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    System and method for forming a sealed chamber
    21.
    发明授权
    System and method for forming a sealed chamber 有权

    公开(公告)号：US09997328B2

    公开(公告)日：2018-06-12

    申请号：US15160972

    申请日：2016-05-20

    Applicant: APPLIED MATERIALS ISRAEL LTD.

    Inventor： Michael R. Rice ,  Ron Naftali ,  Natan Schlimoff ,  Igor Krivts (Krayvitz) ,  Israel Avneri ,  Yoram Uziel ,  Zvika Rozenberg ,  Erez Admoni ,  Yochanan Madmon

    IPC: G01N21/95 ,  G02B21/26 ,  H01J37/18 ,  H01J37/20 ,  H01L21/67

    CPC classification number: H01J37/18 ,  G01N21/9501 ,  G01N2201/023 ,  G02B21/26 ,  H01J37/20 ,  H01J2237/022 ,  H01J2237/182 ,  H01J2237/202 ,  H01L21/67126 ,  H01L21/6719 ,  H01L21/67196 ,  H01L21/67242

    Abstract: Chamber elements defining an internal chamber to be utilized during a substrate related stage selected from the group consisting of substrate manufacturing stage and substrate inspection stage, the chamber elements comprising: a first element having a first surface; a second element having a second surface about the periphery of the internal chamber; a third element connected to the second element; and a clamping mechanism that is connected to the second and third elements and is arranged to press the second element towards the first element; wherein a first area of the first surface and a second area of the second surface come into proximity with each other at a first interface; wherein the first surface is positioned above the second surface; wherein a gas groove and a vacuum groove are formed in the second area; wherein the second element comprises a gas conduit that is arranged to provide gas to the gas groove and a vacuum conduit that is arranged to provide vacuum to the vacuum groove; wherein a provision of the gas and the vacuum assists in a formation of a gas cushion between the first and second areas; wherein the chamber elements are operable to partially surround a first portion of a movement system and a substrate during the substrate related stage, the movement system is arranged to introduce a movement of the first element in relation to the second element and the third element, wherein the gas cushion maintains predefined conditions in the internal chamber during the movement.

    Slit valve with a pressurized gas bearing
    23.
    发明授权
    Slit valve with a pressurized gas bearing 有权
    带加压气体轴承的狭槽阀

    公开(公告)号：US09587749B2

    公开(公告)日：2017-03-07

    申请号：US14456258

    申请日：2014-08-11

    Applicant: Applied Materials Israel, Ltd.

    Inventor： Michael R. Rice ,  Natan Schlimoff ,  Igor Krivts (Krayvitz) ,  Israel Avneri ,  Yoram Uziel ,  Erez Admoni ,  Paul Reuter ,  William (Ty) Weaver

    IPC: F16K3/00 ,  F16K25/00 ,  F16K3/02 ,  F16K39/04 ,  F16K25/02 ,  F16K51/02 ,  F16K3/18

    CPC classification number: F16K3/0236 ,  F16K3/0227 ,  F16K3/188 ,  F16K25/02 ,  F16K39/04 ,  F16K51/02 ,  Y10T137/877

    Abstract: There is provided a slit valve, comprising: a first slit valve portion having a first window therethrough, the first window is sized to permit passage of an object through the first window; wherein the first window is surrounded by a first area of the first slit valve portion; a second slit valve portion that comprises a first sealing element and a first positioning module; wherein the first positioning module is arranged to move the first sealing element in relation to the first window; wherein at least one slit valve portion of the first and second slit valve portions comprises at least one first gas opening for emitting pressurized gas so as to assist in a creation of a first gas cushion between the first area and the first sealing element when the first sealing element is placed adjacent to the first window thus creating a seal between the first and second slit valve portions.

