公开(公告)号：WO2007021639A2

公开(公告)日：2007-02-22

申请号：PCT/US2006/030703

申请日：2006-08-07

Applicant: ZIPTRONIX, INC. ,  ENQUIST, Paul, M. ,  FOUNTAIN, Gaius, Gillman, Jr. ,  TONG, Qin-Yi

Inventor： ENQUIST, Paul, M. ,  FOUNTAIN, Gaius, Gillman, Jr. ,  TONG, Qin-Yi

IPC: H01L21/4763

CPC classification number: H01L21/76838 ,  H01L21/76898 ,  H01L23/481 ,  H01L24/02 ,  H01L24/81 ,  H01L24/94 ,  H01L24/97 ,  H01L25/0657 ,  H01L25/50 ,  H01L27/0688 ,  H01L2224/0401 ,  H01L2224/81121 ,  H01L2224/81201 ,  H01L2224/8123 ,  H01L2224/81801 ,  H01L2224/81894 ,  H01L2224/81931 ,  H01L2224/83894 ,  H01L2224/9202 ,  H01L2224/97 ,  H01L2225/06513 ,  H01L2225/06541 ,  H01L2924/01002 ,  H01L2924/01004 ,  H01L2924/01005 ,  H01L2924/01006 ,  H01L2924/01007 ,  H01L2924/01013 ,  H01L2924/01014 ,  H01L2924/01015 ,  H01L2924/01018 ,  H01L2924/01019 ,  H01L2924/0102 ,  H01L2924/01022 ,  H01L2924/01023 ,  H01L2924/01027 ,  H01L2924/01028 ,  H01L2924/01029 ,  H01L2924/01033 ,  H01L2924/01042 ,  H01L2924/01046 ,  H01L2924/01049 ,  H01L2924/0105 ,  H01L2924/01055 ,  H01L2924/01059 ,  H01L2924/01073 ,  H01L2924/01074 ,  H01L2924/01075 ,  H01L2924/01077 ,  H01L2924/01078 ,  H01L2924/01079 ,  H01L2924/01082 ,  H01L2924/014 ,  H01L2924/04941 ,  H01L2924/04953 ,  H01L2924/05042 ,  H01L2924/10329 ,  H01L2924/12044 ,  H01L2924/14 ,  H01L2924/19043 ,  H01L2924/3025 ,  H01L2224/81

Abstract: A method of three-dimensionally integrating elements such as singulated die or wafers and an integrated structure having connected elements such as singulated dies or wafers. Either or both of the die and wafer may have semiconductor devices formed therein. A first element having a first contact structure is bonded to a second element having a second contact structure. First and second contact structures can be exposed at bonding and electrically interconnected as a result of the bonding. A via may be etched and filled after bonding to expose and form an electrical interconnect to interconnected first and second contact structures and provide electrical access to this interconnect from a surface. Alternatively, first and/or second contact structures are not exposed at bonding, and a via is etched and filled after bonding to electrically interconnect first and second contact structures and provide electrical access to interconnected first and second contact structure to a surface. Also, a device may be formed in a first substrate, the device being disposed in a device region of the first substrate and having a first contact structure. A via may be etched, or etched and filled, through the device region and into the first substrate before bonding and the first substrate thinned to expose the via, or filled via after bonding.

Abstract translation: 三维集成元件如单模或晶片的方法以及具有连接元件如单个模具或晶片的集成结构。 芯片和晶片中的任一个或两者可以具有形成在其中的半导体器件。 具有第一接触结构的第一元件被结合到具有第二接触结构的第二元件。 第一和第二接触结构可以在结合时暴露，并且由于接合而电连接。 可以在接合之后蚀刻和填充通孔，以暴露并形成互连的第一和第二接触结构的电互连，并提供从表面到该互连的电接入。 或者，第一接触结构和/或第二接触结构在接合时不暴露，并且在接合之后蚀刻并填充通孔以将第一和第二接触结构电互连并且提供对互连的第一和第二接触结构到表面的电接触。 此外，器件可以形成在第一衬底中，该器件设置在第一衬底的器件区域中并且具有第一接触结构。 通孔可以在结合之前被蚀刻或蚀刻和填充穿过器件区域并进入第一衬底，并且第一衬底被稀释以暴露通孔，或者在结合之后填充通孔。

公开(公告)号：WO2006127163A2

公开(公告)日：2006-11-30

申请号：PCT/US2006/013851

申请日：2006-04-13

Applicant: TONG, Qin-Yi ,  FOUNTAIN, Gaius, Gillman, Jr.

