公开(公告)号：US11138499B2

公开(公告)日：2021-10-05

申请号：US16147176

申请日：2018-09-28

Applicant: Intel Corporation

Inventor： Abhishek Sharma ,  Jack T. Kavalieros ,  Ian A. Young ,  Sasikanth Manipatruni ,  Ram Krishnamurthy ,  Uygar Avci ,  Gregory K. Chen ,  Amrita Mathuriya ,  Raghavan Kumar ,  Phil Knag ,  Huseyin Ekin Sumbul ,  Nazila Haratipour ,  Van H. Le

IPC: G06N3/063 ,  H01L27/108 ,  H01L27/11502 ,  G06N3/04 ,  G06F17/16 ,  H01L27/11 ,  G11C11/54 ,  G11C7/10 ,  G11C11/419 ,  G11C11/409 ,  G11C11/22

Abstract: An apparatus is described. The apparatus includes a compute-in-memory (CIM) circuit for implementing a neural network disposed on a semiconductor chip. The CIM circuit includes a mathematical computation circuit coupled to a memory array. The memory array includes an embedded dynamic random access memory (eDRAM) memory array. Another apparatus is described. The apparatus includes a compute-in-memory (CIM) circuit for implementing a neural network disposed on a semiconductor chip. The CIM circuit includes a mathematical computation circuit coupled to a memory array. The mathematical computation circuit includes a switched capacitor circuit. The switched capacitor circuit includes a back-end-of-line (BEOL) capacitor coupled to a thin film transistor within the metal/dielectric layers of the semiconductor chip. Another apparatus is described. The apparatus includes a compute-in-memory (CIM) circuit for implementing a neural network disposed on a semiconductor chip. The CIM circuit includes a mathematical computation circuit coupled to a memory array. The mathematical computation circuit includes an accumulation circuit. The accumulation circuit includes a ferroelectric BEOL capacitor to store a value to be accumulated with other values stored by other ferroelectric BEOL capacitors.

公开(公告)号：US20200212532A1

公开(公告)日：2020-07-02

申请号：US16238421

申请日：2019-01-02

Applicant: Intel Corporation

Inventor： Tanay Gosavi ,  Chia-ching Lin ,  Raseong Kim ,  Ashish Verma Penumatcha ,  Uygar Avci ,  Ian Young

IPC: H01P7/10 ,  H01L27/02 ,  H01L49/02 ,  H01P11/00

Abstract: Describe is a resonator that uses ferroelectric (FE) material in a capacitive structure. The resonator includes a first plurality of metal lines extending in a first direction; an array of capacitors comprising ferroelectric material; a second plurality of metal lines extending in the first direction, wherein the array of capacitors is coupled between the first and second plurality of metal lines; and a circuitry to switch polarization of at least one capacitor of the array of capacitors. The switching of polarization regenerates acoustic waves. In some embodiments, the acoustic mode of the resonator is isolated using phononic gratings all around the resonator using metal lines above and adjacent to the FE based capacitors.

公开(公告)号：US20160274857A1

公开(公告)日：2016-09-22

申请号：US15171833

申请日：2016-06-02

Applicant: Intel Corporation

Inventor： Johanna M. Swan ,  Uygar Avci ,  Islam A. Salama ,  Ravi Pillarisetty

IPC: G06F3/14 ,  G09G5/14 ,  G09G5/00

CPC classification number: G06F3/1446 ,  G02F1/13336 ,  G02F1/1345 ,  G09F9/3026 ,  G09F9/35 ,  G09G3/20 ,  G09G5/003 ,  G09G5/14 ,  G09G2300/026 ,  G09G2320/02 ,  G09G2340/14 ,  G09G2360/04 ,  H01L27/3293

Abstract: Embodiments of systems and methods of seamless displays are generally described herein. In some embodiments, a backpanel device comprising display drive circuitry can be removably coupled with a display device via an array of contact members. The display device can include image-producing elements or pixels that can be selectively driven by the backpanel device via corresponding portions of the array of contact members. Multiple display devices can be disposed adjacently on one or more backpanel devices such that an image displayed across the multiple display devices appears seamless.

