公开(公告)号：US09269520B2

公开(公告)日：2016-02-23

申请号：US14621526

申请日：2015-02-13

Applicant: JEOL Ltd.

Inventor： Takashi Satoh

IPC: H01J29/58 ,  H01J3/08 ,  H01J3/02 ,  H01J37/063 ,  H01J37/305 ,  B23K15/00 ,  B23K15/06 ,  B33Y30/00

CPC classification number: H01J3/08 ,  B22F3/1055 ,  B23K15/002 ,  B23K15/0026 ,  B23K15/0086 ,  B23K15/06 ,  B33Y30/00 ,  H01J3/02 ,  H01J3/024 ,  H01J3/027 ,  H01J37/063 ,  H01J37/305 ,  H01J2237/06308 ,  H01J2237/065 ,  H01J2237/3128 ,  Y02P10/295

Abstract: There is disclosed a method of controlling an electron gun without causing decreases in brightness of the electron beam if a current-limiting aperture cannot be used. The electron gun (10) has a cathode (11), a Wehnelt electrode (12), a control electrode (13), an anode (14), and a controller (22). The Wehnelt electrode (12) has a first opening (12c) in which the tip of the cathode is inserted, and focuses thermal electrons emitted from the tip of the cathode (11). The thermal electrons emitted from the tip of the cathode (11) are caused to pass into a second opening (13c) by the control electrode (13). The anode (14) accelerates the thermal electrons emitted from the cathode (11) such that the thermal electrons passed through the second opening (13c) pass through a third opening (14b) and impinge as an electron beam (B1) on a powdered sample (8). The controller (22) sets the bias voltage and the control voltage based on combination conditions of the bias voltage and control voltage to maintain the brightness of the beam constant.

Abstract translation: 如果不能使用限流孔，则公开了一种控制电子枪而不引起电子束亮度降低的方法。 电子枪（10）具有阴极（11），Wehnelt电极（12），控制电极（13），阳极（14）和控制器（22）。 Wehnelt电极（12）具有插入阴极顶端的第一开口（12c），并聚焦从阴极（11）的尖端发射的热电子。 从阴极（11）的顶端发射的热电子被控制电极（13）通入第二开口（13c）。 阳极（14）加速从阴极（11）发射的热电子，使得穿过第二开口（13c）的热电子通过第三开口（14b）并作为电子束（B1）撞击在粉末样品上 （8）。 控制器（22）基于偏置电压和控制电压的组合条件设置偏置电压和控制电压，以保持光束的亮度恒定。

公开(公告)号：US20150155136A1

公开(公告)日：2015-06-04

申请号：US14400815

申请日：2013-05-14

Applicant: MAPPER LITHOGRAPHY IP B.V.

Inventor： Paul IJmert Scheffers

IPC: H01J37/304 ,  G01B11/14 ,  H01J37/317

CPC classification number: H01J37/3045 ,  B82Y10/00 ,  B82Y40/00 ,  G01B11/14 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/065 ,  H01J2237/24514 ,  H01J2237/24578 ,  H01J2237/3175 ,  H01J2237/31774

Abstract: The invention relates to a method for determining a beamlet position in a charged particle multi-beamlet exposure apparatus. The apparatus is provided with a sensor comprising a conversion element for converting charged particle energy into light and a light sensitive detector. The conversion element is provided with a sensor surface area provided with a 2D-pattern of beamlet blocking and non-blocking regions. The method comprises taking a plurality of measurements and determining the position of the beamlet with respect to the 2D-pattern on the basis of a 2D-image created by means of the measurements. Each measurement comprises exposing a feature onto a portion of the 2D-pattern with a beamlet, wherein the feature position differs for each measurement, receiving light transmitted through the non-blocking regions, converting the received light into a light intensity value, and assigning the light intensity value to the position at which the measurement was taken.

