公开(公告)号：US20180191126A1

公开(公告)日：2018-07-05

申请号：US15901388

申请日：2018-02-21

Applicant: KLA-Tencor Corporation

Inventor： Yung-Ho Chuang ,  J. Joseph Armstrong ,  Yujun Deng ,  Justin Dianhuan Liou ,  Vladimir Dribinski ,  John Fielden

IPC: H01S3/30

CPC classification number: H01S3/302 ,  G01N21/9501 ,  G02B17/0892 ,  G02F1/353 ,  G02F1/395 ,  G02F2001/354 ,  H01S3/005 ,  H01S3/0092 ,  H01S3/067 ,  H01S3/06754 ,  H01S3/10053 ,  H01S3/11 ,  H01S3/16 ,  H01S3/1643 ,  H01S3/1666 ,  H01S3/23 ,  H01S3/2308

Abstract: An optical inspection system that utilizes sub-200 nm incident light beam to inspect a surface of an object for defects is described. The sub-200 nm incident light beam is generated by combining first light having a wavelength of about 1109 nm with second light having a wavelength of approximately 234 nm. An optical system includes optical components configured to direct the incident light beam to a surface of the object, and image relay optics are configured to collect and relay at least two channels of light to a sensor, where at least one channel includes light reflected from the object, and at least one channel includes light transmitted through the object. The sensor is configured to simultaneously detect both the reflected and transmitted light. A laser for generating the sub-200 nm incident light beam includes a fundamental laser, two or more harmonic generators, a frequency doubler and a two frequency mixing stages.

公开(公告)号：US09459215B2

公开(公告)日：2016-10-04

申请号：US15010331

申请日：2016-01-29

Applicant: KLA-Tencor Corporation

Inventor： Yung-Ho Chuang ,  Vladimir Dribinski

IPC: G01N21/00 ,  G01N21/88 ,  C30B29/10 ,  C30B33/00 ,  C30B33/02 ,  G01N21/3563 ,  G01N21/59 ,  G01N21/95 ,  G01N21/35 ,  G01N21/84

CPC classification number: H01L21/3003 ,  C30B29/10 ,  C30B33/00 ,  C30B33/02 ,  G01N21/3563 ,  G01N21/59 ,  G01N21/8806 ,  G01N21/9501 ,  G01N2021/3568 ,  G01N2021/3595 ,  G01N2021/8477 ,  G01N2021/8822 ,  G01N2201/06113 ,  H01L21/322 ,  H01S3/027 ,  H01S3/094 ,  H01S3/109 ,  H01S3/1666

Abstract: A system for optically inspection one or more samples includes a sample stage, a laser system configured for illuminating a portion of the surface of the one or more samples disposed on the sample stage, and a detector configured to receive at least a portion of illumination reflected from the surface of the sample. The laser system includes an NLO crystal annealed within a selected temperature range. In addition, the NLO crystal is passivated with at least one of hydrogen, deuterium, a hydrogen-containing compound or a deuterium-containing compound to a selected passivation level. Further, the laser system includes a light source configured to generate light of a selected wavelength. The light source is configured to transmit light through the NLO crystal. The laser system includes a crystal housing unit configured to house the NLO crystal.

Abstract translation: 用于光学检查一个或多个样品的系统包括样品台，配置用于照射设置在样品台上的一个或多个样品的表面的一部分的激光系统，以及被配置为接收反射的至少一部分光的检测器 从样品的表面。 激光系统包括在所选温度范围内退火的NLO晶体。 此外，NLO晶体与氢，氘，含氢化合物或含氘化合物中的至少一种钝化至选定的钝化水平。 此外，激光系统包括被配置为产生所选波长的光的光源。 光源配置为透过NLO晶体传输光。 激光系统包括构造成容纳NLO晶体的晶体容纳单元。

公开(公告)号：US20160169815A1

公开(公告)日：2016-06-16

申请号：US15010331

申请日：2016-01-29

Applicant: KLA-Tencor Corporation

Inventor： Yung-Ho Chuang ,  Vladimir Dribinski

IPC: G01N21/88 ,  G01N21/95

CPC classification number: H01L21/3003 ,  C30B29/10 ,  C30B33/00 ,  C30B33/02 ,  G01N21/3563 ,  G01N21/59 ,  G01N21/8806 ,  G01N21/9501 ,  G01N2021/3568 ,  G01N2021/3595 ,  G01N2021/8477 ,  G01N2021/8822 ,  G01N2201/06113 ,  H01L21/322 ,  H01S3/027 ,  H01S3/094 ,  H01S3/109 ,  H01S3/1666

