公开(公告)号：US10163737B2

公开(公告)日：2018-12-25

申请号：US15169535

申请日：2016-05-31

Applicant: STATS ChipPAC Pte. Ltd.

Inventor： Yaojian Lin ,  Kang Chen

IPC: H01L23/498 ,  H01L21/66 ,  H01L21/56 ,  H01L23/28 ,  H01L23/00 ,  H01L23/538 ,  H01L25/10 ,  H01L23/31 ,  H01L21/48 ,  H01L21/78

Abstract: A semiconductor device has a first interconnect structure formed over the carrier. A semiconductor die is disposed over the first interconnect structure after testing the first interconnect structure to be known good. The semiconductor die in a known good die. A vertical interconnect structure, such as a bump or stud bump, is formed over the first interconnect structure. A discrete semiconductor device is disposed over the first interconnect structure or the second interconnect structure. An encapsulant is deposited over the semiconductor die, first interconnect structure, and vertical interconnect structure. A portion of the encapsulant is removed to expose the vertical interconnect structure. A second interconnect structure is formed over the encapsulant and electrically connected to the vertical interconnect structure. The first interconnect structure or the second interconnect structure includes an insulating layer with an embedded glass cloth, glass cross, filler, or fiber.

公开(公告)号：US20180331018A1

公开(公告)日：2018-11-15

申请号：US16030668

申请日：2018-07-09

Applicant: STATS ChipPAC Pte. Ltd.

Inventor： Il Kwon Shim ,  Yaojian Yaojian ,  Pandi C. Marimuthu ,  Kang Chen ,  Yu Gu

IPC: H01L23/48 ,  H01L25/10 ,  H01L23/498 ,  H01L21/56 ,  H01L23/00 ,  H01L23/31 ,  H01L23/538 ,  H01L25/00

CPC classification number: H01L23/481 ,  H01L21/561 ,  H01L21/563 ,  H01L21/565 ,  H01L23/3121 ,  H01L23/3128 ,  H01L23/49816 ,  H01L23/49827 ,  H01L23/49833 ,  H01L23/49838 ,  H01L23/5389 ,  H01L24/11 ,  H01L24/19 ,  H01L24/20 ,  H01L24/32 ,  H01L24/48 ,  H01L24/96 ,  H01L24/97 ,  H01L25/105 ,  H01L25/50 ,  H01L2224/0401 ,  H01L2224/04105 ,  H01L2224/05548 ,  H01L2224/05552 ,  H01L2224/05567 ,  H01L2224/12105 ,  H01L2224/13022 ,  H01L2224/24155 ,  H01L2224/32225 ,  H01L2224/48091 ,  H01L2224/48227 ,  H01L2224/73267 ,  H01L2224/94 ,  H01L2224/97 ,  H01L2225/1035 ,  H01L2225/1058 ,  H01L2225/107 ,  H01L2924/00014 ,  H01L2924/01322 ,  H01L2924/12041 ,  H01L2924/12042 ,  H01L2924/1306 ,  H01L2924/13091 ,  H01L2924/15311 ,  H01L2924/181 ,  H01L2924/3511 ,  H01L2924/00 ,  H01L2224/19 ,  H01L2224/03 ,  H01L2924/00012 ,  H01L2224/45099 ,  H01L2224/45015 ,  H01L2924/207

Abstract: A semiconductor device has a semiconductor package and an interposer disposed over the semiconductor package. The semiconductor package has a first semiconductor die and a modular interconnect unit disposed in a peripheral region around the first semiconductor die. A second semiconductor die is disposed over the interposer opposite the semiconductor package. An interconnect structure is formed between the interposer and the modular interconnect unit. The interconnect structure is a conductive pillar or stud bump. The modular interconnect unit has a core substrate and a plurality of vertical interconnects formed through the core substrate. A build-up interconnect structure is formed over the first semiconductor die and modular interconnect unit. The vertical interconnects of the modular interconnect unit are exposed by laser direct ablation. An underfill is deposited between the interposer and semiconductor package. A total thickness of the semiconductor package and build-up interconnect structure is less than 0.4 millimeters.

