Self-aligned diffused source vertical transistors with stack capacitors
in a 4F-square memory cell array
    1.
    发明授权
    Self-aligned diffused source vertical transistors with stack capacitors in a 4F-square memory cell array 失效
    具有4F方形存储单元阵列中堆叠电容器的自对准扩散源垂直晶体管

    公开(公告)号:US6077745A

    公开(公告)日:2000-06-20

    申请号:US960250

    申请日:1997-10-29

    摘要: A densely packed array of vertical semiconductor devices, having pillars with stack capacitors thereon, and methods of making thereof are disclosed. The pillars act as transistor channels, and are formed between upper and lower doped regions. The lower doped regions are self-aligned and are located below the pillars. The array has columns of bitlines and rows of wordlines. The lower doped regions of adjacent bitlines may be isolated from each other without increasing the cell size and allowing a minimum area of approximately 4 F.sup.2 to be maintained. The array is suitable for Gbit DRAM applications because the stack capacitors do not increase array area. The array may have an open bitline, a folded, or an open/folded architecture with dual wordlines, where two transistors are formed on top of each other in each trench. The lower regions may be initially implanted. Alternatively, the lower regions may be diffused below the pillars after forming thereof. In this case, the lower region diffusion may be controlled either to form floating pillars isolated from the underlying substrate, or to maintain contact between the pillars and the substrate.

    摘要翻译: 公开了一种密集堆叠的垂直半导体器件阵列,其上具有堆叠电容器的柱及其制造方法。 支柱用作晶体管沟道,并且形成在上部和下部掺杂区域之间。 低掺杂区域是自对准的并且位于柱下方。 该阵列具有位线和字线行。 相邻位线的较低掺杂区域可以彼此隔离,而不增加单元尺寸,并允许维持约4F2的最小面积。 该阵列适用于Gbit DRAM应用,因为堆叠电容器不会增加阵列面积。 阵列可以具有双字线的开放位线,折叠或开/折叠架构,其中在每个沟槽中彼此之间形成两个晶体管。 可以最初植入下部区域。 或者,下部区域在其形成之后可以在柱下方扩散。 在这种情况下,可以控制下部区域扩散以形成从下面的衬底分离的浮动柱,或者保持柱和衬底之间的接触。

    Self-aligned diffused source vertical transistors with stack capacitors
in a 4F-square memory cell array
    2.
    发明授权
    Self-aligned diffused source vertical transistors with stack capacitors in a 4F-square memory cell array 失效
    具有4F方形存储单元阵列中堆叠电容器的自对准扩散源垂直晶体管

    公开(公告)号:US5929477A

    公开(公告)日:1999-07-27

    申请号:US792955

    申请日:1997-01-22

    摘要: A densely packed array of vertical semiconductor devices, having pillars with stack capacitors thereon, and methods of making thereof are disclosed. The pillars act as transistor channels, and are formed between upper and lower doped regions. The lower doped regions are self-aligned and are located below the pillars. The array has columns of bitlines and rows of wordlines. The lower doped regions of adjacent bitlines may be isolated from each other without increasing the cell size and allowing a minimum area of approximately 4F.sup.2 to be maintained. The array is suitable for Gbit DRAM applications because the stack capacitors do not increase array area. The array may have an open bitline, a folded, or an open/folded architecture with dual wordlines, where two transistors are formed on top of each other in each trench. The lower regions may be initially implanted. Alternatively, the lower regions may be diffused below the pillars after forming thereof. In this case, the lower region diffusion may be controlled either to form floating pillars isolated from the underlying substrate, or to maintain contact between the pillars and the substrate.

