RECESSED PORTION IN A SUBSTRATE AND METHOD OF FORMING THE SAME

    公开(公告)号:US20240168238A1

    公开(公告)日:2024-05-23

    申请号:US18427793

    申请日:2024-01-30

    IPC分类号: G02B6/36 G02B6/42 H01L21/3065

    摘要: A recessed portion in a semiconductor substrate and a method of forming the same are provided. The method comprises: forming a mask on the semiconductor substrate; forming a protection layer on a top surface of the mask and on at least one sidewall of the mask, and on at least one surface of the semiconductor substrate exposed by the mask; performing a first etching process to remove the protection layer on the top surface of the mask and on a bottom surface of the semiconductor substrate exposed by the mask; and performing a second etching process to remove the remaining protection layer and to etch the semiconductor substrate to form the recessed portion. In this way, a recessed portion with relatively smooth and vertical sidewalls can be realized.

    Electronic device
    28.
    发明授权

    公开(公告)号:US11991827B2

    公开(公告)日:2024-05-21

    申请号:US17966701

    申请日:2022-10-14

    IPC分类号: H05K1/14

    CPC分类号: H05K1/141

    摘要: An electronic device is disclosed. The electronic device includes a system board and a first set of electronic devices disposed over the system board. Each of the first set of electronic devices comprises a processing unit and a carrier carrying the processing unit. The electronic device also includes a first interconnection structure electrically connected with the processing unit through the carrier and configured to receive a first power from a first power supply unit and to transmit the first power to the processing unit.