公开(公告)号：US20090305513A1

公开(公告)日：2009-12-10

申请号：US12455938

申请日：2009-06-08

Applicant: Boris Kobrin

Inventor： Boris Kobrin

IPC: H01L21/30 ,  B05D5/06 ,  B05D1/32

CPC classification number: H05K3/1258 ,  H05K3/1275 ,  H05K2201/09045 ,  H05K2203/0143 ,  H05K2203/0522 ,  H05K2203/0568 ,  H05K2203/1173

Abstract: Embodiments of the invention relate to a method of functional materials deposition using a polymer template fabricated on a substrate. Such template forms an exposed and masked areas of the substrate material, and can be fabricated using polymer resists or Self-assembled monolayers. Deposition is performed using an applicator, which is fabricated in the shape of cylinder or cone made of soft elastomeric materials or laminated with soft elastomeric film. Functional materials, for example, metals, semiconductors, sol-gels, colloids of particles are deposited on the surface of applicator using liquid immersion, soaking, contact with wetted surfaces, vapor deposition or other techniques. Then wetted applicator is contacted the surface of the polymer template and rolled over it's surface. During this dynamic contact functional material is transferred selectively to the areas of the template. Patterning of functional material is achieved by lift-off of polymeric template after deposition. According to another embodiment, where self-assembled monolayers are used as template, selective deposition of functional materials is achieved either due to low surface energy of SAM or reactivity of terminal groups.

Abstract translation: 本发明的实施方案涉及使用在基底上制造的聚合物模板进行功能材料沉积的方法。 这种模板形成基底材料的暴露和掩蔽的区域，并且可以使用聚合物抗蚀剂或自组装单层制造。 使用施用器进行沉积，该施加器被制造成由柔性弹性体材料制成的圆筒或圆锥体形状，或者与柔性弹性体膜层压。 功能材料，例如金属，半导体，溶胶凝胶，粒子的胶体沉积在施涂器的表面上，使用液浸，浸泡，接触湿润表面，气相沉积或其它技术。 然后湿润的涂抹器与聚合物模板的表面接触并在其表面上滚动。 在该动态接触期间，功能材料被选择性地转移到模板的区域。 功能材料的图案化是通过在沉积后剥离聚合物模板来实现的。 根据另一个实施方案，其中使用自组装单层作为模板，功能材料的选择性沉积由于SAM的低表面能或端基的反应性而实现。

公开(公告)号：US20080248263A1

公开(公告)日：2008-10-09

申请号：US12077261

申请日：2008-03-17

Applicant: Boris Kobrin

Inventor： Boris Kobrin

IPC: B32B33/00 ,  C23C16/00 ,  C08J7/18 ,  C23C14/02

CPC classification number: C23C16/403 ,  C08J7/16 ,  C23C16/45514 ,  Y10T428/24802

Abstract: The present invention is related to a chemical vapor deposition method of depositing layers of materials to provide super-hydrophilic surface properties, or super-hydrophobic surface properties, or combinations of such properties at various locations on a given surface. The invention also relates to various product applications which make use of super-hydrophobic surface properties, such as electronic devices, biological analytical and diagnostic tools, and optical devices, for example.

Abstract translation: 本发明涉及沉积材料层以提供超亲水表面性质或超疏水性表面性质的化学气相沉积方法，或者给定表面上各种位置处的这些性质的组合。 本发明还涉及使用超疏水表面性质的各种产品应用，例如电子设备，生物分析和诊断工具以及光学装置。

公开(公告)号：US20060213441A1

公开(公告)日：2006-09-28

申请号：US11445706

申请日：2006-06-02

Applicant: Boris Kobrin ,  Romuald Nowak ,  Richard Yi ,  Jeffrey Chinn

Inventor： Boris Kobrin ,  Romuald Nowak ,  Richard Yi ,  Jeffrey Chinn

IPC: C23C16/00

CPC classification number: C23C16/45557 ,  B05D1/60 ,  B05D3/142 ,  B82Y30/00 ,  C23C16/4485 ,  C23C16/45561

Abstract: A vapor phase deposition method and apparatus for the application of thin layers and coatings on substrates. The method and apparatus are useful in the fabrication of electronic devices, micro-electromechanical systems (MEMS), Bio-MEMS devices, micro and nano imprinting lithography, and microfluidic devices. The apparatus used to carry out the method provides for the addition of a precise amount of each of the reactants to be consumed in a single reaction step of the coating formation process. The apparatus provides for precise addition of quantities of different combinations of reactants during a single step or when there are a number of different individual steps in the coating formation process. The precise addition of each of the reactants in vapor form is metered into a predetermined set volume at a specified temperature to a specified pressure, to provide a highly accurate amount of reactant.

