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    Alternating current rotatable sputter cathode
    94.
    发明授权
    Alternating current rotatable sputter cathode 失效
    交替电流可旋转溅射阴极

    公开(公告)号：US07905995B2

    公开(公告)日：2011-03-15

    申请号：US12172574

    申请日：2008-07-14

    Applicant: John R. German ,  Daniel T. Crowley ,  Brian P. Meinke ,  Roger L. Peterson

    Inventor： John R. German ,  Daniel T. Crowley ,  Brian P. Meinke ,  Roger L. Peterson

    IPC: C23C14/35

    CPC classification number: H01J37/3405 ,  H01J37/32577 ,  H01J2237/166

    Abstract: The present invention is an alternating current rotary sputter cathode in a vacuum chamber. The apparatus includes a housing containing a vacuum and a cathode disposed therein. A drive shaft is rotatably mounted in the bearing housing. A rotary vacuum seal is located in the bearing housing for sealing the drive shaft to the housing. An at least one electrical contact is disposed between a power source and the cathode for transmittal of an oscillating or fluctuating current to the cathode. The electrical contact between the power source and the cathode is disposed inside of the vacuum chamber, greatly reducing, and almost eliminating, the current induced heating of various bearing, seals, and other parts of the rotatably sputter cathode assembly.

    Abstract translation: 本发明是真空室中的交流旋转溅射阴极。 该装置包括容纳真空和设置在其中的阴极的外壳。 驱动轴可旋转地安装在轴承壳体中。 旋转真空密封件位于轴承壳体中，用于将驱动轴密封到壳体。 在电源和阴极之间设置至少一个电触头，用于传输振荡或波动的电流到阴极。 电源和阴极之间的电接触被设置在真空室的内部，大大减少并几乎消除了可旋转溅射的阴极组件的各种轴承，密封件和其它部件的电流感应加热。

    Compact Scanning Electron Microscope
    96.
    发明申请
    Compact Scanning Electron Microscope 有权
    紧凑型扫描电子显微镜

    公开(公告)号：US20100276592A1

    公开(公告)日：2010-11-04

    申请号：US12303715

    申请日：2007-04-26

    Applicant: Johannes Antonius Hendricus Wilhelmus Gerardus Persoon ,  Andreas Theodorus Engelen ,  Siegfried Lichtenegger ,  Petrus Henricus Joannes Van Dooren

    Inventor： Johannes Antonius Hendricus Wilhelmus Gerardus Persoon ,  Andreas Theodorus Engelen ,  Siegfried Lichtenegger ,  Petrus Henricus Joannes Van Dooren

    IPC: F16C29/02 ,  H01J37/28 ,  H01J37/08 ,  H01J37/18 ,  H01J5/02 ,  H01J27/02

    CPC classification number: H01J37/28 ,  H01J37/185 ,  H01J37/20 ,  H01J2237/166 ,  H01J2237/184 ,  H01J2237/2006 ,  H01J2237/204

    Abstract: A slider bearing for use with an apparatus comprising a vacuum chamber (11). The slider bearing comprises: a base plate (20) in contact with the vacuum chamber (11) at one side, said base plate showing a first through-hole (21) in contact with the vacuum chamber (11), a second plate (30), one side of the second plate in contact with the base plate (20), said second plate showing a second through-hole (31), the faces of the base plate and the second plate facing each other being sufficiently smooth to form a non-elastomeric vacuum seal, said base plate (20) and said second plate (30) slidable between a first relative position in which the first through-hole (21) and the second through-hole (31) do not overlap and a second relative position in which the first through-hole and the second through-hole overlap, characterised in that the second plate (30) is a flexible plate, the face of the flexible plate opposite to the base plate is equipped to seal against a cup (50), the cup equipped to hold a sample (1), the first through-hole (21) in the base plate shows a rim facing the flexible plate (30) with a controlled curvature, the curvature of the rim formed such that the vacuum seal between the base plate and the flexible plate forms on a pre-defined contour and that the Hertzian contact pressure is smaller than a pre-defined maximum contact pressure, the pre-determined maximum contact pressure chosen to minimise particle generation. By forming the second plate as a flexible plate the pressure with which the base plate and the second plate are pressed together is better reproducible than when both plates are rigid. By forming the rim with a controlled radius, the particle generation is minimized.

