公开(公告)号：US20120235036A1

公开(公告)日：2012-09-20

申请号：US13420731

申请日：2012-03-15

Applicant: Masahiro Hatakeyama ,  Shoji Yoshikawa ,  Takeshi Murakami ,  Kenji Watanabe ,  Yoshihiko Naito ,  Yasushi Toma ,  Tsutomu Karimata ,  Takehide Hayashi ,  Kiwamu Tsukamoto ,  Tatsuya Kohama ,  Noboru Kobayashi

Inventor： Masahiro Hatakeyama ,  Shoji Yoshikawa ,  Takeshi Murakami ,  Kenji Watanabe ,  Yoshihiko Naito ,  Yasushi Toma ,  Tsutomu Karimata ,  Takehide Hayashi ,  Kiwamu Tsukamoto ,  Tatsuya Kohama ,  Noboru Kobayashi

IPC: G01N23/225

CPC classification number: H01J37/073 ,  G01N23/22 ,  G01N23/223 ,  G01N23/2251 ,  G01N2223/611 ,  H01J1/34 ,  H01J37/09 ,  H01J37/10 ,  H01J37/20 ,  H01J37/222 ,  H01J37/244 ,  H01J37/265 ,  H01J37/28 ,  H01J37/29 ,  H01J2237/0048 ,  H01J2237/022 ,  H01J2237/032 ,  H01J2237/038 ,  H01J2237/045 ,  H01J2237/0458 ,  H01J2237/0473 ,  H01J2237/0492 ,  H01J2237/061 ,  H01J2237/06333 ,  H01J2237/166 ,  H01J2237/186 ,  H01J2237/2002 ,  H01J2237/2007 ,  H01J2237/2008 ,  H01J2237/2448 ,  H01J2237/2482 ,  H01J2237/2485 ,  H01J2237/2817 ,  H01J2237/2855 ,  H01J2237/2857

Abstract: An inspection device for inspecting a surface of an inspection object using a beam includes a beam generator capable of generating one of either charge particles or an electromagnetic wave as a beam, a primary optical system capable of guiding and irradiating the beam to the inspection object supported within a working chamber, a secondary optical system capable of including a first movable numerical aperture and a first detector which detects secondary charge particles generated from the inspection object, the secondary charge particles passing through the first movable numerical aperture, an image processing system capable of forming an image based on the secondary charge particles detected by the first detector; and a second detector arranged between the first movable numerical aperture and the first detector and which detects a location and shape at a cross over location of the secondary charge particles generated from the inspection object.

Abstract translation: 用于使用光束检查检查对象的表面的检查装置包括能够产生电荷粒子或电磁波之一作为光束的光束发生器，能够将所述光束引导并照射到被检查对象的主光学系统 在工作室内，能够包括第一可移动数值孔径的二次光学系统和检测从检查对象产生的二次电荷粒子的第一检测器，通过第一可移动数值孔径的二次电荷粒子，能够 基于由所述第一检测器检测到的次级电荷粒子形成图像; 以及第二检测器，其布置在第一可移动数值孔径和第一检测器之间，并且检测在从检查对象生成的次级充电颗粒的交叉位置处的位置和形状。

公开(公告)号：US20090127473A1

公开(公告)日：2009-05-21

申请号：US11920420

申请日：2005-11-18

Applicant: Kenjiro Kimura ,  Kei Kobayashi ,  Hirofumi Yamada ,  Kazumi Matsushige

Inventor： Kenjiro Kimura ,  Kei Kobayashi ,  Hirofumi Yamada ,  Kazumi Matsushige

IPC: H01J3/14 ,  A61N5/00

CPC classification number: H01J37/3175 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/073 ,  H01J37/3174 ,  H01J2237/06333 ,  H01J2237/06358 ,  H01J2237/31779 ,  H01J2237/31794

Abstract: An electron beam irradiation device of the present invention includes: a projector 8 for generating a two-dimensional light pattern 13; a microchannel plate 11 for (i) generating an electron beam array based on the light pattern 13 having entered, (ii) amplifying the electron beam array, and (iii) emitting the electron beam array as an amplified electron beam array 14; and an electron beam lens section 12 for converging the amplified electron beam array 14. This electron beam irradiation device is capable of manufacturing a semiconductor device whose performance is improved through a finer processing by means of irradiation using an electron beam. Further, the electron beam irradiation device allows cost reduction, because the device allows collective irradiation using a two dimensional pattern.

