Capacitor and method for fabricating the same
    34.
    发明授权
    Capacitor and method for fabricating the same 有权
    电容器及其制造方法

    公开(公告)号:US06803617B2

    公开(公告)日:2004-10-12

    申请号:US10340713

    申请日:2003-01-13

    IPC分类号: H01G706

    CPC分类号: H01L28/55 H01L27/0805

    摘要: The capacitor comprises an lower electrode 22, a dielectric film 30 formed on the lower electrode 22, a floating electrode 20 formed on the dielectric film 30, a dielectric film 50 formed on the floating electrode 40 and having a film orientation different from that of the dielectric film 30, and an upper electrode 80 formed on the dielectric film 50, whereby various characteristics depending on film orientations of the dielectric films can be simultaneously improved.

    摘要翻译: 电容器包括下电极22,形成在下电极22上的电介质膜30,形成在电介质膜30上的浮动电极20,形成在浮动电极40上并且具有不同于 电介质膜30和形成在电介质膜50上的上电极80,由此可以同时改善取决于电介质膜的膜取向的各种特性。

    Laminated thin-film device, manufacturing method thereof, and circuit

    公开(公告)号:US20110073993A1

    公开(公告)日:2011-03-31

    申请号:US12926733

    申请日:2010-12-07

    IPC分类号: H01L29/92 H01L21/02

    CPC分类号: H01L28/55

    摘要: The present invention provides a novel capacitor element, laminated thin-film device, and circuit wherein the capacitance dependency on voltage can be appropriately adjusted, and a technology for manufacturing such a capacitor element and laminated thin-film device. In the capacitor element that comprises a pair of electrode layers and a dielectric layer disposed between the electrode layers, a well region where an ion is implanted is disposed in the dielectric layer, and the C-V curve between the electrode layers is shifted or shifted and expanded in at least one direction of the plus direction and minus direction with respect to the voltage axis.

    Laminated thin-film device, manufacturing method thereof, and circuit
    37.
    发明授权
    Laminated thin-film device, manufacturing method thereof, and circuit 有权
    层压薄膜器件及其制造方法和电路

    公开(公告)号:US07867869B2

    公开(公告)日:2011-01-11

    申请号:US10458678

    申请日:2003-06-11

    IPC分类号: H01L21/203

    CPC分类号: H01L28/55

    摘要: The present invention provides a novel capacitor element, laminated thin-film device, and circuit wherein the capacitance dependency on voltage can be appropriately adjusted, and a technology for manufacturing such a capacitor element and laminated thin-film device. In the capacitor element that comprises a pair of electrode layers and a dielectric layer disposed between the electrode layers, a well region where an ion is implanted is disposed in the dielectric layer, and the C-V curve between the electrode layers is shifted or shifted and expanded in at least one direction of the plus direction and minus direction with respect to the voltage axis.

    摘要翻译: 本发明提供了一种新颖的电容器元件,层叠薄膜器件以及可以适当地调节电容对电压的依赖性的电路,以及用于制造这种电容器元件和层叠薄膜器件的技术。 在包括一对电极层和设置在电极层之间的电介质层的电容器元件中,在电介质层中设置注入离子的阱区,电极层之间的CV曲线偏移或偏移 在相对于电压轴的正方向和负方向的至少一个方向上。

    Electromagnetic radiation sensor and method for fabricating the same
    40.
    发明授权
    Electromagnetic radiation sensor and method for fabricating the same 有权
    电磁辐射传感器及其制造方法

    公开(公告)号:US07365327B2

    公开(公告)日:2008-04-29

    申请号:US11086909

    申请日:2005-03-23

    IPC分类号: G01J5/02

    CPC分类号: H01L31/101 G01J1/42 H01L37/02

    摘要: An SiO2 layer (3), a Ti layer (4), a Pt layer (5), a PLZT layer (6) and an IrO2 layer (7) are formed sequentially on an Si substrate (2). The IrO2 layer (7) functioning as a top electrode has a thickness of about 100 nm. Since the IrO2 layer (7) has conductivity lower than that of Pt or the like conventionally used as a top electrode and a skin depth deeper than that of Pt or the like, sufficient sensitivity can be attained by a thickness of about 100 nm.

    摘要翻译: SiO 2层(3),Ti层(4),Pt层(5),PLZT层(6)和IrO 2层(7) 顺序地形成在Si衬底(2)上。 用作顶部电极的IrO 2层(7)具有约100nm的厚度。 由于IrO 2层(7)的导电率比常规用作顶部电极的Pt等等的电导率低,而且比Pt等的深度更深,因此可以通过 厚度约100nm。