中科微点-全球专利检索

  1. Login
  2. Sign Up

Search Results

47 records (took 0.016 seconds)

    MEMS based charged particle deflector design
    11.
    发明授权
    MEMS based charged particle deflector design 失效
    基于MEMS的带电粒子偏转器设计

    公开(公告)号：US06956219B2

    公开(公告)日：2005-10-18

    申请号：US10987871

    申请日：2004-11-12

    Applicant: Rahul Saini ,  Zoran Jandric ,  David Tuggle

    Inventor： Rahul Saini ,  Zoran Jandric ,  David Tuggle

    IPC: G01K1/08 ,  H01J3/14 ,  H01J3/26 ,  H01J37/04 ,  H01J37/067 ,  H01L21/44 ,  H05K1/00

    CPC classification number: H01J37/04 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/28 ,  H01J37/3177 ,  H01J2237/03 ,  H01J2237/0492 ,  H01J2237/1205

    Abstract: A microcolumn including a plurality of beam modification components coupled to an assembly substrate, wherein the plurality of beam modification components includes: (1) an extractor component; (2) a first focusing electrode component; (3) a first anode component; (4) a first deflector component; (5) a second focusing electrode component; (6) a second deflector component; (7) a third focusing electrode component; (8) a third deflector component; (9) a second anode component; (10) a fourth focusing electrode component; and (11) a third anode component. The beam modification components may be ordered on the substrate in this sequence or other sequences.

    Abstract translation: 一种微柱，包括耦合到组件衬底的多个光束修改部件，其中所述多个光束修改部件包括：（1）提取器部件; （2）第一聚焦电极组件; （3）第一阳极部件; （4）第一偏转器部件; （5）第二聚焦电极部件; （6）第二偏转器部件; （7）第三聚焦电极部件; （8）第三偏转器部件; （9）第二阳极部件; （10）第四聚焦电极组件; 和（11）第三阳极组件。 束修饰组分可以按照该顺序或其它序列在衬底上排列。

    Electron beam generator and emission cathode
    12.
    发明授权
    Electron beam generator and emission cathode 失效
    电子束发生器和发射阴极

    公开(公告)号：US5159234A

    公开(公告)日：1992-10-27

    申请号：US635682

    申请日：1990-12-27

    Applicant: Urs Wegmann ,  Albert Koller ,  Hubert Mannhart

    Inventor： Urs Wegmann ,  Albert Koller ,  Hubert Mannhart

    IPC: H01J1/18 ,  H01J37/06 ,  H01J37/065 ,  H01J37/067 ,  H01J37/305

    CPC classification number: H01J37/3053 ,  H01J37/067

    Abstract: An electron beam generator having an electron emission cathode adopted to be rapidly mounted to an installation, has an electronically insulating support body that is clamped on one side to a metal contact body having a large surface area. At the other side of the electrically insulating support body, a quick release device is arranged in order to rapidly mount and dismount the generator to an installation.

    Abstract translation: 具有电子发射阴极的电子束发生器被迅速地安装在一个装置上，具有一个电子绝缘支撑体，该电绝缘支撑体一侧夹在具有大表面积的金属接触体上。 在电绝缘支撑体的另一侧，设置快速释放装置，以便将发电机快速安装和拆卸到一个设备上。

    Electron gun for heating, fusing and vaporizing
    14.
    发明授权
    Electron gun for heating, fusing and vaporizing 失效
    电子枪用于加热，熔化和蒸发

    公开(公告)号：US4034256A

    公开(公告)日：1977-07-05

    申请号：US691041

    申请日：1976-05-27

    Applicant: Peter Sommerkamp ,  Walter Heil

    Inventor： Peter Sommerkamp ,  Walter Heil

    IPC: H01J37/06 ,  H01J37/067 ,  H01J37/30 ,  H01J37/301 ,  H01J37/305 ,  H01J37/315 ,  H01J7/24 ,  H01J29/76

    CPC classification number: H01J37/301 ,  H01J37/067 ,  H01J37/305 ,  H01J37/315

    Abstract: An electron gun for heating, fusing and vaporizing having a high voltage portion, an electron emitting cathode and at least one beam forming electrode associated with the cathode. An accelerating anode, a beam guiding tube extending in the direction of the beam path and surrounded by a jacket tube and an electromatic lens are also provided. One or more deflection systems are positioned in the space formed between the beam guiding tube and the jacket tube. The beam guiding tube, the jacket tube, the electromatic lens and the deflection systems are contained in a single, replaceable unit which is joined by a plurality of hollow posts parallel to the gun axis to the high-voltage portion of the gun. The space for the electromagnetic lens and the deflection systems communicates with the atmosphere through at least one of the hollow posts.