    Abstract translation: 一种用于与包括真空室（11）的设备一起使用的滑块轴承。 滑动轴承包括：在一侧与真空室（11）接触的基板（20），所述基板显示与真空室（11）接触的第一通孔（21），第二板 30），与所述基板（20）接触的所述第二板的一侧，所述第二板表示第二通孔（31），所述基板和所述第二板的面彼此相对平滑以形成 非弹性真空密封件，所述基板（20）和所述第二板（30）可在其中第一通孔（21）和第二通孔（31）不重叠的第一相对位置和第二通孔 第二相对位置，其中第一通孔和第二通孔重叠，其特征在于，第二板（30）是柔性板，与基板相对的柔性板的表面被装备以密封杯 （50），装备有样品（1）的杯子，底板中的第一通孔（21） 面对具有受控曲率的柔性板（30），边缘的曲率形成为使得基板和柔性板之间的真空密封形成预定义的轮廓，并且赫兹接触压力小于预定值， 定义的最大接触压力，所选择的预定最大接触压力以最小化颗粒产生。 通过将第二板形成为柔性板，将基板和第二板压在一起的压力比两个板刚性时的压力更好。 通过以受控的半径形成轮辋，使颗粒的产生最小化。

    ELECTRON BEAM PROCESSING DEVICE
    97.
    发明申请
    ELECTRON BEAM PROCESSING DEVICE 有权
    电子束加工装置

    公开(公告)号：US20100012860A1

    公开(公告)日：2010-01-21

    申请号：US12502567

    申请日：2009-07-14

    Applicant: Franz Vokurka

    Inventor： Franz Vokurka

    IPC: B01J19/08

    CPC classification number: B23K15/06 ,  B23K15/002 ,  H01J37/023 ,  H01J37/147 ,  H01J37/16 ,  H01J37/315 ,  H01J2237/0245 ,  H01J2237/1503 ,  H01J2237/166

    Abstract: An electron beam processing device includes a chamber housing that defines a chamber interior space and has a first opening. A carriage is movable along the first opening. An electron beam generator is disposed on the carriage so that the generated electron beam passes through the first opening when the carriage moves along the first opening. A disk is disposed between the chamber housing and the carriage and is rotatable about a rotational axis, which is perpendicular to the first opening, at least between a first rotational position and a second rotational position. The disk has a second opening spaced from the rotational axis of the disk in the radial direction. The rotational axis of the disk is disposed so that the first opening always overlaps the second opening at least along an electron beam propagation axis when the disk rotates between the first and second rotational positions.

    Abstract translation: 电子束处理装置包括限定腔室内部空间并具有第一开口的腔室壳体。 托架可沿着第一开口移动。 电子束发生器设置在滑架上，使得当滑架沿着第一开口移动时，所产生的电子束通过第一开口。 盘被布置在腔室壳体和托架之间，并且可绕至少在第一旋转位置和第二旋转位置之间绕与第一开口垂直的旋转轴线旋转。 盘具有沿径向与盘的旋转轴线间隔开的第二开口。 盘的旋转轴线设置成使得当盘在第一和第二旋转位置之间旋转时，至少第一开口总是与电子束传播轴线重叠。

    Sealing between vacuum chambers
    98.
    发明授权
    Sealing between vacuum chambers 有权
    真空室之间密封

    公开(公告)号：US07559557B2

    公开(公告)日：2009-07-14

    申请号：US11894979

    申请日：2007-08-22

    Applicant: Gregory D. Thronson ,  Jeffrey A. Burgess

    Inventor： Gregory D. Thronson ,  Jeffrey A. Burgess

    IPC: G21K5/00 ,  H01J37/18 ,  G03B27/52 ,  F16J15/00

    CPC classification number: H01J37/16 ,  H01J37/18 ,  H01J2237/166 ,  H01J2237/31701 ,  Y10S277/913

    Abstract: A sealing system is disclosed. One such sealing system includes a first vacuum chamber and a second vacuum chamber. The sealing system includes a first sealing unit having a proximal end and a distal end, the proximal end of the first sealing unit disposed on the first vacuum chamber. The sealing system includes a second sealing unit having a distal end and a proximal end, the distal end of the second sealing unit disposed on the distal end of the first sealing unit and the proximal end of the second sealing unit disposed on the second vacuum chamber. One of the sealing units is concave, while the other is convex. The sealing system also includes a first o-ring, a second o-ring, and a third o-ring.

