ELECTRICAL INTERCONNECT FORMING METHOD
    6.
    发明申请
    ELECTRICAL INTERCONNECT FORMING METHOD 审中-公开
    电气互连形成方法

    公开(公告)号:US20090065555A1

    公开(公告)日:2009-03-12

    申请号:US11854008

    申请日:2007-09-12

    IPC分类号: B23K31/02

    CPC分类号: B23K1/0016 B23K2101/40

    摘要: An electrical structure method of forming. The method includes forming a plurality of individual metallic structures from metallic layer formed over a first substrate. A plurality of vias are formed within a second substrate. The plurality of vias are positioned over and surrounding the plurality of metallic structures. A portion of each via is filled with solder to form solder structure surrounding an exterior surface of each metallic structure. The first substrate is removed from the metallic structures. The metallic structures comprising the solder structures are positioned over a third substrate comprising a plurality of electrically conductive pads. The metallic structures comprising the solder structures are heated to a temperature sufficient to cause the solder to melt and form an electrical and mechanical connection between each metallic structure and an associated electrically conductive pad. The second substrate is removed from the individual metallic structures.

    摘要翻译: 一种形成电气结构的方法。 该方法包括从形成在第一衬底上的金属层形成多个单独的金属结构。 多个通孔形成在第二基板内。 多个通孔位于多个金属结构上并围绕着多个金属结构。 每个通孔的一部分填充有焊料以形成围绕每个金属结构的外表面的焊料结构。 从金属结构中去除第一衬底。 包括焊料结构的金属结构位于包括多个导电焊盘的第三基板上。 包括焊料结构的金属结构被加热到足以使焊料熔化并在每个金属结构和相关联的导电焊盘之间形成电和机械连接的温度。 从各个金属结构移除第二基板。