Abstract: A system for optically inspection one or more samples includes a sample stage, a laser system configured for illuminating a portion of the surface of the one or more samples disposed on the sample stage, and a detector configured to receive at least a portion of illumination reflected from the surface of the sample. The laser system includes an NLO crystal annealed within a selected temperature range. In addition, the NLO crystal is passivated with at least one of hydrogen, deuterium, a hydrogen-containing compound or a deuterium-containing compound to a selected passivation level. Further, the laser system includes a light source configured to generate light of a selected wavelength. The light source is configured to transmit light through the NLO crystal. The laser system includes a crystal housing unit configured to house the NLO crystal.

Abstract translation: 用于光学检查一个或多个样品的系统包括样品台，配置用于照射设置在样品台上的一个或多个样品的表面的一部分的激光系统，以及被配置为接收反射的至少一部分照度的检测器 从样品的表面。 激光系统包括在所选温度范围内退火的NLO晶体。 此外，NLO晶体与氢，氘，含氢化合物或含氘化合物中的至少一种钝化至选定的钝化水平。 此外，激光系统包括被配置为产生所选波长的光的光源。 光源配置为透过NLO晶体传输光。 激光系统包括构造成容纳NLO晶体的晶体容纳单元。

公开(公告)号：US20160099540A1

公开(公告)日：2016-04-07

申请号：US14872890

申请日：2015-10-01

Applicant: KLA-Tencor Corporation

Inventor： Yung-Ho Alex Chuang ,  J. Joseph Armstrong ,  Yujun Deng ,  Vladimir Dribinski ,  John Fielden ,  Jidong Zhang

IPC: H01S3/109 ,  H01S3/108 ,  H01S5/40 ,  G01N21/88 ,  H01S5/00 ,  G02B21/10 ,  G02B21/16 ,  G02B21/36 ,  H01S3/10 ,  H01S5/06

CPC classification number: H01F17/0006 ,  G01N21/9501 ,  G01N21/956 ,  G01N2021/95676 ,  G02B21/10 ,  G02B21/16 ,  G02B21/361 ,  G02F1/353 ,  G02F2001/3507 ,  G02F2001/354 ,  H01F17/04 ,  H01F27/292 ,  H01S3/0092 ,  H01S3/10007 ,  H01S3/10084 ,  H01S3/1083 ,  H01S3/109 ,  H01S5/0071 ,  H01S5/0085 ,  H01S5/0604 ,  H01S5/4012

Abstract: A laser assembly for generating laser output light at an output wavelength of approximately 183 nm includes a fundamental laser, an optical parametric system (OPS), a fifth harmonic generator, and a frequency mixing module. The fundamental laser generates fundamental light at a fundamental frequency. The OPS generates a down-converted signal at a down-converted frequency. The fifth harmonic generator generates a fifth harmonic of the fundamental light. The frequency mixing module mixes the down-converted signal and the fifth harmonic to produce the laser output light at a frequency equal to a sum of the fifth harmonic frequency and the down-converted frequency. The OPS generates the down-converted signal by generating a down-converted seed signal at the down-converted frequency, and then mixing the down-converted seed signal with a portion of the fundamental light. At least one of the frequency mixing, frequency conversion or harmonic generation utilizes an annealed, deuterium-treated or hydrogen-treated CLBO crystal.

Abstract translation: 用于在大约183nm的输出波长处产生激光输出光的激光组件包括基本激光器，光学参数系统（OPS），五次谐波发生器和频率混合模块。 基本激光器产生基频的基本光。 OPS以降频转换的频率产生降频转换的信号。 五次谐波发生器产生基波的五次谐波。 频率混合模块混合下变频信号和第五谐波，以产生等于五次谐波频率和下变频频率之和的频率的激光输出光。 OPS通过在下变频的频率处产生下变频的种子信号，然后将下变频的种子信号与基本光的一部分混合来产生下变频信号。 频率混合，频率转换或谐波产生中的至少一种利用退火，氘处理或氢处理的CLBO晶体。

