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1.发明授权公开(公告)号：US07931955B2
公开(公告)日：2011-04-26
申请号：US10486056
申请日：2002-08-07
申请人： Stephan Behle , Lutz Klippe , Matthias Bicker , Marten Walther
发明人： Stephan Behle , Lutz Klippe , Matthias Bicker , Marten Walther
IPC分类号： B32B7/02
CPC分类号： C23C16/401 , C23C16/045 , C23C16/30 , C23C16/405 , C23C16/515 , Y10T428/24967 , Y10T428/24975 , Y10T428/265 , Y10T428/31507 , Y10T428/31565 , Y10T428/31587 , Y10T428/31667
摘要： A composite material having a substrate material and at least one barrier coating on one side of the substrate material. The barrier coating is plasma impulse chemical vapor deposited (PICVD) to the substrate material. The barrier coating includes at least one of material selected from the group consisting of SiOx, TiOx, SnOx, Si3Ny, Nb2Oy, and Al2Oy.
摘要翻译： 一种复合材料，其具有衬底材料和在衬底材料的一侧上的至少一个阻挡涂层。 阻挡涂层是等离子体脉冲化学气相沉积（PICVD）到基底材料。 阻挡涂层包括选自SiO x，TiO x，SnO x，Si 3 N y，Nb 2 O y和Al 2 O y的材料中的至少一种。
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公开(公告)号：US20050118428A1
公开(公告)日：2005-06-02
申请号：US10637779
申请日：2003-08-07
IPC分类号： B05D7/00 , B05D7/02 , B05D7/24 , C23C16/02 , C23C16/04 , C23C16/30 , C23C16/40 , C23C16/515 , C23C28/00 , B32B9/00 , C23C16/00 , H05H1/24
CPC分类号： B05D7/50 , B05D1/60 , B05D1/62 , B05D7/02 , C23C16/0272 , C23C16/045 , C23C16/30 , C23C16/401 , C23C16/515 , Y10T428/31504 , Y10T428/31681
摘要： The invention describes a process for applying alternating layers by chemical vapor deposition which comprises the process steps of depositing an adhesion-promoter layer on a substrate and of applying a barrier layer, alternating layers comprising organic and inorganic materials being deposited alternately, in which process the coating time for application of the adhesion-promoter layer is between 0.05 s and 4.0 s and the coating time for application of the inorganic barrier layer is between 0.1 s and 6.0 s, and also a composite material produced using the process.
摘要翻译： 本发明描述了一种通过化学气相沉积施加交替层的方法，其包括在衬底上沉积粘合促进剂层和施加阻挡层的方法步骤，交替层包含交替沉积的有机和无机材料，在该过程中 粘合促进剂层的涂布时间为0.05s〜4.0s，涂布无机阻挡层的涂布时间为0.1s〜6.0s，也是使用该方法制造的复合材料。
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公开(公告)号：US07399500B2
公开(公告)日：2008-07-15
申请号：US10637779
申请日：2003-08-07
IPC分类号： C23C16/511 , H05H1/24
CPC分类号： B05D7/50 , B05D1/60 , B05D1/62 , B05D7/02 , C23C16/0272 , C23C16/045 , C23C16/30 , C23C16/401 , C23C16/515 , Y10T428/31504 , Y10T428/31681
摘要： A process for applying alternating layers by chemical vapor deposition comprises the process steps of depositing an adhesion-promoter layer on a substrate and applying a barrier layer. Alternating layers comprising organic and inorganic materials are deposited alternately, and in this process the coating time for application of the adhesion-promoter layer is between 0.05 s and 4.0 s and the coating time for application of the inorganic barrier layer is between 0.1 s and 6.0 s. A composite material is also produced using the process.
