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11 条记录 (耗时 0.02 秒)

    Target arrangement with a circular plate, magnetron for mounting the target arrangement, and process for coating a series of circular disc-shaped workpieces by means of said magnetron source
    1.
    发明授权
    Target arrangement with a circular plate, magnetron for mounting the target arrangement, and process for coating a series of circular disc-shaped workpieces by means of said magnetron source 失效
    具有圆板的目标布置，用于安装目标布置的磁控管，以及通过所述磁控管源涂覆一系列圆形圆形工件的工艺

    公开(公告)号：US6068742A

    公开(公告)日：2000-05-30

    申请号：US701861

    申请日：1996-08-23

    申请人： Helmut Daxinger ,  Walter Haag ,  Eduard Kugler

    发明人： Helmut Daxinger ,  Walter Haag ,  Eduard Kugler

    IPC分类号： C23C14/34 ,  H01J37/34

    CPC分类号： H01J37/3423 ,  C23C14/3407 ,  H01J37/3408

    摘要： A target arrangement for a sputtering apparatus has a circular plate target with either a circumferential protrusion or recess which is symmetrical about a central plane through the target, the plane being perpendicular to the central axis of the target and located halfway between the top and bottom surfaces of the target. Each surface of the target is composed primarily of sputtering material. A magnetron for use with the target arrangement for easy changing of the target to sputter using the opposite surface of the target is disclosed. A process for using the target arrangement and magnetron assembly to sputter a work piece is also disclosed.

    摘要翻译： 用于溅射装置的目标装置具有圆形板目标，其具有圆周突起或凹部，所述圆周突起或凹部围绕穿过靶的中心平面对称，该平面垂直于目标的中心轴并且位于顶部和底部表面之间的中间 的目标。 靶的每个表面主要由溅射材料组成。 公开了一种与目标装置一起使用的磁控管，用于使用目标的相对表面容易地改变靶溅射。 还公开了使用目标装置和磁控管组件来溅射工件的方法。

    Vacuum treatment chamber
    2.
    发明授权
    Vacuum treatment chamber 失效
    真空处理室

    公开(公告)号：US5733419A

    公开(公告)日：1998-03-31

    申请号：US598326

    申请日：1996-02-08

    申请人： Helmut Daxinger ,  Walter Haag

    发明人： Helmut Daxinger ,  Walter Haag

    IPC分类号： C23C14/34 ,  C23C14/35 ,  C23F4/00 ,  H01J37/34 ,  H01L21/203

    CPC分类号： H01J37/3438 ,  C23C14/35 ,  H01J37/3405

    摘要： A vacuum treatment chamber has a sputtering electrode and a counter electrode together defining a plasma discharge area. The counter electrode has an electrode surface area which is not visible from the sputtering electrode. A third electrode, together with the non-visible surface area, defines an auxiliary plasma discharge space. A substantially unencumbered propagative electron path is established between the discharge spaces. A plasma discharge is generated between the sputtering electrode and the counter electrode within a vacuum chamber.

    摘要翻译： 真空处理室具有溅射电极和对置电极，共同限定等离子体放电区域。 对电极具有从溅射电极不可见的电极表面积。 第三电极与不可见表面区域一起限定辅助等离子体放电空间。 在放电空间之间建立基本上未受阻的传播电子通路。 在真空室内在溅射电极和对电极之间产生等离子体放电。

    Method of producing coating using negative DC pulses with specified duty factor
    3.
    发明授权
    Method of producing coating using negative DC pulses with specified duty factor 失效
    使用具有指定负荷因子的负直流脉冲生产涂层的方法

    公开(公告)号：US5192578A

    公开(公告)日：1993-03-09

    申请号：US613390

    申请日：1990-11-14

    申请人： Jurgen Ramm ,  Helmut Daxinger ,  Rainer Buhl ,  Erich Bergmann

    发明人： Jurgen Ramm ,  Helmut Daxinger ,  Rainer Buhl ,  Erich Bergmann

    IPC分类号： C23C14/06 ,  A61L27/00 ,  A61L31/00 ,  B23P15/28 ,  C23C14/08 ,  C23C14/32 ,  C23C14/34

    CPC分类号： C23C14/3478 ,  C23C14/325

    摘要： For coating workpieces having basic bodies (3), with a ceramic, electrically non-conducting material, during the coating process a pulsating dc voltage is applied to the basic bodies (3) or their holders (36). Preferably the pulse height is changed during vaporization used for the coating process, from high negative values to smaller negative values. A further layer can be applied onto the workpieces coated in this way whereby these work-pieces, due to their excellent corrosion resistance, are suited as pieces of jewelry which can be exposed in particular to ocean water and body perspiration, as rolling bodies in which the use of oil or grease as corrosion protection can be dispensed with, and as separating and cutting tools for organic materials.

