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29 条记录 (耗时 0.02 秒)

    Spotting pin
    1.
    发明授权
    Spotting pin 失效
    点针

    公开(公告)号：US06835352B2

    公开(公告)日：2004-12-28

    申请号：US10434214

    申请日：2003-05-09

    申请人： Seiichiro Ito ,  Mitsuhiro Tachibana

    发明人： Seiichiro Ito ,  Mitsuhiro Tachibana

    IPC分类号： B01L302

    CPC分类号： B01L3/0244 ,  B01L3/0248 ,  B01L3/0262 ,  B01L2200/0605 ,  B01L2400/025 ,  B01L2400/0406 ,  Y10T436/2575

    摘要： A spotting pin 10 capable of spotting equal amounts of a solution in a sequential manner comprises a first member 11 having a solution holding portion 13 formed at the tip thereof for holding a predetermined amount of solution, and a second member 12 having a solution supply portion 14 for holding the solution by a capillary action, the second member adapted to slide along the first member. As the solution supply portion 14 is brought into contact with the solution holding portion 13, the solution enters the solution holding portion 13 from the solution supply portion 14 by a capillary action. As the solution supply portion 14 and the solution holding portion 13 are separated from each other, a predetermined amount of the solution can be carried in the solution holding portion 13. Then, as the solution holding portion 13 is brought into contact with a water-absorbing support 21, a spot 22 of a predetermined amount of the solution can be formed thereon.

    摘要翻译： 能够顺序地分配等量溶液的点针10包括：第一构件11，其具有形成在其顶端处的用于保持预定量溶液的溶液保持部分13;以及第二构件12，其具有溶液供应部分 14，用于通过毛细作用保持溶液，第二构件适于沿着第一构件滑动。 当溶液供应部分14与溶液保持部分13接触时，溶液通过毛细作用从溶液供应部分14进入溶液保留部分13。 当溶液供应部分14和溶液保持部分13彼此分离时，可以在溶液保留部分13中承载预定量的溶液。然后，当溶液保持部分13与水溶液保持部分13接触时， 吸收支撑件21，可以在其上形成预定量的溶液的点22。

    Biochip reader and labeling reagent
    3.
    发明授权
    Biochip reader and labeling reagent 失效
    生物芯片阅读器和贴标试剂

    公开(公告)号：US06787349B1

    公开(公告)日：2004-09-07

    申请号：US09889747

    申请日：2001-07-19

    申请人： Kenji Yamamoto ,  Mitsuhiro Tachibana ,  Katsuya Mizuno

    发明人： Kenji Yamamoto ,  Mitsuhiro Tachibana ,  Katsuya Mizuno

    IPC分类号： C12M100

    CPC分类号： G01N33/543 ,  B01J2219/00536 ,  Y10T436/13

    摘要： The present invention provides a high-sensitive, inexpensive biochip reader for reading a biochip as compared to a fluorescence method. The biochip reader is provided with an X-Y stage (3) for mounting a biochip (6) and scanning the biochip (6) in a two-dimensional manner, a controller (4) for the X-Y stage, a magnetic sensor (1) for reading the magnetic field strength, an ohmmeter (2), and a computer (5) for signal processing. As a result, a high-performance, inexpensive biochip reader can be provided without using an expensive laser or an expensive optical system, by employing a magnetic sensor and a disk driving mechanism generally used in a hard disk drive and the like.

    摘要翻译： 与荧光方法相比，本发明提供了一种用于读取生物芯片的高灵敏度，便宜的生物芯片读取器。 生物芯片读取器设置有用于安装生物芯片（6）并以二维方式扫描生物芯片（6）的XY台（3），用于XY台的控制器（4），用于 读取磁场强度，欧姆表（2）和用于信号处理的计算机（5）。 结果，通过采用通常用于硬盘驱动器等中的磁传感器和盘驱动机构，可以提供高性能，廉价的生物芯片读取器，而不需要使用昂贵的激光器或昂贵的光学系统。

    Apparatus and method for detecting an end point of a cleaning process
    5.
    发明授权
    Apparatus and method for detecting an end point of a cleaning process 有权
    用于检测清洁过程的终点的装置和方法

