Semiconductor chip structures with embedded thermal conductors and a thermal sink disposed over opposing substrate surfaces
    21.
    发明授权
    Semiconductor chip structures with embedded thermal conductors and a thermal sink disposed over opposing substrate surfaces 失效
    具有嵌入式热导体的半导体芯片结构和设置在相对基板表面上的散热器

    公开(公告)号:US06773952B2

    公开(公告)日:2004-08-10

    申请号:US10243397

    申请日:2002-09-12

    Abstract: Semiconductor chip structures are provided with embedded thermal conductors for removing heat from one or more electrically conductive circuit members thereof, wherein the circuit members are formed on one or more dielectric layers above a substrate, each layer having a low dielectric constant and a low thermal conductivity. One or more cooling posts, for example, multiple thermally conductive plugs, are selectively disposed within the semiconductor chip structure adjacent to one or more electrically conductive members and thermally coupled thereto so that heat produced by the members is transferred into and through the cooling posts for forwarding to the substrate and/or to an upper surface of the semiconductor chip structure. The backside of the substrate has a thermal sink thermally coupled thereto and electrically isolated from the substrate. The thermal sink includes one or more thermally conductive via structures embedded within the substrate and aligned to thermally contact to the cooling posts disposed above the substrate.

    Abstract translation: 半导体芯片结构设置有用于从一个或多个导电电路构件去除热量的嵌入式热导体,其中电路构件形成在衬底上方的一个或多个电介质层上,每层具有低介电常数和低热导率 。 一个或多个冷却柱,例如多个导热塞,被选择性地设置在半导体芯片结构内邻近一个或多个导电构件并与其热耦合,使得由构件产生的热量被传送到冷却柱中并通过冷却柱 转移到衬底和/或到半导体芯片结构的上表面。 衬底的背面具有热耦合到其上并与衬底电隔离的散热器。 散热器包括一个或多个热传导通孔结构,其嵌入衬底内并对准以与设置在衬底上方的冷却柱热接触。

    Basketball shooting trainer device
    22.
    发明授权
    Basketball shooting trainer device 失效
    篮球射击训练器

    公开(公告)号:US06729979B1

    公开(公告)日:2004-05-04

    申请号:US10161669

    申请日:2002-06-04

    CPC classification number: A63B69/0059 A63B69/0071 A63B71/148

    Abstract: A basketball shooting trainer device for teaching a user to correctly shoot and release a basketball. The basketball shooting trainer device includes a piece of material having a top edge and a bottom edge and being adapted to removably cover a back of a user's basketball shooting hand; and also includes tubular finger members extending from the top edge of the piece of material and being adapted to fittingly receive a user's fingers; and further includes a finger wedge being attached to the piece of material for keeping a user's middle two fingers spread apart; and also includes a support member being attached to the piece of material; and also includes a strap assembly being attached along the bottom edge of the piece of material and being adapted to removably fasten about a user's wrist to support the piece of material upon the user's basketball shooting hand.

    Abstract translation: 一种用于教导用户正确拍摄和释放篮球的篮球射击训练器。 篮球训练器装置包括具有顶边缘和底边缘的一块材料,并且适于可移除地覆盖使用者的篮球射击手的背部; 并且还包括从所述材料件的顶部边缘延伸并且适于适合地接收使用者的手指的管状指状构件; 并且还包括附接到所述材料片上的手指楔以保持使用者的中间两个手指分开; 并且还包括附接到所述材料块的支撑构件; 并且还包括沿着该材料件的底部边缘附接的带组件,并且适于可拆卸地紧固使用者手腕以将该材料材料支撑在用户的篮球射击手上。

    Cooling microfan arrangements and process
    24.
    发明授权
    Cooling microfan arrangements and process 失效
    冷却微管安排和工艺

    公开(公告)号:US5296775A

    公开(公告)日:1994-03-22

    申请号:US950621

    申请日:1992-09-24

    CPC classification number: F04D25/08 H02N1/004

    Abstract: A micro electrostatic cooling fan arrangement is provided which includes a heat source having a planar surface, a stator attached to the heat source, an axle attached to the heat source and spaced from the stator, a rotary element including a hub having an aperture therein and a fan blade, the axle passing through the aperture of the hub and the fan blade having a major surface thereof disposed at an angle with respect to the surface of the heat source and attached to the hub at one end, with the other end of the fan blade being adjacent to but spaced from the stator and a voltage source applied to the stator having sufficient voltage to charge the fan blade.Also, a process is provided for making a microfan which includes forming a strip of sacrificial material on a planar surface of a heat source, applying a spin on insulating layer over the heat source and the strip for producing a sloping surface extending from about the top of the strip toward the planar surface of the heat source, applying a layer of conductive material on the sloping surface and strip and defining from the layer of conductive material a fan blade on the sloping surface of the spin on insulating layer and a stator at one end of the fan blade.