Abstract translation: 一种用于在基底上施加薄层和涂层的气相沉积方法和装置。 该方法和装置可用于制造电子设备，微机电系统（MEMS），生物MEMS装置，微型和纳米压印光刻以及微流体装置。 用于实施该方法的装置提供了在涂层形成过程的单个反应步骤中添加精确量的每种待消耗的反应物。 该装置提供在单一步骤期间或当涂层形成过程中存在许多不同的单独步骤时精确添加量的不同组合的反应物。 将蒸气形式的每种反应物的精确加入在指定温度下计量到预定设定体积至指定压力，以提供高精度的反应物。

公开(公告)号：US20060201425A1

公开(公告)日：2006-09-14

申请号：US11076390

申请日：2005-03-08

Applicant: Boris Kobrin ,  Romuald Nowak ,  Jeffrey Chinn ,  Richard Yi

Inventor： Boris Kobrin ,  Romuald Nowak ,  Jeffrey Chinn ,  Richard Yi

IPC: C23C16/00

CPC classification number: C23C16/4402

Abstract: We have devised an apparatus useful for and a method of removing impurities from vaporous precursor compositions used to generate reactive precursor vapors from which thin films/layers are formed under sub-atmospheric conditions. The method is particularly useful when the layer deposition apparatus provides for precise addition of quantities of different combinations of reactants during a single step or when there are a number of different individual steps in the layer formation process, where the presence of impurities has a significant affect on both the quantity of reactants being charged and the overall composition of the reactant mixture from which the layer is deposited. The method is particularly useful when the vapor pressure of a liquid reactive precursor is less than about 250 Torr at atmospheric pressure.

Abstract translation: 我们已经设计了一种可用于从用于产生反应性前体蒸气的气态前体组合物中除去杂质的装置，其中在大气下条件下形成薄膜/层。 当层沉积设备在单一步骤期间提供量的不同组合的反应物的精确添加时或当层形成过程中存在多个不同的单独步骤时，该方法是特别有用的，其中杂质的存在具有显着的影响 在被充电的反应物的量和沉积层的反应物混合物的总体组成。 当液体反应性前体的蒸气压在大气压下小于约250乇时，该方法特别有用。

公开(公告)号：US20060049826A1

公开(公告)日：2006-03-09

申请号：US10469516

申请日：2002-03-01

Applicant: Michael Daneman ,  Franklin Wall ,  Behrang Behin ,  Murali Chaparala ,  Mark Chang ,  Scott Dalton ,  Timothy Beerling ,  Stephen Panyko ,  Meng-Hsiung Kiang ,  Boris Kobrin ,  Chuang-Chia Lin

Inventor： Michael Daneman ,  Franklin Wall ,  Behrang Behin ,  Murali Chaparala ,  Mark Chang ,  Scott Dalton ,  Timothy Beerling ,  Stephen Panyko ,  Meng-Hsiung Kiang ,  Boris Kobrin ,  Chuang-Chia Lin

IPC: G01B7/14

CPC classification number: G02B6/3518 ,  G02B6/3546 ,  G02B6/356 ,  G02B6/357 ,  G02B6/3572 ,  G02B6/3584 ,  G02B26/0841

Abstract: An optical cross-connect switch comprises a base (216), a flap (211) and one or more electrically conductive landing pads (222) connected to the flap (211). The flap (211) has a bottom portion that is movably coupled to the base (216) such that the flap (211) is movable with respect to a plane of the base (216) from a first orientation to a second orientation. The one or more landing pads (222) are electrically isolated from the flap (211) and electrically coupled to be equipotential with a landing surface.

