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    Alignment and registration targets for charged particle beam substrate patterning and inspection
    14.
    发明授权
    Alignment and registration targets for charged particle beam substrate patterning and inspection 有权

    公开(公告)号：US10026589B1

    公开(公告)日：2018-07-17

    申请号：US15454872

    申请日：2017-03-09

    申请人： Multibeam Corporation

    发明人： Kevin M. Monahan ,  Michael C. Smayling ,  Theodore A. Prescop ,  David K. Lam

    IPC分类号： H01J37/22 ,  H01J37/304 ,  H01J37/317 ,  H01J37/30 ,  H01J37/20

    摘要： The present application discloses methods, systems and devices for using charged particle beam tools to pattern and inspect a substrate. The inventors have discovered that it is highly advantageous to use patterns generated using the Hadamard transform as alignment and registration marks (Hadamard targets) for multiple-column charged particle beam substrate processing and inspection tools. Hadamard targets can be written to a substrate using charged particle beams performing, for example, resist-based lithography or resist-less direct processing. High-order Hadamard targets can also be patterned and imaged to obtain superior column performance metrics for applications such as super-rapid beam calibration DOE, column matching, and column performance tracking. Hadamard target blocks can be written highly locally to electrically functional pattern portions, or integrated into said pattern portions, thereby enabling re-registration local and contemporaneous to writing and improving beam targeting accuracy following re-registration. Superior alignment and registration, and column parameter optimization, allow significant yield gains.

    Alignment and registration targets for multiple-column charged particle beam lithography and inspection
    16.
    发明授权
    Alignment and registration targets for multiple-column charged particle beam lithography and inspection 有权
    多列带电粒子束光刻和检查的对准和配准目标

    公开(公告)号：US09595419B1

    公开(公告)日：2017-03-14

    申请号：US14522563

    申请日：2014-10-23

    申请人： Multibeam Corporation

    发明人： Kevin M. Monahan ,  Michael C. Smayling ,  Theodore A. Prescop ,  David K. Lam

    IPC分类号： H01J37/22 ,  H01J37/26

    CPC分类号： H01J37/3045 ,  G03F1/42 ,  G03F1/86 ,  G03F9/7076 ,  G03F9/7084 ,  H01J37/222 ,  H01J37/261 ,  H01J37/265 ,  H01J37/3005 ,  H01J37/3177 ,  H01J2237/063 ,  H01J2237/2611 ,  H01J2237/2826 ,  H01J2237/30444 ,  H01J2237/31762 ,  H01J2237/31764 ,  H01J2237/31774

    摘要： The present application discloses methods, systems and devices for using charged particle beam tools to pattern and inspect a substrate. The inventors have discovered that it is highly advantageous to use patterns generated using the Hadamard transform as alignment and registration marks (Hadamard targets) for multiple-column charged particle beam lithography and inspection tools. Further, superior substrate alignment and layer-to-layer pattern registration accuracy can be achieved using Hadamard targets patterned in edge-proximal portions of the substrate that are typically stripped bare of resist prior to lithography, in addition to Hadamard targets patterned in inner substrate portions. High-order Hadamard targets can also be patterned and imaged to obtain superior column performance metrics for applications such as super-rapid beam calibration DOE, column matching, and column performance tracking. Superior alignment and registration, and column parameter optimization, allow significant yield gains.

    摘要翻译： 本申请公开了使用带电粒子束工具来图案化和检查衬底的方法，系统和装置。 本发明人已经发现使用Hadamard变换产生的图案作为用于多列带电粒子束光刻和检查工具的对准和对准标记（Hadamard靶）是非常有利的。 此外，除了在内部衬底部分中图案化的Hadamard靶之外，还可以使用在光刻之前通常剥离光刻胶的基板的边缘近端部分图案化的Hadamard靶，从而实现优异的衬底对准和层间图案配准精度 。 高阶Hadamard靶也可以进行图案化和成像，以获得诸如超快速光束校准DOE，色谱柱匹配和色谱柱性能跟踪等应用的卓越色谱柱性能指标。 优异的对齐和注册以及列参数优化，可显着提高收益。