Abstract translation: 本发明的电子束照射装置包括：用于产生二维光图案13的投影仪8; 微通道板11，用于（i）基于已经进入的光图案13产生电子束阵列，（ii）放大电子束阵列，和（iii）发射电子束阵列作为放大的电子束阵列14; 以及用于会聚放大电子束阵列14的电子束透镜部分12.该电子束照射装置能够通过使用电子束的照射通过更精细的处理来制造其性能得到改善的半导体器件。 此外，电子束照射装置允许成本降低，因为该装置允许使用二维图案的集体照射。

公开(公告)号：US07446474B2

公开(公告)日：2008-11-04

申请号：US11090094

申请日：2005-03-25

Applicant: Juan Ramon Maldonado ,  Francisco J. Machuca ,  Steven T. Coyle

Inventor： Juan Ramon Maldonado ,  Francisco J. Machuca ,  Steven T. Coyle

IPC: H01J40/06

CPC classification number: H01J1/34 ,  B82Y10/00 ,  B82Y40/00 ,  H01J3/021 ,  H01J9/12 ,  H01J37/073 ,  H01J37/3177 ,  H01J2237/06333 ,  H01J2237/31762 ,  H01J2237/31774 ,  H01J2237/31779

Abstract: A photocathode is capable of generating an electron beam from incident light. The photocathode comprises a light permeable support having a light receiving surface and an opposing surface. A Group III nitride layer is provided on the opposing surface of the support. The Group III nitride layer comprises at least one Group III element and nitrogen. An alkali halide layer is provided on the Group III nitride layer. The alkali halide can be a cesium halide, such as cesium bromide or iodide.

Abstract translation: 光电阴极能够从入射光产生电子束。 光电阴极包括具有光接收表面和相对表面的透光性支撑体。 在载体的相对表面上设置III族氮化物层。 III族氮化物层包含至少一种III族元素和氮。 在III族氮化物层上设置碱金属卤化物层。 碱金属卤化物可以是卤化铯，如溴化铯或碘化物。

公开(公告)号：US07019312B2

公开(公告)日：2006-03-28

申请号：US10600953

申请日：2003-06-20

Applicant: Pieter Kruit

Inventor： Pieter Kruit

IPC: G21G5/00 ,  H01L29/06

CPC classification number: H01J37/065 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/073 ,  H01J37/3174 ,  H01J2237/06333 ,  H01J2237/24514

Abstract: The present invention relates to a lithography system comprising: means for generating a plurality of light beamlets, and an electron source, arranged to be illuminated by said light beamlets, said electron source comprising a plurality of converter elements at an element distance from each other for converting a light beamlet impinging onto it into an electron beamlet directed towards and focussed on an object plane, said lithography system further comprising control means for manipulating the mutual positions of the light beamlets with respect to the converter elements. These control means can be of optical, thermal, mechanical or magnetical nature, and work on for instance the micro lens array, the converter plate, and the mask.

Abstract translation: 光刻系统技术领域本发明涉及一种光刻系统，包括：用于产生多个光束的装置和被所述光束照射的电子源，所述电子源包括彼此间距离的多个转换器元件， 将照射到其上的光束转换成指向并聚焦在物平面上的电子束，所述光刻系统还包括用于操纵光束相对于转换器元件的相互位置的控制装置。 这些控制装置可以具有光学，热学，机械或磁性，并且例如工作在微透镜阵列，转换器板和掩模上。

公开(公告)号：US20030178583A1

公开(公告)日：2003-09-25

申请号：US10392228

申请日：2003-03-18

Inventor： Bert Jan Kampherbeek ,  Marco Jan-Jaco Wieland ,  Pieter Kruit

IPC: G21G005/00 ,  H01L029/06 ,  H01L029/12 ,  G21K005/04 ,  G03F007/20

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  G03F7/70375 ,  H01J1/304 ,  H01J1/34 ,  H01J37/073 ,  H01J37/3175 ,  H01J2201/317 ,  H01J2237/06333 ,  H01J2237/31779

Abstract: The present invention relates to the use of an electron source in a lithography system for producing a plurality of electron beams directed towards an object to be processed, said electron source comprising a plurality of field emitters, characterized in that said electron source comprises a semiconductor layer with a plurality of tips, said use including the steps of: producing a plurality of light spots on said electron source, producing one light spot on one field emitter; exciting electrons to a conduction band (Ec) by light from a light spot within said field emitter by a photo-electric effect; accelerating said electrons in said conduction band (Ec) towards said tips and tunnelling them outside tips in order to generate electrons for said plurality of electron beams, causing tips to generate electrons for said electron beam having a spot smaller than 100 nm on an object to be processed, each spot of light triggering an electron beam from one tip.

