公开(公告)号：US12130561B2

公开(公告)日：2024-10-29

申请号：US17892211

申请日：2022-08-22

申请人： Applied Materials, Inc.

发明人： Kartik Ramaswamy ,  Michael D. Willwerth ,  Yang Yang

IPC分类号： G03F7/42 ,  G03F7/00 ,  H01J37/32

CPC分类号： G03F7/70808 ,  G03F7/42 ,  G03F7/427 ,  G03F7/70925 ,  H01J37/32633 ,  H01J2237/3342

摘要： Apparatus for processing substrates can include a gas distribution plate that includes an upper plate and a lower plate and a solid disk between the upper plate and the lower plate. Each of the upper plate and the lower plate has a central region and an outer region surrounding the central region, the central region being solid and the outer region having a plurality of through holes. The upper plate and the lower plate are coaxially aligned along a central axis extending through a center of the central region of the upper plate and a center of the central region of the lower plate. The solid disk is coaxially aligned with the upper plate and the lower plate. The solid disk is configured to block transmission of ultraviolet radiation through the solid disk.

公开(公告)号：US12130557B2

公开(公告)日：2024-10-29

申请号：US17885353

申请日：2022-08-10

申请人： Carl Zeiss SMT GmbH

发明人： Matthias Manger ,  Markus Raab

IPC分类号： G03F7/00

CPC分类号： G03F7/70266 ,  G03F7/70825 ,  G03F7/7085 ,  G03F7/70891

摘要： An optical system comprises at least one mirror having a mirror body and a mirror surface, and at least one actuator device coupled to the mirror body and serving for deforming the mirror surface. The actuator device comprises at least one electrostrictive actuator element for generating a mechanical stress in the mirror body for deforming the mirror surface depending on an electrical drive voltage, and at least one electrostrictive sensor element for outputting a sensor signal depending on a deformation of the sensor element. The at least one sensor element is arranged directly adjacent to the actuator element and/or is arranged in such a way that it is configured at least partly for transferring the mechanical stress generated by the actuator element to the mirror body.

公开(公告)号：US12130548B2

公开(公告)日：2024-10-29

申请号：US18343493

申请日：2023-06-28

申请人： Taiwan Semiconductor Manufacturing Company, Ltd.

发明人： Wen-Chang Hsueh ,  Huan-Ling Lee ,  Chia-Jen Chen ,  Hsin-Chang Lee

IPC分类号： G03F1/22 ,  G03F1/24 ,  G03F1/48 ,  G03F1/52 ,  G03F1/58 ,  H01L21/027

CPC分类号： G03F1/22 ,  G03F1/24 ,  G03F1/48 ,  G03F1/52 ,  G03F1/58 ,  H01L21/0274

摘要： A reticle is provided. The reticle includes a first reflective multilayer (ML) over a mask substrate and a capping layer over the first reflective ML. The reticle also includes a first absorption layer over the capping layer and a second reflective multilayer (ML) over the first absorption layer. The reticle further includes an etch stop layer over the second reflective ML and a third reflective multilayer (ML) over the etch stop layer. In addition, the reticle includes an absorption film pair over the third reflective ML.

公开(公告)号：US12130510B2

公开(公告)日：2024-10-29

申请号：US18136514

申请日：2023-04-19

申请人： SAMSUNG ELECTRONICS CO., LTD.

