利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

10 条记录 (耗时 0.02 秒)

    Polishing composition and polishing method employing it
    5.
    发明授权
    Polishing composition and polishing method employing it 有权
    抛光组合物和抛光方法

    公开(公告)号：US06773476B2

    公开(公告)日：2004-08-10

    申请号：US10200173

    申请日：2002-07-23

    申请人： Kenji Sakai ,  Kazusei Tamai ,  Tadahiro Kitamura ,  Tsuyoshi Matsuda ,  Katsuyoshi Ina

    发明人： Kenji Sakai ,  Kazusei Tamai ,  Tadahiro Kitamura ,  Tsuyoshi Matsuda ,  Katsuyoshi Ina

    IPC分类号： C09G102

    CPC分类号： H01L21/3212 ,  C09G1/02 ,  C09K3/1463 ,  C23F3/06

    摘要： A polishing composition comprising: (a) at least one abrasive selected from the group consisting of silicon dioxide and aluminum oxide, (b) at least one organic compound selected from the group consisting of a polyethylene oxide, a polypropylene oxide, a polyoxyethylene alkyl ether, a polyoxypropylene alkyl ether, a polyoxyethylenepolyoxypropylene alkyl ether and a polyoxyalkylene addition polymer having a C≡C triple bond, represented by the formula (1): wherein each of R1 to R6 is H or a C1-10 alkyl group, each of X and Y is an ethyleneoxy group or a propyleneoxy group, and each of m and n is a positive number of from 1 to 20, (c) at least one polishing accelerating compound selected from the group consisting of citric acid, oxalic acid, tartaric acid, glycine, &agr;-alanine and histidine, (d) at least one anticorrosive selected from the group consisting of benzotriazole, benzimidazole, triazole, imidazole and tolyltriazole, (e) hydrogen peroxide, and (f) water.

    摘要翻译： 一种抛光组合物，其包含：（a）至少一种选自二氧化硅和氧化铝的研磨剂，（b）至少一种选自聚环氧乙烷，聚环氧丙烷，聚氧乙烯烷基醚 ，聚氧亚丙基烷基醚，聚氧乙烯聚氧丙烯烷基醚和具有C = C三键的聚氧化烯加成聚合物，由式（1）表示：其中R 1至R 6各自为H或C 1-10烷基，X Y是乙烯氧基或丙烯氧基，m和n分别为1〜20的正数，（c）至少一种选自柠檬酸，草酸，酒石酸 ，甘氨酸，α-丙氨酸和组氨酸，（d）至少一种选自苯并三唑，苯并咪唑，三唑，咪唑和甲苯基三唑的防腐剂，（e）过氧化氢和（f）水。

    Polishing composition and polishing process
    6.
    发明授权
    Polishing composition and polishing process 失效
    抛光组合和抛光工艺

    公开(公告)号：US06315803B1

    公开(公告)日：2001-11-13

    申请号：US09452384

    申请日：1999-12-01

    申请人： Katsuyoshi Ina ,  Tadahiro Kitamura

    发明人： Katsuyoshi Ina ,  Tadahiro Kitamura

    IPC分类号： C23F118

    CPC分类号： C09K3/1463 ,  C09G1/02 ,  H01L21/3212

    摘要： Object: To provide a polishing composition which is capable of polishing a tantalum-containing compound at a high stock removal rate and whereby the copper surface after polishing is scarcely corroded, and to provide a polishing process where dishing can be minimized. Means to accomplish the object: A polishing composition comprising an abrasive, oxalic acid, an ethylenediamine derivative, a benzotriazole derivative and water and not containing an oxidizing agent, and a polishing composition comprising an abrasive, oxalic acid, an ethylenediamine derivative, a benzotriazole derivative, water and hydrogen peroxide. Further, a polishing process for forming a copper printed wiring, which is a polishing process for a semiconductor device and which comprises a first polishing step wherein polishing is completed immediately before reaching a barrier layer while a copper layer still slightly remains, and second and third polishing steps wherein the remaining copper layer and the barrier layer are polished, wherein in the second polishing step, a polishing composition containing hydrogen peroxide is used and all the copper layer to be removed, is removed by polishing, and then, in the third polishing step, a polishing composition not containing hydrogen peroxide is used and all the barrier layer to be removed, is removed by polishing.