Abstract translation: 本发明涉及在光刻系统中使用电子源来制造指向待处理物体的多个电子束，所述电子源包括多个场致发射体，其特征在于，所述电子源包括半导体层 具有多个尖端，所述用途包括以下步骤：在所述电子源上产生多个光点，在一个场发射器上产生一个光斑; 通过光电效应使来自所述场发射器内的光点的光激发电子到导带（Ec）; 将所述导带（Ec）中的所述电子加速朝向所述尖端并将其隧穿到外部尖端，以便为所述多个电子束产生电子，从而使得针对具有小于100nm的点的所述电子束产生电子， 被处理，每个光点从一个尖端触发电子束。

公开(公告)号：US5932966A

公开(公告)日：1999-08-03

申请号：US987397

申请日：1997-12-09

Applicant: James E. Schneider ,  Kenneth A. Costello ,  Mark A. McCord ,  R. Fabian Pease ,  Aaron W. Baum

Inventor： James E. Schneider ,  Kenneth A. Costello ,  Mark A. McCord ,  R. Fabian Pease ,  Aaron W. Baum

IPC: H01J40/06 ,  G03F7/20 ,  H01J3/02 ,  H01J27/04 ,  H01J37/073 ,  H01J37/075 ,  H01J40/16

CPC classification number: G03F7/70375 ,  H01J27/04 ,  H01J3/021 ,  H01J37/073 ,  H01J37/075 ,  H01J40/16 ,  H01J2201/3423 ,  H01J2237/06333 ,  H01J2237/31779

Abstract: An electron source includes a negative electron affinity photocathode on a light-transmissive substrate and a light beam generator for directing a light beam through the substrate at the photocathode for exciting electrons into the conduction band. The photocathode has at least one active area for emission of electrons with dimensions of less than about two micrometers. The electron source further includes electron optics for forming the electrons into an electron beam and a vacuum enclosure for maintaining the photocathode at high vacuum. The photocathode is patterned to define emission areas. A patterned mask may be located on the emission surface of the active layer, may be buried within the active layer or may be located between the active layer and the substrate.

Abstract translation: 电子源包括透光性基板上的负电子亲合性光电阴极和光束发生器，用于将光束引导到光电阴极处的基板，用于将电子激发到导带中。 光电阴极具有用于发射尺寸小于约两微米的电子的至少一个有源面积。 电子源还包括用于将电子形成电子束的电子光学器件和用于将光电阴极保持在高真空的真空外壳。 图案化光电阴极以限定发射区域。 图案化掩模可以位于有源层的发射表面上，可以被掩埋在有源层内或者可以位于有源层和衬底之间。

公开(公告)号：US4460831A

公开(公告)日：1984-07-17

申请号：US525514

申请日：1983-08-22

Applicant: Peter E. Oettinger ,  Chunghsin Lee

Inventor： Peter E. Oettinger ,  Chunghsin Lee

IPC: H01J9/12 ,  H01J37/073 ,  H01J37/317 ,  G21K5/04 ,  H01J40/06 ,  H01J40/16

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  H01J37/073 ,  H01J37/3174 ,  H01J9/12 ,  H01J2201/3423 ,  H01J2201/3426 ,  H01J2237/061 ,  H01J2237/06333 ,  H01J2237/31779

Abstract: An electron beam generator particularly adapted for direct-write semiconductor lithography applications is disclosed which includes a photoemissive cathode, a modulable laser for illuminating the photoemissive cathode, and light optics to create an optical pattern on the cathode. The photoemissive cathode is composed of a light transmissive substrate onto which is deposited an optically semitransparent, electrically conductive film. This film in turn is coated with a thin layer of a photoemissive substance such as cesium antimonide so that the photoemissive cathode emits an intense and substantially monochromatic beam of electrons upon laser light illumination. The emitted electron beam is configured in accordance with the optical pattern created on the cathode, and in passing through successive electron optical devices is further shaped and sized for use, for example, in lithographically generating very large scale integrated (VLSI) circuits on semiconductors.