公开(公告)号：US20170194228A1

公开(公告)日：2017-07-06

申请号：US15461713

申请日：2017-03-17

Applicant: STATS ChipPAC Pte. Ltd.

Inventor： Kian Meng Heng ,  Hin Hwa Goh ,  Jose Alvin Caparas ,  Kang Chen ,  Seng Guan Chow ,  Yaojian Lin

IPC: H01L23/31 ,  H01L21/78 ,  H01L21/56

CPC classification number: H01L23/3128 ,  H01L21/561 ,  H01L21/568 ,  H01L21/78 ,  H01L23/562 ,  H01L24/19 ,  H01L24/20 ,  H01L24/96 ,  H01L2224/04105 ,  H01L2224/12105 ,  H01L2924/01322 ,  H01L2924/12041 ,  H01L2924/12042 ,  H01L2924/13091 ,  H01L2924/181 ,  H01L2924/3511 ,  H01L2924/37001 ,  H01L2924/00

Abstract: A semiconductor device has a substrate with a plurality of active semiconductor die disposed over a first portion of the substrate and a plurality of non-functional semiconductor die disposed over a second portion of the substrate while leaving a predetermined area of the substrate devoid of the active semiconductor die and non-functional semiconductor die. The predetermined area of the substrate devoid of the active semiconductor die and non-functional semiconductor die includes a central area, checkerboard pattern, linear, or diagonal area of the substrate. The substrate can be a circular shape or rectangular shape. An encapsulant is deposited over the active semiconductor die, non-functional semiconductor die, and substrate. An interconnect structure is formed over the semiconductor die. The absence of active semiconductor die and non-functional semiconductor die from the predetermined areas of the substrate reduces bending stress in that area of the substrate.

公开(公告)号：US20160351419A1

公开(公告)日：2016-12-01

申请号：US15235008

申请日：2016-08-11

Applicant: STATS ChipPAC Pte. Ltd.

Inventor： Yaojian Lin ,  Kang Chen ,  Hin Hwa Goh ,  Il Kwon Shim

IPC: H01L21/48 ,  H01L21/56 ,  H01L23/498

CPC classification number: H01L21/485 ,  H01L21/4853 ,  H01L21/486 ,  H01L21/561 ,  H01L21/568 ,  H01L23/13 ,  H01L23/49816 ,  H01L23/49827 ,  H01L23/49833 ,  H01L23/49838 ,  H01L23/5385 ,  H01L23/5386 ,  H01L23/5389 ,  H01L23/562 ,  H01L24/19 ,  H01L24/20 ,  H01L24/96 ,  H01L24/97 ,  H01L2224/04105 ,  H01L2224/12105 ,  H01L2224/24155 ,  H01L2224/97 ,  H01L2225/1035 ,  H01L2225/1041 ,  H01L2225/1058 ,  H01L2225/107 ,  H01L2924/01322 ,  H01L2924/12041 ,  H01L2924/12042 ,  H01L2924/13091 ,  H01L2924/181 ,  H01L2924/3511 ,  H01L2924/00 ,  H01L2224/82

Abstract: A semiconductor device has a substrate. A conductive via is formed through the substrate. A plurality of first contact pads is formed over a first surface of the substrate. A plurality of second contact pads is formed over a second surface of the substrate. A dummy pattern is formed over the second surface of the substrate. An indentation is formed in a sidewall of the substrate. An opening is formed through the substrate. An encapsulant is deposited in the opening. An insulating layer is formed over second surface of the substrate. A dummy opening is formed in the insulating layer. A semiconductor die is disposed adjacent to the substrate. An encapsulant is deposited over the semiconductor die and substrate. The first surface of the substrate includes a width that is greater than a width of the second surface of the substrate.