    公开(公告)号：US06737666B1

    公开(公告)日：2004-05-18

    申请号：US09721703

    申请日：2000-11-27

    申请人： Natsuko Ito ,  Tsuyoshi Moriya ,  Fumihiko Uesugi ,  Yoshinori Kato ,  Masaru Aomori ,  Shuji Moriya ,  Mitsuhiro Tachibana

    发明人： Natsuko Ito ,  Tsuyoshi Moriya ,  Fumihiko Uesugi ,  Yoshinori Kato ,  Masaru Aomori ,  Shuji Moriya ,  Mitsuhiro Tachibana

    IPC分类号： G01N2149

    CPC分类号： H01J37/32935 ,  C23C16/4405 ,  C23C16/52 ,  G01N21/49 ,  H01J37/32963 ,  Y10S438/905

    摘要： A cleaning end point detecting apparatus detects an end point of a cleaning process in which contamination attached to an inner wall of a reaction chamber is removed by introducing a cleaning gas into the chamber to produce a cluster cloud and detached particles. An irradiating unit irradiates a laser beam onto the cluster cloud and the detached particles within the reaction chamber to produce a scattered laser beam. A monitoring unit monitors the scattered laser beam as a two-dimensional image information. A judging unit judges the end point of the cleaning process on the basis of the two-dimensional image information. Preferably, the judging unit judges, as the end point of the cleaning process, a time instant when neither the detached particles nor the cluster cloud are detected on the basis of the two-dimensional image information.

    摘要翻译： 清洗终点检测装置检测清洁过程的终点，其中通过将清洁气体引入室中来除去附着在反应室内壁上的污染物，以产生簇云和分离的颗粒。 照射单元将激光束照射到聚簇云和反应室内的分离的颗粒以产生散射的激光束。 监视单元将散射的激光束监视为二维图像信息。 判断单元基于二维图像信息判断清洁处理的结束点。 优选地，判断单元基于二维图像信息来判断清除处理的结束点是否没有检测到分离的颗粒和簇云的时刻。

    Method and apparatus for reading fluorescence
    6.
    发明授权
    Method and apparatus for reading fluorescence 失效
    读取荧光的方法和装置

    公开(公告)号：US06646271B2

    公开(公告)日：2003-11-11

    申请号：US09998527

    申请日：2001-11-28

    申请人： Naoki Yokokawa ,  Mitsuhiro Tachibana

    发明人： Naoki Yokokawa ,  Mitsuhiro Tachibana

    IPC分类号： G01N2164

    CPC分类号： G01N21/6408 ,  G01N21/6458

    摘要： The present invention aims at minimizing the influence of residual fluorescence emitted from adjacent spots, upon reading time-resolved fluorescence. The path of laser beam scan is set to be intermittent such that residual fluorescence from adjacent spots gives no effect. In other words, the spots are read in a skipping manner.

    摘要翻译： 本发明的目的是在读取时间分辨荧光的同时最小化从相邻光点发射的残留荧光的影响。激光束扫描的路径被设置为间歇的，使得来自相邻斑点的残留荧光不起作用。 换句话说，以跳过的方式读取斑点。

    Shower head
    7.
    发明授权
    Shower head 有权
    淋浴头

    公开(公告)号：US6036782A

    公开(公告)日：2000-03-14

    申请号：US166577

    申请日：1998-10-06

    申请人： Sumi Tanaka ,  Sakae Nakatsuka ,  Mitsuhiro Tachibana

    发明人： Sumi Tanaka ,  Sakae Nakatsuka ,  Mitsuhiro Tachibana

    IPC分类号： H01L21/285 ,  C23C16/44 ,  C23C16/455 ,  H01L21/205 ,  H01L21/3065 ,  H01L21/31 ,  H01L21/687 ,  C23C16/00

    CPC分类号： C23C16/45565 ,  C23C16/455 ,  H01L21/687

    摘要： A showerhead for use in a process chamber for performing a predetermined process on an object, designed to apply a prescribed gas in the process chamber. The showerhead comprises a main body, a cover, and a support. The main body has a an internal space into which the gas to be supplied into the process chamber is introduced and an opening which opens to the process chamber. The cover closes the opening of the main body and has a plurality of gas-applying holes for applying the gas from the main body. The support supports the cover to the main body and provides a predetermined clearance between the cover and the main body.