Abstract translation: 公开了一种特别适用于直写半导体光刻应用的电子束发生器，其包括光发射阴极，用于照射光发射阴极的可调激光器，以及用于在阴极上产生光学图案的光学光学器件。 光发射阴极由其上沉积有光学半透明导电膜的透光基板组成。 该薄膜依次涂覆有诸如锑化锑的光发射物质的薄层，使得在激光照明下，光发射阴极发射强烈且基本上单色的电子束。 发射的电子束根据在阴极上产生的光学图案来配置，并且通过连续的电子光学器件进一步成型和定尺寸以用于例如在半导体上平版印刷生成非常大规模的集成（VLSI）电路。

公开(公告)号：US09881762B2

公开(公告)日：2018-01-30

申请号：US14976083

申请日：2015-12-21

Applicant: International Business Machines Corporation

Inventor： Ravi K. Bonam

IPC: H01J1/34 ,  H01J37/073 ,  H01J9/12 ,  H01J37/317

CPC classification number: H01J1/34 ,  H01J9/12 ,  H01J37/073 ,  H01J37/3174 ,  H01J2237/06333 ,  H01J2237/31774 ,  H01J2237/31779

Abstract: A scalable, integrated multi-level photoemitter device of tapered design and method of manufacture using conventional CMOS manufacturing techniques. The photoemitter device has a tapered multi-level structure formed in a material layer of a substrate, each level comprising a layer of photoemissive material and a connecting portion, said connecting portion for connecting to an adjacent photoemissive material layer of a next successive level. A first photoemissive material layer of a first level is of a configuration having a first length or width dimension; and each successive layer includes a photoemissive material layer of successively smaller length or width dimensions

公开(公告)号：US20160181050A1

公开(公告)日：2016-06-23

申请号：US14976083

申请日：2015-12-21

Applicant: International Business Machines Corporation

Inventor： Ravi K. Bonam

IPC: H01J1/34 ,  H01J9/12

CPC classification number: H01J1/34 ,  H01J9/12 ,  H01J37/073 ,  H01J37/3174 ,  H01J2237/06333 ,  H01J2237/31774 ,  H01J2237/31779

Abstract: A scalable, integrated multi-level photoemitter device of tapered design and method of manufacture using conventional CMOS manufacturing techniques. The photoemitter device has a tapered multi-level structure formed in a material layer of a substrate, each level comprising a layer of photoemissive material and a connecting portion, said connecting portion for connecting to an adjacent photoemissive material layer of a next successive level. A first photoemissive material layer of a first level is of a configuration having a first length or width dimension; and each successive layer includes a photoemissive material layer of successively smaller length or width dimensions

Abstract translation: 采用传统CMOS制造技术的可扩展的集成多级光电发生器，采用锥形设计和制造方法。 光发射器装置具有形成在衬底的材料层中的锥形多层结构，每层包括一层光发射材料和连接部分，所述连接部分用于连接到下一个连续级别的相邻发光材料层。 第一级的第一光发射材料层是具有第一长度或宽度尺寸的构造; 并且每个连续层包括连续更小的长度或宽度尺寸的光发射材料层

公开(公告)号：US09263229B2

公开(公告)日：2016-02-16

申请号：US14378386

申请日：2013-02-15

Applicant: Arnaud Arbouet ,  Florent Houdellier

Inventor： Arnaud Arbouet ,  Florent Houdellier

IPC: G21K5/04 ,  H01J37/073 ,  H01J37/26 ,  H01J37/285

CPC classification number: H01J37/073 ,  H01J37/26 ,  H01J37/285 ,  H01J2237/022 ,  H01J2237/0432 ,  H01J2237/049 ,  H01J2237/06333 ,  H01J2237/06341 ,  H01J2237/21 ,  H01J2237/2614 ,  H01J2237/2626 ,  H01J2237/2802

Abstract: A device and method for emitting electrons by a field effect. The device (10) includes a vacuum chamber (12) including a tip (14) having an end (18) and forming a cold cathode, an extracting anode (16), components adapted for generating a potential difference between the tip (14) and the anode (16); an electromagnetic wave source (22) outside the chamber (12); a system (24) for forwarding the electromagnetic wave emitted by the electromagnetic wave source from the outside to the inside of the chamber as far as the vicinity of the tip (14); a system (26) for focusing the electromagnetic wave, laid out inside the chamber (12); and a system (28) for aligning the electromagnetic wave outside the chamber and adapted for allowing alignment of the electromagnetic wave focused by the focusing system on the end of the tip.

Abstract translation: 一种通过场效应发射电子的装置和方法。 装置（10）包括一个真空室（12），该真空室包括具有端部（18）并形成冷阴极的尖端（14），提取阳极（16），适于产生尖端（14） 和阳极（16）; 在室（12）外部的电磁波源（22）; 一个系统（24），用于将电磁波源发射的电磁波从外部传送到腔室的内部，直到尖端（14）附近; 用于聚焦放置在腔室（12）内的电磁波的系统（26）; 以及用于将所述电磁波对准所述室外并适于允许由所述聚焦系统聚焦的所述电磁波对准所述尖端的端部的系统（28）。