摘要翻译： 通过化学气相沉积施加交替层的方法包括在衬底上沉积粘合促进剂层并施加阻挡层的工艺步骤。 包含有机和无机材料的交替层交替沉积，并且在该过程中，涂覆粘合促进剂层的涂布时间为0.05s至4.0s，并且施加无机阻挡层的涂布时间为0.1s至6.0 s。 还使用该方法生产复合材料。
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公开(公告)号：US08961688B2
公开(公告)日：2015-02-24
申请号：US10515610
申请日：2003-05-09
申请人： Michael Lizenberg , Frank Lewin , Hartwig Müller , Klaus Vogel , Gregor Arnold , Stephan Behle , Andreas Lüttringhaus-Henkel , Matthias Bicker , Jürgen Klein , Marten Walther
发明人： Michael Lizenberg , Frank Lewin , Hartwig Müller , Klaus Vogel , Gregor Arnold , Stephan Behle , Andreas Lüttringhaus-Henkel , Matthias Bicker , Jürgen Klein , Marten Walther
IPC分类号： C23C16/452 , C23C16/511 , C23C16/52 , C23C16/44 , B08B7/00 , B08B9/42 , B29C49/42 , B65D23/02 , B65G29/00 , C08J9/00 , C23C14/04 , C23C14/50 , C23C14/56 , C23C16/04 , C23C16/40 , C23C16/455 , C23C16/458 , C23C16/50 , C23C16/54 , H01J37/32 , B05D1/00 , B29C49/02 , B29K77/00
CPC分类号： C23C16/4409 , B05D1/62 , B08B7/00 , B08B9/426 , B29C49/421 , B29C2049/026 , B29C2049/027 , B29C2049/4221 , B29C2791/001 , B29K2077/00 , B29K2995/0067 , B65D23/02 , B65G29/00 , B65G2201/0244 , C08J9/0004 , C08J2300/14 , C23C14/046 , C23C14/505 , C23C14/56 , C23C16/045 , C23C16/401 , C23C16/455 , C23C16/458 , C23C16/50 , C23C16/511 , C23C16/54 , H01J37/32733
摘要： Disclosed are a method and a device for plasma treating workpieces (5). Said workpiece is inserted into a chamber (7) of a treatment station (3), which can be at least partly evacuated, and is positioned within the treatment station by means of a holding element. In order to simultaneously supply at least two chambers with at least one operating means, a flow of the operating means is branched at least once so as to form at least two partial flows (55).
摘要翻译： 公开了一种等离子体处理工件（5）的方法和装置。 所述工件被插入处理台（3）的腔室（7）中，其可被至少部分抽真空，并通过保持元件定位在处理站内。 为了同时供给具有至少一个操作装置的至少两个室，操作装置的流动至少分支一次以形成至少两个部分流（55）。
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公开(公告)号：US07744790B2
公开(公告)日：2010-06-29
申请号：US10485979
申请日：2002-08-07
申请人： Stephan Behle , Markus Kuhr , Marten Walther , Detlef Wolff , Matthias Bicker
发明人： Stephan Behle , Markus Kuhr , Marten Walther , Detlef Wolff , Matthias Bicker
IPC分类号： B29C51/10
CPC分类号： B05D1/62 , B05D7/227 , B29C45/0053 , B29C45/1703 , B29C2045/0079
摘要： A process for simultaneously coating and forming a body. The process includes moving two mold halves into contact with one another; introducing an injection-molding material into the mold halves so that a molding is formed; evacuating the molding; admitting a gas into the molding; igniting a plasma in the molding so that a coating is deposited on the inner side of the molding; and moving the mold halves apart so that the molding drops out.
