公开(公告)号：US06846513B2

公开(公告)日：2005-01-25

申请号：US10028712

申请日：2001-12-28

申请人： Masahiro Furusawa ,  Satoru Miyashita ,  Ichio Yudasaka ,  Tatsuya Shimoda ,  Yasuaki Yokoyama ,  Yasuo Matsuki ,  Yasumasa Takeuchi

发明人： Masahiro Furusawa ,  Satoru Miyashita ,  Ichio Yudasaka ,  Tatsuya Shimoda ,  Yasuaki Yokoyama ,  Yasuo Matsuki ,  Yasumasa Takeuchi

IPC分类号： C23C16/24 ,  B32B9/04 ,  C23C16/04 ,  C23C16/448 ,  H01L21/205

CPC分类号： C23C16/042 ,  B82Y30/00 ,  C23C16/24 ,  C23C16/4481 ,  H01L21/0237 ,  H01L21/02422 ,  H01L21/02439 ,  H01L21/02499 ,  H01L21/02532 ,  H01L21/0262 ,  H01L21/02628 ,  H01L21/02639 ,  H01L21/02642 ,  H01L21/02661

摘要： Provided is a method of forming a silicon thin-film which comprises a step of arranging in one or more parts of a liquid arranging surface liquid which contains a silicide comprising ring silane and/or a derivative thereof, such ring silane comprising silicon and hydrogen, and a step of forming a silicon thin-film by vaporizing silicide from liquid and supplying the silicide to a thin-film-forming surface.

摘要翻译： 提供一种形成硅薄膜的方法，其包括在一个或多个部分中布置包含硅烷和/或其衍生物的硅化物的液体排列表面液体的步骤，所述硅烷包括硅和氢， 以及通过从液体中蒸发硅化物并将硅化物供给到薄膜形成表面来形成硅薄膜的步骤。

公开(公告)号：US06541354B1

公开(公告)日：2003-04-01

申请号：US09701647

申请日：2000-11-30

申请人： Tatsuya Shimoda ,  Satoru Miyashita ,  Shunichi Seki ,  Masahiro Furusawa ,  Ichio Yudasaka ,  Yasumasa Takeuchi ,  Yasuo Matsuki

发明人： Tatsuya Shimoda ,  Satoru Miyashita ,  Shunichi Seki ,  Masahiro Furusawa ,  Ichio Yudasaka ,  Yasumasa Takeuchi ,  Yasuo Matsuki

IPC分类号： H01L2120

CPC分类号： H01L21/0242 ,  C30B7/00 ,  C30B7/005 ,  C30B29/06 ,  H01L21/0237 ,  H01L21/02532 ,  H01L21/02592 ,  H01L21/02595 ,  H01L21/02628 ,  H01L21/02675

摘要： A solution containing a cyclic silane compound, which does not contain carbon, and/or a silane compound modified by boron or phosphorus is applied onto a substrate and a silicon precursor film is formed, and the film is then transformed into semiconductor silicon by heat and/or light treatment. Thereby, it is possible to easily produce a silicon film having satisfactory characteristics as an electronic material at low costs, differing from the vacuum process, such as by CVD methods.

摘要翻译： 将含有不含碳的环状硅烷化合物和/或通过硼或磷改性的硅烷化合物的溶液施加到基板上，形成硅前体膜，然后通过加热将膜转变成半导体硅， /或轻度治疗。 由此，与真空工艺不同，例如通过CVD方法，可以以低成本容易地制造具有令人满意的特性的硅膜作为电子材料。

公开(公告)号：US06518087B1

公开(公告)日：2003-02-11

申请号：US09701646

申请日：2000-11-30

申请人： Masahiro Furusawa ,  Shunichi Seki ,  Satoru Miyashita ,  Tatsuya Shimoda ,  Ichio Yudasaka ,  Yasuo Matsuki ,  Yasumasa Takeuchi

