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    MULTI-ELECTRON BEAM WRITING APPARATUS AND MULTI-ELECTRON BEAM WRITING METHOD
    11.
    发明公开
    MULTI-ELECTRON BEAM WRITING APPARATUS AND MULTI-ELECTRON BEAM WRITING METHOD 审中-公开

    公开(公告)号：US20230260748A1

    公开(公告)日：2023-08-17

    申请号：US18148761

    申请日：2022-12-30

    Applicant: NuFlare Technology, Inc.

    Inventor： Kota IWASAKI

    IPC: H01J37/317

    CPC classification number: H01J37/3177 ,  H01J2237/0437 ,  H01J2237/31764 ,  H01J2237/10

    Abstract: A multi-electron beam writing apparatus includes a light source array to include plural light sources and generate plural first lights, a multi-lens array to include plural first lenses, and to divide the plural first lights into plural second lights by that each of the plural first lights illuminates a corresponding lens set of plural lens sets each composed of plural second lenses being a portion of the plural first lenses and by that each of lenses, being at least a part of the plural second lenses, is irradiated with two or more first lights of the plural first lights, a photoemissive surface to receive the plural second lights through its upper surface, and emit multiple photoelectron beams from its back surface, and a blanking aperture array mechanism to perform an individual blanking control by individually switching between ON and OFF of each of the multiple photoelectron beams.

    BEAM TRANSMISSION SYSTEM AND METHOD THEREOF
    13.
    发明申请
    BEAM TRANSMISSION SYSTEM AND METHOD THEREOF 审中-公开
    光束传输系统及其方法

    公开(公告)号：US20170011898A1

    公开(公告)日：2017-01-12

    申请号：US15150090

    申请日：2016-05-09

    Applicant: Kingstone Semiconductor Limited Company

    Inventor： Jiong Chen ,  Junhua Hong ,  Jin Zhang ,  Jeff Boeker

    IPC: H01J49/00 ,  H01J37/147 ,  H01J49/06 ,  H01J37/317

    CPC classification number: H01J37/147 ,  H01J37/3007 ,  H01J37/3171 ,  H01J49/06 ,  H01J2237/10 ,  H01J2237/15

    Abstract: A beam current transmission system and method are disclosed. The beam current transmission system comprises an extraction device, a mass analyzer, a divergent element, a collimation element and a speed change and turning element, wherein an analysis plane of the mass analyzer is perpendicular to a convergent plane of the extracted beam, and after entering an entrance, the beam is converged on a convergent point in a plane perpendicular to the analysis plane, and then is diverged from the convergent point and transmitted to the divergent element from an exit; the collimation element is used for parallelizing the beam in a transmission plane of the beam; and the speed change and turning element is used for enabling the beam to change speed so as to achieve a target energy while the beam is deflected so that the transmission direction of the beam changes by a first pre-set angle. Through the coordinated cooperation among a plurality of beam current optical elements, a relatively wider distribution can be formed in a vertical plane, so the invention is suitable to the processing of a wafer with a large size and also ensure better injection uniformity on the premise of avoiding energy contamination.

    Abstract translation: 公开了一种射束电流传输系统和方法。 射束电流传输系统包括提取装置，质量分析器，发散元件，准直元件和变速和转动元件，其中质量分析器的分析平面垂直于提取的光束的会聚平面，之后 进入入口时，光束会聚在与分析平面垂直的平面上的会聚点上，然后从会聚点发散，并从出口传递到发散元件; 准直元件用于在光束的透射平面中平行化光束; 并且速度改变和转动元件用于使光束能够改变速度，以便在光束被偏转时实现目标能量，使得光束的透射方向改变第一预设角度。 通过多个光束电流光学元件之间的协调配合，可以在垂直平面上形成相对较宽的分布，因此本发明适用于具有大尺寸的晶片的加工，并且还可以在 避免能量污染。

    METHOD AND APPARATUS FOR INSPECTION OF SCATTERED HOT SPOT AREAS ON A MANUFACTURED SUBSTRATE
    14.
    发明申请
    METHOD AND APPARATUS FOR INSPECTION OF SCATTERED HOT SPOT AREAS ON A MANUFACTURED SUBSTRATE 审中-公开
    用于检查制造基板上散射热点区域的方法和装置

