Manufacturing method of semiconductor device
    7.
    发明授权
    Manufacturing method of semiconductor device 失效
    半导体器件的制造方法

    公开(公告)号:US06831002B2

    公开(公告)日:2004-12-14

    申请号:US10242422

    申请日:2002-09-13

    IPC分类号: H01L244763

    摘要: A manufacturing method of a semiconductor device for providing wires on a front surface of a semiconductor wafer by providing a plating layer, in which conductive layers provided on the front and back surfaces of the semiconductor wafer are electrically conducted by solder filled in its through-holes, and electrolytic plating is carried out by electrically connecting cathode terminals of an electrolytic plating apparatus and the conductive layer provided on the back surface of the semiconductor wafer which is provided with a mask on the conductive layer provided on its front surface.

    摘要翻译: 一种半导体器件的制造方法,其通过提供镀层,在半导体晶片的前表面上提供导线,其中设置在半导体晶片的前表面和后表面上的导电层通过填充在其通孔中的焊料电导电 并且通过将电解电镀装置的阴极端子与设置在其前表面上的导电层上设置有掩模的半导体晶片的背面上的导电层电连接进行电解电镀。