    Abstract translation: 一种用于加热，熔化和汽化具有高电压部分的电子枪，电子发射阴极和与阴极相关的至少一个光束形成电极。 还提供加速阳极，沿着光束路径的方向延伸并被套管和电子透镜包围的光束引导管。 一个或多个偏转系统定位在形成在光束引导管和护套管之间的空间中。 光束引导管，护套管，电子透镜和偏转系统被包含在单个可更换单元中，其通过平行于枪轴线的多个中空柱连接到枪的高压部分。 用于电磁透镜和偏转系统的空间通过至少一个空心柱与大气连通。

    Electron beam apparatus with means for generating a rotation-symmetrical magnetic field
    15.
    发明授权
    Electron beam apparatus with means for generating a rotation-symmetrical magnetic field 失效
    电子束装置，用于产生旋转对称磁场

    公开(公告)号：US3731094A

    公开(公告)日：1973-05-01

    申请号：US17304571

    申请日：1971-08-19

    Applicant: PHILIPS CORP

    Inventor： LE POOLE J

    IPC: G01Q30/02 ,  H01J29/56 ,  H01J37/04 ,  H01J37/063 ,  H01J37/067 ,  H01J37/145 ,  H01J37/153 ,  H01J41/04 ,  H01J37/26

    CPC classification number: H01J37/04 ,  H01J29/56 ,  H01J37/063 ,  H01J37/067 ,  H01J37/145 ,  H01J37/153 ,  H01J41/04

    Abstract: An apparatus for generating an electrostatic space charge in a rotation-symmetrical magnetic field, in which an electron beam from an electron gun which is arranged laterally on the field space generates the space charge in the field space. The electron beam may be adjusted by mechanical adjustment of the gun and also by means of the potential of a conducting sleeve in the magnetic field. By means of this potential, it is also possible to adjust the ratio between the contributions to the space charge which are due to primary electrons and to secondary electrons produced by the primary electrons in a residual gas in the field space.

    Abstract translation: 一种用于在旋转对称磁场中产生静电空间电荷的装置，其中来自电子枪的电子束横向设置在场空间上，在场空间中产生空间电荷。 电子束可以通过枪的机械调节以及通过导磁套在磁场中的电位来调节。 通过这种电位，还可以调整由于一次电子引起的空间电荷的贡献与在场空间中残留气体中的一次电子产生的二次电子之间的比率。

    COMPACT MICROCOLUMN FOR AUTOMATED ASSEMBLY
    19.
    发明申请
    COMPACT MICROCOLUMN FOR AUTOMATED ASSEMBLY 失效
    用于自动组装的紧凑型微型计算机

    公开(公告)号：US20050199821A1

    公开(公告)日：2005-09-15

    申请号：US10799836

    申请日：2004-03-12

    Applicant: Rahul Saini ,  Zoran Jandric

    Inventor： Rahul Saini ,  Zoran Jandric

    IPC: G01K1/08 ,  H01J3/14 ,  H01J3/26 ,  H01J37/04 ,  H01J37/067 ,  H01L21/44 ,  H05K1/00

    CPC classification number: H01J37/04 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/28 ,  H01J37/3177 ,  H01J2237/03 ,  H01J2237/0492 ,  H01J2237/1205

    Abstract: A microcolumn including an assembly substrate and a plurality of beam modification components. The assembly substrate includes a plurality of sockets, and the beam modification components each include a connector coupled to a corresponding one of the sockets. Assembly of the beam modification components to the assembly substrate may employ automation and/or automated calibration, including automated motion of robotic stages in a substantially automated manner.

    Abstract translation: 包括组装衬底和多个束修改组件的微柱。 组装衬底包括多个插座，并且光束修改部件各自包括连接到对应的一个插座的连接器。 将束修改部件组装到组装衬底可以采用自动化和/或自动校准，包括基本自动化的机器人级的自动运动。

    Simultaneous specimen and stage cleaning device for analytical electron microscope
    20.
    发明授权
    Simultaneous specimen and stage cleaning device for analytical electron microscope 失效
    用于分析电子显微镜的同时标本和舞台清洁装置

    公开(公告)号：US5510624A

    公开(公告)日：1996-04-23

    申请号：US522618

    申请日：1995-09-01

    Applicant: Nestor J. Zaluzec

    Inventor： Nestor J. Zaluzec

    IPC: G01N1/32 ,  H01J37/02 ,  H01J37/32 ,  H01J37/067

    CPC classification number: H01J37/32 ,  G01N1/32 ,  H01J37/02 ,  H01J2237/184 ,  H01J2237/335

    Abstract: An improved method and apparatus are provided for cleaning both a specimen stage, a specimen and an interior of an analytical electron microscope (AEM). The apparatus for cleaning a specimen stage and specimen comprising a plasma chamber for containing a gas plasma and an air lock coupled to the plasma chamber for permitting passage of the specimen stage and specimen into the plasma chamber and maintaining an airtight chamber. The specimen stage and specimen are subjected to a reactive plasma gas that is either DC or RF excited. The apparatus can be mounted on the analytical electron microscope (AEM) for cleaning the interior of the microscope.

    Abstract translation: 提供了一种用于清洁样品台，样品和分析电子显微镜（AEM）内部的改进的方法和装置。 用于清洁样品台和试样的装置包括用于容纳气体等离子体的等离子体室和耦合到等离子体室的气锁，用于允许样品台和样品通过等离子体室并保持气密室。 样品台和样品经受直流或射频激发的反应性等离子体气体。 该装置可以安装在分析电子显微镜（AEM）上，用于清洁显微镜的内部。

Patent Agency Ranking