Abstract translation: 本发明涉及一种用于确定带电粒子多子束曝光装置中的子束位置的方法。 该装置设置有传感器，其包括用于将带电粒子能量转换成光的转换元件和光敏检测器。 转换元件设置有设置有子束阻挡和非阻挡区域的2D图案的传感器表面区域。 该方法包括采取多个测量并基于通过测量产生的2D图像来确定子束相对于2D图案的位置。 每个测量包括用子束将特征曝光到2D图案的一部分上，其中对于每个测量，特征位置不同，接收透过非阻挡区域的光，将接收的光转换成光强度值， 光强值到测量位置。

公开(公告)号：US09006654B2

公开(公告)日：2015-04-14

申请号：US14447589

申请日：2014-07-30

Applicant: Hitachi High-Technologies Corporation

Inventor： Soichiro Matsunaga ,  Souichi Katagiri ,  Hajime Kawano

IPC: H01J37/26 ,  H01J37/28 ,  H01J37/304 ,  H01J37/09 ,  H01J37/147

CPC classification number: H01J37/28 ,  H01J37/06 ,  H01J37/09 ,  H01J37/147 ,  H01J37/3045 ,  H01J2237/0455 ,  H01J2237/06316 ,  H01J2237/065 ,  H01J2237/1501 ,  H01J2237/24465 ,  H01J2237/24535 ,  H01J2237/24542

Abstract: An embodiment is to provide a technique that continuously applies a certain amount of an electron beam to a sample by selecting a beam applied to the sample from an electron beam emitted from an electron source in a scanning electron microscope. A charged particle apparatus is configured, including: a mechanism that detects the distribution of electric current strength with respect to the emitting direction of an electron beam emitted from an electron source; a functionality that predicts a fluctuation of an electric current applied to a sample by predicting the distribution of the electric current based on the detected result; a functionality that determines a position at which a beam applied to the sample is acquired based on the predicted result; and a mechanism that controls a position at which a probe beam is acquired based on the determined result.

Abstract translation: 一个实施例是提供一种技术，其通过从扫描电子显微镜中从电子源发射的电子束中选择施加到样品的光束，将一定量的电子束连续地施加到样品。 一种带电粒子装置，包括：检测相对于从电子源发射的电子束的发射方向的电流强度分布的机构; 通过基于检测结果预测电流分布来预测施加到样本的电流的波动的功能; 基于预测结果确定施加到样本的光束的位置的功能; 以及基于所确定的结果来控制获取探测光束的位置的机构。

公开(公告)号：US08723138B2

公开(公告)日：2014-05-13

申请号：US13369340

申请日：2012-02-09

Applicant: Volker Drexel ,  Ulrich Mantz ,  Bernd Irmer ,  Christian Penzkofer

Inventor： Volker Drexel ,  Ulrich Mantz ,  Bernd Irmer ,  Christian Penzkofer

IPC: H01J37/065

CPC classification number: H01J37/065 ,  H01J1/3044 ,  H01J37/06 ,  H01J2201/30415 ,  H01J2201/30446 ,  H01J2201/30476 ,  H01J2237/06316 ,  H01J2237/06375 ,  H01J2237/065 ,  Y10T29/49888

Abstract: A tip of an electron beam source includes a core carrying a coating. The coating is formed from a material having a greater electrical conductivity than a material forming the surface of the core.

Abstract translation: 电子束源的尖端包括承载涂层的芯。 该涂层由具有比形成芯的表面的材料更大的导电性的材料形成。

公开(公告)号：US20140065549A1

公开(公告)日：2014-03-06

申请号：US13971901

申请日：2013-08-21

Applicant: CANON KABUSHIKI KAISHA

Inventor： Takahiro Nakayama ,  Kentaro Sano

IPC: H01J37/30

CPC classification number: H01J37/3007 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/09 ,  H01J37/3177 ,  H01J2237/0213 ,  H01J2237/022 ,  H01J2237/0453 ,  H01J2237/065

Abstract: The present invention provides a drawing apparatus for performing drawing on a substrate using a plurality of charged particle beams, the apparatus including an aperture array including an opening region including a region in which a plurality of openings are formed to generate the plurality of charged particle beams, and a peripheral region surrounding the opening region, wherein the aperture array has a shielding structure for shielding at least part of an electric field generated by charging of a contaminant in the peripheral region with respect to the plurality of charged particle beams passing through the plurality of openings.

