Method for forming Au-bump with clean surface
    8.
    发明申请
    Method for forming Au-bump with clean surface 审中-公开
    用清洁表面形成Au凸块的方法

    公开(公告)号:US20080131981A1

    公开(公告)日:2008-06-05

    申请号:US11950358

    申请日:2007-12-04

    IPC分类号: H01L21/66

    CPC分类号: H01L22/22

    摘要: A method for fabricating and testing a semiconductor wafer includes sputtering a TiW layer on a passivation layer and on pads, next sputtering a seed layer, made of gold, on the TiW layer, next forming a photoresist layer on the seed layer, next electroplating gold bumps on the seed layer exposed by openings in the photoresist layer, next removing the photoresist layer, next removing the seed layer not under the gold bumps, next etching the TiW layer not under the gold bumps with an etchant containing H2O2 at a temperature of between 35 and 50 degrees C, or with an etchant containing H2O2 and with ultrasonic waves applied to the etchant, next contacting probe tips of a probe card with some of the gold bumps, next cleaning the probe tips until repeating the step of contacting the probe tips with some of the gold bumps at greater than 100 times, and then after cleaning the probe tips, repeating the step of contacting the probe tips with some of the gold bumps.

    摘要翻译: 一种用于制造和测试半导体晶片的方法包括在钝化层和焊盘上溅射TiW层,接下来在TiW层上溅射由金构成的晶种层,接着在种子层上形成光致抗蚀剂层,接下来的电镀金 在光致抗蚀剂层中由开口暴露的晶种层上的突起,接下来去除光致抗蚀剂层,接下来除去不在金凸块之下的种子层,接着用含有H 2的蚀刻剂蚀刻不在金凸块之下的TiW层, 在35至50℃的温度下,或用含有H 2 O 2 O 2的蚀刻剂和超声波 应用于蚀刻剂,接下来将探针卡的探针尖端与一些金凸块接触,然后清洁探针尖端,直到重复将探针尖端与一些金凸块接触大于100次的步骤,然后清洁 探针尖端,重复探针尖端与其中一些接触的步骤 金块。