Method of forming conductor pattern on wiring board
    3.
    发明授权
    Method of forming conductor pattern on wiring board 有权
    在布线板上形成导体图案的方法

    公开(公告)号:US06254758B1

    公开(公告)日:2001-07-03

    申请号:US09243507

    申请日:1999-02-01

    申请人: Toshinori Koyama

    发明人: Toshinori Koyama

    IPC分类号: C23C2802

    摘要: A method of forming a conductor pattern on a wiring board, in which a conductor pattern forming process on the wiring board can be simplified; and an interval between the conductor patterns can be further reduced by suppressing the etching conducted on the side portions of the electrolytic copper plated layer. The method of forming a conductor pattern on a wiring board in which an electroless copper plated layer 12 is formed on a surface of an insulating layer 10 of the wiring board and an electrolytic copper plated layer 16 is formed on the electroless copper plated layer 12, comprises the steps of: forming an electroless copper plated layer 12 on the insulating layer 10; forming and patterning a layer of resist 14 on the electroless copper plated layer 12; forming an electrolytic copper plated layer 16 on the electroless copper plated layer 12 exposed from the layer of plated resist 14; removing the layer of plated resist 14 for exposing the electroless copper plated layer 12 except for a portion in which the electrolytic copper plated layer 16 is formed; and removing the exposed electroless copper plated layer 12 by using an etching solution composed of a mixed aqueous solution containing sulfuric acid, hydrogen peroxide and Cu chelate agent.

    摘要翻译: 在布线基板上形成导体图案的方法,其中可以简化布线板上的导体图形形成处理; 并且通过抑制在电解镀铜层的侧面进行的蚀刻,可以进一步减小导体图案之间的间隔。 在化学镀铜层12上形成在布线基板的绝缘层10的表面上形成化学镀铜层12的布线基板上形成导体图案的方法和电解镀铜层16, 包括以下步骤:在绝缘层10上形成化学镀铜层12; 在化学镀铜层12上形成和图案化抗蚀剂层14; 在从镀覆抗蚀剂层14暴露的化学镀铜层12上形成电解镀铜层16; 除去电镀抗蚀剂14的层,以暴露除了形成电解镀铜层16的部分之外的无电镀铜层12; 并且通过使用由含有硫酸,过氧化氢和Cu螯合剂的混合水溶液组成的蚀刻溶液除去暴露的化学镀铜层12。

    Patterning method and computer readable medium therefor
    7.
    发明申请
    Patterning method and computer readable medium therefor 失效
    图案化方法及其计算机可读介质

    公开(公告)号:US20080123070A1

    公开(公告)日:2008-05-29

    申请号:US11812450

    申请日:2007-06-19

    IPC分类号: G03B27/42

    摘要: In a patterning apparatus for forming a desired pattern on a surface of an object by exposing the surface of the object to light by using a plurality of spatial light modulation elements assigned to respective exposure areas defined along a relative moving direction of the object, predetermined areas which are on the surface of the object and are to be positioned in the vicinity of borders of the respective exposure areas exposed to light by the spatial light modulation elements are exposed to light by the spatial light modulation elements corresponding to the exposure areas, after the object is shifted in a direction perpendicular to the relative moving direction, such that the predetermined areas are positioned in the vicinity of the center parts of the exposure areas.

    摘要翻译: 在通过使用分配给沿着物体的相对移动方向限定的各个曝光区域的多个空间光调制元件将物体表面曝光的对象的表面上形成期望图案的图案形成装置中,预定区域 在物体的表面上并且被定位在由空间光调制元件暴露于光的各个曝光区域的边界附近的位置,在与曝光区域相对应的空间光调制元件之后被曝光 物体沿垂直于相对移动方向的方向移动,使得预定区域位于曝光区域的中心部分附近。