摘要翻译： 同时涂覆和形成身体的方法。 该过程包括使两个半模彼此接触; 将注射成型材料引入到半模中，从而形成模制品; 抽真空模具; 将气体进入模制品; 在模制品中点燃等离子体，使得涂层沉积在模制品的内侧; 并将半模分开，使模具脱落。
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公开(公告)号：US20050233077A1
公开(公告)日：2005-10-20
申请号：US10515610
申请日：2003-05-09
申请人： Michael Lizenberg , Frank Lewi , Hartwig Muller , Klaus Vogel , Gregor Arnold , Stephan Behle , Andreas Luttinghaus-Henkel , Matthias Bicker , Jurgen Klein , Marten Walther
发明人： Michael Lizenberg , Frank Lewi , Hartwig Muller , Klaus Vogel , Gregor Arnold , Stephan Behle , Andreas Luttinghaus-Henkel , Matthias Bicker , Jurgen Klein , Marten Walther
IPC分类号： H05H1/46 , B05D7/24 , B08B7/00 , B08B9/42 , B29C49/42 , B65D1/00 , B65D23/02 , B65G29/00 , C03C17/00 , C08J9/00 , C23C14/04 , C23C14/50 , C23C14/56 , C23C16/04 , C23C16/40 , C23C16/44 , C23C16/455 , C23C16/458 , C23C16/50 , C23C16/511 , C23C16/54 , C23C16/00
CPC分类号： C23C16/4409 , B05D1/62 , B08B7/00 , B08B9/426 , B29C49/421 , B29C2049/026 , B29C2049/027 , B29C2049/4221 , B29C2791/001 , B29K2077/00 , B29K2995/0067 , B65D23/02 , B65G29/00 , B65G2201/0244 , C08J9/0004 , C08J2300/14 , C23C14/046 , C23C14/505 , C23C14/56 , C23C16/045 , C23C16/401 , C23C16/455 , C23C16/458 , C23C16/50 , C23C16/511 , C23C16/54 , H01J37/32733
摘要： Disclosed are a method and a device for plasma treating workpieces (5). Said workpiece is inserted into a chamber (7) of a treatment station (3), which can be at least partly evacuated, and is positioned within the treatment station by means of a holding element. In order to simultaneously supply at least two chambers with at least one operating means, a flow of the operating means is branched at least once so as to form at least two partial flows (55).
摘要翻译： 公开了一种等离子体处理工件（5）的方法和装置。 所述工件被插入处理台（3）的腔室（7）中，其可被至少部分抽真空，并通过保持元件定位在处理站内。 为了同时供给具有至少一个操作装置的至少两个室，操作装置的流动至少分支一次以形成至少两个部分流（55）。
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公开(公告)号：US20060086320A1
公开(公告)日：2006-04-27
申请号：US10515606
申请日：2003-05-09
申请人： Michael Lizenberg , Frank Lewin , Hartwig Muller , Klaus Vogel , Gregor Arnold , Stephan Behle , Andreas Luttringhaus-Henkel , Matthias Bicker , Jurgen Klein
发明人： Michael Lizenberg , Frank Lewin , Hartwig Muller , Klaus Vogel , Gregor Arnold , Stephan Behle , Andreas Luttringhaus-Henkel , Matthias Bicker , Jurgen Klein
CPC分类号： C23C16/4409 , B05D1/62 , B08B7/00 , B08B9/426 , B29C49/421 , B29C2049/4221 , B29C2791/001 , B65D23/02 , B65G29/00 , B65G2201/0244 , C08J9/0004 , C08J2300/14 , C23C14/046 , C23C14/505 , C23C14/56 , C23C16/045 , C23C16/401 , C23C16/455 , C23C16/458 , C23C16/50 , C23C16/511 , C23C16/54 , H01J37/32733
摘要： Disclosed are a method and a device for plasma treating workpieces (5). Said workpiece is inserted into a chamber (4) of a treatment station (17), which can be at least partly evacuated, and at least one part (18) of the treatment station is moved relative to another part (27, 35) thereof in order to help manipulate the workpieces. The movement is carried out in such a way that a shell-shaped chamber wall (18) is positioned relative to a floor (35) of the chamber and relative to a chamber lid (27).
