Abstract:
A system configured for detecting electrical overstress events within an integrated circuit includes a comparator configured to determine whether a monitored voltage level of a monitored signal exceeds an overstress reference voltage level. The overstress reference voltage level is a predetermined amount of voltage above a nominal voltage level for the monitored signal. The system further includes a write circuit coupled to an output of the comparator. The write circuit is configured to indicate an occurrence of an electrical overstress event within the integrated circuit responsive to the comparator determining that the monitored voltage level exceeds the overstress reference voltage level.
Abstract:
A master-slave flip-flop implemented in an integrated circuit comprises a master latch coupled to receive data at an input; and a slave latch coupled to an output of the master latch, wherein the slave latch comprises an SEU-enhanced latch, and the master latch is not enhanced for SEU protection. A method of implementing a master-slave flip-flop in an integrated circuit is also described.
Abstract:
A semiconductor device includes a first under-bump metallization (UBM) layer disposed over a bond pad, a dielectric layer above an interconnect layer having a via exposing at least a portion of the first UBM layer. A second UBM layer is disposed above the first UBM layer and forms a UBM bucket over the via. The first UBM layer and UBM bucket are configured to support a solder ball and can advantageously block all alpha particles emitted by the solder ball having a relevant angle of incidence from reaching the active semiconductor regions of the IC. Thus, soft errors, such as single event upsets in memory cells, are reduced or eliminated.
Abstract:
A circuit includes a complimentary metal-oxide semiconductor (CMOS) storage element implemented within a p-type substrate and an n-well implemented within the p-type substrate that is independent of the storage element. The n-well and the storage element are separated by a minimum distance in which the p-type substrate includes no n-well.
Abstract:
Examples described herein provide for single event latch-up (SEL) mitigation techniques. In an example, a circuit includes a semiconductor substrate, a first transistor, a second transistor, and a ballast resistor. The semiconductor substrate comprises a p-doped region and an n-doped region. The first transistor comprises an n+ doped source region disposed in the p-doped region of the semiconductor substrate. The second transistor comprises a p+ doped source region disposed in the n-doped region of the semiconductor substrate. The p+ doped source region, the n-doped region, the p-doped region, and the n+ doped source region form a PNPN structure. The ballast resistor is electrically connected in series with the PNPN structure between a power node and a ground node.
Abstract:
A circuit for storing data in an integrated circuit is described. The circuit comprises an input adapted to receive the data; a memory element coupled to the input, the memory element comprising a storage node for storing the data; at least one node that is separate from the storage node for storing the data; and at least a portion of a dummy transistor coupled to the at least one node that is separate from the storage node for storing the data. A method of storing data in an integrated circuit is also described.
Abstract:
FinFET, P-N junctions and methods for forming the same are described herein. In one example, a FinFET transistor is described that includes a fin having a channel region wrapped by a gate, the channel region connecting a source and a drain. A first isolation layer is disposed on a first side of the in and a second isolation layer is disposed on a second side of the fin, where the second side is opposite of the first side. The second oxide isolation layer has a thickness greater than a thickness of the first isolation layer.
Abstract:
Methods and apparatus are described for detecting both single event latch-up (SEL) and electrical overvoltage stress (EOS) using a single, reconfigurable detection circuit. One example circuit capable of detecting a latch-up state and an overvoltage condition generally includes an impedance element coupled to a power supply node; a voltage divider coupled to the power supply node; a multiplexer having a first input coupled to a tap of the voltage divider, a second input coupled to a first portion of the impedance element, and a third input coupled to a second portion of the impedance element; a reference generator; and an analog-to-digital converter (ADC) having a first input coupled to an output of the multiplexer and a second input coupled to an output of the reference generator.
Abstract:
A circuit for storing data in an integrated circuit is described. The circuit comprises an inverter comprising a first transistor having a first gate configured to receive input data and a first output configured to generate a first inverted data output and a second transistor having a second gate configured to receive the input data and a second output configured to generate a second inverted data output; a first pass gate coupled to the first output of the inverter; a second pass gate coupled to the second output of the inverter; and a storage element having an input coupled to receive an output of the first pass gate and an output of the second pass gate. A method of storing data in an integrated circuit is also described.
Abstract:
A wafer includes a first interposer having a first patterned metal layer and a second interposer having a second patterned metal layer. The wafer includes a metal connection in a scribe region of the wafer that electrically couples the first patterned metal layer of the first interposer with the second patterned metal layer of the second interposer forming a global wafer network. The wafer further includes a probe pad located in the scribe region that is electrically coupled to the global wafer network.