    公开(公告)号：US20160260577A1

    公开(公告)日：2016-09-08

    申请号：US15061372

    申请日：2016-03-04

    Applicant: KLA-Tencor Corporation

    Inventor： Sean X. Wu ,  Kini Vivekanand

    IPC: H01J37/22 ,  H01J37/285 ,  H01J37/06 ,  H01J37/29

    CPC classification number: H01J37/222 ,  H01J37/06 ,  H01J37/265 ,  H01J37/285 ,  H01J37/292 ,  H01J2237/10 ,  H01J2237/202 ,  H01J2237/2813 ,  H01J2237/2817 ,  H01L22/12

    Abstract: One embodiment relates to a method of automated inspection of scattered hot spot areas on a manufactured substrate using an electron beam apparatus. A stage holding the substrate is moved along a swath path so as to move a field of view of the electron beam apparatus such that the moving field of view covers a target area on the substrate. Off-axis imaging of the hot spot areas within the moving field of view is performed. A number of hot spot areas within the moving field of view may be determined, and the speed of the stage movement may be adjusted based on the number of hot spot areas within the moving field of view. Another embodiment relates to an electron beam apparatus for inspecting scattered areas on a manufactured substrate. Other embodiments, aspects and features are also disclosed.

    Abstract translation: 一个实施例涉及一种使用电子束装置自动检查制造的衬底上的散射热点区域的方法。 保持基板的台阶沿着条带路径移动，以便移动电子束装置的视野，使得移动视场覆盖基板上的目标区域。 执行移动视野内的热点区域的离轴成像。 可以确定运动视场内的多个热点区域，并且可以基于运动视场内的热点区域的数量来调整平台运动的速度。 另一实施例涉及一种用于检查制造的基板上的散射区域的电子束装置。 还公开了其它实施例，方面和特征。

    Ion implantation apparatus, beam parallelizing apparatus, and ion implantation method
    15.
    发明授权
    Ion implantation apparatus, beam parallelizing apparatus, and ion implantation method 有权
    离子注入装置，光束并行化装置和离子注入方法

    公开(公告)号：US09343262B2

    公开(公告)日：2016-05-17

    申请号：US14468844

    申请日：2014-08-26

    Applicant: Sumitomo Heavy Industries Ion Technology Co., Ltd.

    Inventor： Takanori Yagita ,  Mitsuaki Kabasawa ,  Haruka Sasaki

    IPC: H01J37/00 ,  H01J37/24 ,  H01J37/317

    CPC classification number: H01J37/243 ,  H01J37/3171 ,  H01J2237/047 ,  H01J2237/10 ,  H01J2237/30472

    Abstract: An ion implantation apparatus includes a beam parallelizing unit and a third power supply unit. The beam parallelizing unit includes an acceleration lens, and a deceleration lens disposed adjacent to the acceleration lens in an ion beam transportation direction. The third power supply unit operates the beam parallelizing unit under one of a plurality of energy settings. The plurality of energy settings includes a first energy setting suitable for transport of a low energy ion, and a second energy setting suitable for transport of a high energy ion beam. The third power supply unit is configured to generate a potential difference in at least the acceleration lens under the second energy setting, and generate a potential difference in at least the deceleration lens under the first energy setting. A curvature of the deceleration lens is smaller than a curvature of the acceleration lens.

    Abstract translation: 离子注入装置包括光束并联单元和第三电源单元。 光束并行化单元包括加速透镜和在离子束输送方向上与加速透镜相邻设置的减速透镜。 第三电源单元在多个能量设置之一下操作光束并联单元。 多个能量设置包括适于运输低能量离子的第一能量设定和适于运输高能离子束的第二能量设定。 第三电源单元被配置为在第二能量设定下至少在加速透镜中产生电位差，并且在第一能量设定下产生至少减速透镜的电位差。 减速透镜的曲率小于加速度透镜的曲率。

    ION BEAM LINE
    16.
    发明申请
    ION BEAM LINE 有权
    离子束线

    公开(公告)号：US20140261171A1

    公开(公告)日：2014-09-18

    申请号：US13833668

    申请日：2013-03-15

    Applicant: NISSIN ION EQUIPMENT CO., LTD.

    Inventor： Sami K. Hahto ,  Nariaki Hamamoto ,  Tetsuya Igo

    IPC: H05H7/00 ,  H01J37/317

    CPC classification number: H01J37/3171 ,  H01J37/3007 ,  H01J2237/047 ,  H01J2237/10 ,  H01J2237/24542 ,  H01J2237/30472

    Abstract: In some aspects, an ion implantation system is disclosed that includes an ion source for generating a ribbon ion beam and at least one corrector device for adjusting the current density of the ribbon ion beam along its longitudinal dimension to ensure that the current density profile exhibits a desired uniformity. The ion implantation system can further include other components, such as an analyzer magnet, and electrostatic bend and focusing lenses, to shape and steer the ion beam to an end station for impingement on a substrate. In some embodiments, the present teachings allows the generation of a nominally one-dimensional ribbon beam with a longitudinal size greater than the diameter of a substrate in which ions are implanted with a high degree of longitudinal profile uniformity.