    摘要翻译: 公开了一种密集堆叠的垂直半导体器件阵列,其上具有堆叠电容器的柱及其制造方法。 支柱用作晶体管沟道,并且形成在上部和下部掺杂区域之间。 低掺杂区域是自对准的并且位于柱下方。 该阵列具有位线和字线行。 相邻位线的较低掺杂区域可以彼此隔离,而不增加单元尺寸,并允许维持约4F2的最小面积。 该阵列适用于Gbit DRAM应用,因为堆叠电容器不会增加阵列面积。 阵列可以具有双字线的开放位线,折叠或开/折叠架构,其中在每个沟槽中彼此之间形成两个晶体管。 可以最初植入下部区域。 或者,下部区域在其形成之后可以在柱下方扩散。 在这种情况下,可以控制下部区域扩散以形成从下面的衬底分离的浮动柱,或者保持柱和衬底之间的接触。

    Boundary independent bit decode for a SDRAM
    4.
    发明授权
    Boundary independent bit decode for a SDRAM 失效
    用于SDRAM的边界独立位解码

    公开(公告)号:US5663924A

    公开(公告)日:1997-09-02

    申请号:US572604

    申请日:1995-12-14

    IPC分类号: G11C7/10 G11C8/00

    CPC分类号: G11C7/1072 G11C7/1018

    摘要: A boundary independent decoder for a Synchronous Dynamic Random Access Memory (SDRAM) with an n bit burst transfer block length. A user, usually a processor or microprocessor requests access to a block of SDRAM memory. The requested block may begin between array decode boundaries. A column address is decoded by an SDRAM column decoder. The decoder selects a starting boundary for 2n bits. The first requested bit is in the first n bits of the 2n selected bits. Thus, the entire n bit block is included in the selected 2n bit block. The n bit block is selected from the selected 2n bits and latched in a high speed decoder/register in a sequentially scrambled order, i.e., the i.sup.th bit is the first requested bit and the requested bit order is i, . . . , (n-1), . . . , 0, . . . , (i-1). Latched data is scrambled either sequentially or interleaved, if required. Scrambled data is burst transferred off chip.

    摘要翻译: 具有n位突发传输块长度的同步动态随机存取存储器(SDRAM)的边界独立解码器。 用户,通常是处理器或微处理器请求访问一块SDRAM存储器。 所请求的块可以在阵列解码边界之间开始。 列地址由SDRAM列解码器解码。 解码器为2n位选择起始边界。 第一个请求位在2n个选定位的前n位。 因此,整个n位块被包括在所选择的2n位块中。 从选定的2n位中选择n位块,并以顺序加扰的顺序锁存在高速解码器/寄存器中,即第i个位是第一个请求位,并且所请求的位顺序为i。 。 。 ,(n-1),。 。 。 ,0,。 。 。 ,(i-1)。 如果需要,锁存数据按顺序或交错进行加扰。 加扰数据是芯片外的突发传输。

    Self-isolated and self-aligned 4F-square vertical fet-trench dram cells
    6.
    发明授权
    Self-isolated and self-aligned 4F-square vertical fet-trench dram cells 失效
    自分离和自对准4F方形垂直胎面沟槽细胞

    公开(公告)号:US6137128A

    公开(公告)日:2000-10-24

    申请号:US94383

    申请日:1998-06-09

    摘要: A densely packed array of vertical semiconductor devices, having pillars, deep trench capacitors, vertical transistors, and methods of making thereof are disclosed. The pillars act as transistor channels, and may be formed utilizing the application of hybrid resist over a block of semiconductor material. Drain doped regions are formed on the top of each pillar. The source doped regions and the plate doped regions are self-aligned and are created by diffusion in the trenches surrounding the pillars. The array has columns of bitlines and rows of wordlines. The capacitors are formed by isolating n.sup.+ polysilicon in trenches separating said pillars. The array is suitable for GBit DRAM applications because the deep trench capacitors do not increase array area. The array may have an open bitline architecture, where the plate region is common to all the storage nodes or a folded architecture with two wordlines that pass through each cell having stacked transistors, where one wordline is active and the other is passing for each cell.

