Hardmask
    6.
    发明授权
    Hardmask 有权
    硬掩模

    公开(公告)号:US08795774B2

    公开(公告)日:2014-08-05

    申请号:US13624946

    申请日:2012-09-23

    IPC分类号: G03F7/004 G03F7/038

    摘要: Compositions containing certain organometallic oligomers suitable for use as spin-on, metal hardmasks are provided, where such compositions can be tailored to provide a metal oxide hardmask having a range of etch selectivity. Also provided are methods of depositing metal oxide hardmasks using the present compositions.

    摘要翻译: 提供了包含适合用作旋涂金属硬掩模的某些有机金属低聚物的组合物,其中可以调整这些组合物以提供具有一定范围的蚀刻选择性的金属氧化物硬掩模。 还提供了使用本发明组合物沉积金属氧化物硬掩模的方法。