公开(公告)号：US09666426B2

公开(公告)日：2017-05-30

申请号：US14127285

申请日：2011-06-24

Applicant: Hui Wang ,  Yue Ma ,  Chuan He ,  Xi Wang

Inventor： Hui Wang ,  Yue Ma ,  Chuan He ,  Xi Wang

IPC: C25D7/12 ,  C25D5/20 ,  H01L21/02 ,  C25D17/00 ,  C25D5/08 ,  C25D5/18 ,  C25D17/06 ,  C25D21/10

CPC classification number: C25D21/10 ,  C25D5/08 ,  C25D5/18 ,  C25D5/20 ,  C25D7/12 ,  C25D7/123 ,  C25D17/00 ,  C25D17/001 ,  C25D17/002 ,  C25D17/008 ,  C25D17/06 ,  H01L21/02 ,  H01L21/67138

Abstract: An apparatus for substrate metallization from electrolyte is provided. The apparatus comprises: an immersion cell containing metal salt electrolyte; at least one electrode connecting to at least one power supply; an electrically conductive substrate holder holding at least one substrate to expose a conductive side of the substrate to face the at least one electrode; an oscillating actuator for oscillating the substrate holder with an amplitude and a frequency; at least one ultrasonic device with an operating frequency and an intensity, disposed in the metallization apparatus; at least one ultrasonic power generator connecting to the ultrasonic device; at least one inlet for metal slat electrolyte feeding; and at least one outlet for metal salt electrolyte draining.

公开(公告)号：US20130209416A1

公开(公告)日：2013-08-15

申请号：US13703608

申请日：2010-11-11

Applicant: Yue Ma

Inventor： Yue Ma

IPC: C12N5/071

CPC classification number: C12N5/0657 ,  C12N2501/115 ,  C12N2501/155 ,  C12N2501/16 ,  C12N2501/385 ,  C12N2501/415 ,  C12N2506/02

Abstract: The present invention discloses novel compositions and methods for enhancing cardiac differentiation efficiency of stem cells or promoting ventricular and atrial cardiomyocytes formation from stem cells. The present invention also discloses the atrial and ventricular cardiomyocytes formed from the stem cells, and the uses of the cardiomyocytes for repairing cardiac injuries and screening for new medicaments for treating cardiac injuries.

Abstract translation: 本发明公开了用于提高干细胞的心脏分化效率或促进心室和心房心肌细胞从干细胞形成的新型组合物和方法。 本发明还公开了由干细胞形成的心房和心室心肌细胞，以及心肌细胞用于修复心脏损伤和筛选用于治疗心脏损伤的新药物的用途。

公开(公告)号：US08383429B2

公开(公告)日：2013-02-26

申请号：US12733436

申请日：2007-08-29

Applicant: Yue Ma ,  Chuan He ,  Zhenxu Pang ,  David Wang ,  Voha Nuch

Inventor： Yue Ma ,  Chuan He ,  Zhenxu Pang ,  David Wang ,  Voha Nuch

IPC: H01L21/00

CPC classification number: H01L21/324 ,  F27B17/0025 ,  H01L21/67109 ,  H01L21/6719

Abstract: The present invention provides an apparatus and method for rapid and uniform thermal treatment of semiconductor workpieces in two closely arranged thermal treatment chambers with a retractable door between them. The retractable door moves in between two thermal treatment chambers during heating or cooling process, and additional heating and cooling sources are provided for double-side thermal treatment of the semiconductor workpiece.

Abstract translation: 本发明提供了一种用于在两个紧密布置的热处理室中快速均匀地热处理半导体工件的装置和方法，其间具有可伸缩门。 可伸缩门在加热或冷却过程中在两个热处理室之间移动，并且为半导体工件的双面热处理提供附加的加热和冷却源。

公开(公告)号：US20120097195A1

公开(公告)日：2012-04-26

申请号：US13262264

申请日：2009-03-31

Applicant: Jian Wang ,  Sunny Voha Nuch ,  Liangzhi Xie ,  Junping Wu ,  Zhaowei Jia ,  Yunwen Huang ,  Zhifeng Gao ,  Yue Ma ,  Hui Wang

Inventor： Jian Wang ,  Sunny Voha Nuch ,  Liangzhi Xie ,  Junping Wu ,  Zhaowei Jia ,  Yunwen Huang ,  Zhifeng Gao ,  Yue Ma ,  Hui Wang

IPC: B08B3/00

CPC classification number: H01L21/02068 ,  B08B3/12 ,  H01L21/02063 ,  H01L21/67051

Abstract: A method for cleaning semiconductor substrate using ultra/mega sonic device comprising holding a semiconductor substrate by using a chuck, positioning a ultra/mega sonic device adjacent to the semiconductor substrate, injecting chemical liquid on the semiconductor substrate and gap between the semiconductor substrate and the ultra/mega sonic device, changing gap between the semiconductor substrate and the ultra/mega sonic device for each rotation of the chuck during the cleaning process by turn the semiconductor substrate or the ultra/mega sonic device clockwise or count clockwise.