Inventor： TONG, Qin-Yi ,  FOUNTAIN, Gaius, Gillman, Jr.

IPC: H01L21/30

CPC classification number: H01L21/76254

Abstract: A method for detachable bonding that forms an amorphous silicon layer, or a silicon oxide layer with a high hydrogen content, on an element such as a carrier substrate. A second element, such as a substrate, is bonded to the amorphous silicon layer or silicon oxide layer, and the second element may then have a portion removed. A third element, such as a host or carrier substrate, is bonded to the second element or to the remaining portion of the second element to form a bonded structure. The bonded structure is then heated to cause the first element to detach from the bonded structure.

Abstract translation: 在诸如载体衬底的元件上形成非晶硅层或具有高氢含量的氧化硅层的可分离接合方法。 诸如衬底的第二元件被结合到非晶硅层或氧化硅层，然后第二元件可以去除部分。 诸如主体或载体衬底的第三元件被结合到第二元件或第二元件的剩余部分以形成结合结构。 然后将接合结构加热以使第一元件从接合结构上分离。

公开(公告)号：WO2004105084A2

公开(公告)日：2004-12-02

申请号：PCT/US2004/013306

申请日：2004-05-19

Applicant: ZIPTRONIX, INC. ,  TONG, Qin-Yi

Inventor： TONG, Qin-Yi

IPC: H01L

CPC classification number: B32B7/04 ,  B32B2250/04 ,  B81C1/00357 ,  B81C2201/019 ,  B81C2203/0118 ,  B81C2203/019 ,  H01L21/3105 ,  H01L21/76251 ,  H01L24/26 ,  H01L24/29 ,  H01L24/81 ,  H01L24/83 ,  H01L24/92 ,  H01L2224/0401 ,  H01L2224/08059 ,  H01L2224/29186 ,  H01L2224/80896 ,  H01L2224/81894 ,  H01L2224/81895 ,  H01L2224/8319 ,  H01L2224/8385 ,  H01L2224/83894 ,  H01L2224/83896 ,  H01L2224/9202 ,  H01L2224/9212 ,  H01L2224/92125 ,  H01L2924/01004 ,  H01L2924/01005 ,  H01L2924/01006 ,  H01L2924/01013 ,  H01L2924/01015 ,  H01L2924/01016 ,  H01L2924/01018 ,  H01L2924/01019 ,  H01L2924/01023 ,  H01L2924/01033 ,  H01L2924/01039 ,  H01L2924/01058 ,  H01L2924/01067 ,  H01L2924/01072 ,  H01L2924/01074 ,  H01L2924/01075 ,  H01L2924/01082 ,  H01L2924/07802 ,  H01L2924/10253 ,  H01L2924/1305 ,  H01L2924/14 ,  H01L2924/1461 ,  H01L2924/351 ,  Y10T156/10 ,  Y10T428/24355 ,  Y10T428/24942 ,  Y10T428/31504 ,  Y10T428/31678 ,  H01L2924/3512 ,  H01L2924/00 ,  H01L2924/05442

Abstract: A method of bonding includes using a bonding layer having a fluorinated oxide. Fluorine may be introduced into the bonding layer by exposure to a fluorine-containing solution, vapor or gas or by implantation. The bonding layer may also be formed using a method where fluorine is introduced into the layer during its formation. The surface of the bonding layer is terminated with a desired species, preferably an NH 2 species. This may be accomplished by exposing the bonding layer to an NH 4 OH solution. High bonding strength is obtained at room temperature. The method may also include bonding two bonding layers together and creating a fluorine distribution having a peak in the vicinity of the interface between the bonding layers. One of the bonding layers may include two oxide layers formed on each other. The fluorine concentration may also have a second peak at the interface between the two oxide layers.

