Abstract:
A mask for photolithography includes: a transparent substrate; a phase shift pattern on the transparent substrate and configured to change a phase of light; a dielectric layer on the transparent substrate; and a negative refractive-index meta material layer on the dielectric layer.
Abstract:
A chemically amplified photoresist composition is provided which includes: a solute including a novolac resin with an acid decomposable protecting group, a photoacid generator, and an organic solvent.
Abstract:
A display device includes a substrate including a first region and a second region, a gate line and a data line on the substrate, a thin film transistor on the substrate, being connected to the gate line and the data line, and a pixel electrode connected to the thin film transistor, wherein the second region has a second contact hole of which an area is larger than that of a first contact hole of the first region.
Abstract:
A photoresist composition includes an acid-labile polymer that is decomposable by reaction with an acid, a photoacid generator, an organic base having a pKa value of 9 or less and a solvent. Based on 100 parts by weight of the acid-labile polymer, the photoacid generator is about 1 to about 30 parts by weight, and the organic base is about 0.1 to about 5 parts by weight. The solvent is about 50 to about 90 wt % based on the total weight of the composition.
Abstract:
A cleaning composition includes about 0.01 to about 5 wt % of a chelating agent; about 0.01 to about 0.5 wt % of an organic acid; about 0.01 to about 1.0 wt % of an inorganic acid; about 0.01 to about 5 wt % of an alkali compound; and deionized water.
Abstract:
A phase shift device includes a phase shift mask which includes a transparent substrate, and a phase shift pattern which is provided on the transparent substrate, and includes a first area having a first thickness, a second area having a second thickness which is less than the first thickness, a first opening having a first opening width and defined at the first area, and a second opening having a second opening width and defined at the second area.
Abstract:
A method of manufacturing a pattern includes forming a pattern material layer on a substrate, forming a protective layer on the pattern material layer, forming a resist layer on the protective layer, selectively exposing the resist layer to light, and developing the selectively exposed resist layer.
Abstract:
A photo mask includes a transparent substrate and a mask pattern. The mask pattern is disposed on the transparent substrate. The mask pattern includes a blocking portion for blocking light and a transmitting portion for transmitting the light. The transmitting portion is adjacent to the blocking portion. The blocking portion includes a first blocking layer, a photo guide layer and a second blocking layer. The first blocking layer is disposed on the transparent substrate. The first blocking layer transmits a portion of the light. The first blocking layer includes a plurality of blocking patterns including a first blocking material. The photo guide layer is disposed on the first blocking layer. The photoguide layer guides the transmitted portion of the light to a side surface of the photoguide layer. The second blocking layer reflects the transmitted portion of the light.
Abstract:
In a display panel, a thin film transistor is connected to a gate line and a data line, and includes a gate electrode, a semiconductor pattern, a source electrode and a drain electrode. An organic pattern makes contact with a side surface of the data line and a side surface of the thin film transistor, and the organic pattern overlaps pixel areas of the display panel. A first passivation layer is on the data line, the thin film transistor and the organic pattern. A common electrode is on the first passivation layer, and the common electrode overlaps the pixel areas. A second passivation layer covers the common electrode. A pixel electrode is on the second passivation layer, the pixel electrode overlaps the common electrode, and the pixel electrode is electrically connected to the drain electrode through a first contact hole and the data line through a second contact hole.
Abstract:
A method of manufacturing a liquid crystal display panel. The method includes: preparing a substrate; forming a sacrificial pattern including a negative photoresist material on the substrate; forming a loop portion to cover top and side surfaces of the sacrificial pattern and to expose one side surface of the sacrificial pattern; forming a cavity defined as a predetermined region in the loop portion by performing a strip process on the exposed side surface of the sacrificial pattern by using (utilizing) a strip solution and removing the sacrificial pattern; forming a liquid crystal layer by injecting liquid crystal in the cavity; and forming a blocking member to cover a surface of the cavity into which the liquid crystal is injected.