THREE-DIMENSIONAL NANORIBBON-BASED DYNAMIC RANDOM-ACCESS MEMORY

    公开(公告)号:US20220068931A1

    公开(公告)日:2022-03-03

    申请号:US17522225

    申请日:2021-11-09

    Abstract: Described herein are IC devices that include semiconductor nanoribbons stacked over one another to realize high-density three-dimensional (3D) dynamic random-access memory (DRAM). An example device includes a first semiconductor nanoribbon, a second semiconductor nanoribbon, a first source or drain (S/D) region and a second S/D region in each of the first and second nanoribbons, a first gate stack at least partially surrounding a portion of the first nanoribbon between the first and second S/D regions in the first nanoribbon, and a second gate stack, not electrically coupled to the first gate stack, at least partially surrounding a portion of the second nanoribbon between the first and second S/D regions in the second nanoribbon. The device further includes a bitline coupled to the first S/D regions of both the first and second nanoribbons.

    Dense memory arrays utilizing access transistors with back-side contacts

    公开(公告)号:US11056492B1

    公开(公告)日:2021-07-06

    申请号:US16724691

    申请日:2019-12-23

    Abstract: Described herein are memory arrays where some memory cells include access transistors with one front-side and one back-side source/drain (S/D) contacts. An example memory array further includes a bitline, coupled to the first S/D region of the access transistor of a first memory cell of the memory array, and a plateline, coupled to a first capacitor electrode of a storage capacitor of the first memory cell. Because the access transistor is a transistor with one front-side and one back-side S/D contacts, the bitline may be provided in a first layer, the channel material—in a second layer, and the plateline—in a third layer, where the second layer is between the first layer and the third layer, which may allow increasing the density of memory cells in a memory array, or, conversely, reducing the footprint area of a memory array with a given density of memory cells.

    DENSE MEMORY ARRAYS UTILIZING ACCESS TRANSISTORS WITH BACK-SIDE CONTACTS

    公开(公告)号:US20210193666A1

    公开(公告)日:2021-06-24

    申请号:US16724691

    申请日:2019-12-23

    Abstract: Described herein are memory arrays where some memory cells include access transistors with one front-side and one back-side source/drain (S/D) contacts. An example memory array further includes a bitline, coupled to the first S/D region of the access transistor of a first memory cell of the memory array, and a plateline, coupled to a first capacitor electrode of a storage capacitor of the first memory cell. Because the access transistor is a transistor with one front-side and one back-side S/D contacts, the bitline may be provided in a first layer, the channel material—in a second layer, and the plateline—in a third layer, where the second layer is between the first layer and the third layer, which may allow increasing the density of memory cells in a memory array, or, conversely, reducing the footprint area of a memory array with a given density of memory cells.

    THREE-DIMENSIONAL NANORIBBON-BASED LOGIC

    公开(公告)号:US20210184052A1

    公开(公告)日:2021-06-17

    申请号:US16715135

    申请日:2019-12-16

    Abstract: Described herein are three-dimensional nanoribbon-based logic ICs that include one of more of 1) individual gate control in a vertical stack of nanoribbons, 2) inter-ribbon interconnects in a vertical stack of nanoribbons, and 3) both P- and N-type nanoribbons in a vertical stack of nanoribbons. Using one or more of these features may help realize unique monolithic 3D logic architectures that were not possible with conventional logic circuits and may allow realizing logic devices with favorable metrics in terms of power and performance while preserving the substrate area and cost.

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