    Alignment and registration targets for multiple-column charged particle beam lithography and inspection
    17.
    发明授权
    Alignment and registration targets for multiple-column charged particle beam lithography and inspection 有权
    多列带电粒子束光刻和检查的对准和配准目标

    公开(公告)号：US09478395B1

    公开(公告)日：2016-10-25

    申请号：US14523909

    申请日：2014-10-26

    申请人： Multibeam Corporation

    发明人： Kevin M. Monahan ,  Michael C. Smayling ,  Theodore A. Prescop ,  David K. Lam

    IPC分类号： G06F17/50 ,  H01J37/317 ,  H01J37/26 ,  H01J37/30

    CPC分类号： H01J37/3045 ,  G03F1/42 ,  G03F1/86 ,  G03F9/7076 ,  G03F9/7084 ,  H01J37/222 ,  H01J37/261 ,  H01J37/265 ,  H01J37/3005 ,  H01J37/3177 ,  H01J2237/063 ,  H01J2237/2611 ,  H01J2237/2826 ,  H01J2237/30444 ,  H01J2237/31762 ,  H01J2237/31764 ,  H01J2237/31774

    摘要： The present application discloses methods, systems and devices for using charged particle beam tools to pattern and inspect a substrate. The inventors have discovered that it is highly advantageous to use patterns generated using the Hadamard transform as alignment and registration marks (Hadamard targets) for multiple-column charged particle beam lithography and inspection tools. Further, superior substrate alignment and layer-to-layer pattern registration accuracy can be achieved using Hadamard targets patterned in edge-proximal portions of the substrate that are typically stripped bare of resist prior to lithography, in addition to Hadamard targets patterned in inner substrate portions. High-order Hadamard targets can also be patterned and imaged to obtain superior column performance metrics for applications such as super-rapid beam calibration DOE, column matching, and column performance tracking. Superior alignment and registration, and column parameter optimization, allow significant yield gains.

    摘要翻译： 本申请公开了使用带电粒子束工具来图案化和检查衬底的方法，系统和装置。 本发明人已经发现使用Hadamard变换产生的图案作为用于多列带电粒子束光刻和检查工具的对准和对准标记（Hadamard靶）是非常有利的。 此外，除了在内部衬底部分中图案化的Hadamard靶之外，还可以使用在光刻之前通常剥离光刻胶的基板的边缘近端部分图案化的Hadamard靶，从而实现优异的衬底对准和层间图案配准精度 。 高阶Hadamard靶也可以进行图案化和成像，以获得诸如超快速光束校准DOE，色谱柱匹配和色谱柱性能跟踪等应用的卓越色谱柱性能指标。 优异的对齐和注册以及列参数优化，可显着提高收益。

    Secure permanent integrated circuit personalization
    18.
    发明授权
    Secure permanent integrated circuit personalization 有权

    公开(公告)号：US10312091B1

    公开(公告)日：2019-06-04

    申请号：US15260987

    申请日：2016-09-09

    申请人： Multibeam Corporation

    发明人： Michael C. Smayling ,  David K. Lam

    IPC分类号： H01L21/263 ,  G06F21/60 ,  H04L9/30 ,  H01L23/00 ,  H01L21/3065 ,  H01L23/544

    摘要： Methods, systems and devices for using charged particle beams (CPBs) to write different die-specific, non-volatile, electronically readable data to different dies on a substrate. CPBs can fully write die-specific data within the chip interconnect structure during the device fabrication process, at high resolution and within a small area, allowing one or multiple usefully-sized values to be securely written to service device functions. CPBs can write die-specific data in areas readable or unreadable through a (or any) communications bus. Die-specific data can be used for, e.g.: encryption keys; communications addresses; manufacturing information (including die identification numbers); random number generator improvements; or single, nested, or compartmentalized security codes. Die-specific data and locations for writing die-specific data can be kept in encrypted form when not being written to the substrate to conditionally or permanently prevent any knowledge of said data and locations.