Abstract translation: 这里通常描述无缝显示器的系统和方法的实施例。 在一些实施例中，包括显示器驱动电路的背板装置可以通过接触构件阵列可移除地与显示装置耦合。 显示装置可以包括图像产生元件或可以由背板装置通过接触构件阵列的相应部分选择性地驱动的图像。 多个显示设备可以相邻地布置在一个或多个背板设备上，使得跨越多个显示设备显示的图像看起来是无缝的。

公开(公告)号：US20240373644A1

公开(公告)日：2024-11-07

申请号：US18778857

申请日：2024-07-19

Applicant: Intel Corporation

Inventor： Nazila Haratipour ,  Sou-Chi Chang ,  Shriram Shivaraman ,  I-Cheng Tung ,  Tobias Brown-Heft ,  Devin R. Merrill ,  Che-Yun Lin ,  Seung Hoon Sung ,  Jack Kavalieros ,  Uygar Avci ,  Matthew V. Metz

IPC: H10B53/00 ,  G11C11/22 ,  H01G4/008 ,  H01L27/08 ,  H10B53/10

Abstract: An integrated circuit capacitor structure, includes a first electrode includes a cylindrical column, a ferroelectric layer around an exterior sidewall of the cylindrical column and a plurality of outer electrodes. The plurality of outer electrodes include a first outer electrode laterally adjacent to a first portion of an exterior of the ferroelectric layer and a second outer electrode laterally adjacent to a second portion of the exterior of the ferroelectric layer, wherein the second outer electrode is above the first outer electrode.

公开(公告)号：US20240222484A1

公开(公告)日：2024-07-04

申请号：US18092152

申请日：2022-12-30

Applicant: Intel Corporation

Inventor： Chia-Ching Lin ,  Kevin P. O'Brien ,  Ashish Verma Penumatcha ,  Chelsey Dorow ,  Kirby Maxey ,  Carl H. Naylor ,  Tao Chu ,  Guowei Xu ,  Uygar Avci ,  Feng Zhang ,  Ting-Hsiang Hung ,  Ande Kitamura ,  Mahmut Sami Kavrik

IPC: H01L29/76 ,  H01L21/02 ,  H01L29/06 ,  H01L29/24 ,  H01L29/423 ,  H01L29/66 ,  H01L29/775

CPC classification number: H01L29/7606 ,  H01L21/02568 ,  H01L21/02603 ,  H01L29/0673 ,  H01L29/24 ,  H01L29/42392 ,  H01L29/66969 ,  H01L29/775

Abstract: Transistors and integrated circuitry including a 2D channel material layer within a stack of material layers further including one or more insulator (e.g., dielectric) materials above and/or below the 2D channel material layer. These supporting insulator layers may be non-sacrificial while other material layers within a starting material stack may be sacrificial, replaced, for example, with gate insulator and/or gate material. In some exemplary embodiments, the 2D channel material is a metal chalcogenide and the supporting insulator layer is advantageously a dielectric material composition having a low dielectric constant.

公开(公告)号：US20240222482A1

公开(公告)日：2024-07-04

申请号：US18091192

申请日：2022-12-29

Applicant: Intel Corporation

Inventor： Kevin P. O'Brien ,  Rachel Steinhardt ,  Chelsey Dorow ,  Carl H. Naylor ,  Kirby Maxey ,  Sudarat Lee ,  Ashish Verma Penumatcha ,  Uygar Avci ,  Scott Clendenning ,  Tristan Tronic ,  Mahmut Sami Kavrik ,  Ande Kitamura

IPC: H01L29/76 ,  H01L21/02 ,  H01L29/06 ,  H01L29/24 ,  H01L29/423 ,  H01L29/66 ,  H01L29/775

CPC classification number: H01L29/7606 ,  H01L21/02568 ,  H01L21/02603 ,  H01L29/0673 ,  H01L29/24 ,  H01L29/42392 ,  H01L29/66969 ,  H01L29/775

Abstract: Devices, transistor structures, systems, and techniques are described herein related to field effect transistors having a doping layer on metal chalcogenide nanoribbons outside of the channel region. The doping layer is a metal oxide that shifts the electrical characteristics of the nanoribbons and is formed by depositing a metal and oxidizing the metal by exposure to ozone and ultraviolet light.