    Abstract translation: 提供一种微静电冷却风扇装置,其包括具有平坦表面的热源,附接到热源的定子,附接到热源并与定子间隔开的轴;旋转元件,包括其中具有孔的旋转元件, 风扇叶片,通过轮毂的孔的轴和风扇叶片的主表面相对于热源的表面设置成一定角度并且在一端附接到轮毂,而另一端 风扇叶片与定子相邻但间隔开,并且施加到定子的电压源具有足够的电压以对风扇叶片充电。 此外,提供了一种制造微纤维的方法,其包括在热源的平坦表面上形成牺牲材料条,在绝热层上施加旋涂在热源和带上,用于产生从顶部延伸的倾斜表面 的条带朝向热源的平面表面,在倾斜表面上施加一层导电材料,并且从导电材料层划分并限定绝缘层上的自旋的倾斜表面上的风扇叶片和一个定子上的风扇叶片 风扇叶片的末端。

    Process for X-ray mask warpage reduction
    25.
    发明授权
    Process for X-ray mask warpage reduction 失效
    X射线掩模翘曲降低的过程

    公开(公告)号:US5124561A

    公开(公告)日:1992-06-23

    申请号:US680216

    申请日:1991-04-04

    CPC classification number: G03F1/22

    Abstract: An X-ray mask substrate includes a silicon wafer having a square, central region etched to a thin, tensile membrane and a highly tensile film deposited on the bottom surface of the substrate to reduce substrate warpage. The square, central region of the substrate is adapted to support X-ray absorbing material during the lithography process. A layer of highly tensile film such as tungsten is deposited on the lower side of the substrate to induce a bending moment on the substrate opposite that induced during the substrate fabrication process. The thickness of the film layer is directly proportional to the amount of warpage induced in the substrate during the fabrication process. A support ring is bonded to the peripheral region of the substrate to provide integrity and support.

    Abstract translation: X射线掩模基板包括具有蚀刻到薄的拉伸膜的正方形中心区域和沉积在基板的底表面上的高拉伸膜的硅晶片,以减少基板翘曲。 衬底的正方形中心区域适于在光刻工艺期间支撑X射线吸收材料。 在基板的下侧沉积有诸如钨的高强度拉伸膜层,以在基板制造过程中引起与基板相反的弯矩。 膜层的厚度与在制造过程中在衬底中引起的翘曲量成正比。 支撑环结合到基板的周边区域以提供完整性和支撑。

    Structure and method to ensure correct operation of an integrated circuit in the presence of ionizing radiation
    26.
    发明授权
    Structure and method to ensure correct operation of an integrated circuit in the presence of ionizing radiation 有权
    确保电离辐射存在时集成电路正确运行的结构和方法

    公开(公告)号:US09223037B2

    公开(公告)日:2015-12-29

    申请号:US13442062

    申请日:2012-04-09

    Abstract: Systems and methods to ensure correct operation of a semiconductor chip in the presence of ionizing radiation is disclosed. The system includes a semiconductor chip, a first radiation detection array incorporated in the semiconductor chip, and at least one additional radiation detection array incorporated in the semiconductor chip. a processor determines a region of the semiconductor chip affected by an incident radiation particle by analyzing a trajectory of the radiation particle determined from locations of sensors hit by the radiation particle in the first radiation detection array and the at least one additional radiation detection array. The processor determines whether corrective action is needed based on the region of the semiconductor chip affected by the incident radiation particle.

    Abstract translation: 公开了在存在电离辐射的情况下确保半导体芯片的正确操作的系统和方法。 该系统包括半导体芯片,并入半导体芯片中的第一辐射检测阵列和并入半导体芯片中的至少一个附加辐射检测阵列。 处理器通过分析从第一辐射检测阵列中的辐射粒子和至少一个附加辐射检测阵列所击中的传感器的位置确定的辐射粒子的轨迹来确定受入射辐射粒子影响的半导体芯片的区域。 处理器基于受入射辐射粒子影响的半导体芯片的区域来确定是否需要校正动作。

    STRUCTURE AND METHOD TO ENSURE CORRECT OPERATION OF AN INTEGRATED CIRCUIT IN THE PRESENCE OF IONIZING RADIATION
    30.
    发明申请
    STRUCTURE AND METHOD TO ENSURE CORRECT OPERATION OF AN INTEGRATED CIRCUIT IN THE PRESENCE OF IONIZING RADIATION 有权
    在放射性放射性的情况下确保整体电路的正确运行的结构和方法

    公开(公告)号:US20140032135A1

    公开(公告)日:2014-01-30

    申请号:US13442062

    申请日:2012-04-09

    Abstract: Systems and methods to ensure correct operation of a semiconductor chip in the presence of ionizing radiation is disclosed. The system includes a semiconductor chip, a first radiation detection array incorporated in the semiconductor chip, and at least one additional radiation detection array incorporated in the semiconductor chip. a processor determines a region of the semiconductor chip affected by an incident radiation particle by analyzing a trajectory of the radiation particle determined from locations of sensors hit by the radiation particle in the first radiation detection array and the at least one additional radiation detection array. The processor determines whether corrective action is needed based on the region of the semiconductor chip affected by the incident radiation particle.

    Abstract translation: 公开了在存在电离辐射的情况下确保半导体芯片的正确操作的系统和方法。 该系统包括半导体芯片,并入半导体芯片中的第一辐射检测阵列和并入半导体芯片中的至少一个附加辐射检测阵列。 处理器通过分析从第一辐射检测阵列中的辐射粒子和至少一个附加辐射检测阵列所击中的传感器的位置确定的辐射粒子的轨迹来确定受入射辐射粒子影响的半导体芯片的区域。 处理器基于受入射辐射粒子影响的半导体芯片的区域来确定是否需要校正动作。

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