发明人： Masahiro Furusawa ,  Shunichi Seki ,  Satoru Miyashita ,  Tatsuya Shimoda ,  Ichio Yudasaka ,  Yasuo Matsuki ,  Yasumasa Takeuchi

IPC分类号： H01L2100

CPC分类号： H01L31/202 ,  H01L31/046 ,  H01L31/077 ,  H01L31/1872 ,  Y02E10/50 ,  Y02P70/521

摘要： A solar battery is provided having a structure in which at least two semiconductor thin-films are disposed one over the other between a pair of electrodes, each semiconductor thin-film differing from the other in the impurity concentration thereof and/or the type of semiconductor. Formation of at least one of the semiconductor thin-films consists of coating a liquid coating composition containing a silicon compound so as to form a coating film and a step of converting the coating film into a silicon film by heat treatment and/or light treatment.

摘要翻译： 提供了一种太阳能电池，其具有这样的结构，其中至少两个半导体薄膜彼此之间设置在一对电极之间，每个半导体薄膜在其杂质浓度和/或半导体的类型中彼此不同 。 至少一个半导体薄膜的形成包括涂覆含有硅化合物的液体涂料组合物以形成涂膜和通过热处理和/或光处理将涂膜转化为硅膜的步骤。

公开(公告)号：US06953600B2

公开(公告)日：2005-10-11

申请号：US10410154

申请日：2003-04-10

申请人： Yasuaki Yokoyama ,  Yasuo Matsuki ,  Ikuo Sakono ,  Kazuki Kobayashi ,  Yasumasa Takeuchi

发明人： Yasuaki Yokoyama ,  Yasuo Matsuki ,  Ikuo Sakono ,  Kazuki Kobayashi ,  Yasumasa Takeuchi

IPC分类号： C23C18/08 ,  C23C18/10 ,  C23C18/14 ,  C23C18/16 ,  H01B5/14 ,  H01B13/00 ,  H01J9/02 ,  H01L21/288 ,  H01L21/768 ,  H01L23/498 ,  H05K3/10 ,  H05K3/24 ,  B05D5/12

CPC分类号： H01L21/76838 ,  C23C18/08 ,  H01L21/288 ,  H01L23/49883 ,  H01L2924/0002 ,  H01L2924/09701 ,  H05K3/105 ,  Y10T428/24917 ,  H01L2924/00

摘要： There are provided a conductive film forming composition capable of forming wiring or an electrode which can be suitably used in a variety of electronic devices, easily and inexpensively, a method for forming a film using the composition, a conductive film formed by the method, and wiring or an electrode which comprises the film.A conductive film forming composition comprising a complex of an amine compound and aluminum hydride and an organic solvent is applied on a substrate and then subjected to a heat treatment and/or irradiation with light, whereby a conductive film such as an electrode or wiring is produced.

摘要翻译： 提供能够容易且廉价地形成布线或电极的导电膜形成组合物，其可以适用于各种电子器件，使用该组合物形成膜的方法，通过该方法形成的导电膜，以及 布线或包括该膜的电极。 将包含胺化合物和氢化铝的复合物和有机溶剂的导电膜形成组合物施加在基材上，然后进行热处理和/或光照射，由此产生诸如电极或布线的导电膜 。

公开(公告)号：US20070190265A1

公开(公告)日：2007-08-16

申请号：US11787445

申请日：2007-04-16

申请人： Takashi Aoki ,  Masahiro Furusawa ,  Yasuo Matsuki ,  Haruo Iwasawa ,  Yasumasa Takeuchi

发明人： Takashi Aoki ,  Masahiro Furusawa ,  Yasuo Matsuki ,  Haruo Iwasawa ,  Yasumasa Takeuchi

IPC分类号： C08J3/28

CPC分类号： C08G77/60 ,  C01B33/04 ,  C09D183/16 ,  H01L21/02422 ,  H01L21/02532 ,  H01L21/02628

摘要： It is an object of the present invention to provide a high order silane composition that contains a polysilane having a higher molecular weight than conventionally, this being from the viewpoints of wettability when applying onto a substrate, boiling point and safety, and hence in particular enables a high-quality silicon film to be formed easily, and also a method of forming an excellent silicon film using the composition. The present invention attains this object by providing a high order silane composition containing a polysilane obtained through photopolymerization by irradiating a solution of a photopolymerizable silane or a photopolymerizable like-liquid silane with ultraviolet light. Moreover, the present invention provides a method of forming a silicon film comprising the step of applying such a high order silane composition onto a substrate.