    Abstract translation: 公开了一种密封系统。 一个这样的密封系统包括第一真空室和第二真空室。 密封系统包括具有近端和远端的第一密封单元，第一密封单元的近端设置在第一真空室上。 密封系统包括具有远端和近端的第二密封单元，第二密封单元的远端设置在第一密封单元的远端上，第二密封单元的近端设置在第二真空室 。 其中一个密封单元是凹形的，而另一个是凸形的。 密封系统还包括第一O形环，第二O形环和第三O形环。

    Sealing between vacuum chambers
    99.
    发明申请
    Sealing between vacuum chambers 有权

    公开(公告)号：US20090050825A1

    公开(公告)日：2009-02-26

    申请号：US11894979

    申请日：2007-08-22

    Applicant: Gregory D. Thronson ,  Jeffrey A. Burgess

    Inventor： Gregory D. Thronson ,  Jeffrey A. Burgess

    IPC: G21K5/00 ,  H01J37/18

    CPC classification number: H01J37/16 ,  H01J37/18 ,  H01J2237/166 ,  H01J2237/31701 ,  Y10S277/913

    Abstract: A sealing system is disclosed. One such sealing system includes a first vacuum chamber and a second vacuum chamber. The sealing system includes a first sealing unit having a proximal end and a distal end, the proximal end of the first sealing unit disposed on the first vacuum chamber. The sealing system includes a second sealing unit having a distal end and a proximal end, the distal end of the second sealing unit disposed on the distal end of the first sealing unit and the proximal end of the second sealing unit disposed on the second vacuum chamber. One of the sealing units is concave, while the other is convex. The sealing system also includes a first o-ring, a second o-ring, and a third o-ring.

    Chamber isolation valve RF grounding
    100.
    发明授权
    Chamber isolation valve RF grounding 有权
    室内隔离阀RF接地

    公开(公告)号：US07469715B2

    公开(公告)日：2008-12-30

    申请号：US11174229

    申请日：2005-07-01

    Applicant: Ke Ling Lee ,  Shinichi Kurita ,  Emanuel Beer

    Inventor： Ke Ling Lee ,  Shinichi Kurita ,  Emanuel Beer

    IPC: H01J37/32

    CPC classification number: F16K3/0227 ,  F16K51/02 ,  H01J37/32844 ,  H01J2237/166 ,  H01L21/67126 ,  Y02C20/30 ,  Y02P70/605 ,  Y10S277/919 ,  Y10S277/92 ,  Y10T137/8242

    Abstract: A method and apparatus for grounding a chamber isolation valve are provided. Generally, the method makes use of an electrically conductive elastomeric member or members to effectively ground a chamber isolation valve and/or isolation valve door while avoiding metal-to-metal contact between moving parts in the processing system. In one embodiment, the elastomeric member is attached to and in electrical communication with the door of the chamber isolation valve. The elastomeric member is brought into contact with a grounded component of the plasma processing system when the door is in the closed position. In another embodiment, the conductive elastomeric member is attached to a bracing member of the isolation valve and is brought into contact with a grounded component of the plasma processing system when the bracing member is deployed to hold the isolation valve door in place during substrate processing. Other configurations are also provided.

    Abstract translation: 提供了一种用于使室隔离阀接地的方法和装置。 通常，该方法利用导电弹性体构件来有效地将室隔离阀和/或隔离阀门接地，同时避免处理系统中移动部件之间的金属与金属的接触。 在一个实施例中，弹性体构件附接到腔室隔离阀的门并且与腔室隔离阀的门电连通。 当门处于关闭位置时，弹性体构件与等离子体处理系统的接地部件接触。 在另一个实施例中，当支撑构件展开以在衬底处理期间将隔离阀门保持在适当位置时，导电弹性构件附接到隔离阀的支撑构件并与等离子体处理系统的接地构件接触。 还提供其他配置。

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