    摘要翻译： 对象物：提供一种抛光组合物，该抛光组合物能够以较高的原料去除速率抛光含钽化合物，并且由此抛光后的铜表面几乎不被腐蚀，并提供可以最小化凹陷的抛光工艺。 实现该目的的手段：包含磨料，草酸，乙二胺衍生物，苯并三唑衍生物和水，不含氧化剂的抛光组合物，以及包含研磨剂，草酸，乙二胺衍生物，苯并三唑衍生物 ，水和过氧化氢。此外，作为用于半导体器件的抛光工艺的铜印刷布线的抛光工艺，其包括第一抛光步骤，其中抛光在到达阻挡层之前完成，同时铜层仍然稍微 剩下的第二和第三抛光步骤，其中抛光剩余的铜层和阻挡层，其中在第二抛光步骤中，使用含有过氧化氢的抛光组合物，并且通过抛光去除所有要除去的铜层，以及 那么在第三抛光步骤中，不含有氢的抛光组合物 使用xide并且要去除的所有阻挡层通过抛光去除。

    DRYER FOR AIR SUSPENSION FOR VEHICLE
    7.
    发明申请
    DRYER FOR AIR SUSPENSION FOR VEHICLE 有权
    用于车辆的空气悬架的干燥机

    公开(公告)号：US20100206168A1

    公开(公告)日：2010-08-19

    申请号：US12648348

    申请日：2009-12-29

    申请人： Yutaro HONJO ,  Hiroyuki Uehara ,  Tadahiro Kitamura

    发明人： Yutaro HONJO ,  Hiroyuki Uehara ,  Tadahiro Kitamura

    IPC分类号： B01D53/02 ,  B01D50/00

    CPC分类号： B01D53/0415 ,  B01D53/261 ,  B60G2500/2012 ,  B60G2600/66 ,  Y10S55/17

    摘要： A dryer for an air suspension for a vehicle, includes a housing having an inlet port and an outlet port, a desiccant disposed between first and second filters within the housing, and a guide member including a shielding cylinder portion and a plate portion having plural communication holes, wherein the guide member is disposed between the inlet port and the first filter positioned closer to the inlet port, supports the first filter and the desiccant and guides a fluid to the desiccant, the shielding cylinder portion includes an opening and forms a flow passage for guiding the fluid, the fluid is guided to the desiccant from the inlet port via the shielding cylinder portion, and the flow passage and the communication holes, so that the fluid is dried by the desiccant and is then discharged from the dryer as a dry air to the air suspension for the vehicle.

    摘要翻译： 一种用于车辆的空气悬架的干燥机，包括具有入口和出口的壳体，设置在壳体内的第一和第二过滤器之间的干燥剂，以及包括屏蔽筒部分和具有多个连通的板部分的引导构件 孔，其中所述引导构件设置在所述入口和位于所述入口附近的所述第一过滤器之间，支撑所述第一过滤器和所述干燥剂并将流体引导到所述干燥剂，所述屏蔽筒部分包括开口并形成流路 为了引导流体，流体经由屏蔽筒部分和流动通道和连通孔从入口引导到干燥剂，使得流体被干燥剂干燥，然后以干燥的方式从干燥器中排出 空气到车辆的空气悬架。

    Method of polishing copper layer of substrate
    8.
    发明授权
    Method of polishing copper layer of substrate 失效
    抛光衬底铜层的方法

    公开(公告)号：US06797626B2

    公开(公告)日：2004-09-28

    申请号：US10331070

    申请日：2002-12-27

    申请人： Noriko Miyairi ,  Yasuo Inada ,  Tsuyoshi Hasegawa ,  Yuji Terashima ,  Kenji Sakai ,  Tadahiro Kitamura ,  Takahiro Umeda

    发明人： Noriko Miyairi ,  Yasuo Inada ,  Tsuyoshi Hasegawa ,  Yuji Terashima ,  Kenji Sakai ,  Tadahiro Kitamura ,  Takahiro Umeda

    IPC分类号： H01L21302

    CPC分类号： B24B37/30 ,  C09G1/02 ,  H01L21/3212 ,  H05K3/26 ,  H05K3/383 ,  H05K3/4644 ,  H05K2203/025 ,  H05K2203/121

    摘要： The method of polishing a copper layer of a substrate is capable of improving a stock removal rate, etc. The method comprises the steps of: supplying a substrate onto an polishing pad of an polishing plate with a copper layer facing the polishing pad; pressing the substrate onto the polishing pad, with a backing pad, by a press head; relatively rotating the press head with respect to the polishing plate, with supplying polishing slurry onto the polishing pad. The backing pad is made of a material whose Asker C hardness is 75-95 and whose compressibility is 10% or less. The polishing slurry includes a chelating agent for chelating copper, an etching agent for etching the surface of copper layer, an oxidizing agent for oxidizing the surface of copper layer, and water.