    摘要翻译: 公开了一种密集堆叠的垂直半导体器件阵列,具有支柱,深沟槽电容器,垂直晶体管及其制造方法。 支柱用作晶体管通道,并且可以利用在半导体材料块上施加混合抗蚀剂来形成。 在每个支柱的顶部形成漏极掺杂区域。 源掺杂区域和板掺杂区域是自对准的,并且通过在柱子周围的沟槽中的扩散而产生。 该阵列具有位线和字线行。 通过在分离所述柱的沟槽中隔离n +多晶硅来形成电容器。 该阵列适用于GBit DRAM应用,因为深沟槽电容器不增加阵列面积。 阵列可以具有开放的位线架构,其中板区域对于所有存储节点是公共的,或者具有两个字线的折叠结构,其中两个字线通过具有堆叠晶体管的每个单元,其中一个字线是活动的,而另一个字线通过每个单元。

    Processor based BIST for an embedded memory
    7.
    发明授权
    Processor based BIST for an embedded memory 失效
    基于处理器的BIST,用于嵌入式存储器

    公开(公告)号:US5961653A

    公开(公告)日:1999-10-05

    申请号:US803053

    申请日:1997-02-19

    摘要: An integrated chip having a DRAM embedded in logic is tested by an in-situ processor oriented BIST macro. The BIST is provided with two ROMS, one for storing test instructions and a second, which is scannable, that provides sequencing for the test instructions stored in the first ROM, as well as branching and looping capabilities. The BIST macro has, in addition, a redundancy allocation logic section for monitoring failures within the DRAM and for replacing failing word and/or data lines. By stacking the DRAM in 0.5 mb increments up to a 4.0 mb maximum or in 1.0 mb increments up to an 8 mb maximum, all of which are controlled and tested by the BIST macro, a customized chip design with a high level of granularity can be achieved and tailored to specific applications within a larger ASIC.

    摘要翻译: 具有嵌入在逻辑中的DRAM的集成芯片通过原位处理器定向的BIST宏进行测试。 BIST提供两个ROMS,一个用于存储测试指令,另一个用于存储测试指令,第二个可扫描,为存储在第一个ROM中的测试指令提供顺序,以及分支和循环功能。 此外,BIST宏还具有用于监视DRAM内的故障并用于替换失败的字和/或数据线的冗余分配逻辑部分。 通过将DRAM以0.5mb的增量叠加到4.0mb的最大值或以1.0mb的增量最大为8mb的最大值,所有这些都由BIST宏控制和测试,具有高度粒度的定制芯片设计可以是 实现并针对更大的ASIC中的特定应用量身定做。

    Integrated circuit chip with a wide I/O memory array and redundant data
lines
    8.
    发明授权
    Integrated circuit chip with a wide I/O memory array and redundant data lines 失效
    具有宽I / O存储器阵列和冗余数据线的集成电路芯片

    公开(公告)号:US5796662A

    公开(公告)日:1998-08-18

    申请号:US756614

    申请日:1996-11-26

    IPC分类号: G11C29/00 G11C7/00

    CPC分类号: G11C29/848

    摘要: An integrated circuit chip with RAM, a RAM macro or bit slice data logic and at least one spare array element or spare slice element and the redundancy scheme therefor. The chip includes a wide data path with a plurality of interchangeable elements such as bit slice elements or memory element and at least one more element than the number of bits in the wide data path; selection logic for deselecting defective data elements; and, switches for selectively coupling each bit of the wide I/O data path to one element or to an element adjacent the one element responsive to the selection means. The integrated circuit chip may further include drive means for selectively driving data from the switches to the element or, otherwise, passing data from the elements to the switches. The switches preferably are three-way switches, such as three CMOS pass gates.

    摘要翻译: 具有RAM的集成电路芯片,RAM宏或位片数据逻辑以及至少一个备用阵列元件或备用片元件及其冗余方案。 芯片包括具有诸如位片元件或存储器元件的多个可互换元件的宽数据路径以及与宽数据路径中的位数比至少一个元素; 用于取消选择有缺陷的数据元素的选择逻辑; 以及用于响应于选择装置选择性地将宽I / O数据路径的每一位耦合到一个元件或与该元件相邻的元件的开关。 集成电路芯片还可以包括用于选择性地将数据从开关驱动到元件的驱动装置,或者否则将数据从元件传递到开关。 开关优选地是三路开关,例如三个CMOS通孔。