Abstract translation: 光学交叉连接开关包括底座（216），翼片（211）和连接到翼片（211）的一个或多个导电着陆垫（222）。 翼片（211）具有可移动地联接到基部（216）的底部部分，使得翼片（211）能够相对于基部（216）的平面从第一方向移动到第二方向。 一个或多个着陆垫（222）与翼片（211）电隔离并且电耦合以与着陆表面等电位。

公开(公告)号：US20050271900A1

公开(公告)日：2005-12-08

申请号：US11112664

申请日：2005-04-21

Applicant: Boris Kobrin ,  Jeffrey Chinn ,  Romuald Nowak ,  Richard Yi

Inventor： Boris Kobrin ,  Jeffrey Chinn ,  Romuald Nowak ,  Richard Yi

IPC: B05D3/14 ,  B05D7/00 ,  B05D7/24 ,  B21D39/00 ,  B32B9/00 ,  B32B15/04 ,  C23C16/00 ,  C23C16/02 ,  C23C16/40 ,  C23C16/448 ,  C23C16/455 ,  C23C16/56

CPC classification number: C23C16/0227 ,  B05D1/185 ,  B05D1/60 ,  B05D3/142 ,  B05D3/145 ,  B05D7/52 ,  B05D7/56 ,  B82Y30/00 ,  B82Y40/00 ,  C03C17/42 ,  C03C23/006 ,  C23C16/0245 ,  C23C16/0272 ,  C23C16/401 ,  C23C16/402 ,  C23C16/448 ,  C23C16/4485 ,  C23C16/455 ,  C23C16/45557 ,  C23C16/56 ,  Y10T428/12618 ,  Y10T428/12632 ,  Y10T428/24 ,  Y10T428/24355 ,  Y10T428/24967 ,  Y10T428/24975 ,  Y10T428/261 ,  Y10T428/265 ,  Y10T428/31663 ,  Y10T428/31667

Abstract: An improved vapor-phase deposition method and apparatus for the application of multilayered films/coatings on substrates is described. The method is used to deposit multilayered coatings where the thickness of an oxide-based layer in direct contact with a substrate is controlled as a function of the chemical composition of the substrate, whereby a subsequently deposited layer bonds better to the oxide-based layer. The improved method is used to deposit multilayered coatings where an oxide-based layer is deposited directly over a substrate and an organic-based layer is directly deposited over the oxide-based layer. Typically, a series of alternating layers of oxide-based layer and organic-based layer are applied.

Abstract translation: 描述了一种用于在基底上施加多层膜/涂层的改进的气相沉积方法和装置。 该方法用于沉积与衬底直接接触的氧化物基层的厚度作为衬底的化学组成的函数来控制多层涂层，由此随后沉积的层更好地结合到氧化物基层。 改进的方法用于沉积多层涂层，其中氧化物基层直接沉积在衬底上，并且基于有机的层直接沉积在氧化物基层上。 通常，施加一系列交替层的氧化物基层和基于有机层。

公开(公告)号：US10249520B2

公开(公告)日：2019-04-02

申请号：US15616918

申请日：2017-06-08

Applicant: Boris Kobrin

Inventor： Boris Kobrin

IPC: H01L21/67 ,  H01L23/00 ,  H01L21/683 ,  H01L33/62 ,  H01L33/00 ,  H01L21/68 ,  B06B1/06

Abstract: Embodiments of the invention pertain to methods useful in transfer printing of small objects, like micro-LEDs from one substrate to another using acoustic or ultrasonic energy. The pickup of objects from a substrate is performed by transfer head equipped with sticky polymer and an array of ultrasonic transducers, and the high efficiency and selectivity of pickup of selected objects is done using ultrasonic energy directed towards the object. The disposing of objects to another substrate from a transfer head is done by directing an ultrasonic energy toward an object, which enable effective and selective detachment of an object from a sticky polymer. Yet another embodiment also uses a UV light source, which directs the light to the UV curable liquid disposed around the object on receiving substrate, thus curing this liquid would attach an object to receiving substrate.

公开(公告)号：US20180358246A1

公开(公告)日：2018-12-13

申请号：US15616918

申请日：2017-06-08

Applicant: Boris Kobrin

Inventor： Boris Kobrin

IPC: H01L21/67 ,  H01L33/00 ,  H01L21/68 ,  H01L33/62 ,  H01L23/00 ,  H01L21/683

CPC classification number: H01L21/67144 ,  B06B1/0607 ,  H01L21/681 ,  H01L21/6835 ,  H01L24/78 ,  H01L24/83 ,  H01L24/85 ,  H01L24/92 ,  H01L33/0079 ,  H01L33/62 ,  H01L2221/68363 ,  H01L2221/68381 ,  H01L2224/78347 ,  H01L2224/83005 ,  H01L2224/83205 ,  H01L2224/838 ,  H01L2224/83851 ,  H01L2224/83874 ,  H01L2224/85005 ,  H01L2224/85205 ,  H01L2224/92247 ,  H01L2933/0066

