Electronic device including a charge storage component

    公开(公告)号:US11621331B2

    公开(公告)日:2023-04-04

    申请号:US17016682

    申请日:2020-09-10

    Abstract: A circuit and physical structure can help to counteract non-linear COSS associated with power transistors that operate at higher switching speeds and lower RDSON. In an embodiment, a component with a pn junction can be coupled to an n-channel IGFET. The component can include a p-channel IGFET, a pnp bipolar transistor, or both. A gate/capacitor electrode can be within a trench that is adjacent to the active regions of the component and n-channel IGFET, where the active regions can be within a semiconductor pillar. The combination of a conductive member and the semiconductor pillar of the component can be a charge storage component. The physical structure may include a compensation region, a barrier doped region, or both. In a particular embodiment, doped surface regions can be coupled to a buried conductive region without the use of a topside interconnect or a deep collector type of structure.

    Electronic Device Including an Enhancement-Mode HEMT and a Method of Using the Same

    公开(公告)号:US20190305123A1

    公开(公告)日:2019-10-03

    申请号:US16287400

    申请日:2019-02-27

    Abstract: An electronic device can include an enhancement-mode high electron mobility transistor (HEMT) that includes a source electrode; a drain electrode; and a gate. In an embodiment, the gate can correspond to spaced-apart gate electrodes and a space disposed between the spaced-apart gate electrodes, wherein the first space has a width configured such that, a continuous depletion region forms across all of the width of the first space. In another embodiment, the gate can be a gate electrode having a nonuniform thickness along a line in a gate width direction. In another aspect, a method of using the electronic device can include, during a transient period when the HEMT is in an off-state, flowing current from the drain electrode to the source electrode when Vds>−Vth+Vgs.

    SEMICONDUCTOR COMPONENT AND METHOD OF MANUFACTURE

    公开(公告)号:US20180342448A1

    公开(公告)日:2018-11-29

    申请号:US16036560

    申请日:2018-07-16

    Abstract: In accordance with an embodiment, a semiconductor component includes a support and a plurality of leads. An insulated metal substrate having a first portion and a second portion bonded to the support. A semiconductor chip comprising a III-N semiconductor material is bonded to the first portion of the insulated metal substrate and a first electrical interconnect is coupled between a drain bond pad the first portion of the insulated metal substrate. A second semiconductor chip is bonded to the first electrical interconnect. A second electrical interconnect coupled between a lead of the plurality of leads and the second semiconductor chip. In accordance with another embodiment, a method of manufacturing a semiconductor component includes coupling a first semiconductor chip to a first electrically conductive layer and coupling a second semiconductor chip to a second electrically conductive layer.

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