Abstract:
A phase shifter includes a first transistor and a second transistor. The first transistor includes a first gate terminal configured to receive a first voltage. The first transistor is configured to adjust at least a resistance or a first capacitance of the phase shifter responsive to the first voltage. The second transistor is coupled to the first transistor. The second transistor includes a second gate terminal configured to receive a second voltage. The second transistor is configured to adjust a second capacitance of the phase shifter responsive to the second voltage. The second gate terminal includes a first polysilicon portion and a second polysilicon portion extending in a first direction. The first polysilicon portion and the second polysilicon portion are positioned along opposite edges of an active region of the first transistor and the second transistor.
Abstract:
A semiconductor structure includes a circuit with a redistribution layer (RDL) formed over the circuit. The redistribution layer comprises a plurality of metal layers. An inductor is formed in a topmost metal layer, and the circuit is located directly under the inductor. An under bump metallization (UBM) layer formed on the topmost metal layer and a conductive connector formed on the UBM layer.
Abstract:
A method for manufacturing a semiconductor device includes forming one or more fins extending in a first direction over a substrate. The one or more fins include a first region along the first direction and second regions on both sides of the first region along the first direction. A dopant is implanted in the first region of the fins but not in the second regions. A gate structure overlies the first region of the fins and source/drains are formed on the second regions of the fins.
Abstract:
A semiconductor device includes a plurality of fins over a substrate. Each fin of the plurality of fins extends in a first direction substantially perpendicular to a bottom surface of the substrate, and each fin of the plurality of fins comprises a first doped region having a first dopant type. The semiconductor device further includes an isolation region over the substrate between a first fin of the plurality of fins and a second fin of the plurality of fins adjacent to the first fin. The semiconductor device further includes a second doped region extends continuously across the isolation region, the second doped region extends into each fin of the plurality of fins, and a dimension of the second doped region in the isolation region in a second direction perpendicular to the first direction is less than a dimension of the at least one isolation region in the second direction.
Abstract:
A low noise amplifier (LNA) includes a first transistor and a second transistor. A source of the second transistor is connected to a drain of the first transistor. The LNA further includes a feedback transformer. A gate of the first transistor is connected to a primary winding of the feedback transformer and a gate of the second transistor is connected to a secondary winding of the feedback transformer.
Abstract:
A semiconductor device comprises a guarded circuit. The semiconductor device also comprises a guard ring surrounding the guarded circuit. The semiconductor device further comprises a resonant circuit coupled with the guard ring. The resonant circuit comprises an input node coupled with the guard ring. The resonant circuit also comprises an inductor. The resonant circuit further comprises a capacitor coupled with the inductor. The resonant circuit additionally comprises a ground node configured to carry a ground voltage. The inductor and the capacitor are coupled between the input node and the ground node.
Abstract:
An inductor shielding structure includes a first conductive layer including a plurality of first conductive lines having a first width and a plurality of second conductive lines having a second width. The inductor shielding structure further includes a second conductive layer over the first conductive layer. The second conductive layer includes at least one third conductive line having a third width and a plurality of fourth conductive lines having a fourth width. Each conductive line of the at least one third conductive line is parallel to each conductive line of the plurality of first conductive lines. Each conductive line of the plurality of fourth conductive lines is parallel to each conductive line of the plurality of second conductive lines. The first width is different from the second width, or the third width is different from the fourth width.
Abstract:
A device comprises a radio frequency peak detector configured to receive an ac signal from a voltage controlled oscillator and generate a dc value proportional to the ac signal at an output of the radio frequency peak detector and a feedback control unit coupled between an output of the radio frequency peak detector and an input of the voltage controlled oscillator.
Abstract:
A power amplifier structure includes at least one power amplifier circuit. The power amplifier circuit includes a transistor of a first type connected in series with a transistor of a second type connected between the same voltage supply. In a non-limiting nonexclusive example, an n-type transistor is connected in series with a p-type transistor connected between Vdd. The power amplifier structure can include two amplifier circuits configured in a differential amplifier structure. The differential amplifier structure includes two amplifier circuits operably connected in parallel between the same voltage supply.
Abstract:
An IC includes a plurality of pads at a top surface of a semiconductor wafer, an amplifier configured to receive a first AC signal at an input terminal, and output a second AC signal at an output terminal, a first detection circuit coupled to the input terminal and configured to output a first DC voltage to a first pad of the plurality of pads responsive to the first AC signal, and a second detection circuit coupled to the output terminal and configured to output a second DC voltage to a second pad of the plurality of pads responsive to the second AC signal.