    摘要翻译： 对于具有基体（3）的具有陶瓷，不导电材料的工件，在涂覆过程期间，将脉动直流电压施加到基体（3）或其保持器（36）。 优选地，在用于涂覆过程的蒸发期间脉冲高度被改变，从高负值到较小的负值。 可以将另一层施加到以这种方式涂覆的工件上，由于这些工件由于其优异的耐腐蚀性而适合作为可以特别暴露于海洋水和身体排汗的首饰的首饰，作为滚动体，其中 可以省去使用油或油脂作为防腐蚀保护，以及作为有机材料的分离和切割工具。

    Method for producing gold color coatings
    4.
    发明授权
    Method for producing gold color coatings 失效
    金色涂料生产方法

    公开(公告)号：US4333962A

    公开(公告)日：1982-06-08

    申请号：US182800

    申请日：1980-08-29

    申请人： Hans K. Pulker ,  Helmut Daxinger

    发明人： Hans K. Pulker ,  Helmut Daxinger

    IPC分类号： C23C14/00 ,  C23C11/14

    CPC分类号： C23C14/0015 ,  C23C14/0021

    摘要： A method of controlling color hues of coatings particularly gold color coatings on substrate using a housing capable of being evacuated, and having an evacuated chamber, a hot cathode chamber in communication with the evacuated chamber and a support structure for the substrate to be coated and a crucible for the material to be evaporated acting as an anode and with a hot cathode in the hot cathode chamber, comprises evaporating the material in the evaporation chamber while maintaining a residual gas atmosphere containing nitrogen therein, producing an electric gas arc discharge between the cathode and the anode of a low voltage, and mixing a carbon containing gaseous compound to the residual gas while applying a negative biasing voltage relative to the housing to the substrate to be coated.

    摘要翻译： 一种控制涂层的色调的方法，特别是使用能够被抽空的壳体上的金色涂层，并且具有抽真空室，与真空室连通的热阴极室和用于待涂覆的基板的支撑结构， 用于作为阳极的蒸发材料和热阴极室中的热阴极的坩埚包括蒸发蒸发室中的材料，同时保持其中含有氮气的残留气体气氛，在阴极和 低电压的阳极，并且将含碳气体化合物与剩余气体混合，同时相对于外壳施加负偏置电压至待涂覆的基板。

    Plasma CVD method for producing a diamond coating
    6.
    发明授权
    Plasma CVD method for producing a diamond coating 失效
    用于制备金刚石涂层的等离子体CVD方法

    公开(公告)号：US5616373A

    公开(公告)日：1997-04-01

    申请号：US215965

    申请日：1994-03-18

    申请人： Johann Karner ,  Erich Bergmann ,  Helmut Daxinger

    发明人： Johann Karner ,  Erich Bergmann ,  Helmut Daxinger

    IPC分类号： C23C16/26 ,  C23C16/27 ,  C23C16/44 ,  C23C16/455 ,  C23C16/50 ,  C23C16/503 ,  C30B29/04 ,  H01J37/32 ,  B05D3/06

    CPC分类号： C23C16/45565 ,  C23C16/272 ,  C23C16/277 ,  C23C16/455 ,  C23C16/45572 ,  C23C16/45578 ,  C23C16/503 ,  H01J37/32055 ,  H01J37/3233

    摘要： The invention relates to a method for depositing a diamond coating on a workpiece, for instance a drawing die or a tool punch, whereby a reactive plasma supported coating method is used. According to the invention the generation of the plasma is made by a direct current discharge, whereby additionally a flow of charged particles is fed into the discharge gap; according to the invention the workpiece to be coated is positioned in the discharge gap. Due to the inventive design a relatively long discharge gap can be used, such that also large surface areas can be coated; the coating is made at a location of the highest homogeneity and density of the plasma. By means of the invention a method is provided which can be controlled regarding financial expenses and in a reliable manner and which is suitable for large surface area coating.

