Process for mapping formic acid distribution
    22.
    发明授权
    Process for mapping formic acid distribution 失效
    测定甲酸分布的方法

    公开(公告)号:US08342385B2

    公开(公告)日:2013-01-01

    申请号:US13089074

    申请日:2011-04-18

    IPC分类号: B23K31/02 B23K35/38

    摘要: A transfer process for bonding a solderable device to a solderable firsl substrate having a first oxidized surface comprises placing the solderable device proximate to the first substrate in a reducing chamber, where the first surface cannot be visually observed. We place a second substrate having a second oxidized surface in the chamber in a way to visually observe the second surface. Selecting the first substrate and the second substrate so that the reduction of the second surface correlates with the reduction of the first surface provides an indication of the degree of reduction of the first surface. Introducing a reducing agent into the chamber under reducing conditions reduces the surfaces which we track by irradiating and observing the second surface; evaluate any change in the second surface during irradiation and correlate the change with first surface reduction. When sufficiently reduced, we solder the first substrate to the device.

    摘要翻译: 用于将可焊接装置接合到具有第一氧化表面的可焊接冷杉基板的转移过程包括将可焊接装置靠近第一基板放置在还原室中,其中第一表面不能被目视观察。 我们以在目视上观察第二表面的方式放置在腔室中具有第二氧化表面的第二衬底。 选择第一基板和第二基板,使得第二表面的减小与第一表面的减小相关,提供第一表面的减小程度的指示。 在还原条件下将还原剂引入到室中通过照射和观察第二表面来减少我们跟踪的表面; 评估照射期间第二表面的任何变化,并将变化与第一表面还原相关联。 当充分减少时,我们将第一个衬底焊接到器件。

    TECHNIQUES FOR PROVIDING DECOUPLING CAPACITANCE
    24.
    发明申请
    TECHNIQUES FOR PROVIDING DECOUPLING CAPACITANCE 失效
    提供去耦电容的技术

    公开(公告)号:US20080176411A1

    公开(公告)日:2008-07-24

    申请号:US12056773

    申请日:2008-03-27

    IPC分类号: H01L21/31

    摘要: Techniques for electronic device fabrication are provided. In one aspect, an electronic device is provided. The electronic device comprises at least one interposer structure having one or mole vias and a plurality of decoupling capacitors integrated therein, the at least one interposer structure being configured to allow for one or more of the plurality of decoupling capacitors to be selectively deactivated. In another aspect, a method of fabricating an electronic device comprising at least one interposer structure having one or more vias and a plurality of decoupling capacitors integrated therein comprises the following step. One or more of the plurality of decoupling capacitors are selectively deactivated.

    摘要翻译: 提供电子器件制造技术。 一方面,提供一种电子设备。 电子设备包括具有一个或多个通孔和集成在其中的多个去耦电容器的至少一个插入器结构,所述至少一个插入器结构被配置为允许选择性地去激活多个去耦电容器中的一个或多个。 在另一方面,一种制造电子器件的方法,包括至少一个具有一个或多个通孔的内插器结构和集成在其中的多个去耦电容器,其包括以下步骤。 选择性地去激活多个去耦电容器中的一个或多个。