Abstract: Embodiments of the invention pertain to methods useful in transfer printing of small objects, like micro-LEDs from one substrate to another using acoustic or ultrasonic energy. The pickup of objects from a substrate is performed by transfer head equipped with sticky polymer and an array of ultrasonic transducers, and the high efficiency and selectivity of pickup of selected objects is done using ultrasonic energy directed towards the object. The disposing of objects to another substrate from a transfer head is done by directing an ultrasonic energy toward an object, which enable effective and selective detachment of an object from a sticky polymer. Yet another embodiment also uses a UV light source, which directs the light to the UV curable liquid disposed around the object on receiving substrate, thus curing this liquid would attach an object to receiving substrate.

公开(公告)号：US09465296B2

公开(公告)日：2016-10-11

申请号：US13546436

申请日：2012-07-11

Applicant: Boris Kobrin

Inventor： Boris Kobrin

IPC: G03F7/24 ,  G03F7/20 ,  G03F1/34 ,  G03F1/00 ,  G03F7/00 ,  G03F1/50 ,  G03F1/60 ,  B82Y40/00

CPC classification number: G03F7/2035 ,  B82Y40/00 ,  G03F1/0007 ,  G03F1/0084 ,  G03F1/34 ,  G03F1/50 ,  G03F1/60 ,  G03F7/0012 ,  G03F7/2014 ,  G03F7/2032

Abstract: Embodiments of the invention relate to methods and apparatus useful in the nanopatterning of large area substrates, where a movable nanostructured film is used to image a radiation-sensitive material. The nanopatterning technique makes use of Near-Field photolithography, where the nanostructured film used to modulate light intensity reaching radiation-sensitive layer. The Near-Field photolithography may make use of an elastomeric phase-shifting mask, or may employ surface plasmon technology, where a movable film comprises metal nano holes or nanoparticles.

Abstract translation: 本发明的实施例涉及在大面积基板的纳米图案中有用的方法和装置，其中使用可移动的纳米结构膜来对辐射敏感材料成像。 纳米图案技术利用近场光刻技术，其中纳米结构膜用于调制到达辐射敏感层的光强度。 近场光刻可以使用弹性体相移掩模，或者可以采用表面等离子体激元技术，其中可移动膜包括金属纳米孔或纳米颗粒。

公开(公告)号：US09069244B2

公开(公告)日：2015-06-30

申请号：US13767639

申请日：2013-02-14

Applicant: Boris Kobrin

Inventor： Boris Kobrin

IPC: G03F7/24 ,  G03F1/00 ,  G03F7/00 ,  G03F1/92 ,  B82Y10/00 ,  B82Y40/00

CPC classification number: G03F1/00 ,  B82Y10/00 ,  B82Y40/00 ,  G03F1/92 ,  G03F7/0002 ,  G03F7/24

Abstract: Methods for fabricating nanopatterned cylindrical photomasks are disclosed. A master pattern having nanometer scale features may be formed on a master substrate. A layer of an elastomer material may be formed on a surface of a transparent cylinder. The master pattern may be transferred from the master to the layer of elastomer material on the surface of the transparent cylinder. Alternatively, a nanopatterned cylindrical photomask may be fabricated by forming a pattern having nanometer scale features on an elastomer substrate and laminating the patterned elastomer substrate to a surface of a cylinder. In another method, a layer of elastomer material may be formed on a surface of a transparent cylinder and a pattern having nanometer scale features may be formed on the elastomer material by a direct patterning process.

Abstract translation: 公开了制备纳米图案圆柱形光掩模的方法。 具有纳米尺度特征的主图案可以形成在母板上。 可以在透明圆筒的表面上形成弹性体材料层。 主图案可以从主体转移到透明圆柱体表面上的弹性体材料层。 或者，可以通过在弹性体基底上形成具有纳米尺度特征的图案并将图案化的弹性体基底层压到圆柱体的表面上来制造纳米图案化圆柱形光掩模。 在另一种方法中，可以在透明圆柱体的表面上形成弹性体材料层，并且可以通过直接图案化工艺在弹性体材料上形成具有纳米尺度特征的图案。