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    Multidimensional Structural Access
    22.
    发明申请
    Multidimensional Structural Access 审中-公开
    多维结构访问

    公开(公告)号：US20150260784A1

    公开(公告)日：2015-09-17

    申请号：US14432712

    申请日：2013-10-04

    Applicant: FEI COMPANY

    Inventor： Jeffrey Blackwood ,  Sang Hoon Lee ,  Michael Schmidt ,  Stacey Stone ,  Karey Holland

    IPC: G01R31/265 ,  H01J37/153

    CPC classification number: G01R31/2653 ,  G01N1/286 ,  G01N1/32 ,  G01R31/2808 ,  G01R31/2898 ,  G01R31/307 ,  G01R31/312 ,  H01J37/153 ,  H01J37/3005 ,  H01J2237/208 ,  H01J2237/24564 ,  H01J2237/2817 ,  H01J2237/31749 ,  H01L22/14 ,  H01L2924/0002 ,  H01L2924/00

    Abstract: Multiple planes within the sample are exposed from a single perspective for contact by an electrical probe. The sample can be milled at a non-orthogonal angle to expose different layers as sloped surfaces. The sloped edges of multiple, parallel conductor planes provide access to the multiple levels from above. The planes can be accessed, for example, for contacting with an electrical probe for applying or sensing a voltage. The level of an exposed layer to be contacted can be identified, for example, by counting down the exposed layers from the sample surface, since the non-orthogonal mill makes all layers visible from above. Alternatively, the sample can be milled orthogonally to the surface, and then tilted and/or rotated to provide access to multiple levels of the device. The milling is preferably performed away from the region of interest, to provide electrical access to the region while minimizing damage to the region.

    Abstract translation: 样品中的多个平面从单个角度暴露出来，用于通过电探针进行接触。 样品可以以非正交角度研磨，以将不同的层暴露于倾斜的表面。 多个平行导体平面的倾斜边缘可从上方进入多个层次。 例如，可以访问平面，以便与用于施加或感测电压的电探针接触。 可以例如通过从样品表面倒下暴露的层来鉴定待接触的暴露层的水平，因为非正交磨机使得所有层从上方可见。 或者，样品可以与表面正交地研磨，然后倾斜和/或旋转以提供对该装置的多个级别的访问。 铣削优选地远离感兴趣的区域进行，以提供对该区域的电通路，同时使对该区域的损害最小化。

    METHOD FOR PREPARING THIN SAMPLES FOR TEM IMAGING
    23.
    发明申请
    METHOD FOR PREPARING THIN SAMPLES FOR TEM IMAGING 审中-公开
    用于制备TEM成像的稀薄样品的方法

    公开(公告)号：US20150102009A1

    公开(公告)日：2015-04-16

    申请号：US14514199

    申请日：2014-10-14

    Applicant: FEI Company

    Inventor： Michael Moriarty ,  Stacey Stone ,  Jeffrey Blackwood

    IPC: G01N1/32 ,  H01J37/02

    CPC classification number: G01N1/32 ,  G01N1/286 ,  G01N2001/2886 ,  H01J37/02 ,  H01J37/3056 ,  H01J2237/20 ,  H01J2237/2802 ,  H01J2237/31745 ,  H01L21/02318

    Abstract: A method and apparatus for preparing thin TEM samples in a manner that reduces or prevents bending and curtaining is realized. Embodiments of the present invention deposit material onto the face of a TEM sample during the process of preparing the sample. In some embodiments, the material can be deposited on a sample face that has already been thinned before the opposite face is thinned, which can serve to reinforce the structural integrity of the sample and refill areas that have been over-thinned due to a curtaining phenomena. In other embodiments, material can also be deposited onto the face being milled, which can serve to reduce or eliminate curtaining on the sample face.

    Abstract translation: 实现了以减少或防止弯曲和卷曲的方式制备薄TEM样品的方法和装置。 在制备样品的过程中，本发明的实施方案将材料沉积在TEM样品的表面上。 在一些实施例中，材料可以沉积在样品面上，该样品表面在相对面变薄之前已经变薄，这可以用于增强样品的结构完整性并且由于存在现象而已经被过度稀释的区域 。 在其他实施例中，材料也可以沉积到被研磨的面上，这可以用于减少或消除样品面上的绘制。

    Fiducial design for tilted or glancing mill operations with a charged particle beam
    25.
    发明授权
    Fiducial design for tilted or glancing mill operations with a charged particle beam 有权

    公开(公告)号：US11315756B2

    公开(公告)日：2022-04-26

    申请号：US16012888

    申请日：2018-06-20

    Applicant: FEI Company

    Inventor： Stacey Stone ,  Sang Hoon Lee ,  Jeffrey Blackwood ,  Michael Schmidt ,  Hyun Hwa Kim

    IPC: H01J37/317 ,  H01J37/305

    Abstract: A method for analyzing a sample with a charged particle beam including directing the beam toward the sample surface; milling the surface to expose a second surface in the sample in which the end of the second surface distal to ion source is milled to a greater depth relative to a reference depth than the end of the first surface proximal to ion source; directing the charged particle beam toward the second surface to form one or more images of the second surface; forming images of the cross sections of the multiple adjacent features of interest by detecting the interaction of the electron beam with the second surface; assembling the images of the cross section into a three-dimensional model of one or more of the features of interest. A method for forming an improved fiducial and determining the depth of an exposed feature in a nanoscale three-dimensional structure is presented.

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