发明人： Enjung Kim ,  Jeongphil Seo ,  Sungho Kim ,  Seungjun Jeong ,  Suhong Ko ,  Bupmyoung Kim

IPC分类号： G02F1/1333 ,  G02F1/1345 ,  G02F1/1362 ,  G02F1/1368 ,  G03F7/00 ,  G09G3/3208 ,  G09G3/36 ,  H01L27/12

CPC分类号： G02F1/133308 ,  G02F1/13452 ,  G02F1/13456 ,  G02F1/136286 ,  G02F1/1368 ,  G03F7/0005 ,  G09G3/3208 ,  G09G3/36 ,  H01L27/124 ,  H01L27/1259 ,  G09G2310/0264

摘要： A display apparatus includes a first substrate including an upper end, a left end, a right end, and a lower end, and a plurality of wiring pads extending to the lower end; a display layer provided on a surface of the first substrate; a second substrate provided on a surface of the display layer, including an upper end, a left end, and a right end coincident with the upper end, the left end, and the right end of the first substrate, and a lower end shorter than the lower end of the first substrate, where the plurality of wiring pads of the first substrate are exposed; a plurality of side wiring pads provided on the lower end of the first substrate and the lower end of the second substrate and connected to the plurality of wiring pads; and a display driving circuit connected to the plurality of side wiring pads.

公开(公告)号：US12130407B2

公开(公告)日：2024-10-29

申请号：US17168743

申请日：2021-02-05

申请人： Lawrence Livermore National Security, LLC

发明人： Xiaoxing Xia ,  Eyal Feigenbaum

IPC分类号： G02B1/00 ,  G03F7/00

CPC分类号： G02B1/002 ,  G03F7/0037 ,  G03F7/70275 ,  G02B2207/101

摘要： A metalens array is disclosed for controllably modifying a phase of a wavefront of an optical beam. The metalens array may have a substrate having at least first and second metalens unit cells, and forming a single integrated structure with no stitching being required of the first and second metalens unit cells. The first metalens unit cell has a first plurality of nanoscale features and is configured to modify a phase of a first portion of a wavefront of an optical signal incident thereon in accordance with a first predetermined phase pattern to create at least one first focal voxel within an image plane. The second metalens unit cell has a second plurality of nanoscale features configured to modify the phase of a second portion of the wavefront of the optical signal incident thereon, in accordance with a second predetermined phase pattern, to simultaneously create at least one second focal voxel within the image plane. Each metalens unit cell also has an overall diameter of no more than about 200 microns.

公开(公告)号：US12129240B2

公开(公告)日：2024-10-29

申请号：US17419504

申请日：2019-12-16

申请人： SAN-APRO LTD.

发明人： Takuto Nakao

IPC分类号： G03F7/004 ,  C07D333/78 ,  G03F7/039 ,  G03F7/32 ,  G03F7/38 ,  G03F7/40

CPC分类号： C07D333/78 ,  G03F7/0045 ,  G03F7/0392 ,  G03F7/322 ,  G03F7/38 ,  G03F7/40

摘要： Provided are a novel sulfonium salt having high photosensitivity to g-rays or h-rays; a novel photoacid generator containing a sulfonium salt that has high photosensitivity to g-rays or h-rays, has high solubility in solvents and cationically polymerizable compounds such as epoxy compounds, and has an excellent storage stability in compositions containing the cationically polymerizable compounds; and the like. The present invention relates to a sulfonium salt represented by the formula (1), a photoacid generator containing the sulfonium salt, and the like.

公开(公告)号：US20240355644A1

公开(公告)日：2024-10-24

申请号：US18640443

申请日：2024-04-19

申请人： Tokyo Electron Limited

发明人： Shinsuke TAKAKI ,  Hiroki TADATOMO ,  Yoji SAKATA ,  Tomoya ONITSUKA ,  Naoki SHIBATA

IPC分类号： H01L21/67 ,  G03F7/00 ,  G03F7/004 ,  G03F7/30 ,  G03F7/36 ,  G03F7/38 ,  H01L21/677

CPC分类号： H01L21/67017 ,  G03F7/0042 ,  G03F7/30 ,  G03F7/36 ,  G03F7/38 ,  G03F7/70716 ,  G03F7/7075 ,  G03F7/70866 ,  G03F7/70933 ,  G03F7/70991 ,  H01L21/67225 ,  H01L21/67769 ,  H01L21/67778