    摘要翻译： 本发明涉及一种用于在工件上沉积金刚石涂层的方法，例如拉丝模具或工具冲头，由此使用反应等离子体支撑的涂覆方法。 根据本发明，通过直流放电制造等离子体的产生，由此另外将带电粒子的流进给到放电间隙中; 根据本发明，待涂覆的工件位于放电间隙中。 由于本发明的设计，可以使用相当长的放电间隙，使得也可以涂覆大的表面积; 涂层在等离子体的最高均匀性和密度的位置处制成。 通过本发明，提供了一种能够以可靠的方式对财务费用进行控制并适用于大面积涂布的方法。

    Method and apparatus for evaporating material under vacuum using both an arc discharge and electron beam
    7.
    发明授权
    Method and apparatus for evaporating material under vacuum using both an arc discharge and electron beam 失效
    使用电弧放电和电子束在真空下蒸发材料的方法和装置

    公开(公告)号：US4448802A

    公开(公告)日：1984-05-15

    申请号：US357719

    申请日：1982-03-12

    申请人： Rainer Buhl ,  Eberhard Moll ,  Helmut Daxinger

    发明人： Rainer Buhl ,  Eberhard Moll ,  Helmut Daxinger

    IPC分类号： C23C14/24 ,  C23C14/30 ,  C23C14/32 ,  H01J37/305 ,  C23C13/00 ,  C23C13/12

    CPC分类号： C23C14/325 ,  C23C14/30 ,  H01J37/3053

    摘要： A method of evaporating an evaporative substance under vacuum comprises bombarding the evaporative substance with electrons from a low voltage arc discharge established between a cathode and an anode which is located in an evaporation chamber and simultaneously supplying additional power for evaporation to the evaporative substance by means of an electron gun which produces an electron energy in excess of one keV. A device for carrying out the invention comprises an evacuable bowl, an evaporation chamber with a receptacle therein for a substance to be evaporated and means for establishing a low voltage arc discharge between a cathode and an anode located in the evaporation chamber, a further provision of an electron gun for bombarding the substance with electrons which has an electron energy more than one kilovolt.

    摘要翻译： 在真空下蒸发蒸发物质的方法包括用位于蒸发室中的阴极和阳极之间建立的低电压电弧放电的电子轰击蒸发物质，同时通过以下方式提供额外的蒸发功率用于蒸发物质 产生电子能量超过1keV的电子枪。 用于实施本发明的装置包括可抽空的碗，具有用于待蒸发的物质的容器的蒸发室，以及用于在位于蒸发室中的阴极和阳极之间建立低电压电弧放电的装置， 用电子轰击具有电子能量超过一千伏特的电子的电子枪。

    Method of producing gold-color coatings
    10.
    发明授权
    Method of producing gold-color coatings 失效
    生产金色涂料的方法

    公开(公告)号：US4254159A

    公开(公告)日：1981-03-03

    申请号：US971327

    申请日：1978-12-20

    申请人： Hans K. Pulker ,  Helmut Daxinger

    发明人： Hans K. Pulker ,  Helmut Daxinger

    IPC分类号： C23C14/14 ,  C23C14/00 ,  C23C14/06 ,  C23C14/24 ,  C23C14/32 ,  G04B37/22 ,  B05D3/06

    CPC分类号： C23C14/0021 ,  C23C14/32 ,  G04B37/221

    摘要： A method of producing gold-color coatings on substrates by evaporating a coating material comprising a metallic titanium or zirconium in a housing which has walls which define an evaporation space, comprises, maintaining a vacuum atmosphere containing N.sub.2 and argon in the space. The method is carried out using an anode connected to a power source to produce a low voltage arc discharge in the vicinity of the coating material which is arranged within the evaporation space and also maintaining a low voltage arc between the anode and the substrates. A potential difference between the anode and the substrates of a range of between 5 v and 100 v are maintained during the process and, in addition, the electrical potential of the substrates is maintained between 0 and 150 volts lower than the potential of the housing walls which define the evaporation space. The substrate to be coated is coated at a rate of from between 1 to 15 nanometers per second. The N.sub.2 and argon atmosphere is maintained so that a partial pressure of the N.sub.2 -containing component ranges between 2.times.10.sup.-4 and 10.sup.-2 millbar. The potential difference between the anode and the substrates is reduced in the course of the process to release the sputtering threshold of the substrate and the housing wall. The partial pressure of the N.sub.2 -containing components continuously increase in the course of the process.

    摘要翻译： 通过在包含限定蒸发空间的壁的壳体中蒸发包含金属钛或锆的涂层材料，在衬底上生产金色涂层的方法包括在该空间内保持含有N 2和氩的真空气氛。 该方法使用连接到电源的阳极进行，以在布置在蒸发空间内的涂料附近产生低电压电弧放电，并且还在阳极和基板之间保持低电压电弧。 在该过程期间，维持在5v和100v之间范围内的阳极和衬底之间的电位差，此外，衬底的电位保持在比壳体壁的电位低0至150伏特之间 这定义了蒸发空间。 待涂覆的基材以每秒1至15纳米的速率涂覆。 保持N 2和氩气气氛，使含氮组分的分压范围为2×10-4至10-2毫巴。 在释放衬底和壳体壁的溅射阈值的过程中，阳极和衬底之间的电势差减小。 在此过程中，含N2组分的分压持续增加。