    Abstract translation: 提供了一种狭缝阀，包括：第一狭缝阀部分，其具有穿过其中的第一窗口，第一窗口的尺寸设定成允许物体通过第一窗口; 其中所述第一窗口被所述第一狭缝阀部分的第一区域包围; 第二狭缝阀部分，其包括第一密封元件和第一定位模块; 其中所述第一定位模块被布置成相对于所述第一窗口移动所述第一密封元件; 其中所述第一和第二狭缝阀部分的至少一个狭缝阀部分包括用于发射加压气体的至少一个第一气体开口，以便当所述第一和第二狭缝阀部分在所述第一和第二狭缝阀部分的所述第一和第二密封元件之间产生第一气垫时， 密封元件被放置成与第一窗口相邻，从而在第一和第二狭缝阀部分之间形成密封。

    SYSTEM FOR INSPECTING AND REVIEWING A SAMPLE
    24.
    发明申请
    SYSTEM FOR INSPECTING AND REVIEWING A SAMPLE 审中-公开
    检查和审查样本的系统

    公开(公告)号：US20160260642A1

    公开(公告)日：2016-09-08

    申请号：US14639003

    申请日：2015-03-04

    Applicant: APPLIED MATERIALS ISRAEL LTD.

    Inventor： Juergen Frosien ,  Jacob Levin ,  Igor Krivts (Krayvitz) ,  Yoram Uziel ,  Boris Golberg

    IPC: H01L21/66 ,  H01J37/18 ,  H01J37/22 ,  H01J37/20 ,  H01J37/29

    CPC classification number: H01L22/12 ,  H01J37/226 ,  H01J37/228 ,  H01J37/265 ,  H01J37/28 ,  H01J37/292 ,  H01J2237/2817

    Abstract: A system for inspecting and reviewing a sample, the system may include a chamber that is arranged to receive the sample and to maintain vacuum within the chamber during at least a scan period; an inspection unit; a review unit; and a mechanical stage for moving the sample, according to a scan pattern and during the scan period, in relation to the inspection unit and the review unit while a spatial relationship between the inspection unit and the review unit remains unchanged; wherein the inspection unit is arranged to detect, during the scan period, multiple suspected defects of the sample; and wherein the review unit is arranged to (a) receive, during the scan period, information about the multiple suspected defects; and (b) locate, during the scan period and in response to the information about the multiple suspected defects, at least one actual defect.

    Abstract translation: 一种用于检查和检查样品的系统，所述系统可以包括被布置成接收样品并且在至少扫描周期期间在腔室内维持真空的室; 检查单位; 一个审查单位; 以及用于在检查单元和检查单元之间相对于检查单元和检查单元根据扫描图案和扫描周期期间移动样品的机械台，而检查单元和检查单元之间的空间关系保持不变; 其中所述检查单元被布置成在所述扫描周期期间检测所述样品的多个可疑缺陷; 并且其中所述审查单元被布置为（a）在扫描周期期间接收关于所述多个可疑缺陷的信息; 并且（b）在扫描期间以及针对关于多个疑似缺陷的信息，至少存在一个实际缺陷。

    CONDUCTIVE ELEMENT FOR ELECTRICALLY COUPLING AN EUVL MASK TO A SUPPORTING CHUCK
    25.
    发明申请
    CONDUCTIVE ELEMENT FOR ELECTRICALLY COUPLING AN EUVL MASK TO A SUPPORTING CHUCK 有权
    将EUVL面罩电气连接到支撑卡盘的导电元件

    公开(公告)号：US20130075605A1

    公开(公告)日：2013-03-28

    申请号：US13623804

    申请日：2012-09-20

    Applicant: APPLIED MATERIALS ISRAEL, LTD.

    Inventor： Igor Krivts (Krayvitz) ,  Israel Avneri ,  Yoram Uziel ,  Nir Ben-David ,  Ido Holcman ,  Itzak Yair ,  Yosi Basson

    IPC: F16B17/00 ,  G01N23/18

    CPC classification number: H01J37/20 ,  F16B17/00 ,  G01N23/18 ,  G03F1/22 ,  G03F1/40 ,  H01J2237/0044 ,  H01J2237/20 ,  H01J2237/2008 ,  H01L21/6831 ,  Y10T279/23 ,  Y10T403/70

    Abstract: A coupling module may include an upper portion that defines an aperture, mask contact elements, chuck contact elements and an intermediate element that is connected between the mask contact elements and the upper portion. A shape and a size of the aperture may correspond to a shape and size of a pattern transfer area of an extreme ultra violet (EUVL) mask. The coupling module may be shaped and sized so that once the mask contact elements contact the upper portion of the EUVL mask, the chuck contact elements contact a chuck that supports the mask. The coupling module may further provide at least one conductive path between the upper portion of the EUVL mask and the chuck when the EUVL mask is positioned on the chuck.

