摘要:
A bonding element includes a first transient liquid phase (TLP) bonding element including a first material and a second material, the first material having a higher melting point than the second material, a ratio of a quantity of the first material and the second material in the first TLP bonding element having a first value and a second TLP bonding element including the first material and the second material, a ratio of a quantity of the first material and the second material in the second TLP bonding element having a second value different from the first value.
摘要:
Bonded surfaces are formed by adhering first nanorods and second nanorods to respective first and second surfaces. The first shell is formed on the first nanorods and the second shell is formed on the second nanorods, wherein at least one of the first nanorods and second nanorods, and the first shell and the second shell are formed of distinct metals. The surfaces are then exposed to at least one condition that causes the distinct metals to form an alloy, such as eutectic alloy having a melting point below the temperature at which the alloy is formed, thereby bonding the surfaces upon solidification of the alloy.
摘要:
Bei einem Verfahren zur elektrischen Kontaktierung eines Bauteils (10) (z.B. eines Leistungsbauteils und/oder eines (Halbleiter)Bauteils mit mindestens einem Transistor, vorzugsweise einem IGBT (eng. insulated-gate bipolar transistor)) mit zumindest einem Kontakt (40, 50) wird an den zumindest einen Kontakt (40, 50) zumindest ein offenporiges Kontaktstück (60, 70) galvanisch (elektrochemisch oder außenstromfrei) angebunden. Damit wird ein Bauteilmodul gebildet. Der Kontakt (40, 50) ist vorzugsweise ein Flachteil bzw. weist eine Kontaktfläche auf, deren größte flächige Erstreckung größer ist als eine Erstreckung des Kontakts (40, 50) senkrecht zu dieser Kontaktfläche. Die Temperatur der galvanischen Anbindung beträgt höchstens 100 °C, vorzugsweise höchstens 60 °C, zweckmäßig höchstens 20 °C und idealerweise höchstens 5 °C und/oder weicht von der Betriebstemperatur des Bauteils um höchstens 50 °C, vorzugsweise um höchstens 20 °C, insbesondere um höchstens 10 °C und idealerweise um höchstens 5 °C, vorzugsweise höchstens 2 °C, ab. Das Bauteil (10) kann mittels des Kontaktstücks (60, 70) mit einem weiteren Bauteil, Stromleiter und/oder Substrat (90) kontaktiert werden. Vorzugsweise wird ein Bauteil (10) mit zwei Kontakten (40, 50) an einander abgewandten Seiten des Bauteils (10) herangezogen, wobei je Kontakt (40, 50) zumindest ein offenporiges Kontaktstück (60, 70) an dieser galvanisch angebunden wird.
摘要:
A semiconductor device (20) includes: opposed first (36, 56) and second (34, 54) metal plates; a plurality of semiconductor elements (26, 28, 30, 32, 206, 208, 210, 212, 306, 308, 310, 312) each interposed between the first metal plate (36, 56) and the second metal plate (34, 54); a metal block (44, 50, 314, 316) interposed between the first metal plate (36, 56) and each of the semiconductor elements (26, 28, 30, 32, 206, 208, 210, 212, 306, 308, 310, 312); a solder member (46, 52) interposed between the first metal plate (36, 56) and the metal block (44, 50, 314, 316) and connecting the first metal plate (36, 56) to the metal block (44, 50, 314, 316); and a resin moulding (74) sealing the semiconductor elements (26, 28, 30, 32, 206, 208, 210, 212, 306, 308, 310, 312) and the metal block (44, 50, 314, 316). A face of the first metal plate (36, 56), which is on an opposite side of a face of the first metal plate (36, 56) to which the metal block (44, 50, 314, 316) is connected via the solder member (46, 52), is exposed from the resin moulding (74). The first metal plate (36, 56) has a groove (70, 72) formed along an outer periphery of a region in which the solder member(s) (46, 52) is(are) provided, the groove (70, 72) collectively surrounding the solder member(s) (46, 52) so as to prevent spreading of the solder members (46, 52) on a bonding face of the first metal plate (36, 56). Each of the semiconductor elements (26, 30, 206, 210, 306, 310) may be a power semiconductor switching element, such as an insulated gate bipolar transistor (IGBT), that undergoes switching operation at the time of converting electric power and each of the semiconductor elements (28, 32, 208, 212, 308, 312) may be a reflux diode that is required in order to circulate current at the time of interrupting a corresponding one of the semiconductor elements (26, 30, 206, 210, 306, 310).
摘要:
The invention relates to a diffusion soldering method in which an electronic component (13) is placed on a substrate (12). The joining surfaces are designed such that cavities (20, 27) are formed in the region of the joining gap (21). The formation of said cavities can be ensured for example by providing depressions in the mounting surface (18) of the component (13) and/or in the contact surface (14) of the substrate (12), the depressions (27) being cup-shaped or advantageously being in the form of channels (20) that surround columnar structural elements (22), the end faces of said structural elements (22) forming the mounting surface (18) or the contact surface (14) for the connection. The cavities (20, 27) are advantageous in that solder material (19) can leak into the cavities when the component (13) is placed on the contact surface (14) of the substrate (12) in order to achieve the required width of the joining gap (21). Thus, the joining gap (21) can be selected so as to have a width so narrow that the joining gap is formed with a diffusion zone (24) which bridges the joining gap (21) upon soldering. In this manner, a diffusion solder connection is produced in an advantageous manner even when using standard solder. The invention further relates to an electronic assembly (11) which has been produced in the aforementioned manner.