公开(公告)号：US08929406B2

公开(公告)日：2015-01-06

申请号：US14158615

申请日：2014-01-17

Applicant: KLA-Tencor Corporation

Inventor： Yung-Ho Chuang ,  J. Joseph Armstrong ,  Vladimir Dribinski ,  Yujun Deng ,  John Fielden

IPC: H01S3/30 ,  H01S3/00 ,  G01N21/84

CPC classification number: H01S3/1083 ,  G01N21/84 ,  G01N21/9501 ,  G01N21/956 ,  G01N2021/95676 ,  G02F1/3534 ,  G02F1/3536 ,  G02F1/39 ,  G02F2001/3507 ,  G02F2201/16 ,  H01S3/0078 ,  H01S3/0092 ,  H01S3/0602 ,  H01S3/067

Abstract: A laser for generating an output wavelength of approximately 193.4 nm includes a fundamental laser, an optical parametric generator, a fourth harmonic generator, and a frequency mixing module. The optical parametric generator, which is coupled to the fundamental laser, can generate a down-converted signal. The fourth harmonic generator, which may be coupled to the optical parametric generator or the fundamental laser, can generate a fourth harmonic. The frequency mixing module, which is coupled to the optical parametric generator and the fourth harmonic generator, can generate a laser output at a frequency equal to a sum of the fourth harmonic and twice a frequency of the down-converted signal.

Abstract translation: 用于产生约193.4nm的输出波长的激光器包括基本激光器，光参量发生器，第四谐波发生器和混频模块。 耦合到基本激光器的光学参数发生器可以产生下变频信号。 可以耦合到光学参数发生器或基本激光器的第四谐波发生器可以产生四次谐波。 耦合到光参量发生器和第四谐波发生器的混频模块可产生频率等于下变频信号频率的四次谐波和两倍的频率的激光输出。

公开(公告)号：US20130313440A1

公开(公告)日：2013-11-28

申请号：US13797939

申请日：2013-03-12

Applicant: KLA-TENCOR CORPORATION

Inventor： Yung-Ho Chuang ,  J. Joseph Armstrong ,  Vladimir Dribinski ,  John Fielden

IPC: H01S3/00 ,  G01N21/88

Abstract: Improved laser systems and associated techniques generate an ultra-violet (UV) wavelength of approximately 193.368 nm from a fundamental vacuum wavelength near 1064 nm. Preferred embodiments separate out an unconsumed portion of an input wavelength to at least one stage and redirect that unconsumed portion for use in another stage. The improved laser systems and associated techniques result in less expensive, longer life lasers than those currently being used in the industry. These laser systems can be constructed with readily-available, relatively inexpensive components.

Abstract translation: 改进的激光系统和相关技术从1064nm附近的基本真空波长产生约193.368nm的紫外（UV）波长。 优选实施例将输入波长的未消耗的部分分离成至少一个级，并将该未消耗的部分重定向以用于另一级。 改进的激光系统和相关技术导致比当前在工业中使用的激光器更便宜，更长寿命的激光器。 这些激光系统可以由容易获得的相对便宜的部件构成。

公开(公告)号：US20190107766A1

公开(公告)日：2019-04-11

申请号：US16205032

申请日：2018-11-29

Applicant: KLA-Tencor Corporation

Inventor： Yung-Ho Alex Chuang ,  Xiaoxu Lu ,  Baigang Zhang ,  John Fielden ,  Vladimir Dribinski

IPC: G02F1/35 ,  G02F1/355

CPC classification number: G02F1/353 ,  G02F1/3501 ,  G02F1/3551 ,  G02F1/3558 ,  G02F2001/3503 ,  G02F2001/354 ,  G02F2201/16

Abstract: A laser assembly generates continuous wave (CW) laser output light in the range of approximately 181 nm to approximately 185 nm by generating fourth harmonic light from first fundamental CW light having a first fundamental wavelength between 1 μm and 1.1 μm, generating fifth harmonic light by mixing the fourth harmonic light with the first fundamental CW light, and then mixing the fifth harmonic light with second fundamental or signal CW light having a second wavelength between 1.26 μm and 1.82 μm. The fifth harmonic light is generated using an external cavity that circulates first fundamental CW light through a first nonlinear crystal, and by directing the fourth harmonic light through the first nonlinear crystal. The laser output light is generated using a second cavity that passes circulated second fundamental or signal CW light through a second nonlinear crystal, and directing the fifth harmonic light through the second nonlinear crystal.