摘要翻译： 公开了一种等离子体处理工件（5）的方法和装置。 所述工件插入处理台（17）的腔室（4）中，所述腔室可以被至少部分抽真空，并且处理站的至少一个部分（18）相对于其另一部分（27,35）移动 以帮助操纵工件。 该运动以这样的方式进行，使得壳形室壁（18）相对于室的底板（35）相对于室盖（27）定位。
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公开(公告)号：US07434537B2
公开(公告)日：2008-10-14
申请号：US10486140
申请日：2002-08-07
申请人： Stephan Behle , Lars Bewig , Thomas Küpper , Wolfram Maring , Christoph Mölle , Marten Walther
发明人： Stephan Behle , Lars Bewig , Thomas Küpper , Wolfram Maring , Christoph Mölle , Marten Walther
IPC分类号： C23C16/00 , C23F1/00 , H01L21/306
CPC分类号： H01J37/32229 , C23C16/511 , H01J37/32192
摘要： An apparatus for coating objects having a single microwave source, two or more coating chambers, and an impedance structure or a waveguide structure. The coating chambers are connected to the single microwave source. The impedance structure or waveguide structure divides the microwave energy in order to generate plasmas in the coating chambers.
摘要翻译： 一种用于涂覆具有单个微波源，两个或更多个涂层室以及阻抗结构或波导结构的物体的设备。 涂层室连接到单个微波源。 阻抗结构或波导结构划分微波能量，以便在涂层室中产生等离子体。
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公开(公告)号：US20060150909A1
公开(公告)日：2006-07-13
申请号：US10515084
申请日：2003-05-26
IPC分类号： C23C16/00
CPC分类号： C23C16/4409 , B05D1/62 , B08B7/00 , B08B9/426 , B29C49/421 , B29C2049/4221 , B29C2791/001 , B65D23/02 , B65G29/00 , B65G2201/0244 , C03C17/005 , C08J9/0004 , C08J2300/14 , C23C14/046 , C23C14/505 , C23C14/56 , C23C16/045 , C23C16/401 , C23C16/4412 , C23C16/455 , C23C16/458 , C23C16/50 , C23C16/511 , C23C16/54 , H01J37/32733
摘要： A coating apparatus is provided for simplifying the introduction and removal of workpieces into and from a reactor for plasma coating and to increase the throughput. The coating apparatus has a reactor with a moveable sleeve part and a base element, at least one sealed coating chamber being defined between sleeve part and base element when the latter two parts are fitted onto one another. The coating apparatus also has a device for introducing electromagnetic energy into the at least one coating chamber. The reactor has at least two coating places.
摘要翻译： 提供了一种涂布装置，用于简化进入和离开用于等离子体涂覆的反应器的工件的引入和移除并提高生产量。 涂覆装置具有具有可移动套筒部分和基部元件的反应器，当后两个部件彼此装配时，至少一个密封涂覆室限定在套筒部分和基部元件之间。 该涂覆装置还具有用于将电磁能引入到至少一个涂覆室中的装置。 反应器至少有两个涂层位置。
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10.发明授权公开(公告)号：US07811384B2
公开(公告)日：2010-10-12
申请号：US11148740
申请日：2005-06-09
CPC分类号： C23C16/045 , C23C16/0272 , C23C16/401 , C23C16/54
摘要： The invention relates to a method and an apparatus for the treatment of substrates, in particular for the coating of plastic containers on a rotary installation. A plurality of treatment devices are arranged on the rotor and pass through a plurality of process phases as a function of their angle position on the rotor. For at least one process phase, the angle position can be set variably as a function of the current rotational speed of the rotor.
摘要翻译： 本发明涉及用于处理基材的方法和装置，特别是用于在旋转装置上涂覆塑料容器。 多个处理装置设置在转子上并且作为它们在转子上的角度位置的函数通过多个处理阶段。 对于至少一个处理阶段，角位置可以根据转子的当前转速可变地设定。
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