Abstract translation: 一种使用超声波超声波装置清洗半导体衬底的方法，包括通过使用卡盘保持半导体衬底，将超声波器件邻近半导体衬底定位，在半导体衬底上注入化学液体，并在半导体衬底和 超声波/超声波装置，通过顺时针旋转半导体衬底或超/超声波装置，顺时针或顺时针方向计数，在清洁过程中，通过卡盘的每次旋转来改变半导体衬底和超/超声波装置之间的间隙。

公开(公告)号：US20110114120A1

公开(公告)日：2011-05-19

申请号：US12734983

申请日：2007-12-10

Applicant: Voha Nuch ,  David Wang ,  Yue Ma ,  Fufa Chen ,  Jian Wang ,  Yunwen Huang ,  Liangzhi Xie ,  Chuan He

Inventor： Voha Nuch ,  David Wang ,  Yue Ma ,  Fufa Chen ,  Jian Wang ,  Yunwen Huang ,  Liangzhi Xie ,  Chuan He

IPC: B08B3/00

CPC classification number: H01L21/67051

Abstract: An apparatus for cleaning and conditioning the surface of a semiconductor substrate such as wafer includes a rotatable chuck, a chamber, a rotatable tray for collecting cleaning solution with one or more drain outlets, multiple receptors for collecting multiple cleaning solutions, a first motor to drive chuck, and a second motor to drive the tray. The drain outlet in the tray can be positioned directly above its designated receptor located under the drain outlet. The cleaning solution collected by the tray can be guided into designated receptor. One characteristic of the apparatus is having a robust and precisely controlled cleaning solution recycle with minimum cross contamination.

Abstract translation: 用于清洁和调理诸如晶片的半导体衬底的表面的设备包括可转动卡盘，腔室，用于收集具有一个或多个排出口的清洁溶液的可旋转托盘，用于收集多个清洁溶液的多个受体，用于驱动的​​第一马达 卡盘和第二马达驱动托盘。 托盘中的排水出口可以位于排水出口下方的指定接收器的正上方。 由托盘收集的清洁溶液可以被引导到指定的受体中。 该设备的一个特征是具有坚固且精确控制的清洁溶液循环，具有最小的交叉污染。

公开(公告)号：US07941007B1

公开(公告)日：2011-05-10

申请号：US12362171

申请日：2009-01-29

Applicant: Yue Ma ,  Hongmin Zhang

Inventor： Yue Ma ,  Hongmin Zhang

IPC: G06K9/32

CPC classification number: H04N7/012 ,  G06T3/4007 ,  H04N7/0135 ,  H04N7/0142

Abstract: To interpolate a value for a pixel, multiple patterns are selected. Each pattern is used to determine a pixel angle. One of the determined pixel angles is then selected based on the reliability of the pixel angles. The selected pixel angle can be selected based on its reliability irrespective of the reliability of other pixel angles. The selected pixel angle can then be used to interpolate a value for the target pixel. Dynamic thresholds can be computed for use in either determining a pixel angle for a given pattern, or to select the pixel angle from the available determined pixel angles.

Abstract translation: 为了内插像素的值，选择多个模式。 每个图案用于确定像素角度。 然后基于像素角度的可靠性来选择所确定的像素角度中的一个。 可以基于其可靠性而选择所选择的像素角度，而与其他像素角度的可靠性无关。 然后可以使用所选择的像素角度来内插目标像素的值。 可以计算动态阈值以用于确定给定图案的像素角度，或者从可用确定的像素角度中选择像素角度。

公开(公告)号：US20110073469A1

公开(公告)日：2011-03-31

申请号：US12736176

申请日：2008-03-19

Applicant: Yue Ma ,  Chuan He ,  Zhenxu Pang ,  Guangtao Shi ,  Jiexu Xia ,  Voha Nuch ,  Hui Wang

Inventor： Yue Ma ,  Chuan He ,  Zhenxu Pang ,  Guangtao Shi ,  Jiexu Xia ,  Voha Nuch ,  Hui Wang

IPC: C25D17/00

CPC classification number: H01L21/6723 ,  C25D5/48 ,  C25D5/50 ,  C25D17/00 ,  C25D17/001 ,  C25D17/02 ,  C25D17/04 ,  C25D21/02 ,  H01L21/67178

Abstract: A electrochemical deposition system which has a 3-D stacked architecture comprises a factory interface for receiving semiconductor wafers, a mainframe comprising a mainframe transfer robot and a plurality of wafer holder assemblies which disposed on the top thereof, a plurality of electroplating cells disposed within the mainframe, a plurality of cleaning cells disposed within the mainframe and located below the electroplating cells, a plurality of thermal treatment chambers disposed in between the mainframe and the factory interface, and a fluid distribution system fluidly connected to the electroplating cells and the cleaning cells, wherein the mainframe transfer robot transfers the semiconductor wafer from the factory interface and within the electroplating cells, the cleaning cells, and the thermal treatment chambers. As a result, the system of the present invention is expandable to accommodate newly-added processing units without overmuch increased footprint.