Abstract translation: 接合方法包括使用具有氟化氧化物的接合层。 可以通过暴露于含氟溶液，蒸汽或气体或通过注入将氟引入粘合层。 接合层也可以使用在其形成期间将氟引入层中的方法形成。 接合层的表面用所需的物质，优选NH 2物质终止。 这可以通过将结合层暴露于NH 4 OH溶液来实现。 在室温下获得高粘结强度。 该方法还可以包括将两个结合层结合在一起并产生在接合层之间的界面附近具有峰的氟分布。 结合层之一可以包括彼此形成的两个氧化物层。 氟浓度也可以在两个氧化物层之间的界面处具有第二个峰。

公开(公告)号：WO2004071700A2

公开(公告)日：2004-08-26

申请号：PCT/US2004/002006

申请日：2004-02-06

Applicant: ZIPTRONIX, INC. ,  TONG, Qin-Yi ,  ENQUIST, Paul, M. ,  ROSE, Anthony, Scot

Inventor： TONG, Qin-Yi ,  ENQUIST, Paul, M. ,  ROSE, Anthony, Scot

IPC: B23K

CPC classification number: H01L21/76251 ,  B23K20/02 ,  H01L21/481 ,  H01L24/09 ,  H01L24/11 ,  H01L24/12 ,  H01L24/16 ,  H01L24/28 ,  H01L24/32 ,  H01L24/73 ,  H01L24/81 ,  H01L24/83 ,  H01L24/89 ,  H01L24/90 ,  H01L25/50 ,  H01L2224/05568 ,  H01L2224/05573 ,  H01L2224/13011 ,  H01L2224/13099 ,  H01L2224/13109 ,  H01L2224/13144 ,  H01L2224/13147 ,  H01L2224/32145 ,  H01L2224/80801 ,  H01L2224/81011 ,  H01L2224/81013 ,  H01L2224/81014 ,  H01L2224/81136 ,  H01L2224/81143 ,  H01L2224/81193 ,  H01L2224/81208 ,  H01L2224/8121 ,  H01L2224/81801 ,  H01L2224/81815 ,  H01L2224/8183 ,  H01L2224/81894 ,  H01L2224/83095 ,  H01L2224/8319 ,  H01L2224/8334 ,  H01L2224/83801 ,  H01L2224/8383 ,  H01L2224/8384 ,  H01L2224/8385 ,  H01L2224/83894 ,  H01L2224/83895 ,  H01L2224/83907 ,  H01L2224/9202 ,  H01L2225/06513 ,  H01L2924/00013 ,  H01L2924/01003 ,  H01L2924/01005 ,  H01L2924/01006 ,  H01L2924/01013 ,  H01L2924/01015 ,  H01L2924/01018 ,  H01L2924/01019 ,  H01L2924/01022 ,  H01L2924/01023 ,  H01L2924/01027 ,  H01L2924/01029 ,  H01L2924/01033 ,  H01L2924/01039 ,  H01L2924/01046 ,  H01L2924/01047 ,  H01L2924/01049 ,  H01L2924/0105 ,  H01L2924/0106 ,  H01L2924/01072 ,  H01L2924/01074 ,  H01L2924/01075 ,  H01L2924/01078 ,  H01L2924/01079 ,  H01L2924/01082 ,  H01L2924/0132 ,  H01L2924/01322 ,  H01L2924/014 ,  H01L2924/07802 ,  H01L2924/10329 ,  H01L2924/12042 ,  H01L2924/1305 ,  H01L2924/14 ,  H01L2924/1532 ,  H01L2924/351 ,  Y10T29/49126 ,  H01L2924/3512 ,  H01L2924/00 ,  H01L2224/29099 ,  H01L2224/05644 ,  H01L2924/00014 ,  H01L2224/05664 ,  H01L2224/05669 ,  H01L2224/05124 ,  H01L2224/05147

Abstract: A bonded device structure including a first substrate having a first set of metallic bonding pads, preferably connected to a device or circuit, and having a first non-metallic region adjacent to the metallic bonding pads on the first substrate, a second substrate having a second set of metallic bonding pads aligned with the first set of metallic bonding pads, preferably connected to a device or circuit, and having a second non-metallic region adjacent to the metallic bonding pads on the second substrate, and a contact-bonded interface between the first and second set of metallic bonding pads formed by contact bonding of the first non-metallic region to the second non-metallic region. At least one of the first and second substrates may be elastically deformed.

Abstract translation: 一种粘结器件结构，包括具有第一组金属接合焊盘的第一衬底，优选地连接到器件或电路，并且具有与第一衬底上的金属焊盘相邻的第一非金属区域，第二衬底具有第二衬底 一组金属接合焊盘与第一组金属焊盘对准，优选地连接到器件或电路，并且具有与第二衬底上的金属焊盘相邻的第二非金属区域，以及位于第二衬底之间的接触接合界面 通过第一非金属区域与第二非金属区域的接触接合形成的第一和第二组金属接合焊盘。 第一和第二基板中的至少一个可能弹性变形。