摘要： A substrate processing system provided with a plurality of apparatuses to perform a patterning on a plurality of the substrates, wherein a transfer container accommodating the plurality of substrates is transferred to the plurality of apparatuses in a sequential manner. The substrate processing system includes: a first apparatus of the plurality of apparatuses, which is configured to form a metal-containing resist film on each substrate; a second apparatus of the plurality of apparatuses, which is configured to perform a development on the metal-containing resist film after exposure; and an atmosphere regulator having an accommodation space where the substrates, on each of which the metal-containing resist film before being subjected to the development is formed, are accommodated and configured to regulate an atmosphere of the accommodation space so as to regulate a degree of progress of a reaction of the metal-containing resist film on each substrate.

公开(公告)号：US20240354485A1

公开(公告)日：2024-10-24

申请号：US18639045

申请日：2024-04-18

申请人： Onto Innovation Inc.

发明人： Keith Frank Best ,  Jian Lu ,  Prasad Bachiraju

IPC分类号： G06F30/398 ,  G03F7/00 ,  G03F9/00 ,  G06F119/22

CPC分类号： G06F30/398 ,  G03F7/70625 ,  G03F7/70633 ,  G03F7/7065 ,  G03F7/706837 ,  G03F7/706839 ,  G03F9/7003 ,  G06F2119/22

摘要： Tracking and/or predicting the yield of a semiconductor process. In an embodiment, a tracking method monitors the yield at each layer of the process. This can be used to determine how to proceed. In an embodiment, the prediction method measures the values of at least one attribute of each conductive via on a substrate before the lithography process. The measured values are then compared to predefined values for the same attribute, to determine any deviation. Based on this comparison, an overlay yield of the lithography process is predicted.

公开(公告)号：US20240353767A1

公开(公告)日：2024-10-24

申请号：US18138012

申请日：2023-04-21

申请人： TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.

发明人： Cheng-Kang HU ,  Yin Yuan CHEN ,  Ya-Chieh WEN ,  Hsu-Shui LIU ,  Jiun-Rong PAI

IPC分类号： G03F7/20

CPC分类号： G03F7/70925 ,  G03F7/70983

摘要： A method of removing a particle from a pellicle includes moving a nozzle over a surface of a membrane of the pellicle to a location of the particle. A droplet of a liquid material is dispensed from the nozzle to cover the particle on the surface of the membrane. A contact of the droplet with the nozzle is monitored and maintained. The droplet carrying the particle is horizontally dragged along the surface of the membrane toward an edge thereof by the nozzle using the surface tension of the droplet. The droplet carrying the particle is sucked off from the edge of the membrane by a vacuum pump, thereby automatically and safely removing the particle without damaging the pellicle.

公开(公告)号：US20240353758A1

公开(公告)日：2024-10-24

申请号：US18684894

申请日：2022-08-19

申请人： University of Pittsburgh - Of the Commonwealth System of Higher Education

发明人： Hrvoje Petek ,  Zhikang Zhou ,  Atreyie Ghosh ,  Sena Yang ,  Tianyi Wang ,  Chen-Bin Huang ,  Yanan Dai

IPC分类号： G03F7/00

CPC分类号： G03F7/70091 ,  G03F7/70033 ,  G03F7/70041 ,  G03F7/7015

摘要： Methods and systems for assembling electron spin and charge to possess one or more properties of a topological plasmonic spin texture array for performing lithography that is not limited by an optical system's diffraction limit are disclosed. According to one embodiment, the method includes defining a polarization of an optical field of light and a corresponding coupling-structure geometry. The method includes providing a coupling structure having the defined coupling-structure geometry in a metallic material, the coupling structure defining a region of the metallic material. The method includes directing light having the defined polarization to a center of the region, forming a lattice of plasmonic merons having a finer contrast resolution than a diffraction or reflection based resolution determined by Abbe limit based on the defined polarization of the optical field.