    Abstract translation: 耦合模块可以包括限定孔的上部，掩模接触元件，卡盘接触元件和连接在掩模接触元件和上部之间的中间元件。 孔径的形状和尺寸可以对应于极紫外（EUVL）掩模的图案转移区域的形状和尺寸。 耦合模块的形状和尺寸可以使得一旦掩模接触元件接触EUVL掩模的上部，卡盘接触元件就接触支撑掩模的卡盘。 当EUVL掩模位于卡盘上时，耦合模块还可以在EUVL掩模的上部和卡盘之间提供至少一个导电路径。

    System for inspecting and reviewing a sample
    27.
    发明授权
    System for inspecting and reviewing a sample 有权

    公开(公告)号：US10177048B2

    公开(公告)日：2019-01-08

    申请号：US14639003

    申请日：2015-03-04

    Applicant: APPLIED MATERIALS ISRAEL LTD.

    Inventor： Juergen Frosien ,  Jacob Levin ,  Igor Krivts (Krayvitz) ,  Yoram Uziel ,  Boris Golberg

    IPC: H01J37/20 ,  H01L21/66 ,  H01J37/22 ,  H01J37/26 ,  H01J37/29

    Abstract: A system for inspecting and reviewing a sample, the system may include a chamber that is arranged to receive the sample and to maintain vacuum within the chamber during at least a scan period; an inspection unit; a review unit; and a mechanical stage for moving the sample, according to a scan pattern and during the scan period, in relation to the inspection unit and the review unit while a spatial relationship between the inspection unit and the review unit remains unchanged; wherein the inspection unit is arranged to detect, during the scan period, multiple suspected defects of the sample; and wherein the review unit is arranged to (a) receive, during the scan period, information about the multiple suspected defects; and (b) locate, during the scan period and in response to the information about the multiple suspected defects, at least one actual defect.

    Near-field sensor height control
    28.
    发明授权
    Near-field sensor height control 有权

    公开(公告)号：US10060736B1

    公开(公告)日：2018-08-28

    申请号：US15134771

    申请日：2016-04-21

    Applicant: APPLIED MATERIALS ISRAEL LTD.

    Inventor： Amir Moshe Sagiv ,  Yoram Uziel ,  Haim Feldman ,  Ron Naftali

    IPC: G01B15/00

    CPC classification number: G01B15/00

    Abstract: A method for determining a distance between a near field sensor and a substrate, the method may include creating a diffraction pattern by illuminating, with a beam of coherent radiation having a wavelength that does not exceed twenty nanometers, a slit that is formed between the substrate and an opaque element; detecting, by a detector, multiple portions of the diffraction pattern and generating detection signals indicative of the multiple portions of the diffraction pattern; processing the detection signals to determine a height of the slit; and determining the distance between the near field sensor and the substrate based upon (a) the height of the slit, and (b) a relationship between the height of the slit and a location of the near field sensor.

    Method for charging and imaging an object
    30.
    发明授权
    Method for charging and imaging an object 有权

    公开(公告)号：US09666412B1

    公开(公告)日：2017-05-30

    申请号：US15005679

    申请日：2016-01-25

    Applicant: Applied Materials Israel, Ltd.

    Inventor： Alon Litman ,  Yoram Uziel ,  Benzion Sender

    IPC: H01J37/28 ,  H01J37/20

    CPC classification number: H01J37/28 ,  H01J37/20 ,  H01J37/265 ,  H01J2237/0048 ,  H01J2237/15 ,  H01J2237/20285

    Abstract: A system that may include a first mechanical stage, a second mechanical stage, charged particle beam optics and a controller. The system may charge, with a charged particle beam, a slice of the object. During the charging of the slice the first mechanical stage may introduce a first movement along a first direction, between the object and charged particle beam optics. The charged particle beam optics may scan the slice with the charged particle beam. The scanning of the slice includes performing, by the charged particle optics, a first counter-movement deflection of the charged particle beam to at least partially counter the first movement. The second mechanical stage is configured to introduce a second movement along a second direction, between the object and the charged particle beam optics. Upon a completion of the charging of the slice, the second mechanical stage is configured to perform a first flyback operation.

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