利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

192 条记录 (耗时 0.034 秒)

    Process for producing amine formaldehyde resin foam
    1.
    发明授权
    Process for producing amine formaldehyde resin foam 失效
    生产胺甲醛树脂泡沫的方法

    公开(公告)号：US4390643A

    公开(公告)日：1983-06-28

    申请号：US299168

    申请日：1981-09-03

    申请人： Toshiaki Kanada ,  Kazuhiro Suzuki ,  Hiroshi Yoshioka ,  Kenji Maeda ,  Yoshihiro Tsurumi

    发明人： Toshiaki Kanada ,  Kazuhiro Suzuki ,  Hiroshi Yoshioka ,  Kenji Maeda ,  Yoshihiro Tsurumi

    IPC分类号： C08J9/14

    CPC分类号： C08J9/141 ,  C08J9/147 ,  C08J2361/00

    摘要： A process for producing amine formaldehyde resin foam by using a precondensate for the amine formaldehyde resin, a foaming agent, a surfactant and a curing agent is disclosed. Said process is characterized in that the foaming agent is selected from the group consisting of aliphatic hydrocarbons or halogenated aliphatic hydrocarbons having a boiling point in the range of from about -30.degree. C. to about 30.degree. C., the foaming agent is used in amount of from about 0.07 mol to about 1.0 mol per 100 gr. of solid content of the precondensate for resin (residue obtained by heating the precondensate in accordance with JIS K 5400 8.2.1.), the process comprising mixing the precondensate, the foaming agent and the surfactant, emulsifying the resulting mixture at a specified pressure at a temperature of at least 0.degree. C. and higher than the boiling point of the foaming agent by 5.degree.-50.degree. C., and while or after mixing the curing agent with the mixture, foaming the mixture at a specified temperature and pressure.

    摘要翻译： 公开了一种通过使用胺甲醛树脂，发泡剂，表面活性剂和固化剂的预缩合物生产胺甲醛树脂泡沫的方法。 所述方法的特征在于，发泡剂选自沸点在约-30℃至约30℃范围内的脂族烃或卤代脂族烃，发泡剂用于 数量为每100克约0.07摩尔至约1.0摩尔。 树脂预固化物的固体含量（通过根据JIS K 5400 8.2.1加热预缩合物得到的残渣），包括混合预缩合物，发泡剂和表面活性剂的方法，将所得混合物在特定压力下乳化 温度至少为0℃，高于发泡剂的沸点5℃-50℃，并且在将固化剂与混合物混合之后或之后，在特定温度和压力下使混合物发泡。

    Crystalline semiconductor film manufacturing method and crystalline semiconductor film manufacturing apparatus
    2.
    发明授权
    Crystalline semiconductor film manufacturing method and crystalline semiconductor film manufacturing apparatus 有权
    晶体半导体膜制造方法和结晶半导体膜制造装置

    公开(公告)号：US08716113B2

    公开(公告)日：2014-05-06

    申请号：US13295317

    申请日：2011-11-14

    申请人： Toru Saito ,  Hiroshi Yoshioka ,  Sadayoshi Hotta

    发明人： Toru Saito ,  Hiroshi Yoshioka ,  Sadayoshi Hotta

    IPC分类号： H01L21/20 ,  H01L21/36 ,  H01L21/02

    CPC分类号： H01L21/02675 ,  H01L21/02422 ,  H01L21/02488 ,  H01L21/02532 ,  H01L21/02691 ,  H01L21/2026 ,  H01L27/1285

    摘要： A semiconductor film manufacturing method includes: forming a metal layer above the substrate; forming a gate electrode in each of pixels by patterning a metal layer; forming a gate insulating firm on the gate electrode; forming an amorphous semiconductor film on the gate insulating film; and crystallizing the amorphous semiconductor film by irradiating the amorphous semiconductor film with a laser beam, and a laser irradiation width of the laser beam corresponds to n times a width of each pixel (n is an integer of 2 or above), a laser energy intensity is higher in one end portion of the laser irradiation width than in the other end portion, and in the crystallizing, the laser energy intensity of the laser beam is inverted in increments of n pixels, alternately between one of the end portions of the laser irradiation width of the laser beam and the other end portion.