公开(公告)号：US11024561B2

公开(公告)日：2021-06-01

申请号：US16885640

申请日：2020-05-28

Applicant: STATS ChipPAC Pte. Ltd.

Inventor： Il Kwon Shim ,  Yaojian Lin ,  Pandi C. Marimuthu ,  Kang Chen ,  Yu Gu

IPC: H01L23/48 ,  H01L23/00 ,  H01L23/31 ,  H01L23/498 ,  H01L21/56 ,  H01L25/10 ,  H01L25/00 ,  H01L23/538

Abstract: A semiconductor device has a semiconductor package and an interposer disposed over the semiconductor package. The semiconductor package has a first semiconductor die and a modular interconnect unit disposed in a peripheral region around the first semiconductor die. A second semiconductor die is disposed over the interposer opposite the semiconductor package. An interconnect structure is formed between the interposer and the modular interconnect unit. The interconnect structure is a conductive pillar or stud bump. The modular interconnect unit has a core substrate and a plurality of vertical interconnects formed through the core substrate. A build-up interconnect structure is formed over the first semiconductor die and modular interconnect unit. The vertical interconnects of the modular interconnect unit are exposed by laser direct ablation. An underfill is deposited between the interposer and semiconductor package. A total thickness of the semiconductor package and build-up interconnect structure is less than 0.4 millimeters.

公开(公告)号：US20200294890A1

公开(公告)日：2020-09-17

申请号：US16885640

申请日：2020-05-28

Applicant: STATS ChipPAC Pte. Ltd.

Inventor： Il Kwon Shim ,  Yaojian Lin ,  Pandi C. Marimuthu ,  Kang Chen ,  Yu Gu

IPC: H01L23/48 ,  H01L23/00 ,  H01L23/31 ,  H01L23/498 ,  H01L21/56 ,  H01L25/10 ,  H01L25/00 ,  H01L23/538

Abstract: A semiconductor device has a semiconductor package and an interposer disposed over the semiconductor package. The semiconductor package has a first semiconductor die and a modular interconnect unit disposed in a peripheral region around the first semiconductor die. A second semiconductor die is disposed over the interposer opposite the semiconductor package. An interconnect structure is formed between the interposer and the modular interconnect unit. The interconnect structure is a conductive pillar or stud bump. The modular interconnect unit has a core substrate and a plurality of vertical interconnects formed through the core substrate. A build-up interconnect structure is formed over the first semiconductor die and modular interconnect unit. The vertical interconnects of the modular interconnect unit are exposed by laser direct ablation. An underfill is deposited between the interposer and semiconductor package. A total thickness of the semiconductor package and build-up interconnect structure is less than 0.4 millimeters.

公开(公告)号：US10707150B2

公开(公告)日：2020-07-07

申请号：US16030668

申请日：2018-07-09

Applicant: STATS ChipPAC Pte. Ltd.

Inventor： Il Kwon Shim ,  Yaojian Lin ,  Pandi C. Marimuthu ,  Kang Chen ,  Yu Gu

IPC: H01L23/48 ,  H01L23/00 ,  H01L23/31 ,  H01L23/498 ,  H01L21/56 ,  H01L25/10 ,  H01L25/00 ,  H01L23/538

Abstract: A semiconductor device has a semiconductor package and an interposer disposed over the semiconductor package. The semiconductor package has a first semiconductor die and a modular interconnect unit disposed in a peripheral region around the first semiconductor die. A second semiconductor die is disposed over the interposer opposite the semiconductor package. An interconnect structure is formed between the interposer and the modular interconnect unit. The interconnect structure is a conductive pillar or stud bump. The modular interconnect unit has a core substrate and a plurality of vertical interconnects formed through the core substrate. A build-up interconnect structure is formed over the first semiconductor die and modular interconnect unit. The vertical interconnects of the modular interconnect unit are exposed by laser direct ablation. An underfill is deposited between the interposer and semiconductor package. A total thickness of the semiconductor package and build-up interconnect structure is less than 0.4 millimeters.

