Abstract:
In one embodiment, a method of manufacturing a silicon-carbide (SiC) device includes receiving a selection of a specific terrestrial cosmic ray (TCR) rating at a specific applied voltage, determining a breakdown voltage for the SiC device based at least on the specific TCR rating at the specific applied voltage, determining drift layer design parameters based at least on the breakdown voltage. The drift layer design parameters include doping concentration and thickness of the drift layer. The method also includes fabricating the SiC device having a drift layer with the determined drift layer design parameters. The SiC device has the specific TCR rating at the specific applied voltage.
Abstract:
A power module includes a first bus bar having a first plurality of tabs, wherein each of the first plurality of tabs is electrically coupled to a respective conductive trace of a plurality of conductive traces disposed on a first side; a second bus bar having a second plurality of tabs, wherein each of the second plurality of tabs is electrically coupled to a respective conductive trace of a plurality of conductive traces disposed on a second side; and a third bus bar having a third plurality of tabs, wherein at least one tab of the third plurality of tabs is electrically coupled to a respective conductive trace of the plurality of conductive traces disposed on the first side and at least one tab of the third plurality of tabs is electrically coupled to a respective conductive trace of the plurality of conductive traces disposed on the second side.
Abstract:
A power transistor assembly and method of operating the assembly are provided. The power transistor assembly includes integrated transient voltage suppression on a single semiconductor substrate and includes a transistor formed of a wide band gap material, the transistor including a gate terminal, a source terminal, and a drain terminal, the transistor further including a predetermined maximum allowable gate voltage value, and a transient voltage suppression (TVS) device formed of a wide band gap material, the TVS device formed with the transistor as a single semiconductor device, the TVS device electrically coupled to the transistor between at least one of the gate and source terminals and the drain and source terminals, the TVS device including a breakdown voltage limitation selected to be greater than the predetermined maximum allowable gate voltage value.
Abstract:
Embodiments of a silicon carbide (SiC) device are provided herein. In some embodiments, a silicon carbide (SiC) device may include a gate electrode disposed above a SiC semiconductor layer, wherein the SiC semiconductor layer comprises: a drift region having a first conductivity type; a well region disposed adjacent to the drift region, wherein the well region has a second conductivity type; and a source region having the first conductivity type disposed adjacent to the well region, wherein the source region comprises a source contact region and a pinch region, wherein the pinch region is disposed only partially below the gate electrode, wherein a sheet doping density in the pinch region is less than 2.5×1014 cm−2, and wherein the pinch region is configured to deplete at a current density greater than a nominal current density of the SiC device to increase the resistance of the source region.
Abstract:
In one embodiment, a method of manufacturing a silicon-carbide (SiC) device includes receiving a selection of a specific terrestrial cosmic ray (TCR) rating at a specific applied voltage, determining a breakdown voltage for the SiC device based at least on the specific TCR rating at the specific applied voltage, determining drift layer design parameters based at least on the breakdown voltage. The drift layer design parameters include doping concentration and thickness of the drift layer. The method also includes fabricating the SiC device having a drift layer with the determined drift layer design parameters. The SiC device has the specific TCR rating at the specific applied voltage.
Abstract:
A semiconductor device includes a substrate including silicon carbide; a drift layer disposed over the substrate including a drift region doped with a first dopant and conductivity type; and a second region, doped with a second dopant and conductivity type, adjacent to the drift region and proximal to a surface of the drift layer. The semiconductor device further includes a junction termination extension adjacent to the second region with a width and discrete regions separated in a first and second direction doped with varying concentrations of the second dopant type, and an effective doping profile of the second conductivity type of functional form that generally decreases away from the edge of the primary blocking junction. The width is less than or equal to a multiple of five times the width of the one-dimensional depletion width, and the charge tolerance of the semiconductor device is greater than 1.0×1013 per cm2.
Abstract:
Systems and methods for providing automatic short circuit protection in an electrical system via a switching device. In some embodiments, the switching device includes a switching transistor that selectively switches between an open position and a closed position based at least in part on a switching control signal, for example, to facilitate converting electrical power with first electrical characteristics output into electrical power with the second electrical characteristics. Additionally, the switching device includes a protection transistor electrically coupled in series with the switching transistor, in which a constant gate voltage is supplied to the protection transistor to maintain the first protection transistor in the closed position during operation of the power converter; and the protection transistor automatically limits current flow through the first switching device by reducing a gate voltage applied to the switching transistor when a short circuit is expected to be present in the electrical system.
Abstract:
A method and system for a power module is provided. The power module includes a first substrate including a first conductive substrate having a first plurality of power semiconductor switches arranged thereon, and at least one second conductive substrate electrically coupled to the first conductive substrate. A first terminal is electrically coupled to the first conductive substrate. The power module also includes a second substrate including a third conductive substrate having a second plurality of power semiconductor switches arranged thereon, and at least one fourth conductive substrate electrically coupled to the third conductive substrate. The third conductive substrate is electrically coupled to the second conductive substrate. A second terminal is electrically coupled to the fourth conductive substrate.
Abstract:
A power module includes an input bus, a switching device, and an output bus. The input bus includes a first coating of a high permeability magnetic conductive material and is configured to receive input direct current (DC) electrical power from an electrical power source. The switching device is electrically coupled to the first input bus, and is configured to selectively connect and disconnect to facilitate converting the input DC electrical power into output alternating current (AC) electrical power. The output bus includes a second coating of the high permeability magnetic conductive material, and is electrically coupled to the first switching device. The output bus is configured to supply the output AC electrical power to an electrical load.
Abstract:
A power transistor assembly and method of operating the assembly are provided. The power transistor assembly includes integrated transient voltage suppression on a single semiconductor substrate and includes a transistor formed of a wide band gap material, the transistor including a gate terminal, a source terminal, and a drain terminal, the transistor further including a predetermined maximum allowable gate voltage value, and a transient voltage suppression (TVS) device formed of a wide band gap material, the TVS device formed with the transistor as a single semiconductor device, the TVS device electrically coupled to the transistor between at least one of the gate and source terminals and the drain and source terminals, the TVS device including a breakdown voltage limitation selected to be greater than the predetermined maximum allowable gate voltage value.