    摘要翻译： 半导体膜制造方法包括：在基板上形成金属层; 通过图案化金属层在每个像素中形成栅电极; 在栅电极上形成栅绝缘体; 在栅极绝缘膜上形成非晶半导体膜; 并且通过用激光束照射非晶半导体膜来结晶非晶半导体膜，并且激光束的激光照射宽度对应于每个像素的宽度的n倍（n为2以上的整数），激光能量强度 在激光照射宽度的一个端部比在另一端部高，并且在结晶中，激光束的激光能量强度以n个像素为增量反转，交替地在激光照射的一个端部之间 激光束的宽度和另一端部。

    ELECTRONIC COMPONENT PACKAGE, ELECTRONIC COMPONENT, AND ELECTRONIC COMPONENT PACKAGE MANUFACTURING METHOD
    3.
    发明申请
    ELECTRONIC COMPONENT PACKAGE, ELECTRONIC COMPONENT, AND ELECTRONIC COMPONENT PACKAGE MANUFACTURING METHOD 有权
    电子元件封装，电子元件和电子元件封装制造方法

    公开(公告)号：US20140083735A1

    公开(公告)日：2014-03-27

    申请号：US13635024

    申请日：2012-03-16

    申请人： Naoki Kohda ,  Hiroshi Yoshioka

    发明人： Naoki Kohda ,  Hiroshi Yoshioka

    IPC分类号： H05K5/06 ,  H05K13/00

    CPC分类号： H05K5/066 ,  H01L23/055 ,  H01L23/10 ,  H01L2924/0002 ,  H01L2924/16315 ,  H03H9/1021 ,  H03H9/21 ,  H05K13/00 ,  H01L2924/00

    摘要： An electronic component package has a first sealing member main surface with mounted electronic element, and a second sealing member. An outer circumference portion of a second sealing member is molded into a tapered shape, providing a tapered area in at least part of the outer circumference. A flat area adjacent to the tapered area is provided in at least part of a flat portion inward of the outer circumference portion of the surface of the second sealing member. A first area corresponding to the tapered area and a second area corresponding to the flat area are provided adjacent to each other on a first main surface of the first sealing member with mounted electronic component element. A width W2 of the second area is 0.66 to 1.2 times a width W4 of the flat area. First and second bonding layers are formed and bonded with each other by heating.

    摘要翻译： 电子部件封装具有安装有电子元件的第一密封构件主表面和第二密封构件。 第二密封构件的外周部分模制成锥形，在外周的至少一部分中提供锥形区域。 与第二密封构件的表面的外周部的内侧的平坦部的至少一部分设置有与锥形区域相邻的平坦区域。 相对于锥形区域的第一区域和对应于平坦区域的第二区域在具有安装的电子元件的第一密封构件的第一主表面上彼此相邻地设置。 第二区域的宽度W2为平坦区域的宽度W4的0.66〜1.2倍。 通过加热形成第一和第二接合层并彼此接合。

    Process for forming resist pattern, and resist coating and developing apparatus
    6.
    发明授权
    Process for forming resist pattern, and resist coating and developing apparatus 有权
    用于形成抗蚀剂图案的方法，以及抗蚀涂层和显影装置

    公开(公告)号：US07527442B2

    公开(公告)日：2009-05-05

    申请号：US11872055

    申请日：2007-10-15

    申请人： Hiroshi Yoshioka

    发明人： Hiroshi Yoshioka

    IPC分类号： G03D5/00 ,  G03C5/00 ,  H01L21/00

    CPC分类号： G03F7/70933 ,  G03F7/38 ,  G03F7/40

    摘要： A process for forming a resist pattern according to the invention is a process for forming a resist pattern in which a photoresist is coated on a first substrate, the coated photoresist is exposed to light of a predetermined pattern, and afterwards developing is performed, wherein in at least one of the processes of coating, exposing, and developing, whenever lots to which the first substrate belongs change, the atmosphere residing in the lot is changed.

    摘要翻译： 根据本发明的形成抗蚀剂图案的方法是形成抗蚀剂图案的方法，其中将光致抗蚀剂涂覆在第一基底上，将涂覆的光致抗蚀剂暴露于预定图案的光，然后进行显影 涂布，曝光和显影的过程中的至少一个，无论第一底材所属的地点何处，改变了批次中存在的气氛。

    FUEL SUPPLY SYSTEM
    7.
    发明申请
    FUEL SUPPLY SYSTEM 审中-公开
    燃油供应系统

    公开(公告)号：US20080216904A1

    公开(公告)日：2008-09-11

    申请号：US11836421

    申请日：2007-08-09

    申请人： Shigeki Kanamaru ,  Hiroshi Yoshioka

    发明人： Shigeki Kanamaru ,  Hiroshi Yoshioka

    IPC分类号： F23K5/04

    CPC分类号： F02M37/103 ,  B01D29/56 ,  B01D35/0273 ,  B01D35/0276 ,  F02M37/22 ,  F02M37/44 ,  F02M37/50 ,  Y10T137/85978

    摘要： A fuel supply system includes: a flange mounted at an upper opening in a fuel tank; a fuel pump that discharges fuel in the fuel tank; a high-pressure filter that filters fuel discharged from the fuel pump; and a filter case that accommodates the high-pressure filter and includes an upper case and a lower case, the upper case integrally formed with the flange. The fuel pump is fitted to an underside of the lower case to be positioned substantially coaxial with the high-pressure filter.

