Method and apparatus for storing wafers without moisture absorption
    4.
    发明授权
    Method and apparatus for storing wafers without moisture absorption 失效
    储存晶片而不吸湿的方法和装置

    公开(公告)号:US6032704A

    公开(公告)日:2000-03-07

    申请号:US70395

    申请日:1998-04-30

    IPC分类号: H01L21/00 H01L21/673 B65B1/04

    摘要: A method and apparatus for storing wafers without the moisture absorption problem by providing a wafer storage container that has a cavity therein and an inert gas supply line into the cavity for flowing an inert gas at a substantially constant flow rate into the cavity while allowing a portion of the inert gas to escape into surrounding environment outside the cavity such that there is always a positive pressure differential maintained between the cavity and the outside environment to keep out moisture.

    摘要翻译: 一种方法和装置,用于通过提供在其中具有空腔的晶片储存容器和惰性气体供应管线来存储晶片而没有吸湿问题,用于使惰性气体以基本恒定的流速流入空腔,同时允许一部分 的惰性气体逸出到空腔外面的周围环境中,使得在空腔和外部环境之间总是保持正压差以防止湿气。