Semiconductor wafer processing tapes
    1.
    发明授权
    Semiconductor wafer processing tapes 有权
    半导体晶圆加工带

    公开(公告)号:US06478918B2

    公开(公告)日:2002-11-12

    申请号:US09765230

    申请日:2001-01-18

    IPC分类号: H01L21784

    摘要: A semiconductor wafer processing tape includes a permanent backing and a layer of a nonpressure sensitive adhesive. The tapes are useful for wafer grinding and/or wafer dicing applications. The nonpressure sensitive adhesive includes a copolymer of at least one of a first monoethylenically unsaturated monomer, at least one of a second monoethylenically unsaturated monomer, and at least one copolymerizable nonionic crosslinking agent; wherein the second monoethylenically unsaturated monomer is a reinforcing monomer having a homopolymer glass transition temperature higher than that of the first monoethylenically unsaturated monomer. A method of processing semiconductor wafers is also provided.

    摘要翻译: 半导体晶片处理带包括永久性背衬和非压敏粘合剂层。 磁带可用于晶片研磨和/或晶圆切片应用。 非压敏粘合剂包括第一单烯属不饱和单体,至少一种第二单烯属不饱和单体和至少一种可共聚非离子交联剂中的至少一种的共聚物; 其中所述第二单烯属不饱和单体是均聚物玻璃化转变温度高于所述第一单烯属不饱和单体的均聚物玻璃化转变温度的增强单体。 还提供了一种处理半导体晶片的方法。

    Semiconductor wafer processing tapes
    2.
    发明授权
    Semiconductor wafer processing tapes 失效
    半导体晶圆加工带

    公开(公告)号:US06235387B1

    公开(公告)日:2001-05-22

    申请号:US09050476

    申请日:1998-03-30

    IPC分类号: H01L2168

    摘要: A semiconductor wafer processing tape includes a permanent backing and a layer of a nonpressure sensitive adhesive. The tapes are useful for wafer grinding and/or wafer dicing applications. The nonpressure sensitive adhesive includes a copolymer of at least one of a first monoethylenically unsaturated monomer, at least one of a second monoethylenically unsaturated monomer, and at least one copolymerizable nonionic crosslinking agent; wherein the second monoethylenically unsaturated monomer is a reinforcing monomer having a homopolymer glass transition temperature higher than that of the first monoethylenically unsaturated monomer. A method of processing semiconductor wafers is also provided.

    摘要翻译: 半导体晶片处理带包括永久性背衬和非压敏粘合剂层。 磁带可用于晶片研磨和/或晶圆切片应用。 非压敏粘合剂包括第一单烯属不饱和单体,至少一种第二单烯属不饱和单体和至少一种可共聚非离子交联剂中的至少一种的共聚物; 其中所述第二单烯属不饱和单体是均聚物玻璃化转变温度高于所述第一单烯属不饱和单体的均聚物玻璃化转变温度的增强单体。 还提供了一种处理半导体晶片的方法。