公开(公告)号：US20240222441A1

公开(公告)日：2024-07-04

申请号：US18091197

申请日：2022-12-29

Applicant: Intel Corporation

Inventor： Mahmut Sami Kavrik ,  Carl Naylor ,  Chelsey Dorow ,  Chia-Ching Lin ,  Dominique Adams ,  Kevin O'Brien ,  Matthew Metz ,  Scott Clendenning ,  Sudarat Lee ,  Tristan Tronic ,  Uygar Avci

IPC: H01L29/40 ,  H01L21/04 ,  H01L21/28 ,  H01L21/3213 ,  H01L21/44 ,  H01L29/423 ,  H01L29/45 ,  H01L29/786

CPC classification number: H01L29/401 ,  H01L21/043 ,  H01L21/044 ,  H01L21/28264 ,  H01L21/32136 ,  H01L21/44 ,  H01L29/42384 ,  H01L29/45 ,  H01L29/454 ,  H01L29/78648 ,  H01L29/4908

Abstract: Devices, transistor structures, systems, and techniques, are described herein related to selective gate oxide formation on 2D materials for transistor devices. A transistor structure includes a gate dielectric structure on a 2D semiconductor material layer, and source and drain structures in contact with the gate dielectric structure and on the 2D semiconductor material layer. The source and drain structures include a metal material or metal nitride material and the gate dielectric structure includes an oxide of the metal material or metal nitride material.

公开(公告)号：US11769789B2

公开(公告)日：2023-09-26

申请号：US16368450

申请日：2019-03-28

Applicant: Intel Corporation

Inventor： Nazila Haratipour ,  Chia-Ching Lin ,  Sou-Chi Chang ,  Ashish Verma Penumatcha ,  Owen Loh ,  Mengcheng Lu ,  Seung Hoon Sung ,  Ian A. Young ,  Uygar Avci ,  Jack T. Kavalieros

IPC: H01G4/30 ,  H10B51/00 ,  H01L23/522 ,  H01L49/02 ,  H01G4/012

CPC classification number: H01L28/56 ,  H01G4/012 ,  H01G4/30 ,  H01L23/5226 ,  H10B51/00

Abstract: A capacitor is disclosed. The capacitor includes a first metal layer, a second metal layer on the first metal layer, a ferroelectric layer on the second metal layer, and a third metal layer on the ferroelectric layer. The second metal layer includes a first non-reactive barrier metal and the third metal layer includes a second non-reactive barrier metal. A fourth metal layer is on the third metal layer.

公开(公告)号：US20230238444A1

公开(公告)日：2023-07-27

申请号：US18130326

申请日：2023-04-03

Applicant: Intel Corporation

Inventor： Tanay Gosavi ,  Chia-ching Lin ,  Raseong Kim ,  Ashish Verma Penumatcha ,  Uygar Avci ,  Ian Young

IPC: H01L29/51 ,  H01L27/088 ,  H01L29/78 ,  H03H9/17 ,  H01L29/423

CPC classification number: H01L29/516 ,  H01L27/0886 ,  H01L29/7851 ,  H03H9/17 ,  H01L29/78391 ,  H01L29/42356

Abstract: Describe is a resonator that uses ferroelectric (FE) materials in the gate of a transistor as a dielectric. The use of FE increases the strain/stress generated in the gate of the FinFET. Along with the usual capacitive drive, which is boosted with the increased polarization, FE material expands or contacts depending on the applied electric field on the gate of the transistor. As such, acoustic waves are generated by switching polarization of the FE materials. In some embodiments, the acoustic mode of the resonator is isolated using phononic gratings all around the resonator using the metal line above and vias' to body and dummy fins on the side. As such, a Bragg reflector is formed above the FE based transistor.

公开(公告)号：US20230100451A1

公开(公告)日：2023-03-30

申请号：US17485153

申请日：2021-09-24

Applicant: Intel Corporation

Inventor： Kirby Maxey ,  Ashish Verma Penumatcha ,  Carl Naylor ,  Chelsey Dorow ,  Kevin O?Brien ,  Shriram Shivaraman ,  Tanay Gosavi ,  Uygar Avci

IPC: H01L29/417 ,  H01L29/40 ,  H01L29/423 ,  H01L29/24

Abstract: Transistors, devices, systems, and methods are discussed related to transistors including a number of 2D material channel layers and source and drain control electrodes coupled to source and drain control regions of the 2D material channels. The source and drain control electrodes are on opposite sides of a gate electrode, which controls a channel region of the 2D material channels. The source and drain control electrodes provide for reduced contact resistance of the transistor, the ability to create complex logic gates, and other advantages.