Abstract:
The present invention discloses a structure of package comprising: a substrate with die receiving through holes, conductive connecting through holes and contact metal pads; a base attached on a portion of the lower surface of the substrate; multiple dice disposed within the die receiving through holes and attached on the base; multiple dielectric layers formed on the multiple dice and the substrate; multiple re-distribution layers (RDL) formed within the multiple dielectric layers and coupled to the multiple dice; a top layer formed over the RDL; and pluralities of terminal pads formed on the backside of the substrate and coupled to the RDL through the connecting through holes. The RDL is made from an alloy comprising Ti/Cu/Au alloy or Ti/Cu/Ni/Au alloy.
Abstract translation:本发明公开了一种包装结构,其特征在于,包括:具有通孔的基板,导电连接孔和接触金属垫; 基部,其附接在所述基板的所述下表面的一部分上; 设置在模具内的多个骰子接收通孔并附接在基座上; 形成在多个骰子和基底上的多个电介质层; 在多个介电层内形成多个再分配层(RDL),并耦合到多个骰子; 在RDL上形成顶层; 以及形成在基板的背面上并通过连接通孔与RDL连接的多个端子焊盘。 RDL由包含Ti / Cu / Au合金或Ti / Cu / Ni / Au合金的合金制成。
Abstract:
A method for position restoration. By comparing the graphic data and the restored graphic data, the graphic data closest to the restored graphic data is selected. Therefore, the graphic data scanned subsequently is correctly connected to the restored graphic data to avoid the missing line or repetition of graphic data.
Abstract:
A method of forming interconnects for three dimensional integrated circuits comprises attaching a metal layer on a first carrier, attaching a first side of a packaging component on the metal layer, wherein the packaging component comprises a plurality of through vias. The method further comprises filling the plurality of through vias with a metal material using an electrochemical plating process, wherein the metal layer functions as an electrode for the electrochemical plating process, attaching a second carrier on a second side of the packaging component, detaching the first carrier from the packaging component, forming a photoresist layer on the metal layer, patterning the photoresist layer and detaching exposed portions of the metal layer.
Abstract:
A method of forming interconnects for three dimensional integrated circuits comprises attaching a metal layer on a first carrier, attaching a first side of a packaging component on the metal layer, wherein the packaging component comprises a plurality of through vias. The method further comprises filling the plurality of through vias with a metal material using an electrochemical plating process, wherein the metal layer functions as an electrode for the electrochemical plating process, attaching a second carrier on a second side of the packaging component, detaching the first carrier from the packaging component, forming a photoresist layer on the metal layer, patterning the photoresist layer and detaching exposed portions of the metal layer.
Abstract:
The present invention discloses a structure of package comprising: a substrate with a die receiving through hole; a base attached on a lower surface of the substrate; a die disposed within the die receiving through hole and attached on the base; a dielectric layer formed on the die and the substrate; a re-distribution layer (RDL) formed on the dielectric layer and coupled to the die; a protection layer formed over the RDL; and pluralities of pads formed on the protection layer and coupled to the RDL. The RDL is made from an alloy comprising Ti/Cu/Au alloy or Ti/Cu/Ni/Au alloy.
Abstract translation:本发明公开了一种包装体的结构,其特征在于,包括:具有模头的通孔的基板; 基底,其附接在所述基底的下表面上; 模具,设置在模具接收通孔内并附接在基座上; 形成在所述管芯和所述基板上的电介质层; 在所述电介质层上形成并耦合到所述管芯的再分布层(RDL); 形成在RDL上的保护层; 以及形成在保护层上并耦合到RDL的多个焊盘。 RDL由包含Ti / Cu / Au合金或Ti / Cu / Ni / Au合金的合金制成。
Abstract:
A multi-chip wafer level package comprises three stacked semiconductor dies. A first semiconductor die is embedded in a first photo-sensitive material layer. A second semiconductor die is stacked on top of the first semiconductor die wherein the second semiconductor die is face-to-face coupled to the first semiconductor die. A third semiconductor die is back-to-back attached to the second semiconductor die. Both the second semiconductor die and the third semiconductor die are embedded in a second photo-sensitive material layer. The multi-chip wafer level package further comprises a plurality of through assembly vias formed in the first photo-sensitive material layer and the second photo-sensitive material layer.
Abstract:
Methods and apparatus for integrating a CMOS image sensor and an image signal processor (ISP) together using an interposer to form a system in package device module are disclosed. The device module may comprise an interposer with a substrate. An interposer contact is formed within the substrate. A sensor device may be bonded to a surface of the interposer, wherein a sensor contact is bonded to a first end of the interposer contact. An ISP may be connected to the interposer, by bonding an ISP contact in the ISP to a second end of the interposer contact. An underfill layer may fill a gap between the interposer and the ISP. A printed circuit board (PCB) may further be connected to the interposer by way of a solder ball connected to another interposer contact. A thermal interface material may be in contact with the ISP and the PCB.
Abstract:
The present invention discloses a structure of package comprising: a substrate with a die receiving through hole; a base attached on a lower surface of the substrate; a die disposed within the die receiving through hole and attached on the base; a dielectric layer formed on the die and the substrate; a re-distribution layer (RDL) formed on the dielectric layer and coupled to the die; a protection layer formed over the RDL; and pluralities of pads formed on the protection layer and coupled to the RDL. The RDL is made from an alloy comprising Ti/Cu/Au alloy or Ti/Cu/Ni/Au alloy.
Abstract translation:本发明公开了一种包装体的结构,其特征在于,包括:具有模头的通孔的基板; 基底,其附接在所述基底的下表面上; 模具,设置在模具接收通孔内并附接在基座上; 形成在所述管芯和所述基板上的电介质层; 在所述电介质层上形成并耦合到所述管芯的再分布层(RDL); 形成在RDL上的保护层; 以及形成在保护层上并耦合到RDL的多个焊盘。 RDL由包含Ti / Cu / Au合金或Ti / Cu / Ni / Au合金的合金制成。
Abstract:
To pick and place standard first chip size package on a base with a second chip for obtaining an appropriate stacking chip size package than the original chip size package. The package structure has a larger chip size package than the size of the traditional stacking package. Moreover, the terminal pins of the flip chip package may be located on peripheral of LGA package or on array of BGA package.
Abstract:
The present invention discloses a semiconductor packaging method, comprises steps of back lapping a processed silicon wafer to a desired thickness. Then, the dice are separated from the processed and lapped wafer into a single die. Then, the dice are picked and placed on a tool, an active surface of the dice is attached on the tool. A molding is performed to mold the dice by molding material. The tool is then removed from the dice to form a small unit. The next step is to arrange a plurality of the small units on a carrier in a matrix from. Then, a build-up layer, a re-distribution layer are formed over the dice, followed by forming solder balls on the dice. Finally, the carrier is removed.