    Abstract translation: 在一些方面，公开了一种离子注入系统，其包括用于产生带状离子束的离子源和用于调节带状离子束沿其纵向尺寸的电流密度的至少一个校正器装置，以确保电流密度分布呈现 所需均匀度。 离子注入系统还可以包括其它组件，例如分析器磁体，以及静电弯曲和聚焦透镜，以将离子束成形和转向终端站以冲击衬底。 在一些实施例中，本发明允许产生具有大于其中注入离子的衬底的直径的纵向尺寸的标称一维带状束，并具有高度的纵向轮廓均匀性。

    Electric-magnetic field-generating element and assembling method for same
    19.
    发明授权
    Electric-magnetic field-generating element and assembling method for same 有权
    电磁场发生元件及其组装方法

    公开(公告)号：US07429740B2

    公开(公告)日：2008-09-30

    申请号：US11483804

    申请日：2006-07-10

    Applicant: Carlo Salvesen ,  Ralf Degenhardt

    Inventor： Carlo Salvesen ,  Ralf Degenhardt

    IPC: H01J1/50

    CPC classification number: H01J37/153 ,  H01J37/1413 ,  H01J37/145 ,  H01J2237/10 ,  H01J2237/1508 ,  Y10T29/4902

    Abstract: An electric-magnetic field-generating element and a multipole element comprising a plurality of these field-generating elements providing for a stable charged particle beam are described. For some embodiments, the electric-magnetic field-generating element includes a pole piece, a yoke to which the pole piece is attached, at least one coil, a vacuum-tight container accommodating the coil(s), and a holder adapted to hold the vacuum-tight container such that the vacuum-tight container is spaced from the pole piece and the yoke.

    Abstract translation: 描述了包括提供稳定的带电粒子束的多个这些场产生元件的电磁场产生元件和多极元件。 对于一些实施例，电磁场产生元件包括极片，连接有极片的磁轭，至少一个线圈，容纳线圈的真空密封容器和适于保持 真空密封容器使得真空密封容器与极靴和轭架间隔开。

    Particle-optical projection system
    20.
    发明申请
    Particle-optical projection system 有权
    粒子投影系统

    公开(公告)号：US20070125956A1

    公开(公告)日：2007-06-07

    申请号：US11700468

    申请日：2007-01-31

    Applicant: Herbert Buschbeck ,  Gertraud Lammer ,  Alfred Chalupka ,  Robert Nowak ,  Elmar Platzgummer ,  Gerhard Stengl

    Inventor： Herbert Buschbeck ,  Gertraud Lammer ,  Alfred Chalupka ,  Robert Nowak ,  Elmar Platzgummer ,  Gerhard Stengl

    IPC: H01J3/14 ,  G21K1/08

    CPC classification number: H01J37/3177 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/21 ,  H01J37/304 ,  H01J2237/024 ,  H01J2237/10 ,  H01J2237/216 ,  H01J2237/30455

    Abstract: In a particle-optical projection system a pattern is imaged onto a target by means of energetic electrically charged particles. The pattern is represented in a patterned beam of said charged particles emerging from the object plane through at least one cross-over; it is imaged into an image with a given size and distortion. To compensate for the Z-deviation of the image position from the actual positioning of the target (Z denotes an axial coordinate substantially parallel to the optical axis), without changing the size of the image, the system includes a position detector for measuring the Z-position of several locations of the target, and a controller for calculating modifications of selected lens parameters of the final particle-optical lens and controlling said lens parameters according to said modifications.

    Abstract translation: 在粒子光学投影系统中，通过能量带电粒子将图案成像到靶上。 所述图案表示在所述带电粒子的图案化束中，所述带电粒子通过至少一个交叉从对象平面出射; 它被成像为具有给定尺寸和失真的图像。 为了补偿图像位置的Z偏差与目标的实际定位（Z表示基本上平行于光轴的轴向坐标），而不改变图像的尺寸，系统包括用于测量Z的位置检测器 - 位置，以及用于计算最终粒子 - 光学透镜的所选透镜参数的修改并根据所述修改来控制所述透镜参数的控制器。

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