    摘要翻译： 一种在处理室中使用的用于对物体进行预定处理的喷头，其被设计成在处理室中施加规定的气体。 喷头包括主体，盖和支撑件。 主体具有内部空间，供给到处理室中的气体被引入到该内部空间中，并且开口通向处理室。 盖封闭主体的开口，并具有多个用于从主体施加气体的气体施加孔。 支撑件支撑主体的盖，并且在盖和主体之间提供预定的间隙。

    System for continuously washing and film-forming a semiconductor wafer
    8.
    发明授权
    System for continuously washing and film-forming a semiconductor wafer 失效
    用于连续洗涤和成膜半导体晶片的系统

    公开(公告)号：US5303671A

    公开(公告)日：1994-04-19

    申请号：US014150

    申请日：1993-02-05

    申请人： Hiroshi Kondo ,  Mitsuhiro Tachibana

    发明人： Hiroshi Kondo ,  Mitsuhiro Tachibana

    IPC分类号： C23C16/02 ,  C23C16/54 ,  H01L21/00 ,  H01L21/677 ,  C23C16/00

    CPC分类号： H01L21/67757 ,  C23C16/0227 ,  C23C16/54 ,  H01L21/67051 ,  H01L21/67115 ,  H01L21/67201 ,  H01L21/67207 ,  Y10S414/137 ,  Y10S414/139

    摘要： A system for cleaning and film-forming a semiconductor wafer continuously comprises a washing section for removing native oxide from the surface of the wafer while applying hydrofluoric acid to the silicon wafer, a load lock chamber located adjacent to the washing section and filled with the atmosphere of non-oxidizing gas, a film-forming section communicated with and shielded from the load lock chamber by a gate valve to form film on that face of the wafer which is to be processed, a first transfer robot for transferring the wafer between the washing section and the load lock chamber, and a second transfer robot for transferring the wafer between the load lock chamber and the film-forming section. Film is formed on the wafer in the film-forming section after the native oxide is removed from the wafer.

    摘要翻译： 用于连续地清洁和成膜半导体晶片的系统包括：洗涤部分，用于从硅晶片的表面除去天然氧化物，同时向硅晶片施加氢氟酸;位于邻近洗涤部分并充满大气的负载锁定室 的非氧化性气体，通过栅极阀与负载锁定室连通并与其隔离的成膜部，以在被处理晶片的面上形成膜，第一传送机器人，用于在洗涤之间传送晶片 以及用于在所述负载锁定室和所述成膜部之间传送所述晶片的第二传送机器人。 在从晶片上去除自然氧化物之后，在成膜部分的晶片上形成膜。

    CVD process capable of reducing incubation time
    9.
    发明授权
    CVD process capable of reducing incubation time 失效
    CVD工艺能够减少孵化时间

    公开(公告)号：US07063871B2

    公开(公告)日：2006-06-20

    申请号：US10617819

    申请日：2003-07-14

    申请人： Hideaki Yamasaki ,  Tatsuo Hatano ,  Tsukasa Matsuda ,  Taro Ikeda ,  Kazuhito Nakamura ,  Koumei Matsuzawa ,  Yumiko Kawano ,  Mitsuhiro Tachibana

    发明人： Hideaki Yamasaki ,  Tatsuo Hatano ,  Tsukasa Matsuda ,  Taro Ikeda ,  Kazuhito Nakamura ,  Koumei Matsuzawa ,  Yumiko Kawano ,  Mitsuhiro Tachibana

    IPC分类号： C23C16/16

    CPC分类号： C23C16/16

    摘要： A metal CVD process includes a step (A) of introducing a gaseous source material containing a metal carbonyl compound into a process space adjacent to a surface of a substrate to be processed in such a manner that the metal carbonyl compound has a first partial pressure, and a step (B) of depositing a metal film on the surface of the substrate by introducing a gaseous source material containing the metal carbonyl compound into the process space in such a mater that the metal carbonyl compound has a second, smaller partial pressure. The step (A) is conducted such that there is caused no substantial deposition of the metal film on the substrate.

    摘要翻译： 金属CVD法包括将含有羰基金属化合物的气态源材料以与金属羰基化合物具有第一分压的方式相连接的待处理基板的表面的工艺空间引入的工序（A） 以及在金属羰基化合物具有第二较小分压的情况下，通过将含有羰基金属化合物的气态源材料引入到工艺空间中，在基板的表面上沉积金属膜的工序（B）。 进行步骤（A），使得金属膜不会在基板上实质上沉积。