Abstract translation: 具有3-D堆叠结构的电化学沉积系统包括用于接收半导体晶片的工厂接口，包括主机传送机器人的主机和设置在其顶部的多个晶片保持器组件，多个电镀单元 主机，设置在主机内并位于电镀单元下方的多个清洁单元，设置在主机和工厂界面之间的多个热处理室，以及流体连接到电镀单元和清洁单元的流体分配系统， 其中所述主机传送机器人从所述工厂接口和所述电镀单元，所述清洁单元和所述热处理室中传送所述半导体晶片。 结果，本发明的系统可扩展以容纳新增的处理单元，而不会增加占用空间。

公开(公告)号：US20100307913A1

公开(公告)日：2010-12-09

申请号：US12734438

申请日：2007-11-02

Applicant: Yue Ma ,  Xi Wang ,  Yunwen Huang ,  Zhenxu Pang ,  Voha Nuch ,  David Wang

Inventor： Yue Ma ,  Xi Wang ,  Yunwen Huang ,  Zhenxu Pang ,  Voha Nuch ,  David Wang

IPC: C25D17/00 ,  C25D17/02 ,  C25D17/10

CPC classification number: C25D17/00 ,  C25D17/001 ,  C25D17/10 ,  C25D21/04

Abstract: The present invention provides a plating apparatus with multiple anode zones and cathode zones. The electrolyte flow field within each zone is controlled individually with independent flow control devices. A gas bubble collector whose surface is made into pleated channels is implemented for gas removal by collecting small bubbles, coalescing them, and releasing the residual gas. A buffer zone built within the gas bubble collector further allows unstable microscopic bubbles to dissolve.

Abstract translation: 本发明提供具有多个阳极区和阴极区的电镀装置。 每个区域内的电解液流场都由独立的流量控制装置单独控制。 其表面形成打褶通道的气泡收集器通过收集小气泡，聚结并释放残留气体来实现气体去除。 内置在气泡收集器内的缓冲区还允许不稳定的微小气泡溶解。

公开(公告)号：US20100240226A1

公开(公告)日：2010-09-23

申请号：US12733436

申请日：2007-08-29

Applicant: Yue Ma ,  Chuan He ,  Zhenxu Pang ,  Hui Wang ,  Voha Nuch

Inventor： Yue Ma ,  Chuan He ,  Zhenxu Pang ,  Hui Wang ,  Voha Nuch

IPC: H01L21/26 ,  F28C3/00

CPC classification number: H01L21/324 ,  F27B17/0025 ,  H01L21/67109 ,  H01L21/6719

Abstract: The present invention provides an apparatus and method for rapid and uniform thermal treatment of semiconductor workpieces in two closely arranged thermal treatment chambers with a retractable door between them. The retractable door moves in between two thermal treatment chambers during heating or cooling process, and additional heating and cooling sources are provided for double-side thermal treatment of the semiconductor workpiece.

Abstract translation: 本发明提供了一种用于在两个紧密布置的热处理室中快速均匀地热处理半导体工件的装置和方法，其间具有可伸缩门。 可伸缩门在加热或冷却过程中在两个热处理室之间移动，并且为半导体工件的双面热处理提供附加的加热和冷却源。

公开(公告)号：US20100192089A1

公开(公告)日：2010-07-29

申请号：US12691373

申请日：2010-01-21

Applicant: Xiao He ,  Yue Ma ,  Wei She ,  Pei Ling Zhou ,  Zhi Bo Zuo

Inventor： Xiao He ,  Yue Ma ,  Wei She ,  Pei Ling Zhou ,  Zhi Bo Zuo

IPC: G06F3/048

CPC classification number: G06F17/2247 ,  G06F16/9577 ,  G06F17/218

Abstract: Provided are a method and device for controlling scrolling of a document, the document has a marked section and is scrolling-displayed within a display area, and the method comprises detecting whether the document is scrolled to the marked section, and restricting the scrolling of the document when the document is scrolled to the marked section. The method and device can control the scrolling of the document according to contents of the document, so that the contents cannot be neglected due to quick scrolling of the document.

Abstract translation: 提供了一种用于控制文档的滚动的方法和装置，该文档具有标记部分并且在显示区域内滚动显示，并且该方法包括检测文档是否滚动到标记部分，并且限制文本的滚动 当文档滚动到标记部分时记录文档。 方法和装置可以根据文档的内容来控制文档的滚动，使得由于文档的快速滚动而不能忽略内容。