    摘要翻译： 燃料供给系统包括：安装在燃料箱的上部开口的凸缘; 燃料泵，其在燃料箱中排出燃料; 高压过滤器，其对从燃料泵排出的燃料进行过滤; 以及容纳高压过滤器并且包括上壳体和下壳体的过滤器壳体，上壳体与凸缘一体形成。 燃料泵安装在下壳体的下侧，以与高压过滤器基本同轴。

    Liquid crystal display device
    9.
    发明申请
    Liquid crystal display device 审中-公开
    液晶显示装置

    公开(公告)号：US20060197716A1

    公开(公告)日：2006-09-07

    申请号：US11362171

    申请日：2006-02-27

    申请人： Yoshinori Tanaka ,  Tomohide Oohira ,  Hiroshi Yoshioka ,  Yoshiteru Tomizuka ,  Satoshi Takahashi

    发明人： Yoshinori Tanaka ,  Tomohide Oohira ,  Hiroshi Yoshioka ,  Yoshiteru Tomizuka ,  Satoshi Takahashi

    IPC分类号： G09G5/00

    CPC分类号： H04N13/398 ,  H04N13/324 ,  H04N13/395

    摘要： The present invention provides a display device which can provide a stereoscopic display to a viewer by overlapping a plurality of sheets of liquid crystal panels. A front liquid crystal panel and a rear liquid crystal panel are overlapped to each other. The display device also includes a TCON board on which timing controllers which are connected with a front liquid crystal panel and a rear liquid crystal panel are arranged. The timing controllers output output I/F signals to the front liquid crystal panel and the rear liquid crystal panel based on input I/F signals which are inputted from an external image signal source.

    摘要翻译： 本发明提供了一种显示装置，其可以通过重叠多个液晶面板来向观看者提供立体显示。 前液晶面板和后液晶面板重叠。 显示装置还包括TCON板，其上配置有与前液晶面板和后液晶面板连接的定时控制器。 定时控制器基于从外部图像信号源输入的输入I / F信号将输出I / F信号输出到前液晶面板和后液晶面板。

    Fuel vapor leak detecting apparatus, and fuel supplying apparatus to be applied to the same
    10.
    发明授权
    Fuel vapor leak detecting apparatus, and fuel supplying apparatus to be applied to the same 失效
    燃料蒸气泄漏检测装置和应用于其的燃料供给装置

    公开(公告)号：US07077112B2

    公开(公告)日：2006-07-18

    申请号：US10771458

    申请日：2004-02-05

    申请人： Tateki Mitani ,  Shigeki Kanamaru ,  Hiroshi Yoshioka ,  Kazushi Ishii

    发明人： Tateki Mitani ,  Shigeki Kanamaru ,  Hiroshi Yoshioka ,  Kazushi Ishii

    IPC分类号： F02M25/08

    CPC分类号： F02M25/08 ,  F02M25/0818

    摘要： A fuel vapor leak detecting apparatus, includes: a valve which is in a vapor purge system including a canister that is communicated with a fuel tank and an internal combustion engine, and which controllably closes the vapor purge system; a pressurizing section which introduces atmospheric air into the vapor purge system to pressurize the vapor purge system; and an internal-pressure measuring section which detects an internal pressure of the vapor purge system. The pressurizing section supplies the air for a predetermined time in a state where the vapor purge system is closed. When the internal pressure measured by the internal-pressure measuring section at the air supply is equal to or lower than a preset criterion pressure, it is judged that leak occurs.

    摘要翻译： 一种燃料蒸汽泄漏检测装置，包括：阀，其处于包括与燃料箱和内燃机连通的罐的蒸气吹扫系统中，并且可控地关闭蒸气吹扫系统; 加压部分，其将大气引入蒸汽吹扫系统中以对蒸汽吹扫系统加压; 以及检测蒸气吹扫系统的内部压力的内压测量部。 在蒸气吹扫系统关闭的状态下，加压部供给预定时间的空气。 当由内部压力测量部在空气供给下测量的内部压力等于或低于预设的标准压力时，判断为发生泄漏。