公开(公告)号：US06224788B1

公开(公告)日：2001-05-01

申请号：US09041312

申请日：1998-03-12

申请人： Toshihiro Ogawa ,  Shoichi Nakata ,  Yutaka Makita ,  Masayuki Kimura ,  Yasumasa Takeuchi ,  Yasuo Matsuki ,  Shin-ichi Kimura

发明人： Toshihiro Ogawa ,  Shoichi Nakata ,  Yutaka Makita ,  Masayuki Kimura ,  Yasumasa Takeuchi ,  Yasuo Matsuki ,  Shin-ichi Kimura

IPC分类号： C09K1956

CPC分类号： G02F1/133723 ,  G02F1/133788 ,  Y10T428/1005 ,  Y10T428/1023

摘要： A liquid crystal aligning agent composed of a polymer containing a moiety having two aromatic nuclei and an ethylene carbonyl group therebetween. The liquid crystal aligning agent is converted to a liquid crystal alignment film by irradiation a thin film of the agent with a linearly polarized ray.

摘要翻译： 由含有具有两个芳香核的部分的聚合物和其间的乙烯羰基组成的液晶取向剂。 通过用线偏振光照射该试剂的薄膜，将液晶取向剂转化为液晶取向膜。

公开(公告)号：US20120064302A1

公开(公告)日：2012-03-15

申请号：US13263805

申请日：2010-04-09

申请人： Tatsuya Shimoda ,  Yasuo Matsuki ,  Ryo Kawajiri ,  Takashi Masuda ,  Toshihiko Kaneda

发明人： Tatsuya Shimoda ,  Yasuo Matsuki ,  Ryo Kawajiri ,  Takashi Masuda ,  Toshihiko Kaneda

IPC分类号： B32B3/30 ,  B05D3/12

CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  C01B33/02 ,  C01B33/027 ,  C01B33/18 ,  C01P2004/01 ,  C01P2004/20 ,  C23C18/06 ,  C23C18/08 ,  C23C18/1208 ,  C23C18/1279 ,  C23C18/14 ,  H01L21/02164 ,  H01L21/02282 ,  H01L21/0237 ,  H01L21/02532 ,  H01L21/02623 ,  H01L21/02656 ,  H01L21/31 ,  Y10T428/24612

摘要： A patterning method comprising the steps of:the first step of disposing at least one silane compound selected from the group consisting of a silicon hydride compound and a silicon halide compound in the space between a substrate and a patterned mold; andthe second step of subjecting the silane compound to at least one treatment selected from a heat treatment and an ultraviolet exposure treatment.A pattern composed of silicon can be formed by carrying out the second step in an inert atmosphere or a reducing atmosphere and a pattern composed of silicon oxide can be formed by carrying out at least part of the second step in an oxygen-containing atmosphere.

摘要翻译： 一种图案化方法，包括以下步骤：在衬底和图案化模具之间的空间中设置选自由硅化合物和硅卤化物组成的组中的至少一种硅烷化合物的第一步骤; 以及对硅烷化合物进行选自热处理和紫外线曝光处理中的至少一种处理的第二步骤。 可以通过在惰性气氛或还原气氛中进行第二步骤形成由硅构成的图案，并且可以通过在含氧气氛中进行至少一部分第二步骤来形成由氧化硅组成的图案。

公开(公告)号：US20110184141A1

公开(公告)日：2011-07-28

申请号：US13003641

申请日：2009-07-09

申请人： Tatsuya Shimoda ,  Ryo Kawajiri ,  Kiyoshi Isobe ,  Hidetaka Nakai ,  Yasuo Matsuki