公开(公告)号：US10475779B2

公开(公告)日：2019-11-12

申请号：US15676488

申请日：2017-08-14

Applicant: STATS ChipPAC Pte. Ltd.

Inventor： Yaojian Lin ,  Kang Chen ,  Seung Wook Yoon

IPC: H01L25/00 ,  H01L21/768 ,  H01L23/522 ,  H01L23/31 ,  H01L23/498 ,  H01L21/56 ,  H01L23/538 ,  H01L23/552 ,  H01L21/683 ,  H01L23/00 ,  H01L25/065 ,  H01L25/10

Abstract: A semiconductor device has an encapsulant deposited over a first surface of the semiconductor die and around the semiconductor die. A first insulating layer is formed over a second surface of the semiconductor die opposite the first surface. A conductive layer is formed over the first insulating layer. An interconnect structure is formed through the encapsulant outside a footprint of the semiconductor die and electrically connected to the conductive layer. The first insulating layer includes an optically transparent or translucent material. The semiconductor die includes a sensor configured to receive an external stimulus passing through the first insulating layer. A second insulating layer is formed over the first surface of the semiconductor die. A conductive via is formed through the first insulating layer outside a footprint of the semiconductor die. A plurality of stacked semiconductor devices is electrically connected through the interconnect structure.

公开(公告)号：US10446479B2

公开(公告)日：2019-10-15

申请号：US15807102

申请日：2017-11-08

Applicant: STATS ChipPAC Pte. Ltd.

Inventor： Pandi C. Marimuthu ,  Yaojian Lin ,  Kang Chen ,  Yu Gu ,  Won Kyoung Choi

IPC: H01L23/498 ,  H01L23/00 ,  H01L23/31 ,  H01L21/48 ,  H01L21/56 ,  H01L23/538 ,  H01L25/10 ,  H01L21/683 ,  H01L25/065 ,  H01L23/13 ,  H01L23/14

Abstract: A semiconductor device has a substrate. A plurality of conductive vias is formed through the substrate. A conductive layer is formed over the substrate. An insulating layer is formed over conductive layer. A portion of the substrate is removed to expose the conductive vias. A plurality of vertical interconnect structures is formed over the substrate. A first semiconductor die is disposed over the substrate. A height of the vertical interconnect structures is less than a height of the first semiconductor die. An encapsulant is deposited over the first semiconductor die and the vertical interconnect structures. A first portion of the encapsulant is removed from over the first semiconductor die while leaving a second portion of the encapsulant over the vertical interconnect structures. The second portion of the encapsulant is removed to expose the vertical interconnect structures. A second semiconductor die is disposed over the first semiconductor die.

公开(公告)号：US10304817B2

公开(公告)日：2019-05-28

申请号：US15705646

申请日：2017-09-15

Applicant: STATS ChipPAC Pte. Ltd.

Inventor： Yaojian Lin ,  Kang Chen

IPC: H01L23/31 ,  H01L23/498 ,  H01L25/065 ,  H01L25/00 ,  H01L21/56 ,  H01L23/538 ,  H01L23/00 ,  H01L25/10 ,  H01L23/552 ,  H01L21/66

Abstract: A semiconductor device has a first build-up interconnect structure formed over a substrate. The first build-up interconnect structure includes an insulating layer and conductive layer formed over the insulating layer. A vertical interconnect structure and semiconductor die are disposed over the first build-up interconnect structure. The semiconductor die, first build-up interconnect structure, and substrate are disposed over a carrier. An encapsulant is deposited over the semiconductor die, first build-up interconnect structure, and substrate. A second build-up interconnect structure is formed over the encapsulant. The second build-up interconnect structure electrically connects to the first build-up interconnect structure through the vertical interconnect structure. The substrate provides structural support and prevents warpage during formation of the first and second build-up interconnect structures. The substrate is removed after forming the second build-up interconnect structure. A portion of the insulating layer is removed exposing the conductive layer for electrical interconnect with subsequently stacked semiconductor devices.