公开(公告)号：US10199149B2

公开(公告)日：2019-02-05

申请号：US15659981

申请日：2017-07-26

Applicant: KLA-Tencor Corporation

Inventor： Yung-Ho Alex Chuang ,  J. Joseph Armstrong ,  Yujun Deng ,  Vladimir Dribinski ,  John Fielden ,  Jidong Zhang

IPC: H01F17/00 ,  G02F1/35 ,  G02B21/10 ,  G02B21/16 ,  G02B21/36 ,  H01S3/10 ,  H01S3/108 ,  H01S3/109 ,  H01S5/00 ,  H01S5/06 ,  H01S5/40 ,  G01N21/95 ,  G01N21/956 ,  H01F17/04 ,  H01F27/29 ,  H01S3/00

Abstract: A laser assembly for generating laser output light at an output wavelength of approximately 183 nm includes a fundamental laser, an optical parametric system (OPS), a fifth harmonic generator, and a frequency mixing module. The fundamental laser generates fundamental light at a fundamental frequency. The OPS generates a down-converted signal at a down-converted frequency. The fifth harmonic generator generates a fifth harmonic of the fundamental light. The frequency mixing module mixes the down-converted signal and the fifth harmonic to produce the laser output light at a frequency equal to a sum of the fifth harmonic frequency and the down-converted frequency. The OPS generates the down-converted signal by generating a down-converted seed signal at the down-converted frequency, and then mixing the down-converted seed signal with a portion of the fundamental light. At least one of the frequency mixing, frequency conversion or harmonic generation utilizes an annealed, deuterium-treated or hydrogen-treated CLBO crystal.

公开(公告)号：US09972959B2

公开(公告)日：2018-05-15

申请号：US15176346

申请日：2016-06-08

Applicant: KLA-Tencor Corporation

Inventor： Yung-Ho Chuang ,  J. Joseph Armstrong ,  Justin Dianhuan Liou ,  Vladimir Dribinski ,  David L. Brown

IPC: G02B5/30 ,  H01S3/00 ,  G02B27/28 ,  H01S3/083 ,  G01N21/21 ,  G01N21/95 ,  G02B5/08

CPC classification number: H01S3/0057 ,  G01N21/21 ,  G01N21/9501 ,  G01N2201/06113 ,  G01N2201/0683 ,  G01N2201/0697 ,  G02B5/0816 ,  G02B5/3083 ,  G02B27/281 ,  G02B27/283 ,  G02B27/286 ,  H01S3/083

Abstract: A pulse multiplier includes a polarizing beam splitter, a wave plate, and a set of multi-surface reflecting components (e.g., one or more etalons and one or more mirrors). The polarizing beam splitter passes input laser pulses through the wave plate to the multi-surface reflecting components, which reflect portions of each input laser pulse back through the wave plate to the polarizing beam splitter. The polarizing beam splitter reflects each reflected portion to form an output of the pulse multiplier. The multi-surface reflecting components are configured such that the output pulses exiting the pulse multiplier have an output repetition pulse frequency rate that is at least double the input repetition pulse frequency.

公开(公告)号：US20160365693A1

公开(公告)日：2016-12-15

申请号：US15249096

申请日：2016-08-26

Applicant: KLA-Tencor Corporation

Inventor： Yung-Ho Alex Chuang ,  J. Joseph Armstrong ,  Vladimir Dribinski ,  John Fielden

IPC: H01S3/00 ,  H01S3/23 ,  G01N21/956 ,  H01S3/16 ,  G01N21/88

Abstract: Improved inspection systems utilize laser systems and associated techniques to generate an ultra-violet (UV) wavelength of approximately 193.368 nm from a fundamental vacuum wavelength near 1063.5 nm. Preferred embodiments separate out an unconsumed portion of an input wavelength to at least one stage and redirect that unconsumed portion for use in another stage. The improved laser systems and associated techniques result in less expensive, longer life lasers than those currently being used in the industry. These laser systems can be constructed with readily-available, relatively inexpensive components.

Abstract translation: 改进的检查系统利用激光系统和相关技术从1063.5nm附近的基本真空波长产生约193.368nm的紫外（UV）波长。 优选实施例将输入波长的未消耗的部分分离成至少一个级，并将该未消耗的部分重定向以用于另一级。 改进的激光系统和相关技术导致比当前在工业中使用的激光器更便宜，更长寿命的激光器。 这些激光系统可以由容易获得的相对便宜的部件构成。