Abstract translation: 本发明提供一种使用多个带电粒子束在基板上进行绘图的绘图装置，该装置包括孔阵列，该孔阵列包括开口区域，该开口区域包括形成有多个开口的区域，以产生多个带电粒子束 以及围绕所述开口区域的周边区域，其中所述孔阵列具有屏蔽结构，用于屏蔽通过对通过所述多个的所述多个带电粒子束在所述周边区域中的污染物的充电而产生的电场的至少一部分 的开口。

公开(公告)号：US20130341527A1

公开(公告)日：2013-12-26

申请号：US14003030

申请日：2012-03-15

Applicant: Jean Berney

Inventor： Jean Berney

IPC: G21K5/04

CPC classification number: G21K5/04 ,  H01J37/073 ,  H01J2201/342 ,  H01J2237/06333 ,  H01J2237/065

Abstract: A method suitable for preparing a specimen for inspection, the method comprising the steps of: irradiating a photocathode so that the photocathode emits electrons from a surface of the photocathode, wherein the emitted electrons each follow a trajectory, and the trajectories of the electrons are such that they can be extrapolated to intersect at a region within the photocathode, the region defining a virtual source, and wherein the photocathode comprises a rounded tip which has a radius of curvature; configuring the emitted electrons so that they form an electron beam; focusing the electron beam onto a specimen to form an image of the virtual source on the specimen. There is further provided a corresponding electron beam apparatus.

Abstract translation: 一种适于制备用于检查的样品的方法，所述方法包括以下步骤：照射光电阴极，使得光电阴极从光电阴极的表面发射电子，其中发射的电子各自遵循轨迹，并且电子的轨迹为 它们可以外推到在光电阴极内的区域相交，所述区域限定虚拟源，并且其中所述光电阴极包括具有曲率半径的圆形尖端; 配置发射的电子，使它们形成电子束; 将电子束聚焦到样本上以形成样本上的虚拟源的图像。 还提供了相应的电子束装置。

公开(公告)号：US08314401B2

公开(公告)日：2012-11-20

申请号：US12896110

申请日：2010-10-01

Applicant: Xu Zhang ,  Zhong-Wei Chen

Inventor： Xu Zhang ,  Zhong-Wei Chen

IPC: H01J1/50

CPC classification number: H01J37/141 ,  H01J37/063 ,  H01J2237/065 ,  H01J2237/083 ,  H01J2237/1035 ,  H01J2237/1405

Abstract: An electron gun comprises an electron emitter, an electrode surrounding the electron emitter, an extraction electrode, and a double condenser lens assembly, the double condenser lens assembly comprising a magnetic immersion pre-condenser lens and a condenser lens. In combination with a probe forming objective lens, the electron gun apparatus can provide an electron beam of independently adjustable probe size and probe current, as is desirable in electron beam applications. The electron emitter is immersed in the magnetic field generated by a magnetic type pre-condenser lens. When activated, the pre-condenser lens collimates the beam effectively to increase its angular intensity while at the same time enlarging the virtual source as compared with non-immersion case, due to geometric magnification and aberrations of its lens action. The pre-condenser lens is followed by a condenser lens. If the condenser lens is of the magnetic type, its peak magnetic field is far enough away and thus its action does not significantly affect the size of the virtual source. Independent adjustment of the lenses, combined with suitable selection of final probe forming objective aperture size, allows various combination of the final probe size and probe current to be obtained in a range sufficient for most electron beam applications.

