  C23C16/45589 ,  H01L21/0228 ,  H01L21/0262 ,  H01L21/28556

    摘要： A vapor deposition device includes a reactor including a reaction chamber and an injector for injecting vapor into the reaction chamber. The device also includes a manifold for delivering vapor to the injector. The manifold includes a manifold body having an internal bore, a first distribution channel disposed within the body in a plane intersecting the longitudinal axis of the bore, and a plurality of supply channels disposed within the body and in flow communication with the first distribution channel and with the bore. Each of the first supply channels is disposed at an acute angle with respect to the longitudinal axis of the bore, and each of the supply channels connects with the bore at a different angular position about the longitudinal axis. The distribution channel (and thus, the supply channels) can be connected with a common reactant source. Related deposition methods are also described.

    摘要翻译： 气相沉积装置包括反应器，该反应器包括反应室和用于将蒸汽注入反应室的喷射器。 该装置还包括用于将蒸气输送到喷射器的歧管。 歧管包括具有内孔的歧管主体，在与所述孔的纵向轴线相交的平面内设置在所述主体内的第一分配通道，以及设置在所述主体内并与所述第一分配通道流动连通的多个供应通道，以及 与孔。 每个第一供应通道相对于孔的纵向轴线以锐角设置，并且每个供应通道在与纵向轴线不同的角度位置处与孔连通。 分配通道（因此，供应通道）可以与常见的反应物源连接。 还描述了相关的沉积方法。

    Susceptor heater shim
    7.
    发明授权
    Susceptor heater shim 有权
    受体加热器垫片

    公开(公告)号：US09202727B2

    公开(公告)日：2015-12-01

    申请号：US13411271

    申请日：2012-03-02

    申请人： Todd Dunn ,  Carl White ,  Michael Halpin ,  Eric Shero ,  Jerry Winkler

    发明人： Todd Dunn ,  Carl White ,  Michael Halpin ,  Eric Shero ,  Jerry Winkler

    IPC分类号： F27D5/00 ,  H01L21/67 ,  F27B17/00 ,  F27D3/00 ,  H01L21/687

    CPC分类号： H01L21/67103 ,  F27B17/0025 ,  F27D3/0084 ,  F27D5/0037 ,  H01L21/68785

    摘要： A substrate supporting assembly in a reaction space includes a heater, a substrate support member, and a shim positioned between the heater and the substrate support member. The shim may be removably secured between the heater and the substrate support member. The shim may further include an inner surface defining a perimeter of a gap. The gap may be further defined by a bottom surface of the substrate support member and a top surface of the heater. The substrate support member may further include a shoulder positioned radially outside of a substrate support position and wherein the shim inner surface is radially aligned with the substrate support member shoulder.

    摘要翻译： 反应空间中的基板支撑组件包括加热器，基板支撑构件和位于加热器和基板支撑构件之间的垫片。 垫片可以可拆卸地固定在加热器和衬底支撑构件之间。 垫片还可包括限定间隙周长的内表面。 间隙可以由衬底支撑构件的底表面和加热器的顶表面进一步限定。 衬底支撑构件还可以包括位于衬底支撑位置的径向外侧的肩部，并且其中垫片内表面与衬底支撑构件肩部径向对准。

    SUSCEPTOR HEATER SHIM
    8.
    发明申请
    SUSCEPTOR HEATER SHIM 有权
    SUSCEPTOR加热器SHIM

    公开(公告)号：US20130230814A1

    公开(公告)日：2013-09-05

    申请号：US13411271

    申请日：2012-03-02

    申请人： Todd Dunn ,  Carl White ,  Michael Halpin ,  Eric Shero ,  Jerry Winkler

    发明人： Todd Dunn ,  Carl White ,  Michael Halpin ,  Eric Shero ,  Jerry Winkler

    IPC分类号： F27D3/00 ,  F27D5/00

    CPC分类号： H01L21/67103 ,  F27B17/0025 ,  F27D3/0084 ,  F27D5/0037 ,  H01L21/68785

    摘要： A substrate supporting assembly in a reaction space includes a heater, a substrate support member, and a shim positioned between the heater and the substrate support member. The shim may be removably secured between the heater and the substrate support member. The shim may further include an inner surface defining a perimeter of a gap. The gap may be further defined by a bottom surface of the substrate support member and a top surface of the heater. The substrate support member may further include a shoulder positioned radially outside of a substrate support position and wherein the shim inner surface is radially aligned with the substrate support member shoulder.

