Method for the manufacturing of a thyristor with defined lateral resistor
    1.
    发明授权
    Method for the manufacturing of a thyristor with defined lateral resistor 失效
    用定义的侧向电阻制造三元器件的方法

    公开(公告)号:US5204273A

    公开(公告)日:1993-04-20

    申请号:US723800

    申请日:1991-07-01

    IPC分类号: H01L29/417 H01L29/74

    CPC分类号: H01L29/7428 H01L29/7408

    摘要: Thyristor with defined lateral resistor and method for the manufacturing thereof. The thyristor has a resistor area (5) for the generation of a lateral resistor, for example between an emitter field (8) and an auxiliary emitter field (7), whereby the resistor are (5) has a defined lower doping concentration than the layer (2) surrounding it. The defined lower doping concentration is generated by recesses (3) in an occupation layer and can be adjusted by the ratio of the widths alternately arranged recesses (3) and ribs (4). The recess (3) and the ribs (4) are generated either by diffusion and subsequent etching or by implantation with an implantation mask, before the deposition layer is driven into the semiconductor body of the thyristor by heat supply from a surface.

    摘要翻译: 具有限定横向电阻的晶闸管及其制造方法。 晶闸管具有用于产生横向电阻器的电阻器区域(5),例如在发射极场(8)和辅助发射极场(7)之间,由此电阻器(5)具有比 层(2)周围。 限定的较低掺杂浓度由占用层中的凹部(3)产生,并且可以通过交替布置的凹部(3)和肋(4)的宽度的比率来调节。 在通过从表面的热供应将沉积层驱动到晶闸管的半导体本体之前,通过扩散和随后的蚀刻或通过注入掩模注入来产生凹部(3)和肋(4)。

    Method for the manufacture of a pn-junction having high dielectric
strength
    3.
    发明授权
    Method for the manufacture of a pn-junction having high dielectric strength 失效
    制造具有高介电强度的pn结的方法

    公开(公告)号:US4757031A

    公开(公告)日:1988-07-12

    申请号:US086269

    申请日:1987-08-17

    摘要: A method for the manufacture of a pn-junction having high dielectric strength starting with a doped semiconductor body of a first conductivity type. A zone of a second conductivity type is formed in the semiconductor body inwardly from a surface thereof. At least one recess is then provided inwardly from the surface and including a recess which is formed at the extreme marginal edge of the semiconductor body. Dopant of the second conductivity type is diffused into the semiconductor body to form zones of varying dopant penetration depths from the center of the body to the marginal edge.

    摘要翻译: 一种从第一导电类型的掺杂半导体本体开始制造具有高介电强度的pn结的方法。 第二导电类型的区域从其表面向内形成在半导体本体中。 然后至少一个凹部从表面向内提供,并且包括形成在半导体主体的最外边缘处的凹部。 第二导电类型的掺杂剂扩散到半导体本体中以形成从主体的中心到边缘的不同掺杂剂穿透深度的区域。

    Light-triggerable thyristor having low-loss feed of the trigger energy
    4.
    发明授权
    Light-triggerable thyristor having low-loss feed of the trigger energy 失效
    具有触发能量低损耗馈电的可触发晶闸管

    公开(公告)号:US4757366A

    公开(公告)日:1988-07-12

    申请号:US846582

    申请日:1986-03-31

    摘要: A light-triggerable thyristor comprises a cathode contact and a light conductor arranged in a bore thereof for supplying trigger energy. In order to obtain optimally low losses of the trigger energy and to guarantee simple assembly and interchangeability, the end of the light conductor at the side of the thyristor is surrounded by a rigid sleeve which is pluggable into a sleeve-shaped insert mounted in the bore. In particular, a central region of the cathode contact is fashioned raised in comparison to a flange-like projection of the cathode contact which is connected to a ceramic envelope, and the central region is provided with a groove which serves for receiving an angled portion of the rigid sleeve. The invention is particularly suited for power thyristors in high-voltage DC transmission systems.