    摘要翻译： 抛光基板的铜层的方法能够提高原料去除率等。该方法包括以下步骤：将基板供给到具有面向抛光垫的铜层的抛光板的抛光垫上; 用衬垫将衬底用衬垫压入抛光垫上; 相对于抛光板相对地旋转压头，同时将抛光浆料供应到抛光垫上。 衬垫由Asker C硬度为75-95且压缩率为10％以下的材料制成。 抛光浆料包括用于螯合铜的螯合剂，用于蚀刻铜层表面的蚀刻剂，用于氧化铜层表面的氧化剂和水。

    Dryer for air suspension for vehicle
    9.
    发明授权
    Dryer for air suspension for vehicle 有权
    用于车辆空气悬架的干燥机

    公开(公告)号：US08216350B2

    公开(公告)日：2012-07-10

    申请号：US12648348

    申请日：2009-12-29

    申请人： Yutaro Honjo ,  Hiroyuki Uehara ,  Tadahiro Kitamura

    发明人： Yutaro Honjo ,  Hiroyuki Uehara ,  Tadahiro Kitamura

    IPC分类号： B01D53/04 ,  B01D53/26

    CPC分类号： B01D53/0415 ,  B01D53/261 ,  B60G2500/2012 ,  B60G2600/66 ,  Y10S55/17

    摘要： A dryer for an air suspension for a vehicle, includes a housing having an inlet port and an outlet port, a desiccant disposed between first and second filters within the housing, and a guide member including a shielding cylinder portion and a plate portion having plural communication holes, wherein the guide member is disposed between the inlet port and the first filter positioned closer to the inlet port, supports the first filter and the desiccant and guides a fluid to the desiccant, the shielding cylinder portion includes an opening and forms a flow passage for guiding the fluid, the fluid is guided to the desiccant from the inlet port via the shielding cylinder portion, and the flow passage and the communication holes, so that the fluid is dried by the desiccant and is then discharged from the dryer as a dry air to the air suspension for the vehicle.

    摘要翻译： 一种用于车辆的空气悬架的干燥机，包括具有入口和出口的壳体，设置在壳体内的第一和第二过滤器之间的干燥剂，以及包括屏蔽筒部分和具有多个连通的板部分的引导构件 孔，其中所述引导构件设置在所述入口和位于所述入口附近的所述第一过滤器之间，支撑所述第一过滤器和所述干燥剂并将流体引导到所述干燥剂，所述屏蔽筒部分包括开口并形成流路 为了引导流体，流体经由屏蔽筒部分和流动通道和连通孔从入口引导到干燥剂，使得流体被干燥剂干燥，然后以干燥的方式从干燥器中排出 空气到车辆的空气悬架。

    GENERATION OF PANCREATIC ENDOCRINE CELLS FROM PRIMARY DUCT CELL CULTURES AND METHODS OF USE FOR TREATMENT OF DIABETES
    10.
    发明申请
    GENERATION OF PANCREATIC ENDOCRINE CELLS FROM PRIMARY DUCT CELL CULTURES AND METHODS OF USE FOR TREATMENT OF DIABETES 审中-公开
    来自原代细胞培养的胰腺内皮细胞的产生及其用于治疗糖尿病的方法

    公开(公告)号：US20080260700A1

    公开(公告)日：2008-10-23

    申请号：US12037401

    申请日：2008-02-26

    申请人： Domenico ACCILI ,  Tadahiro Kitamura

    发明人： Domenico ACCILI ,  Tadahiro Kitamura

    IPC分类号： A61K35/12 ,  C12N5/00 ,  A61P3/10 ,  C12N5/08

    CPC分类号： C12N5/0676 ,  C12N2500/25 ,  C12N2501/117

    摘要： The invention is directed to spontaneously immortalized pancreatic duct cells and methods for generating pancreatic endocrine cells from spontaneously immortalized pancreatic duct cells that express the transcription factors Pdx1 and FoxO1. The invention also provides for methods for treating beta cell failure, the method comprising administering to a subject an effective amount of spontaneously immortalized pancreatic duct cells expressing a mutated version FoxO1.

    摘要翻译： 本发明涉及自发永生化胰管细胞和从表达转录因子Pdx1和FoxO1的自发永生化胰腺细胞产生胰腺内分泌细胞的方法。 本发明还提供了治疗β细胞衰竭的方法，所述方法包括向受试者施用有效量的表达突变型FoxO1的自发永生化胰管细胞。