    摘要翻译： 反应空间中的基板支撑组件包括加热器，基板支撑构件和位于加热器和基板支撑构件之间的垫片。 垫片可以可拆卸地固定在加热器和衬底支撑构件之间。 垫片还可包括限定间隙周长的内表面。 间隙可以由衬底支撑构件的底表面和加热器的顶表面进一步限定。 衬底支撑构件还可以包括位于衬底支撑位置的径向外侧的肩部，并且其中垫片内表面与衬底支撑构件肩部径向对准。

    PRECURSOR DELIVERY SYSTEM
    9.
    发明申请
    PRECURSOR DELIVERY SYSTEM 有权
    前身送货系统

    公开(公告)号：US20080085226A1

    公开(公告)日：2008-04-10

    申请号：US11870374

    申请日：2007-10-10

    申请人： Kyle Fondurulia ,  Eric Shero ,  Mohith E. Verghese ,  Carl L. White

    发明人： Kyle Fondurulia ,  Eric Shero ,  Mohith E. Verghese ,  Carl L. White

    IPC分类号： B01J19/00 ,  F28D21/00

    CPC分类号： C23C16/4481 ,  C23C16/4401 ,  C23C16/4402

    摘要： A precursor source vessel comprises a vessel body, a passage within the vessel body, and a valve attached to a surface of the body. An internal chamber is adapted to contain a chemical reactant, and the passage extends from outside the body to the chamber. The valve regulates flow through the passage. The vessel has inlet and outlet valves, and optionally a vent valve for venting internal gas. An external gas panel can include at least one valve fluidly interposed between the outlet valve and a substrate reaction chamber. Gas panel valves can each be positioned along a plane that is generally parallel to, and no more than about 10.0 cm from, a flat surface of the vessel. Filters in a vessel lid or wall filter gas flow through the vessel's valves. A quick-connection assembly allows fast and easy connection of the vessel to a gas panel.

    摘要翻译： 前体源容器包括容器主体，容器主体内的通道和附接到主体表面的阀。 内部腔室适于容纳化学反应物，并且通道从身体外部延伸到腔室。 阀调节通过通道的流量。 容器具有入口和出口阀，并且可选地用于排放内部气体的排气阀。 外部气体面板可以包括流体地介于出口阀和基板反应室之间的至少一个阀。 气体面板阀可以分别沿着与容器的平坦表面大致平行且不超过约10.0cm的平面定位。 容器盖中的过滤器或壁过滤气体流过容器的阀门。 快速连接组件允许快速和容易地将容器连接到气体面板。

    Precursor delivery system
    10.
    发明授权
    Precursor delivery system 有权
    前体输送系统

    公开(公告)号：US08137462B2

    公开(公告)日：2012-03-20

    申请号：US11870374

    申请日：2007-10-10

    申请人： Kyle Fondurulia ,  Eric Shero ,  Mohith E Verghese ,  Carl L White

    发明人： Kyle Fondurulia ,  Eric Shero ,  Mohith E Verghese ,  Carl L White

    IPC分类号： C23C16/00 ,  C23C16/455 ,  C23C16/448

    CPC分类号： C23C16/4481 ,  C23C16/4401 ,  C23C16/4402

    摘要： A precursor source vessel comprises a vessel body, a passage within the vessel body, and a valve attached to a surface of the body. An internal chamber is adapted to contain a chemical reactant, and the passage extends from outside the body to the chamber. The valve regulates flow through the passage. The vessel has inlet and outlet valves, and optionally a vent valve for venting internal gas. An external gas panel can include at least one valve fluidly interposed between the outlet valve and a substrate reaction chamber. Gas panel valves can each be positioned along a plane that is generally parallel to, and no more than about 10.0 cm from, a flat surface of the vessel. Filters in a vessel lid or wall filter gas flow through the vessel's valves. A quick-connection assembly allows fast and easy connection of the vessel to a gas panel.

    摘要翻译： 前体源容器包括容器主体，容器主体内的通道和附接到主体表面的阀。 内部腔室适于容纳化学反应物，并且通道从身体外部延伸到腔室。 阀调节通过通道的流量。 容器具有入口和出口阀，并且可选地用于排放内部气体的排气阀。 外部气体面板可以包括流体地介于出口阀和基板反应室之间的至少一个阀。 气体面板阀可以分别沿着与容器的平坦表面大致平行且不超过约10.0cm的平面定位。 容器盖中的过滤器或壁过滤气体流过容器的阀门。 快速连接组件允许快速和容易地将容器连接到气体面板。