Abstract:
PROBLEM TO BE SOLVED: To provide a microencapsulated silane coupling agent providing good adhesion, preventing delamination at the adhesion interface and generation of voids in a cured product, and attaining storage stability good for an epoxy resin composition upon compounding the silane coupling agent. SOLUTION: The microencapsulated silane coupling agent comprises an adduct particle of an epoxy-based compound and an imidazole-based silane coupling agent, and an ethylcellulose membrane covering it enclosed therein. The ethylcellulose membrane is crosslinked with a polyfunctional isocyanate compound. Preferred imidazole silane coupling agents include compounds of formula (1), in which R 1 and R 2 are each independently a hydrogen atom or a lower alkyl group, and R 3 is a lower alkyl group. COPYRIGHT: (C)2009,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To provide a method of forming conductive layers and a flexible substrate having the conductive layers with a high yield, and to provide a method of manufacturing a semiconductor device that is reduced in size, thickness, and weight. SOLUTION: A method includes: a step of forming a separation layer 51 over a substrate 50 having recessed portions 50a and 50b by using a silane coupling agent; a step of forming conductive layers 52a and 52b in the recessed portions 50a and 50b and an insulating layer 53 that covers the conductive layers 52a and 52b over the separation layer 51; a step of attaching an adhesive member 59 to the insulating layer 53, and then of separating the conductive layers 52a and 52b and the insulating layer 53 from the substrate 50. Alternatively, after these steps, a flexible substrate is attached to the conductive layers and the insulating layer. COPYRIGHT: (C)2008,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To provide a conductive ink capable of forming a conductive thin film having improved heat resistance, shrinkage resistance, and dimensional stability. SOLUTION: The conductive ink contains metal fine particles, an inorganic binder, and a solvent. The inorganic binder comprises a coupling agent or a chelate containing Ti or Al. The inorganic binder is preferably contained in the ink by 1-50 pts.wt. to 100 pts.wt. of metal fine particles. A print pattern is formed on a substrate by an additive method using the conductive ink and is baked at 100-950°C to obtain the conductive thin film. COPYRIGHT: (C)2008,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To provide a liquid or pasty connecting material to implement connection with high reliability, and to impart an excellent preservation property and moisture absorption resistant property of level 2A of JEDEC not giving rise to floating in moisture absorption reflow test. SOLUTION: For the connecting material containing a thermosetting component, a non-conductive filler, and a silane coupling agent, the silane coupling agent is to be composed of a first silane coupling agent and a second silane coupling agent. Here, as the first silane coupling agent, one with a higher reactivity to the non-conductive filler than that the second silane coupling agent is used. A content of the first silane coupling agent is 0.15 to 1.85 pts.wt. to 100 pts.wt. of the non-conductive filler, and that of the second silane coupling agent is 0.80 to 12.00 pts.wt. to 100 pts.wt. of the non-conductive filler. COPYRIGHT: (C)2006,JPO&NCIPI
Abstract:
The invention provides for a back-end metallisation process in which a recess is filled with copper and which includes the step of forming a plating base on the surfaces of the recess for the subsequent galvanic deposition of the said copper, and wherein subsequent to the formation of the plating base, but prior to the galvanic deposition of the copper, a modifying agent is introduced to the recess and which serves to absorb in the surface regions not covered by the plating base and to thereby modify the surface to promote copper growth thereon so as to effectively repair the initial plating base before the copper plating fill commences.