Abstract translation: 电子枪包括电子发射器，围绕电子发射体的电极，引出电极和双重聚光透镜组件，双重聚光透镜组件包括磁性浸入式预聚光透镜和聚光透镜。 与形成物镜的探针组合，如在电子束应用中所希望的那样，电子枪装置可以提供独立可调的探针尺寸和探针电流的电子束。 将电子发射器浸入由磁式预聚光透镜产生的磁场中。 当激活时，由于几何放大和其透镜作用的像差，预聚焦透镜有效地准直光束以增加其角度强度，同时与非浸没情况相比放大虚拟光源。 预聚光透镜之后是聚光透镜。 如果聚光透镜是磁性的，则其峰值磁场足够远，因此其作用不会显着影响虚拟源的尺寸。 透镜的独立调整结合适当选择最终探针形成物镜孔径的尺寸允许在足以满足大多数电子束应用的范围内获得最终探针尺寸和探针电流的各种组合。

公开(公告)号：US20120131785A1

公开(公告)日：2012-05-31

申请号：US13369340

申请日：2012-02-09

Applicant: Volker Drexel ,  Ulrich Mantz ,  Bernd Irmer ,  Christian Penzkofer

Inventor： Volker Drexel ,  Ulrich Mantz ,  Bernd Irmer ,  Christian Penzkofer

IPC: B23P19/04

CPC classification number: H01J37/065 ,  H01J1/3044 ,  H01J37/06 ,  H01J2201/30415 ,  H01J2201/30446 ,  H01J2201/30476 ,  H01J2237/06316 ,  H01J2237/06375 ,  H01J2237/065 ,  Y10T29/49888

Abstract: A tip of an electron beam source includes a core carrying a coating. The coating is formed from a material having a greater electrical conductivity than a material forming the surface of the core.

Abstract translation: 电子束源的尖端包括承载涂层的芯。 该涂层由具有比形成芯的表面的材料更大的导电性的材料形成。

公开(公告)号：US07247867B2

公开(公告)日：2007-07-24

申请号：US11170171

申请日：2005-06-30

Applicant: Hiroshi Itokawa ,  Yoshimasa Kawase ,  Kyoichi Suguro

Inventor： Hiroshi Itokawa ,  Yoshimasa Kawase ,  Kyoichi Suguro

IPC: G01N23/00 ,  G01N21/00 ,  A61N5/00 ,  H01J37/08

CPC classification number: H01J37/3171 ,  H01J37/08 ,  H01J37/244 ,  H01J2237/065 ,  H01J2237/083 ,  H01J2237/20207 ,  H01J2237/2446 ,  H01J2237/24495 ,  H01J2237/24578 ,  H01J2237/31703

Abstract: An ion implanter includes a sample stage for setting a sample having a main surface, an ion generating section configured to generate a plurality of ions, the ion generating section including a container into which an ion source gas is introduced and a filament for emitting thermal electrons provided in the container, an implanting section configured to implants an ion beam containing the plurality of ions in the main surface of the sample, and a control section configured to control a position of the sample or a spatial distribution of electrons emitted from the filament so that a direction of eccentricity of a center of gravity of the ion beam coincides with a direction of a normal line of the main surface.

Abstract translation: 离子注入机包括用于设置具有主表面的样品的样品台，被配置为产生多个离子的离子产生部分，离子产生部分包括引入离子源气体的容器和用于发射热电子的灯丝 设置在容器中的植入部，其构造成在样品的主表面中植入含有多个离子的离子束，以及控制部，其被配置为控制样品的位置或从灯丝发射的电子的空间分布 离子束的重心的偏心方向与主面的法线方向一致。

公开(公告)号：US08507855B2

公开(公告)日：2013-08-13

申请号：US13192903

申请日：2011-07-28

Applicant: Tuvia Biber ,  Efim Kerner

Inventor： Tuvia Biber ,  Efim Kerner

IPC: H01J3/14 ,  H01J37/26

CPC classification number: H01J37/026 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/0044 ,  H01J2237/065 ,  H01J2237/083 ,  H01J2237/21

Abstract: A modulator of a charged particle beam system is arranged to generate a modulation signal that is provided to an inductor, which receives the modulation signal and modulates, by inductance, a supply voltage signal for the charged particle beam system. Modulation of the supply voltage signal changes a focal length of a charged particle beam produced by the charged particle beam system.

Abstract translation: 带电粒子束系统的调制器被布置成产生提供给电感器的调制信号，其接收调制信号并通过电感调制用于带电粒子束系统的电源电压信号。 电源电压信号的调制改变由带电粒子束系统产生的带电粒子束的焦距。