METHOD FOR FABRICATING A WAFER LEVEL PACKAGE HAVING THROUGH WAFER VIAS FOR EXTERNAL PACKAGE CONNECTIVITY AND RELATED STRUCTURE
    8.
    发明申请
    METHOD FOR FABRICATING A WAFER LEVEL PACKAGE HAVING THROUGH WAFER VIAS FOR EXTERNAL PACKAGE CONNECTIVITY AND RELATED STRUCTURE 审中-公开
    用于通过WAVER VIAS进行外部封装连接和相关结构的WAFER LEVEL封装的方法

    公开(公告)号:WO2006101768A2

    公开(公告)日:2006-09-28

    申请号:PCT/US2006008539

    申请日:2006-03-09

    IPC分类号: H01L21/44

    摘要: According to an exemplary embodiment, a method for fabricating a wafer level package includes forming a polymer layer on a device wafer, where the device wafer includes at least one device wafer contact pad and a device, and where the at least one device wafer contact pad is electrically connected to the device. The method further includes bonding a protective wafer to the device wafer. The method further includes forming at least one via in the protective wafer, where the at least one via extends through the protective wafer and is situated over the at least one device wafer contact pad. The method further includes forming at least one protective wafer contact pad on the protective wafer, where the at least one protective wafer contact pad is situated over the at least one via and electrically connected to the at least one device wafer contact pad.

    摘要翻译: 根据示例性实施例,制造晶片级封装的方法包括在器件晶片上形成聚合物层,其中器件晶片包括至少一个器件晶片接触焊盘和器件,并且其中至少一个器件晶片接触焊盘 电连接到设备。 该方法还包括将保护晶片接合到器件晶片。 该方法还包括在保护晶片中形成至少一个通孔,其中至少一个通孔延伸穿过保护晶片并且位于至少一个器件晶片接触焊盘上方。 所述方法还包括在所述保护晶片上形成至少一个保护性晶片接触焊盘,其中所述至少一个保护性晶片接触焊盘位于所述至少一个通孔上并电连接至所述至少一个器件晶片接触焊盘。