发明人： Tatsuya Shimoda ,  Ryo Kawajiri ,  Kiyoshi Isobe ,  Hidetaka Nakai ,  Yasuo Matsuki

IPC分类号： C08G77/60 ,  C08G79/00 ,  C08G85/00

CPC分类号： C08G77/60 ,  C07F7/0896

摘要： A polymer production process comprising reacting a compound represented by the following formula (1) in the presence of a binuclear metal complex represented by the following formula (2). R4-nMHn  (1) (in the formula (1), R is a monovalent organic group, M is a silicon atom or a germanium atom, and n is 2 or 3.) [CpM(μ-CH2)]2  (2) (in the formula (2), Cp is a cyclopentadienyl-based ligand, M is a metal atom selected from Rh and Ir, and the bond between M's is a double bond.)

摘要翻译： 一种聚合物制备方法，包括在由下式（2）表示的双核金属络​​合物的存在下使由下式（1）表示的化合物反应。 R4-nMHn（1）（式（1）中，R为一价有机基团，M为硅原子或锗原子，n为2或3.）[CpM（μ-CH 2）] 2 ）（式（2）中，Cp为环戊二烯基配体，M为选自Rh和Ir的金属原子，M'之间的键为双键。）

公开(公告)号：US20060257667A1

公开(公告)日：2006-11-16

申请号：US10542358

申请日：2003-12-24

申请人： Yasuaki Yokoyama ,  Michiko Yokoyama ,  Naomi Shinoda ,  Risa Yokoyama ,  Yasuo Matsuki

发明人： Yasuaki Yokoyama ,  Michiko Yokoyama ,  Naomi Shinoda ,  Risa Yokoyama ,  Yasuo Matsuki

IPC分类号： C22C21/02 ,  B32B9/00

CPC分类号： C23C18/08

摘要： A composition for forming a silicon.aluminum film, containing a silicon compound and an aluminum compound. The silicon.aluminum film is obtained by forming a coating film of the above composition and treating it with heat and/or light. The silicon.aluminum film can easily be formed from the above composition by the above method at a low cost without requiring an expensive vacuum apparatus or high-frequency wave generator.

摘要翻译： 一种用于形成含硅化合物和铝化合物的硅铝膜的组合物。 硅铝膜通过形成上述组成的涂膜并用热和/或光进行处理而获得。 通过上述方法可以以低成本容易地由上述组成形成硅铝膜，而不需要昂贵的真空装置或高频波发生器。

公开(公告)号：US20070208117A1

公开(公告)日：2007-09-06

申请号：US11681501

申请日：2007-03-02

申请人： Yasuo Matsuki ,  Kazuo Kawaguchi ,  Akiyoshi Fujii ,  Yuichi Saito ,  Yasumasa Takeuchi

发明人： Yasuo Matsuki ,  Kazuo Kawaguchi ,  Akiyoshi Fujii ,  Yuichi Saito ,  Yasumasa Takeuchi

IPC分类号： B32B5/16 ,  C08K5/00

CPC分类号： C08K5/0091 ,  C08K3/12 ,  H01L2224/73204 ,  H01L2224/83101 ,  Y10T428/25 ,  Y10T428/257 ,  Y10T428/31

摘要： A composition for forming an aluminum fine particle dispersed film, which comprises a complex of an amine compound and aluminum hydride and a polymer component having film formability is prepared, and a film formed therefrom is heated or exposed to light to manufacture an aluminum fine particle dispersed film.The above composition can provide an Al fine particle dispersed film which can be used in electronic devices or optical devices, an Al wiring pattern film and an Al mirror film.

摘要翻译： 制备包含胺化合物和氢化铝的配合物和具有成膜性的聚合物成分的铝微粒分散膜的组合物，将由其形成的膜加热或暴露于光以制造分散的铝细颗粒 电影。 上述组合物可以提供可用于电子器件或光学器件，Al布线图案膜和Al镜面膜的Al微粒分散膜。