    摘要翻译: 光触发晶闸管包括阴极接触件和布置在其孔中的光导体,用于提供触发能量。 为了获得触发能量的最佳低损失并且为了保证简单的组装和可互换性,在晶闸管侧面的光导体的端部被刚性套筒包围,刚性套筒可插入安装在孔中的套筒形插入件 。 特别地,与连接到陶瓷外壳的阴极接触件的凸缘状突起相比,阴极接触件的中心区域形成凸起,并且中心区域设置有用于接收角度部分的凹槽 刚性套筒。 本发明特别适用于高压直流输电系统中的功率晶闸管。

    Method for manufacturing regions having adjustable uniform doping in
silicon crystal wafers by neutron irradiation
    5.
    发明授权
    Method for manufacturing regions having adjustable uniform doping in silicon crystal wafers by neutron irradiation 失效
    用于通过中子照射制造在硅晶片中具有可调均匀掺杂的区域的方法

    公开(公告)号:US4728371A

    公开(公告)日:1988-03-01

    申请号:US838326

    申请日:1986-03-11

    摘要: A method for manufacturing regions having adjustable uniform doping in silicon crystal wafers by neutron irradiation according to the reaction Si.sup.30 (n,.gamma.) Si.sup.31 .beta..sup.- P.sup.31 includes the steps of covering the silicon crystal wafer with neutron-absorbing materials of different thicknesses during the irradiation, and selecting materials having isotopes having a high absorption cross-section which yield stable isotopes in the nuclear reaction having small or short-lived activity. Suitable isotopes are B.sup.10, Cd.sup.113, Sm.sup.149, Gd.sup.155 and Gd.sup.157. The regions are generated photolithographically. By such specific material selection, very small layer thicknesses can be used and microfine surface zones or areas can be doped with high geometrical precision and large penetration depth. The method is particularly suited for manufacturing power thyristors.

    摘要翻译: 根据反应Si30(n,γ)Si31β-P31通过中子照射在硅晶片中制造具有可调均匀掺杂的区域的方法包括以下步骤:在照射期间用不同厚度的中子吸收材料覆盖硅晶片 以及选择具有高吸收截面的同位素的材料,其在具有小或短寿命的核反应中产生稳定的同位素。 合适的同位素是B10,Cd113,Sm149,Gd155和Gd157。 光刻地产生这些区域。 通过这样的具体材料选择,可以使用非常小的层厚度,并且可以以高几何精度和大的穿透深度掺杂微细表面区域或区域。 该方法特别适用于制造功率晶闸管。

    Thyristor having a low-reflection light-triggering structure
    9.
    发明授权
    Thyristor having a low-reflection light-triggering structure 失效
    具有低反射光触发结构的THYRISTOR

    公开(公告)号:US5083177A

    公开(公告)日:1992-01-21

    申请号:US653968

    申请日:1991-02-12

    摘要: A thyristor having low-reflection light-triggering structure. In a light-triggerable thyristor, pyramidal depressions are formed in a simple manner by a preferred etching method, being formed in the region of the photon entry face in order to produce a low-reflection light-triggering structure. Incident light is absorbed in the pyramidal depressions largely independent of the wavelength of the incident light and nearly completely. The low-reflection light-triggering structure thereby produced can be formed with relatively little outlay. This is especially true when a defined overhead ignition voltage is simultaneously set by the pyramidal depressions.

    摘要翻译: 具有低反射光触发结构的晶闸管。 在光触发晶闸管中,通过优选的蚀刻方法以简单的方式形成锥形凹陷,形成在光子入射面的区域中,以便产生低反射光触发结构。 入射光在锥形凹陷中被吸收,其主要与入射光的波长几乎完全相同。 由此产生的低反射光触发结构可以以相对较少的花费形成。 当定义的顶点点火电压由金字塔形凹陷同时设定时尤其如此。

    Thyristor with high positive and negative blocking capability and method
for the manufacture thereof
    10.
    发明授权
    Thyristor with high positive and negative blocking capability and method for the manufacture thereof 失效
    具有高积极和负阻塞能力的THYRISTOR及其制造方法

    公开(公告)号:US5077224A

    公开(公告)日:1991-12-31

    申请号:US722176

    申请日:1991-06-27

    摘要: A thyristor having high forward and reverse blocking capability and a method for the manufacture thereof. The thyristor has a p-base region separated from an n-base lying therebelow by a first planar pn-junction that very gradually approaches an upper side of the thyristor at its edge region. A p-emitter is composed of a p-conductive layer inserted at the under side of the thyristor that is continued in a p-conductive lateral zone that laterally limits the thyristor and extends from an under side up to the upper side. This p-conductive lateral zone merges into a p-conductive semiconductor zone that is inserted at the upper side of the thyristor. This latter p-conductive semiconductor zone extends from a part of the lateral zone lying at the upper side, proceeds along the upper side of the thyristor in the direction toward the edge termination of the p-base region, and is separated from the n-base by a second planar pn-junction that very gradually approaches the upper side.